| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 11/07/2001 | CN1074426C Metal ion reduction in novolak resin solution in PGMEA |
| 11/07/2001 | CN1074425C Metal ion content in novolak resin solution reduced by anion exchange resin |
| 11/06/2001 | US6313953 Gas chemical filtering for optimal light transmittance; and methods |
| 11/06/2001 | US6313918 Single-pass and multi-pass interferometery systems having a dynamic beam-steering assembly for measuring distance, angle, and dispersion |
| 11/06/2001 | US6313905 Apparatus and method for defining a pattern on a substrate |
| 11/06/2001 | US6313903 Resist coating and developing unit |
| 11/06/2001 | US6313567 Lithography chuck having piezoelectric elements, and method |
| 11/06/2001 | US6313492 Integrated circuit chip produced by using frequency doubling hybrid photoresist |
| 11/06/2001 | US6313467 Broad spectrum ultraviolet inspection methods employing catadioptric imaging |
| 11/06/2001 | US6313453 Glassmastering photoresist read after write method and system |
| 11/06/2001 | US6313327 Carboxylic acid derivatives and their synthesis method |
| 11/06/2001 | US6313314 Reacting 4-acetamidobenzenesulfonyl halide compound with azide; deblocking, deacetylation; solvent extraction; dehydration with acetic anhydride and metal acetate; cyclization, imidation |
| 11/06/2001 | US6313188 Photocationically polymerizable composition comprising a polycyclic aromatic compound |
| 11/06/2001 | US6313078 Removing deposited contaminant adhered to resist developing apparatus using cleaning composition comprising surfactant containing phenyl group, sulfonated aromatic compound, water |
| 11/06/2001 | US6313041 Method of enhancing the rate of removal of a layer of light-sensitive material after an etching step in the fabrication of semiconductor electronic devices |
| 11/06/2001 | US6312872 Composite relief image printing plates |
| 11/06/2001 | US6312871 Composite relief image printing plates |
| 11/06/2001 | US6312870 t-butyl cinnamate polymers and their use in photoresist compositions |
| 11/06/2001 | US6312869 Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group |
| 11/06/2001 | US6312868 Photoresist cross-linker and photoresist composition comprising the same |
| 11/06/2001 | US6312867 Ester compounds, polymers, resist compositions and patterning process |
| 11/06/2001 | US6312865 Semiconductor device using polymer-containing photoresist, and process for manufacturing the same |
| 11/06/2001 | US6312863 Alkali-soluble resin; photosensitizer comprising an ester of a 1,2-naphthoquinonediazidesulfonyl compound with a substituted m-bis(hydroxybenzyl)phenol |
| 11/06/2001 | US6312860 Inorganic phosphor, capable of emitting blue color upon ultraviolet irradiation, and copper or a copper compound; no deterioration in the brightness or variation in the coloration of the phosphor. |
| 11/06/2001 | US6312859 Projection exposure method with corrections for image displacement |
| 11/06/2001 | US6312857 Silver halide emulsion layer and a physical development center layer formed between the glass substrate and the silver halide emulsion layer; metal silver image having a maximum optical density of 1.0 or more. |
| 11/06/2001 | US6312854 Method of patterning sub-0.25 lambda line features with high transmission, “attenuated” phase shift masks |
| 11/06/2001 | US6312527 Non-corrosive cleaning method for use in the manufacture of microelectronic device |
| 11/06/2001 | US6312518 Apparatus for forming a photoresist film in a semiconductor device and method of forming a photoresist film using the same |
| 11/06/2001 | US6312373 Method of manufacturing an optical system |
| 11/06/2001 | US6312171 Developing apparatus and method thereof |
| 11/06/2001 | US6312134 Seamless, maskless lithography system using spatial light modulator |
| 11/04/2001 | CA2346149A1 Photo-reactive benzocyclobutenones and polymers therefrom for self-photocuring, photo-crosslinking and photopatterning without catalysts |
| 11/01/2001 | WO2001082055A1 Reticle management system |
| 11/01/2001 | WO2001082002A1 Resist stripper composition |
| 11/01/2001 | WO2001082001A1 Lithography system with device for exposing the periphery of a wafer |
| 11/01/2001 | WO2001082000A1 Optical reduction system with elimination of reticle diffraction induced bias |
| 11/01/2001 | WO2001081999A1 Active reticle, method for making same, ion projecting lithography method using same and equipment therefor |
| 11/01/2001 | WO2001081997A1 Selectively colorable polymerizable compositions |
| 11/01/2001 | WO2001081977A2 Optical reduction system with control of illumination polarization |
| 11/01/2001 | WO2001081976A2 Apparatus, system, and method for active compensation of aberrations in an optical system |
| 11/01/2001 | WO2001081970A2 Apparatus, system, and method for precision positioning and alignment of a lens in an optical system |
| 11/01/2001 | WO2001081907A1 Method and apparatus for measurement, and method and apparatus for exposure |
| 11/01/2001 | WO2001081203A1 Pod for carrying reticle cassette |
| 11/01/2001 | WO2001081171A1 Wafer stage with magnetic bearings |
| 11/01/2001 | WO2001030725A3 Diisopropylbenzene solvent for developing flexographic printing plates |
| 11/01/2001 | WO2000054091A9 Illumination system and method for spatial modulators |
| 11/01/2001 | US20010037487 Method of extracting characters and computer-readable recording medium |
| 11/01/2001 | US20010037037 Oximesulfonic acid esters and the use thereof as latent sulfonic acids |
| 11/01/2001 | US20010036998 Comprising di-, tri- and/or tetra-(alkoxy/phenoxy)silanes and a thermosetting resin which can be condensed therewith which has an absorption capacity with respect to exposing light; can be etched at high rate for fine resist patterns |
| 11/01/2001 | US20010036978 Bis-acylphosphine oxides and acylphosphine oxides for curing photopolymerizable compositions without yellowing; use in white surface coatings, as negative photoresists, in printing plates |
| 11/01/2001 | US20010036749 Apparatus and methods for integrated circuit planarization |
| 11/01/2001 | US20010036748 Compatibilization treatment |
| 11/01/2001 | US20010036745 Method of forming a mask |
| 11/01/2001 | US20010036743 Mask for producing rectangular openings in a substrate |
| 11/01/2001 | US20010036739 Interim oxidation of silsesquioxane dielectric for dual damascene process |
| 11/01/2001 | US20010036732 Method of manufacturing semiconductor device having minute gate electrodes |
| 11/01/2001 | US20010036629 Sequencing of surface immobilized polymers utilizing microfluorescence detection |
| 11/01/2001 | US20010036604 Projection optical system forming multiple patterns |
| 11/01/2001 | US20010036602 Controlling photoresist exposure to actinic radiation |
| 11/01/2001 | US20010036599 Pattern forming material and pattern forming method |
| 11/01/2001 | US20010036597 Containing sizing agent |
| 11/01/2001 | US20010036595 Method and apparatus for manufacturing sensitized printing plate |
| 11/01/2001 | US20010036594 Mixture of alkali-soluble resin and polysiloxane containing oxetane ring |
| 11/01/2001 | US20010036593 Chemical amplification type resist composition |
| 11/01/2001 | US20010036591 Radiation sensitive compositions of a cationically polymerizable or curable compound, a compound that increases solubility in developer under acidification, and asymmetrical diaryliodonium salt; storage stable; relief images |
| 11/01/2001 | US20010036590 Alkali-soluble resin of specific structure, such as a vinylphenol-vinylnaphthalene copolymer, a crosslinking agent causing crosslinking by an acid, and an acid generator; storage stability, resolution, sensitivity |
| 11/01/2001 | US20010036589 Chemically amplified resist composition |
| 11/01/2001 | US20010036588 Mask carrier having masks having different aperture patterns to be imaged onto respective areas of the substrate, and mask assembly projects different patterns at different times; partitioning into sub-areas allows smaller exposure fields |
| 11/01/2001 | US20010036584 Comprising an addition polymerizable ethenically unsaturated compound, photoinitiator, an oxide of at least one of copper, iron, manganese, chromium, cobalt, nickel, and aluminum, halogen-free; storage stability |
| 11/01/2001 | US20010036583 Semitransparent phase shifting (SPS) mask has in the periphery pattern element area, a light shielding portion formed by a SPS portion and a transparent portion with optimal size combination; prevents double exposure |
| 11/01/2001 | US20010036582 Comprising a rectangular portion, and band-shaped portions separated from opposite sides of the rectangular portion by an equal distance and parallel to the sides; overlay shift accurately obtained even when photoresist heat shrinks |
| 11/01/2001 | US20010036581 Photolithography; positioning an exposure mask and an object to be processed to locate the object in a region where near-field light is present, and controlling light intensity as a function of aperture density of the mask |
| 11/01/2001 | US20010036561 Device on a receptor substrate two active layers formed by transferring a multicomponent transfer unit from a thermal transfer element comprising the transfer unit and a substrate; organic electroluminescent device |
| 11/01/2001 | US20010036512 Apparatus and method of forming liquid film |
| 11/01/2001 | US20010036216 Preionization arrangement for a gas laser |
| 11/01/2001 | US20010036207 Laser oscillation apparatus, exposure apparatus, semiconductor device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method |
| 11/01/2001 | US20010035991 Actively stabilized, single input beam, interference lithography system and method |
| 11/01/2001 | US20010035959 In-situ mirror characterization |
| 11/01/2001 | US20010035945 Exposure method, exposure apparatus and device producing method |
| 11/01/2001 | US20010035944 Image exposing method and image exposing apparatus |
| 11/01/2001 | US20010035942 Exposure apparatus, gas replacement method, semiconductor device manufacturing method, semiconductor manufacturing factory and exposure apparatus maintenance method |
| 11/01/2001 | US20010035926 Light diffusing plate and display apparatus |
| 11/01/2001 | US20010035394 Mixture of solvent, polymer having acid labile groups, photoacid generator and basic compound |
| 11/01/2001 | US20010035343 Fine pattern forming method, developing/washing device used for the same, plating method using the same, and manufacturing method of thin film magnetic head using the same |
| 11/01/2001 | US20010035125 Coater having controllable pressurized process chamber for semiconductor processing |
| 10/31/2001 | EP1150401A2 Laser device management system |
| 10/31/2001 | EP1150343A2 Aperture fill |
| 10/31/2001 | EP1150331A2 Gas distribution plate assembly for providing laminar gas flow across the surface of a substrate |
| 10/31/2001 | EP1150330A2 Actively-cooled distribution plate for reducing reactive gas temperature in a plasma processing system |
| 10/31/2001 | EP1150172A2 Method of removing antireflective compositions |
| 10/31/2001 | EP1150171A2 Group connection of reticle sub-shapes to reduce line shortening and improve pattern fidelity |
| 10/31/2001 | EP1150170A2 Evaluation of a characteristic of a lithography system |
| 10/31/2001 | EP1150169A2 Gas jet nozzle for extreme ultraviolet light source |
| 10/31/2001 | EP1150168A2 Film formation method, semiconductor element and method thereof, and method of manufacturing a disk-shaped storage medium |
| 10/31/2001 | EP1150167A1 Polymers, resist compositions and patterning process |
| 10/31/2001 | EP1150166A1 Polymers, resist compositions and patterning process |
| 10/31/2001 | EP1150165A1 Radiation sensitive resin composition for forming barrier ribs for an el display element, barrier ribs and el display element |
| 10/31/2001 | EP1150162A2 Exposure method and exposure apparatus using near-field light and exposure mask |
| 10/31/2001 | EP1150158A1 Iris diaphragm |