G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2001
11/13/2001	US6316171 Aqueous developer for lithographic printing plates
11/13/2001	US6316170 Developing solution and method of forming polyimide pattern by using the developing solution
11/13/2001	US6316169 Removal of photoresist from semiconductors, masking and forming polymer layer
11/13/2001	US6316167 Lithography structure with multilayer element
11/13/2001	US6316166 Forming micro patterns, masking layer, etching a photoresists pattern for semiconductors
11/13/2001	US6316165 Planarizing antireflective coating compositions
11/13/2001	US6316163 Patterns for data layer, light exposure, separation and performing patterns
11/13/2001	US6316162 Polymer and a forming method of a micro pattern using the same
11/13/2001	US6316160 Cellulose ethers and esters for improved antireflective coatings
11/13/2001	US6316159 Chemical amplified photoresist composition
11/13/2001	US6316153 Free-form fabricaton using multi-photon excitation
11/13/2001	US6316152 OPC method to improve e-beam writing time
11/13/2001	US6316150 Low thermal distortion extreme-UV lithography reticle
11/13/2001	US6316059 Modifying the substrate with a silane layer, locally removing said layer with uv-ozone treatment and selectively nucleating the remaining silane layer in a polymer-stabilized pd sol.
11/13/2001	US6315927 Photosensitive conductive paste
11/13/2001	US6315916 Chemical imaging of a lithographic printing plate
11/13/2001	US6315467 Material having photosensitive resin composition, method for developing lithographic printing plate precursor, and development processing apparatus
11/13/2001	US20010006767 Aqueous solution of a photosensitive polyimide
11/08/2001	WO2001084615A1 Method for producing substrate for use in electronic parts and solvent for cleaning
11/08/2001	WO2001084599A2 Uv-enhanced silylation process to increase etch resistance of ultra thin resists
11/08/2001	WO2001084544A1 Utilization of beam crosslinkable polymer compositions as data recording medium
11/08/2001	WO2001084382A1 Methods and systems for lithography process control
11/08/2001	WO2001084243A1 Use of rta furnace for photoresist baking
11/08/2001	WO2001084242A1 Multi depth substrate fabrication processes
11/08/2001	WO2001084241A1 Non-contact seal using purge gas
11/08/2001	WO2001084240A1 Exposing dense arrays by interleaved exposures
11/08/2001	WO2001084239A1 Opc optimization
11/08/2001	WO2001084238A1 Nanostructures
11/08/2001	WO2001084235A2 Multiple exposure process for formation of dense rectangular arrays
11/08/2001	WO2001083844A2 Method for depositing metal and metal oxide films and patterned films
11/08/2001	WO2001083627A1 Water-based coating composition curable with actinic energy ray, coated metallic material with cured film of the composition, production process, and method of bonding coated metallic material
11/08/2001	WO2001083591A1 Polyimides and polyamic acids
11/08/2001	WO2001083580A2 Polymerizable composition, cured material thereof and method for manufacturing the same
11/08/2001	WO2001083388A2 Glass preform and methods and apparatus for manufacture thereof
11/08/2001	WO2001083233A1 Thermal transfer of crosslinked materials
11/08/2001	WO2001039985A3 Heat-sensitive imaging element for providing lithographic printing plates
11/08/2001	WO2001009681A3 Multi mirror system for an illumination system
11/08/2001	US20010039300 Photo-curable resin composition, process for producing the same and products using the same
11/08/2001	US20010039126 Supporting structure of optical element, exposure apparatus having the same, and manufacturing method of semiconductor device
11/08/2001	US20010039117 Film formation method, semiconductor element and method thereof, and method of manufacturing a disk-shaped storage medium
11/08/2001	US20010039080 Terpolymer of 1-adamantyl-1-alkylalkyl (meth)acrylate, a norbornene, and maleic anhydride or itaconic anhydride; acid generating agent; sensitivity; resolution
11/08/2001	US20010038976 Rinsing solution for lithography and method for processing substrate with the use of the same
11/08/2001	US20010038975 Laminating multilayer of peelable support, image recording layer, adhesive and ultraviolet sensitive material; image-wise exposure ; flood exposure and development
11/08/2001	US20010038973 Fabrication of semicoductor devices using anti- reflective coatings
11/08/2001	US20010038971 Chemical amplification, positive resist compositions
11/08/2001	US20010038970 Deep ultraviolet radiation photoresists
11/08/2001	US20010038969 Novel polymers, resist compositions and patterning process
11/08/2001	US20010038968 Alicyclic photosensitive polymer, resist composition containing the same and method of preparing the resist composition
11/08/2001	US20010038967 Containing polysiloxane
11/08/2001	US20010038965 Cresol or xylenol resin that has been esterified with 1,2-naphthoquinonediazide-4 or 5-sulfonic acid
11/08/2001	US20010038964 Relief images
11/08/2001	US20010038959 Scanning exposure methods
11/08/2001	US20010038958 Method for evaluating lithography system, method for adjusting substrate-processing apparatus, lithography system, and exposure apparatus
11/08/2001	US20010038955 Methods of photo-processing photoresist
11/08/2001	US20010038953 Multilayer
11/08/2001	US20010038951 Photomask and method of manufacturing same
11/08/2001	US20010038950 Semiconductor
11/08/2001	US20010038803 Fabrication of metallic microstructures by micromolding nanoparticles
11/08/2001	US20010038500 Optical element holding device for exposure apparatus
11/08/2001	US20010038497 Lens barrel and projection aligner
11/08/2001	US20010038484 Light beam scanning device
11/08/2001	US20010038458 Method and apparatus for seamless imaging of sleeves as used in flexography
11/08/2001	US20010038446 Projection exposure apparatus and exposure methods
11/08/2001	US20010038443 Rotational mask scanning exposure method and apparatus
11/08/2001	US20010038442 Method and apparatus for a non-contact scavenging seal
11/08/2001	US20010038441 Exposure apparatus and device manufacturing method using the same in which a door lock mechanism is controlled on the basis of temperature and an operation sequence
11/08/2001	US20010038263 Gate photocathode for controlled single and multiple electron beam emission
11/08/2001	US20010038089 Process for ashing organic materials from substrates
11/08/2001	US20010038080 Charged-particle-beam projection-lens system exhibiting reduced blur and geometric distortion, and microlithography apparatus including same
11/08/2001	US20010037859 Use of a chemically active reticle carrier for photomask etching
11/08/2001	US20010037816 Spraying
11/08/2001	US20010037763 Apparatus and method for applying process solution
11/08/2001	US20010037742 Monitoring method of developing solution for lithographic printing plates
11/08/2001	US20010037738 Intaglio printing method, intaglio printer and touch panel
11/08/2001	DE10119861A1 Projection lens e.g. for photolithography during semiconductor manufacture, has double aspherical lens spaced from image plane by more than maximum lens diameter
11/08/2001	DE10021646A1 Use of radiation-curable polymer composition as data recording medium or composite, e.g. for recording digital data or hologram on label, adhesive tape, smart label or smart coatings on lacquered or metallic surface
11/08/2001	DE10021451A1 Gesteuerte Bebilderung und Löschung einer Druckform aus metallischem Titan Controlled imaging and deletion of a printing form of metallic titanium
11/08/2001	CA2406063A1 Multi depth substrate fabrication processes
11/07/2001	EP1152435A1 Optical element such as multilayer film reflection mirror, production method therefor and device using it
11/07/2001	EP1152296A1 Photosensitive resin printing plate and method for producing photosensitive printing plate having projection
11/07/2001	EP1152295A1 Tertiary-butyl acrylate polymers and their use in photoresist compositions
11/07/2001	EP1152294A2 Photosensitive image-recording material
11/07/2001	EP1152293A2 Image-recording apparatus
11/07/2001	EP1152290A2 Method for fabricating a photolithographic mask
11/07/2001	EP1152289A2 Hybrid phase-shift mask
11/07/2001	EP1152288A1 Phase-shift mask
11/07/2001	EP1152263A1 Optical device with multilayer thin film and aligner with the device
11/07/2001	EP1152037A1 Squarylium compounds and optical recording media made by using the same
11/07/2001	EP1152036A1 Water-soluble resin composition
11/07/2001	EP1151858A2 Lithographic imaging with non-ablative wet printing members
11/07/2001	EP1151857A2 Controlled imaging formation and erasure on a metallic titanium printing form
11/07/2001	EP1151211A1 Method and device for vibration control
11/07/2001	EP1150797A1 Laser processing power output stabilization
11/07/2001	EP0920386B1 Laser absorbable photobleachable compositions
11/07/2001	EP0853774B1 Holographic medium and process
11/07/2001	CN1320840A Shield nozzle for control of gas spray in super ultraviolet light source
11/07/2001	CN1320839A Protective insert for lithographic plate, and method for packing lithographic plate
11/07/2001	CN1320818A Process for preparing capillary electrophoresis chip used in chemical analysis
11/07/2001	CN1074580C Exposure device for forming fluorescence-free absorbing film of CRT panel
11/07/2001	CN1074550C Method for forming photoresist pattern

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