G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2001
11/20/2001	US6319642 Analyzing pattern data to determine stripes of pattern to be successively lithographed; successively, for each determined stripe: extracting part of pattern data corresponding to stripe; dividing extracted part of pattern data; distribution
11/20/2001	US6319641 Scanning exposure method utilizing alignment marks based on scanning direction
11/20/2001	US6319638 Semiconductor device manufacturing method of accurately performing alignment of patterning, mask for exposure
11/20/2001	US6319637 Forming patterns and masking to form opaque films
11/20/2001	US6319603 Poly(meth)acrylate polymer with epoxy groups, ring opening polymerization monomer with glycidyl groups, cationic initiators and free radical photoinitiators
11/20/2001	US6319566 Method of molecular-scale pattern imprinting at surfaces
11/20/2001	US6319317 Coating film forming method and coating apparatus
11/20/2001	US6319316 System and method for performing low contamination extrusion for microelectronics applications
11/20/2001	US6318913 Semiconductor wafer manufacturing method and apparatus for an improved heat exchanger for a photoresist developer
11/20/2001	US6318869 High numerical aperture ring field projection system for extreme ultraviolet lithography
11/20/2001	US6318538 Device for treatment of a substrate
11/20/2001	US6318264 Printing machine and printing process
11/20/2001	US6318262 External drum imaging system
11/20/2001	US6317991 Method for correcting measurement errors in a machine measuring co-ordinates
11/20/2001	CA2025831C Radiation-polymerizable mixture and process for producing a solder resist mask
11/15/2001	WO2001086647A2 Phase contrast variation of a photo-induced refractive material
11/15/2001	WO2001086353A1 Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same
11/15/2001	WO2001086352A2 Polymers for photoresist compositions for microlithography
11/15/2001	WO2001086032A1 Fluoride crystalline optical lithography lens element blank
11/15/2001	WO2001085851A1 Coloring composition
11/15/2001	WO2001085811A2 Copolymers for photoresists and processes therefor
11/15/2001	WO2001085453A1 Chemical imaging of a lithographic printing plate
11/15/2001	US20010042068 Methods and apparatus for data classification, signal processing, position detection, image processing, and exposure
11/15/2001	US20010041769 Polysiloxane, method of manufacturing same, silicon-containingalicyclic compouns, and radiation-sensitive resin composition
11/15/2001	US20010041456 Semiconductor device production method
11/15/2001	US20010041455 Method of manufacturing semiconductor device
11/15/2001	US20010041394 Photolithography system and a method for fabricating a thin film transistor array substrate using the same
11/15/2001	US20010041369 Method for producing micro-carrier and test method by using said micro-carrier
11/15/2001	US20010041338 Method for producing micro-carrier and test method by using said micro-carrier
11/15/2001	US20010041311 Scrubbing unit
11/15/2001	US20010041307 Embossing
11/15/2001	US20010041306 Method of forming resist images by periodic pattern removal
11/15/2001	US20010041303 Mixture of polymer and acid generators
11/15/2001	US20010041302 Copolymer
11/15/2001	US20010041301 Overcoating with image receiver; pressing
11/15/2001	US20010041300 Positive photoresist composition
11/15/2001	US20010041299 Positive-working presensitized plate useful for preparing a lithographic printing plate
11/15/2001	US20010041297 Mask producing method
11/15/2001	US20010041296 Patterning methods and systems using reflected interference patterns
11/15/2001	US20010041119 Processing system and device manufacturing method using the same
11/15/2001	US20010041076 Parts maintenance managing system
11/15/2001	US20010040973 Hearing aid with tinted components
11/15/2001	US20010040735 Variable focus lens by small changes of the equatorial lens diameter
11/15/2001	US20010040722 Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
11/15/2001	US20010040674 Projection exposure method and apparatus
11/15/2001	US20010040324 Anti-vibration apparatus, exposure apparatus using the same, device manufacturing method, and anti-vibration method
11/15/2001	US20010040221 Method and apparatus for forming a curved polyline on a radiation-sensitive resist
11/15/2001	US20010040145 Step and flash imprint lithography
11/15/2001	US20010040132 Treating fluids by exposure to line of magnetic force to facilitate removal of contaminants such as scale forming substances used in production of circuit boards
11/15/2001	US20010039895 Planographic printing plate precursor
11/15/2001	US20010039891 Mask for screen printing, the method for producing same and circuit board produced by screen printing with such mask
11/15/2001	DE10118976A1 Photoresist-Zusammensetzung für ein Resist-Fließverfahren und Verfahren zur Bildung eines Kontaktlochs unter Verwendung desselben Of the same photoresist composition for a resist-flow process and method for forming a contact hole using
11/15/2001	DE10023662A1 Setting variable exposure parameters for laser exposure device involves computing at least some exposure parameters prior to setting and automatically setting computed parameters
11/15/2001	CA2408600A1 Chemical imaging of a lithographic printing plate
11/15/2001	CA2408244A1 Phase contrast variation of a photo-induced refractive material
11/14/2001	EP1154629A2 Optical recording method and optical recording apparatus employing the same
11/14/2001	EP1154330A2 Exposure method and exposure apparatus
11/14/2001	EP1154329A2 Method and apparatus for making lithographic printing plates in an automated computer-to-plate imaging system
11/14/2001	EP1154328A2 Method and apparatus for making lithographic printing plates in an automated computer-to-plate imaging system
11/14/2001	EP1154327A2 Method and apparatus for automatically selecting a printing plate for recording
11/14/2001	EP1154326A1 Process and apparatus for the production of printing plates
11/14/2001	EP1154325A1 Flexographic printing plate and original plate therefor
11/14/2001	EP1154324A1 Composition for antireflection coating
11/14/2001	EP1154323A1 Photosensitive composition, and optical waveguide element and process for producing the same
11/14/2001	EP1154322A1 Flexographic printing cylinders and sleeves with cylindrical, seamless photopolymer printing layer, photopolymer composition therefor, and method of making said cylinders and sleeves from said composition.
11/14/2001	EP1154321A1 Chemical amplification type positive resist compositions and sulfonium salts
11/14/2001	EP1154046A1 Fluoride crystalline optical lithography lens element blank
11/14/2001	EP1153935A1 Photopolymerizable resin composition and use thereof
11/14/2001	EP1153915A2 Method for producing 1,2-naphthoquinone-diazide photosensitive agent
11/14/2001	EP1153863A2 Method and apparatus for making lithographic printing plates in an automated computer-to-plate imaging system
11/14/2001	EP1153411A1 Method and apparatus for electron beam column assembly with precise alignment using displaced semi-transparent membranes
11/14/2001	EP1153336A1 Chemical filtering for optimising the light transmittance of a gas
11/14/2001	EP1153127A1 Method for producing polymers
11/14/2001	EP1152848A1 Method and apparatus for production of a cast component
11/14/2001	EP1152839A1 Method and device for treating substrates
11/14/2001	EP1016092A4 Method and apparatus for producing extreme ultra-violet light for use in photolithography
11/14/2001	EP0919013B1 Antireflective coatings for photoresist compositions
11/14/2001	EP0914242B1 Process for the stereolithographic preparation of three-dimensional objects using a radiation-curable liquid formulation which contains fillers
11/14/2001	EP0815480B1 Scanning lithography system having double pass wynne-dyson optics
11/14/2001	EP0724768B1 Tellurium lamp
11/14/2001	CN1322309A Ionization radiation imageable photopolymer compositions
11/14/2001	CN1322005A Method and device for regeneration of waste solvent
11/14/2001	CN1321900A Production process of zero air void directional coupled optical switch
11/14/2001	CN1321588A Reproduction technique
11/14/2001	CN1074840C Acid development-less gas-phase photoresist and its process to photoetch silicon nitride
11/13/2001	US6317447 Electric discharge laser with acoustic chirp correction
11/13/2001	US6317274 Optical element
11/13/2001	US6317211 Optical metrology tool and method of using same
11/13/2001	US6317203 Narrowband module inspection device
11/13/2001	US6317198 Method of examining an exposure tool
11/13/2001	US6317196 Projection exposure apparatus
11/13/2001	US6317195 Projection exposure apparatus
11/13/2001	US6316901 Exposure apparatus and method utilizing isolated reaction frame
11/13/2001	US6316849 Methods and apparatus involving selectively tailored electromagnetic fields
11/13/2001	US6316765 Device for detecting the position of rotating objects
11/13/2001	US6316565 For forming patterns of integrated semiconductor device, resolution in photolithography
11/13/2001	US6316552 Diacrylates and dimethacrylates
11/13/2001	US6316340 Photolithographic process for preventing corner rounding
11/13/2001	US6316328 Fabrication method for semiconductor device utilizing parallel alignment slits
11/13/2001	US6316282 Method of etching a wafer layer using multiple layers of the same photoresistant material

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