| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 11/22/2001 | WO2001088614A1 Device, method and computer programme product for the transmission of data |
| 11/22/2001 | WO2001088611A1 Amplitude mask for writing long-period gratings |
| 11/22/2001 | WO2001088589A1 Ultra-broadband uv microscope imaging system with wide range zoom capability |
| 11/22/2001 | WO2001088469A1 Interferometric apparatus and method |
| 11/22/2001 | WO2001088467A2 Data age adjustments |
| 11/22/2001 | WO2001087636A1 Ink receptor sheet and its process of use |
| 11/22/2001 | WO2001087634A2 Aqueous dispersions for color imaging |
| 11/22/2001 | WO2001087534A2 Method and system for precisely positioning a waist of a material-processing laser beam to process microstructures within a laser-processing site |
| 11/22/2001 | WO2001028048A3 Energy control for an excimer or molecular fluorine laser |
| 11/22/2001 | US20010044481 New photocurable halofluorinated acrylates |
| 11/22/2001 | US20010044221 Semiconductor processing methods of forming and utilizing antireflective material layers, and methods of forming transistor gate stacks |
| 11/22/2001 | US20010044218 Semiconductor processing methods of forming photoresist over silicon nitride materials |
| 11/22/2001 | US20010044214 Method for dry-etching a titanium nitride containing multilayer film |
| 11/22/2001 | US20010044200 Nanoscale patterning for the formation of extensive wires |
| 11/22/2001 | US20010044080 Controlling refractive index and light absorption coefficient of the antireflection coating film by appropriately selecting the types of compositions; films thickness very small |
| 11/22/2001 | US20010044078 Having a finer pattern can be prepared at low cost while minimizing any additional burden on the manufacturing system. |
| 11/22/2001 | US20010044077 Stabilization of chemically amplified resist coating |
| 11/22/2001 | US20010044075 Alkali soluble resin, unsaturated polymerizable compound, radiation sensitive polymerization initiator |
| 11/22/2001 | US20010044072 Photoresist compositions comprising blends of ionic and non-ionic photoacid generators |
| 11/22/2001 | US20010044071 Cycloalkyl-substituted cycloalkyl or cycloalkenyl acrylates; polymers that are sensitive to high energy radiation; patterning using electron beams or deep UV |
| 11/22/2001 | US20010044070 Interpolymer from alicyclic lactone ester of (meth)acrylic acid; tetrahydrofuranonyl (meth)acrylate; a hydroxyadamantyl (meth)acrylate, or a norbornene and maleic or itaconic anhydride; and another unit (2-ethyl-2-adamantyl acrylate) |
| 11/22/2001 | US20010044068 Improves adhesion and image quality. |
| 11/22/2001 | US20010044066 Alkali-insoluble polymer having acidic groups protected with acid labile groups, photoacid generator, and 1,2-naphthoquinonediazidosulfonyl group-bearing compound; high resolution; plating resistance |
| 11/22/2001 | US20010044065 Chemical resistant underlayer for positive-working printing plates |
| 11/22/2001 | US20010044057 Subresolution grating for attenuated phase shifting mask fabrication |
| 11/22/2001 | US20010043992 9-(alk)acryloylalkyleneanthracene; interpolymers with hydroxyalkyl (alk)acrylate and optionally alkyl (alk)acrylate; acetalized poly(alk)acrolein |
| 11/22/2001 | US20010043813 Developing unit and developing method |
| 11/22/2001 | US20010043666 X-ray exposure apparatus |
| 11/22/2001 | US20010043546 Polymeric nanocomposite materials with a functional matrix and method of reading and writing thereto |
| 11/22/2001 | US20010043495 Three dimensional optical memory storage |
| 11/22/2001 | US20010043408 Microlithographic illuminating system and microlithographic projection exposure arrangement incorporating said system |
| 11/22/2001 | US20010043391 Microlithographic reduction projection catadioptric objective |
| 11/22/2001 | US20010043326 Foreign substance inspecting method and apparatus, and exposure apparatus using this inspecting apparatus |
| 11/22/2001 | US20010043321 Exposure apparatus, exposure method using the same, and method of manufacture of circuit device |
| 11/22/2001 | US20010043320 Illuminator, exposure apparatus, and method for fabricating device using the same |
| 11/22/2001 | US20010043319 Projection exposure apparatus and method |
| 11/22/2001 | US20010043318 Illumination optical system for use in projection exposure apparatus |
| 11/22/2001 | US20010043314 Exposure method and exposure apparatus |
| 11/22/2001 | US20010042839 Holder assembly system and method in an emitted energy system for photolithography |
| 11/22/2001 | US20010042838 Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same |
| 11/22/2001 | US20010042565 Apparatus with a check function for controlling a flow resistance of a photoresist solution |
| 11/22/2001 | US20010042559 Rotating substrate, supplying liquid and supplying a gaseous substance partially miscible with the liquid to the surface of the substrate so that when mixed it lowers the surface tension of the liquid; for integrated circuits, displays |
| 11/22/2001 | US20010042484 Printing press and printing press control method |
| 11/22/2001 | US20010042469 Re-usable printing form with a printing surface and method for forming images on the printing surface |
| 11/22/2001 | US20010042414 Sensor device for non-intrusive diagnosis of a semiconductor processing system |
| 11/22/2001 | DE10109929A1 Wavefront detector has wavefront source with two-dimensional structure and locally varying transmission, diffraction grid and position resolving detector |
| 11/22/2001 | DE10100819A1 Herstellungsverfahren für Mikroträger und Prüfverfahren mit den Mikroträgern Manufacturing process for micro-carrier and test methods with the microcarriers |
| 11/21/2001 | EP1156371A2 Replenishing method of planographic printing plate developer |
| 11/21/2001 | EP1156370A1 Process for the production of back-coated recording material for the production of offset printing plates |
| 11/21/2001 | EP1156369A1 Photosensitive resin print plate material and production method for photosensitive resin print plate |
| 11/21/2001 | EP1156368A2 Multilayered photosensitive material for flexographic printing plate |
| 11/21/2001 | EP1155820A2 Planographic printing plate |
| 11/21/2001 | EP1155481A1 Durable etalon based output coupler |
| 11/21/2001 | EP1155440A1 Methods of fabricating etched structures |
| 11/21/2001 | EP1155164A1 In situ chemical generator and method |
| 11/21/2001 | EP1154868A1 Non-corrosive cleaning composition and method for removing plasma etching residues |
| 11/21/2001 | EP1129145A4 Non-corrosive stripping and cleaning composition |
| 11/21/2001 | EP0854003B1 Laser apparatus |
| 11/21/2001 | EP0684906B1 Liquid curable resin composition |
| 11/21/2001 | CN2461025Y High-quality optical integrating device |
| 11/21/2001 | CN1323410A A mixed solvent system for positive photoresists |
| 11/21/2001 | CN1323057A Method and system for coating and developing |
| 11/21/2001 | CN1322972A Exposure apparatus and exposure method |
| 11/21/2001 | CN1322971A Expoure method and equipment producing method |
| 11/21/2001 | CN1322970A Systme and method for coating and developing |
| 11/21/2001 | CN1322969A Method for coating and developing and its system |
| 11/21/2001 | CN1322968A Chemical reinforcing photoresist structure composition and sulfonium salt |
| 11/21/2001 | CN1322967A Photoresist composition containing cycloolefine polymer with lactone part |
| 11/21/2001 | CN1322966A Process for producing 1,2-naphthaquinone dinitride photosensitisers |
| 11/21/2001 | CN1075245C Method for forming submicroscopic patterns |
| 11/21/2001 | CN1075209C System for supplying photoresist |
| 11/21/2001 | CN1075000C Print stamp material |
| 11/21/2001 | CN1074992C Seal making device |
| 11/21/2001 | CN1074990C Method for producing printing mould plate and apparatus thereof |
| 11/20/2001 | US6320892 Energy efficient lithography laser |
| 11/20/2001 | US6320700 Light-transmitting optical member, manufacturing method thereof, evaluation method therefor, and optical lithography apparatus using the optical member |
| 11/20/2001 | US6320661 Method for measuring transmittance of optical members for ultraviolent use, synthetic silica glass, and photolithography apparatus using the same |
| 11/20/2001 | US6320649 Stage system for exposure apparatus |
| 11/20/2001 | US6320648 Method and apparatus for improving pattern fidelity in diffraction-limited imaging |
| 11/20/2001 | US6320646 Exposure apparatus, method of controlling same, and device manufacturing method |
| 11/20/2001 | US6320645 Stage system and exposure apparatus, and device manufacturing method using the same |
| 11/20/2001 | US6320402 Parallel inspection of semiconductor wafers by a plurality of different inspection stations to maximize throughput |
| 11/20/2001 | US6320345 Command trajectory for driving a stage with minimal vibration |
| 11/20/2001 | US6320198 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 11/20/2001 | US6320187 Magnification and rotation calibration patterns for particle beam projection system |
| 11/20/2001 | US6319885 Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
| 11/20/2001 | US6319853 Method of manufacturing a semiconductor device using a minute resist pattern, and a semiconductor device manufactured thereby |
| 11/20/2001 | US6319835 Stripping method |
| 11/20/2001 | US6319735 Photoresist dispense method by compensation for substrate reflectivity |
| 11/20/2001 | US6319656 Photosensitive polyimide precursor and its use for pattern formation |
| 11/20/2001 | US6319655 Modification of 193 nm sensitive photoresist materials by electron beam exposure |
| 11/20/2001 | US6319654 Preparing a chemical amplification photoresist; coating on a substrate of a semiconductor element to form photoresist film; exposing film to light; silylation; developing to form pattern; etching substrate |
| 11/20/2001 | US6319653 Photoimageable compositions having improved stripping ability and resolution |
| 11/20/2001 | US6319652 To form cured resin having dimensional stability, humidity absorption, chemical resistance; for stereolithography |
| 11/20/2001 | US6319651 Acid sensitive ARC and method of use |
| 11/20/2001 | US6319650 High resolution crosslinkable photoresist composition, compatable with high base concentration aqueous developers method and for use thereof |
| 11/20/2001 | US6319649 Photosensitive resin composition and method of forming resist images |
| 11/20/2001 | US6319648 Dissolution inhibition resists for microlithography |
| 11/20/2001 | US6319644 Methods of reducing proximity effects in lithographic processes |
| 11/20/2001 | US6319643 Conductive photoresist pattern for long term calibration of scanning electron microscope |