Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2013
10/03/2013WO2013143309A1 Black matrix preparation method, color filter and display device
10/03/2013WO2013143183A1 Photoetching method and exposure system
10/03/2013WO2013143179A1 Glass substrate id repair method and glass substrate id repair device based on repair machine
10/03/2013WO2013068198A3 Particle trap for euv source
10/03/2013US20130260319 Method of producing polymeric compound, resist composition and method of forming resist pattern
10/03/2013US20130260318 Repair Machine Based Glass Substrate Re-Marking Method and Glass Substrate Re-Marking Device
10/03/2013US20130260317 Method of producing a planographic printing plate
10/03/2013US20130260316 Radiation-sensitive resin composition and radiation-sensitive acid generating agent
10/03/2013US20130260315 Radiation-sensitive resin composition, pattern-forming method, polymer, and compound
10/03/2013US20130260314 Resist composition, method of forming resist pattern, compound and polymeric compound
10/03/2013US20130260313 Photoacid generating polymers containing a urethane linkage for lithography
10/03/2013US20130260312 Resist composition, method of forming resist pattern, and polymeric compound
10/03/2013US20130260311 Photosensitive material and method of photolithography
10/03/2013US20130260294 Method of manufacturing semiconductor device and exposure device
10/03/2013US20130260293 Photomask, and pattern formation method and exposure apparatus using the photomask
10/03/2013US20130260290 Near-field exposure mask and pattern forming method
10/03/2013US20130260288 Extreme ultraviolet lithography process and mask
10/03/2013US20130260121 Flexographic printing plate precursor
10/03/2013US20130260109 Photocurable resin composition, dry film, cured product and printed wiring board
10/03/2013US20130260108 Photo-curing polysiloxan composition and applications thereof
10/03/2013US20130258316 Tunable Wavelength Illumination System
10/03/2013US20130258308 Exposure apparatus, method of controlling the same and method of manufacturing device
10/03/2013US20130258307 Magnet Array Configuration for Higher Efficiency Planar Motor
10/03/2013US20130258305 Scanned-Spot-Array EUV Lithography System
10/03/2013US20130258303 Method for operating an illumination system of a microlithographic projection exposure apparatus
10/03/2013US20130258302 Projection Exposure Apparatus with at least One Manipulator
10/03/2013US20130258299 Exposure device, substrate processing apparatus, method for exposing substrate and substrate processing method
10/03/2013US20130258095 Optical apparatus, measuring apparatus, lithography apparatus, and method of manufacturing article
10/03/2013US20130256844 Semiconductor Fabrication Utilizing Grating and Trim Masks
10/03/2013US20130256265 Sequential Infiltration Synthesis for Enhancing Multiple-Patterning Lithography
10/03/2013US20130256264 Composition for forming resist underlayer film, and pattern-forming method
10/03/2013US20130255516 Method of making planographic printing plate and planographic printing plate
10/03/2013US20130255515 Positive-working lithographic printing plate precursors
10/03/2013US20130255513 Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor
10/03/2013US20130255407 Apparatus And Methods For Reticle Handling In An EUV Reticle Inspection Tool
10/02/2013EP2645540A1 Corona shielding material for an electric machine
10/02/2013EP2645407A2 Illumination optical apparatus and projection exposure apparatus
10/02/2013EP2645406A2 Illumination optical apparatus and projection exposure apparatus
10/02/2013EP2645405A2 Illumination optical apparatus and projection exposure apparatus
10/02/2013EP2644380A2 Lithographic printing plate precursor
10/02/2013EP2644379A1 Method of producing a planographic printing plate
10/02/2013EP2644378A1 Method of making planographic printing plate and planographic printing plate
10/02/2013EP2643731A2 Photoimaging
10/02/2013EP2643371A1 A self-imageable film forming polymer, compositions thereof and devices and structures made therefrom
10/02/2013DE102013004848A1 Behandlungsflüssigkeit zur Hemmung eines Musterzusammenbruchs in einer Mirkostruktur und Verfahren zur Herstellung einer Mikrostruktur, bei der diese eingesetzt wird Treatment liquid for inhibiting a pattern collapse in a microstructure and method of manufacturing a microstructure, in which it is used
10/02/2013DE102012205181A1 Messvorrichtung zum Vermessen einer Beleuchtungseigenschaft Measuring device for measuring a lighting feature
10/02/2013DE102012205045A1 Optisches System einer mikrolithographischen Projektionsbelichtungsanlage The optical system of a microlithography projection exposure apparatus
10/02/2013DE102012203944A1 Verfahren zur Justage eines optischen Systems einer mikrolithographischen Projektionsbelichtungsanlage Method for adjusting an optical system of a microlithography projection exposure apparatus
10/02/2013CN103339569A Composition for forming resist underlayer films, containing silicon that bears diketone-structure-containing organic group
10/02/2013CN103339568A Photosensitive resin composition, photosensitive element, method for producing resist pattern, and method for manufacturing printed wiring board
10/02/2013CN103339567A Photosensitive coloring composition
10/02/2013CN103339566A Colored curable composition, and color filter
10/02/2013CN103339537A Light-shielding composition, method for producing a light-shielding composition, solder resist, method for forming a pattern, and solid-state imaging device
10/02/2013CN103339532A Photosensitive resin composition for formation of microlenses
10/02/2013CN103337522A Metal oxide thin film transistor array substrate and manufacturing method thereof
10/02/2013CN103336412A Novel photoresist stripper and application technology thereof
10/02/2013CN103336411A Liquid crystal box with micro groove structure, manufacture method thereof and method based on the liquid crystal box and for controlling laser series tuning with voltage change
10/02/2013CN103336410A Device for enhancing capability of lithographic process and lithographic process using same
10/02/2013CN103336409A Method for forming conductive pattern, conductive pattern substrate, and touch panel sensor
10/02/2013CN103336408A Glass cover plate and manufacturing method thereof
10/02/2013CN103336390A Spacer and manufacturing method thereof, substrate and display device
10/02/2013CN103336363A All-aluminum electrostatic-actuation micro mirror and preparation method thereof
10/02/2013CN103336323A Method for manufacturing high-frequency optical gratings through multiple scanning electron beam lithography
10/02/2013CN103331988A Plate-making method of flexible printing plate and main exposure device
10/02/2013CN102608737B Extreme-ultraviolet-projection photoetching objective lens
10/02/2013CN102445857B Temperature control silicon wafer stage of photo-etching machine
10/02/2013CN102408779B Printing ink composition and preparation method thereof and stainless steel workpiece
10/02/2013CN102393560B Catadioptric lithographic projection objective with global spherical surface
10/02/2013CN102103329B Light beam stabilizing device applied to photoetching equipment
10/02/2013CN101943863B Photosensitive resin composition for black resist, and light shielding film of color filter
10/02/2013CN101880352B Copolymer for gap filling material composition, preparation method thereof and gap filling material composition for antireflective coating layer
10/02/2013CN101633728B Oligomer and thermosetting photosensitive resin composition
10/02/2013CN101493648B Color filter, manufacturing method and liquid crystal display device
10/02/2013CN101236265B Optical sheet and method for fabricating the same
10/01/2013US8547528 Stage drive method and stage unit, exposure apparatus, and device manufacturing method
10/01/2013US8547519 Lithographic apparatus and device manufacturing method
10/01/2013US8547518 Stage base, stage apparatus, exposure apparatus, and device manufacturing method
10/01/2013US8546069 Method for enhancing lithographic imaging of isolated and semi-isolated features
10/01/2013US8546068 Method for fabricating microbeads and microbeads
10/01/2013US8546067 Material assisted laser ablation
10/01/2013US8546066 Method for electroconductive pattern formation
10/01/2013US8546065 Mask for crystallizing a semiconductor layer and method of crystallizing a semiconductor layer using the same
10/01/2013US8546064 Method to produce a fuel cell flowfield with photopolymer walls
10/01/2013US8546062 Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same
10/01/2013US8546061 Photo-curing polysiloxane composition and protective film formed from the same
10/01/2013US8546060 Chemically amplified positive resist composition and pattern forming process
10/01/2013US8546059 Photoresist composition
10/01/2013US8546048 Forming sloped resist, via, and metal conductor structures using banded reticle structures
10/01/2013US8545969 Pattern-formed substrate, pattern-forming method, and die
10/01/2013US8545661 Manufacture of organically developable, photopolymerizable flexo-graphic elements on flexible metallic supports
09/2013
09/26/2013WO2013142830A1 Liquid deposition photolithography
09/26/2013WO2013142170A1 Kits and methods of treating a substrate prior to formation of an image thereon
09/26/2013WO2013141580A1 Extreme ultraviolet light generating device for stabilization and improving energy efficiency through laser beam correction
09/26/2013WO2013141578A1 Apparatus for generating extreme ultraviolet light using plasma
09/26/2013WO2013141395A1 Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device
09/26/2013WO2013141376A1 Protectant, method for producing compound protected by protectant, resin protected by protectant, photosensitive resin composition containing resin protected by protectant, pattern-forming material, photosensitive film, cured relief pattern, method for producing same, and semiconductor device
09/26/2013WO2013141286A1 Photosensitive resin composition, method for manufacturing processed glass substrate using same, and touch panel and method for manufacturing same
09/26/2013WO2013141265A1 Photoresist composition, resist pattern forming method, and polymer
09/26/2013WO2013141222A1 Resist pattern forming method and photoresist composition
09/26/2013WO2013141156A1 Colored radiation-sensitive composition, colored cured film, color filter, method for forming colored pattern, method for manufacturing color filter, solid state image sensor, and image display device
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