| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 11/29/2001 | US20010047068 Substituted thiazole derivative; for use in color cathode ray tubes, display tubes, screen printing |
| 11/29/2001 | US20010046781 Method for etching organic film, method for fabricating semiconductor device and pattern formation method |
| 11/29/2001 | US20010046780 Using plasma generated from a gas including an amine such as methylamine. |
| 11/29/2001 | US20010046772 Semiconductor processing methods of forming a conductive projection and methods of increasing alignment tolerances |
| 11/29/2001 | US20010046730 Method of designing/manufacturing semiconductor integrated circuit device using combined exposure pattern and semiconductor integrated circuit device |
| 11/29/2001 | US20010046719 Pattern-forming method using photomask, and pattern-forming apparatus |
| 11/29/2001 | US20010046647 Low temperature anti-reflective coating for IC lithography |
| 11/29/2001 | US20010046645 Graining the aluminum, desmutting, rinsing with hot water, acetating, and silicating the aluminum; excellent adhesion of resist in image areas, and ink repellency in non-image areas; durability without baking |
| 11/29/2001 | US20010046643 Comprising a compound having one or two nitrogen-containing 5-or 6- membered heterocyclic ring having a double bond within the ring, a primary, secondary, or tertiary amino compound, or a mercapto compound; heat stability |
| 11/29/2001 | US20010046642 Polyepoxide compounds, cationic photoinitiator, unsaturated hydroxy-functional compound, a saturated hydroxy compound, a poly(meth)acrylate compound, and a liquid cyclic di- acrylate having no hydroxy groups, diluent; no free radical initiator |
| 11/29/2001 | US20010046641 Comprising an alkali-insoluble, acid-soluble resin comprising units of 2-alkyl-2-adamantyl (meth)acrylate, 3-hydroxy-1-adamantyl (meth)acrylate, an alicyclic olefin and maleic or itaconic anhydride, and acid generator |
| 11/29/2001 | US20010046640 Polyhydroxystyrene resin having a protective base which varies in polarity by acid catalyst and photoacid generator, admixed with a styrene derivative which increases contrast in dissolving rate between exposed and unexposed resist |
| 11/29/2001 | US20010046632 Sulfur dioxide (SO2) gas content of the development recipe is increased to adjust concentration of oxygen gas, passivate resist sidewalls, and reduce microloading; line edge performance of photoresist mask is improved by ashing process |
| 11/29/2001 | US20010046631 Divided reticles for charged-particle-beam microlithography apparatus, and methods for using same |
| 11/29/2001 | US20010046091 Fluoride crystalline optical lithography lens element blank |
| 11/29/2001 | US20010046088 Exposure apparatus and device manufacturing method using the same |
| 11/29/2001 | US20010046073 Beam shaping element for use in a lithographic system |
| 11/29/2001 | US20010046053 Interferometric apparatus and method(s) for precision measurement of altitude above a surface |
| 11/29/2001 | US20010046041 Exposure apparatus and device manufacturing apparatus and method |
| 11/29/2001 | US20010046039 Illumination apparatus, exposure apparatus and exposure method |
| 11/29/2001 | US20010046038 Lithography apparatus |
| 11/29/2001 | US20010045810 High performance stage assembly |
| 11/29/2001 | US20010045690 Maskless laser beam patterning device and apparatus for ablation of multilayered structures with continuous monitoring of ablation |
| 11/29/2001 | US20010045527 Electron-beam cured polymer mask for DRIE micro-machining |
| 11/29/2001 | US20010045526 Stage device for an exposure apparatus and semiconductor device manufacturing method wich uses said stage device |
| 11/29/2001 | US20010045523 Superresolution in microlithography and fluorescence microscopy |
| 11/29/2001 | DE10025522A1 Structured deposition of conductive polymer on conducting or insulating substrate, useful for microelectronic device e.g. transistor, involves forming thin, structured adhesion-promoting layer then polymer layer by oxidation of monomer |
| 11/29/2001 | DE10024456A1 Transferring information onto printing plate involves simultaneous illumination of different areas of printing plate with laser beam and ultraviolet light |
| 11/28/2001 | EP1158629A2 Laser oscillation apparatus |
| 11/28/2001 | EP1158575A2 Method for fabricating a semiconductor device including a step of etching an organic film to form a pattern |
| 11/28/2001 | EP1158365A1 Process and apparatus for coating on printing cylinders |
| 11/28/2001 | EP1158364A2 Photopolymerisable flexography elements with SIS/SBS mixtures as ligands for the preparation of flexographic printing plates |
| 11/28/2001 | EP1158363A1 Positive resist composition and onium salts of saccharin derivatives |
| 11/28/2001 | EP1158362A2 Image-recording device |
| 11/28/2001 | EP1158361A1 Photomask, method for manufacturing the same, projection aligner using the photomask, and projection exposing method |
| 11/28/2001 | EP1158025A2 Resin composition for color filter |
| 11/28/2001 | EP1158019A2 Paste, display member, and process for production of display member |
| 11/28/2001 | EP1157853A2 Process for roughening support material for printing plates |
| 11/28/2001 | EP1157852A1 Ink receptor sheet and its process of use |
| 11/28/2001 | EP1157839A2 Printing press and printing press control method |
| 11/28/2001 | EP1157829A1 Photosensitive composition, orginal plate using the same for lithographic printing, and method for producing images on original plate |
| 11/28/2001 | EP1157807A1 Stereolithographic construction techniques |
| 11/28/2001 | EP1157597A1 Method of generating euv radiation, method of manufacturing a device by means of said radiation, euv radiation source unit, and lithographic projection apparatus provided with such a radiation source unit |
| 11/28/2001 | EP1157596A1 Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit |
| 11/28/2001 | EP1157595A1 Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit |
| 11/28/2001 | EP1157407A1 Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
| 11/28/2001 | EP1157308A2 Monograin membrane mask |
| 11/28/2001 | EP1157307A1 Photoresist dispense method by compensation for substrate reflectivity |
| 11/28/2001 | EP1157300A1 Lens system for photodetectors |
| 11/28/2001 | EP1157057A1 Accelerators useful for energy polymerizable compositions |
| 11/28/2001 | EP1156886A1 Apparatus and method for applying flux to a substrate |
| 11/28/2001 | EP1112307A4 Screen coating composition and method for applying same |
| 11/28/2001 | EP0986476B1 Method of preparing a lithographic printing plate |
| 11/28/2001 | EP0829035B1 Scanning-slit exposure device |
| 11/28/2001 | EP0784542B1 Stamp for a lithographic process |
| 11/28/2001 | CN1324456A Photoresists and associated processes for microlitho graphy |
| 11/28/2001 | CN1324106A Method for making mask, semiconductor device and its mfg. method, method for mfg. recording medium |
| 11/28/2001 | CN1324091A Composite material used for mfg. isolation sheet of thin layer display panel |
| 11/28/2001 | CN1323696A Planographic printing image using non-etching wet type printing elements |
| 11/28/2001 | CN1075638C 正性光刻胶 Positive photoresist |
| 11/27/2001 | US6324330 Folded light tunnel apparatus and method |
| 11/27/2001 | US6324256 Liquid sprays as the target for a laser-plasma extreme ultraviolet light source |
| 11/27/2001 | US6324250 Exposure method |
| 11/27/2001 | US6324203 Laser light source, illuminating optical device, and exposure device |
| 11/27/2001 | US6324003 Calcium fluoride (CaF2) stress plate and method of making the same |
| 11/27/2001 | US6323953 Method and device for measuring structures on a transparent substrate |
| 11/27/2001 | US6323938 Method of characterizing photolithographic tool performance and photolithographic tool thereof |
| 11/27/2001 | US6323937 Projection exposure apparatus, and device manufacturing method using the same |
| 11/27/2001 | US6323936 Machine for exposing a panel to laser radiation |
| 11/27/2001 | US6323935 Electromagnetic alignment and scanning apparatus |
| 11/27/2001 | US6323925 Apparatus for fabricating an orientation layer on LCD panels |
| 11/27/2001 | US6323567 Circulating system for shaft-type linear motors |
| 11/27/2001 | US6323560 Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photo mask and method of exposure thereof |
| 11/27/2001 | US6323500 Electron-beam exposure system |
| 11/27/2001 | US6323361 To form transparent polymers useful as optical waveguiding materials |
| 11/27/2001 | US6323301 High performance UV and heat crosslinked or chain extended polymers |
| 11/27/2001 | US6323287 Useful for an undercoat layer in deep ultravilolet radiation lithography; for chemically amplified bilayer resist systems; semiconductors |
| 11/27/2001 | US6323267 Isoxindigos useful as colorants and preparation thereof |
| 11/27/2001 | US6323169 Resist stripping composition and process for stripping resist |
| 11/27/2001 | US6323168 Semiconductor wafer cleaning formulation consisting essentially of catechol, water and gamma-butyrolactone in specified amounts; noncorrosive |
| 11/27/2001 | US6323139 Semiconductor processing methods of forming photoresist over silicon nitride materials |
| 11/27/2001 | US6322957 Light exposure method |
| 11/27/2001 | US6322955 Etching method |
| 11/27/2001 | US6322953 Exposing the first layer to light having a predetermined energy, developing that layer wherein a portion of the first layer remains within the trenches, and providing a second layer of photoresist over the developed first layer. |
| 11/27/2001 | US6322952 Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
| 11/27/2001 | US6322951 Photopolymerizable component comprises a (meth)acrylate functional urethane oligomer separated from the urethane linkage by at least two alkylene oxide groups and at least one ring-opened lactone group for improved flexibility |
| 11/27/2001 | US6322950 Activator compound generates chemical changes by light absorption of indene sensitizing dye and produces radicals, acids or bases; and compound whose physical or chemical characteristics are changed product |
| 11/27/2001 | US6322949 Radiation sensitive resin composition |
| 11/27/2001 | US6322948 Interpolymers containing units of acetals of fused rings such as norbornane and units from maleic anhydride and, optionally, (meth)acrylic acid |
| 11/27/2001 | US6322947 Photosensitive composition for sandblasting and photosensitive film laminate comprising the same |
| 11/27/2001 | US6322938 Nanolithography for multi-passband grating filters |
| 11/27/2001 | US6322937 That allows better and more efficient adhesion of color pigment crystals to the screen display structure. |
| 11/27/2001 | US6322934 Designing a reticle including pattern features having a critical dimension to form corresponding circuit features based upon overlap areas defined by a plurality of exposure steps. |
| 11/27/2001 | US6322220 Exposure apparatus and device manufacturing method using the same |
| 11/27/2001 | US6322060 Anti-vibration apparatus, exposure apparatus using the same, device manufacturing method, and anti-vibration method |
| 11/27/2001 | US6321651 Pin registration system for mounting different width printing plates |
| 11/22/2001 | WO2001089198A1 Method for adjusting the exposure parameters of a laser exposure system |
| 11/22/2001 | WO2001089196A2 Method for controlling calibration and image sharpening of printing plates having integral photomask layer |
| 11/22/2001 | WO2001088960A2 Method of molecular-scale pattern imprinting at surfaces |
| 11/22/2001 | WO2001088615A1 Process for preparing a flexographic printing plate |