Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2001
12/06/2001US20010049433 Method for producing 1,2-naphthoquinonediazide photosensitive agent
12/06/2001US20010049429 Organic anti-reflective coating polymer and preparation thereof
12/06/2001US20010049346 Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same
12/06/2001US20010049150 Using plasma generated from an reactive ion etching gas containing a first gas of a compound including carbon, hydrogen and nitrogen, e.g., methylamine, and a second gas including a nitrogen component, e.g., nitrogen or ammonia
12/06/2001US20010049131 Using baths to which are added a biogenic catalyst (in particular, an enzyme) which selectively acts (etching) upon a preselectable thin layer; less expensive and environmentally friendly; thermally controlled; photoresists
12/06/2001US20010049098 Method for producing structured, self-organized molecular monolayers of individual molecular species, in particular substance libraries.
12/06/2001US20010049075 Applying photoresist film to semiconductor substrate; irradiation; development
12/06/2001US20010049073 Amplification; photolithography patterning
12/06/2001US20010049072 Undercoating composition for photolithographic resist
12/06/2001US20010049071 Highly sensitive positive photoresist compositions
12/06/2001US20010049070 Heating coating solution
12/06/2001US20010049063 Electrically programmable photolithography mask
12/06/2001US20010048977 Manufacturing method for multilayer fluorescent information carriers
12/06/2001US20010048865 Substrate processing system and substrate processing method
12/06/2001US20010048594 Molded optical panel and mold therefore
12/06/2001US20010048515 Flying image for a maskless exposure system
12/06/2001US20010048514 Projection exposure apparatus and method
12/06/2001US20010048513 Environmental control chamber
12/06/2001US20010048512 Projection exposure apparatus and device manufacturing method including a projection optical system having a pair of diffractive members
12/06/2001US20010048510 Air shower head of photolithography equipment for directing air towards a wafer stage
12/06/2001US20010048489 Active matrix substrate, display device, and image sensing device
12/06/2001US20010048478 Pattern distortion detecting method and apparatus and recording medium for pattern distortion detection
12/06/2001US20010048184 Stereolithographic apparatus and method for manufacturing three-dimensional object
12/06/2001US20010048084 Exposure apparatus, device manufacturing method, semiconductor manufacturing plant and method of maintaining exposure apparatus
12/06/2001US20010048083 Exposure apparatus and its making method, and device manufacturing method
12/06/2001US20010048013 Ticket dispensing device, installation and displays
12/06/2001US20010047979 Method and apparatus for increased workpiece throughput
12/06/2001US20010047864 Temperature control apparatus and method with recirculated coolant
12/06/2001DE10119490A1 Substrat-Prozessierverfahren und Substrat-Prozessiervorrichtung Prozessierverfahren substrate and substrate-Prozessiervorrichtung
12/06/2001DE10055280A1 Phasenverschiebungs-Photomaskenrohling, Phasenverschiebungs-Photomaske und Verfahren zur Herstellung von Halbleitervorrichtung Phase shift photomask blank and phase shift photomask process for producing semiconductor device
12/06/2001DE10027119A1 Photolithographic exposure unit for e.g. manufacturing DNA chips, scans target areas of biological material selectively with highly-focused flying spot illumination
12/06/2001DE10026029A1 Process for stripping the non-fixed regions of photoresist lacquers on microelectronic components comprises using a mixture of polyfluorinated hydrocarbon compounds and alcohols or ketones as the stripping agent
12/06/2001CA2405962A1 Imaging media containing heat developable photosensitive microcapsules
12/05/2001EP1160843A1 Planarizing anti-reflective coating layer with improved light absorption
12/05/2001EP1160839A2 Exposure apparatus, coating/developing apparatus, method of transferring a substrate, method of producing a device, semiconductor production factory, and method of maintaining an exposure apparatus
12/05/2001EP1160824A2 Illumination system for charged-particle lithography apparatus
12/05/2001EP1160636A2 Hologram print system and holographic stereogram
12/05/2001EP1160629A2 Interferometric measurement of stage position
12/05/2001EP1160628A2 Supporting assembly for lithographic projection apparatus
12/05/2001EP1160627A2 Lithographic apparatus, device manufacturing method, and device manufactured thereby
12/05/2001EP1160626A1 Method of detecting aberrations of an optical imaging system
12/05/2001EP1160625A1 Method for producing article coated with patterned film and photosensitive composition
12/05/2001EP1160098A1 Stacked planographic printing plates and stacking method for planographic printing plates
12/05/2001EP1160092A1 Material detecting device for stamp making
12/05/2001EP1159768A1 Packaged strain actuator
12/05/2001EP1159651A1 A method for maximizing integrated circuit die production
12/05/2001EP1159650A1 Flat bed platesetter system
12/05/2001EP1159649A1 Electron beam resist
12/05/2001EP1159133A1 Positive-working photosensitive lithographic printing plate and method for producing the same
12/05/2001EP0824719B1 A process for obtaining a lift-off imaging profile
12/05/2001CN2463175Y Exposure device for stamping surface of stamp
12/05/2001CN1325505A Photocurable and photopatternable hydrogel matrix based on azlactone copolymers
12/05/2001CN1325495A Wavelength tuning of photo-induced gratings
12/05/2001CN1325401A Oxime derivatives and the use thereof as latent acids
12/05/2001CN1325130A Coating and developing system
12/05/2001CN1325129A Film-forming device
12/05/2001CN1325038A Paste material display device and mfg. method for display device
12/05/2001CN1075894C Photolithography method and photolithography system for performing the method
12/04/2001US6327332 Exposure method
12/04/2001US6327290 Beam delivery system for molecular fluorine (F2) laser
12/04/2001US6327086 Optical diffraction device and exposure apparatus
12/04/2001US6327035 Method and apparatus for optically examining miniature patterns
12/04/2001US6327034 Apparatus for aligning two objects
12/04/2001US6327026 Exposure apparatus and positioning apparatus
12/04/2001US6327025 Projection exposure apparatus for transferring mask pattern onto photosensitive substrate
12/04/2001US6327024 Vibration isolation apparatus for stage
12/04/2001US6327023 Optimization of reticle rotation for critical dimension and overlay improvement
12/04/2001US6327022 Projection exposure method and apparatus
12/04/2001US6326635 Minimization of electron fogging in electron beam lithography
12/04/2001US6326632 Particle-optical imaging system for lithography purposes
12/04/2001US6326629 Projection lithography device utilizing charged particles
12/04/2001US6326590 Nozzle element adaptable to a laser beam tube used in laser edge marking equipment
12/04/2001US6326319 Method for coating ultra-thin resist films
12/04/2001US6326130 Alkaline solution containing 1-methyl-2-pyrrolidinone, ethanolamine and reducing agent
12/04/2001US6326128 Production of a photosensitive recording material
12/04/2001US6326127 Photo-curable polymer composition and flexographic printing plates containing the same
12/04/2001US6326126 Addition block polymer
12/04/2001US6326125 Photosensitive composition and calcined pattern obtained by use thereof
12/04/2001US6326124 Flexographic printing form made by covering the edges of photopolymerizable printing plates for flexographic printing
12/04/2001US6326122 Heat sensitive elements
12/04/2001US6326120 Self-contained imaging media comprising microencapsulated color formers
12/04/2001US6326106 Overlay measuring pattern, and photomask
12/04/2001US6326058 Device for patterning a substrate with patterning cavities
12/04/2001US6325516 Exposure apparatus and field stop thereof
12/04/2001US6324978 Printing plate substrate and method of making a printing plate substrate or an offset printing plate
12/04/2001CA2278883C Very large scale immobilized peptide synthesis
12/04/2001CA2195014C Positive photoactive compounds based on 2,6-dinitrobenzyl groups
12/04/2001CA2044024C Method and apparatus for preparing relief image printing plates
11/2001
11/29/2001WO2001091204A2 Displacement device
11/29/2001WO2001091168A1 Bottom anti-reflective coating using rapid thermal anneal with oxidizing gas
11/29/2001WO2001090820A1 Flexible piezoelectric chuck
11/29/2001WO2001090819A2 Method and system for selective linewidth optimization during a lithographic process
11/29/2001WO2001090818A1 Process for preparing flexographic printing plates
11/29/2001WO2001090817A2 Data storage medium comprising colloidal metal and preparation process thereof
11/29/2001WO2001090816A1 Method in connection with the production of a template and the template thus produced
11/29/2001WO2001090814A2 Maskless exposure system
11/29/2001WO2001090686A1 In-situ mirror characterization
11/29/2001WO2001046680A3 Reticle for use in photolithography and methods for making same and inspecting
11/29/2001US20010047222 Reticle management system
11/29/2001US20010047216 Service method, service system and manufacturing/inspection apparatus