| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/18/2001 | US6331374 Imaging transfer system and process for transferring image and non-image areas thereof to a receptor element |
| 12/18/2001 | US6331369 Exposure methods for overlaying one mask pattern on another |
| 12/18/2001 | US6331368 Test object for use in detecting aberrations of an optical imaging system |
| 12/18/2001 | US6330971 Radio frequency identification system and method for tracking silicon wafers |
| 12/13/2001 | WO2001095690A1 Method of making electronic materials |
| 12/13/2001 | WO2001095381A2 Post chemical-mechanical planarization (cmp) cleaning composition |
| 12/13/2001 | WO2001095362A1 Plasma focus light source with active and buffer gas control |
| 12/13/2001 | WO2001095361A2 Method of producing rib plasma for display panel substrate |
| 12/13/2001 | WO2001095034A1 Photosensitive composition for making photoresist |
| 12/13/2001 | WO2001095033A1 Photosensitive resin composition and photosensitive material using the same |
| 12/13/2001 | WO2001095032A1 Photosensitive resin composition and photosensitive material using the same |
| 12/13/2001 | WO2001095031A2 Imageable element and waterless printing plate |
| 12/13/2001 | WO2001095030A2 Resin composition and three-dimensional object |
| 12/13/2001 | WO2001094123A1 Polymers and their use in imagable products and image-forming methods |
| 12/13/2001 | WO2001063233A3 Device for detecting wave fronts |
| 12/13/2001 | WO2001059031A3 Near infrared sensitive photopolymerizable composition |
| 12/13/2001 | WO2001051243A3 Laser system and method for processing a memory link with a burst of laser pulses having ultrashort pulsewidths |
| 12/13/2001 | US20010051742 Norbornene ester such as 1-ethylcyclopentyl 3-acetoxy-3-(5-norbornen-2-yl)propionate for use as monomer in photoresist resin having good reactivity and radiation transparency using excimer laser as light source |
| 12/13/2001 | US20010051741 Novel ester compounds having alicyclic structure and method for preparing same |
| 12/13/2001 | US20010051689 Polymeric films having controlled viscosity response to temperature and shear |
| 12/13/2001 | US20010051441 Semiconductor processing methods and structures for determining alignment during semiconductor wafer processing |
| 12/13/2001 | US20010051418 Method of manufacturing semiconductor device having memory cell transistors |
| 12/13/2001 | US20010051395 Tape stiffener, semiconductor device assemblies including same, and stereolithographic methods for fabricating same |
| 12/13/2001 | US20010051318 Stripper pretreatment |
| 12/13/2001 | US20010051317 Slit in tube; dividing eddy current zone |
| 12/13/2001 | US20010051316 Micropatterning using electron beams or ultraviolet rays |
| 12/13/2001 | US20010051315 Polymers, resist compositions and patterning process |
| 12/13/2001 | US20010051313 Positive resist composition |
| 12/13/2001 | US20010051306 Mixture of volatility and nonvolatility components; impurities extraction |
| 12/13/2001 | US20010051265 Heat-setting label sheet |
| 12/13/2001 | US20010051087 Wafer positioning device with storage capability |
| 12/13/2001 | US20010050939 Gas discharge laser with blade-dielectric electrode |
| 12/13/2001 | US20010050820 Optical projection system |
| 12/13/2001 | US20010050769 Illuminance measurement apparatus and exposure apparatus |
| 12/13/2001 | US20010050762 Fluorescence radiation filter |
| 12/13/2001 | US20010050761 Exposure method and exposure apparatus |
| 12/13/2001 | US20010050760 Method of and apparatus for recording image by exposure to light beams |
| 12/13/2001 | US20010050759 Exposure apparatus |
| 12/13/2001 | US20010050357 Ultraviolet curable silver composition and related method |
| 12/13/2001 | US20010050350 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 12/13/2001 | US20010050341 Positioning system for use in lithographic apparatus |
| 12/13/2001 | US20010050050 Developing treatment method and developing treatment unit |
| 12/13/2001 | US20010049881 Methods and circuits for mask-alignment detection |
| 12/13/2001 | DE10127171A1 New metal-organic monoacyl-alkyl-phosphine compounds are used for production of acyl-phosphine oxide or acyl-phosphine sulfide photoinitiators for use in light-curable compositions, e.g. paint, printing ink, adhesives |
| 12/13/2001 | CA2408497A1 Photosensitive composition for making photoresist |
| 12/12/2001 | EP1162509A2 A system, method and article of manufacture for improved laser direct imaging a printed circuit board utilizing a mode locked laser and scophony operation |
| 12/12/2001 | EP1162508A2 Projection optical system and exposure apparatus using the same |
| 12/12/2001 | EP1162507A2 Alignment method, overlay deviation inspection method and photomask |
| 12/12/2001 | EP1162506A1 Radiation-sensitive resin composition |
| 12/12/2001 | EP1162209A1 Acetal copolymers and use thereof in photosensitive compositions |
| 12/12/2001 | EP1162180A1 Optical glass suffering little change in refractive index when exposed to ultra-violet light during service |
| 12/12/2001 | EP1162078A2 Image-formation material and infrared absorber |
| 12/12/2001 | EP1162063A2 Planographic printing plate precursor |
| 12/12/2001 | EP0986894B1 Method and device for removing light |
| 12/12/2001 | EP0986473B1 Heat sensitive plate precursor |
| 12/12/2001 | EP0975996B1 Device for making grid structures in optical fibers |
| 12/12/2001 | EP0929844B1 Antireflective coating for photoresist compositions |
| 12/12/2001 | EP0858616B1 Method of contact printing on metal alloy-coated polymer films |
| 12/12/2001 | EP0723699B1 Electrodeless map with improved efficacy |
| 12/12/2001 | CN1326407A Method for decoratively shaping painted substrate surface |
| 12/12/2001 | CN1326219A Method for etching organic film, manufacture of semiconductor device and pattern forming method |
| 12/11/2001 | US6330355 Frame layout to monitor overlay performance of chip composed of multi-exposure images |
| 12/11/2001 | US6330267 Performance control system and method for gas discharge lasers |
| 12/11/2001 | US6330261 Reliable, modular, production quality narrow-band high rep rate ArF excimer laser |
| 12/11/2001 | US6330260 F2 laser with visible red and IR control |
| 12/11/2001 | US6330065 Gas insensitive interferometric apparatus and methods |
| 12/11/2001 | US6330052 Exposure apparatus and its control method, stage apparatus, and device manufacturing method |
| 12/11/2001 | US6329780 Electromagnetic alignment and scanning apparatus |
| 12/11/2001 | US6329665 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 12/11/2001 | US6329494 Photosensitive resin composition |
| 12/11/2001 | US6329306 Fine patterning utilizing an exposure method in photolithography |
| 12/11/2001 | US6329280 Interim oxidation of silsesquioxane dielectric for dual damascene process |
| 12/11/2001 | US6329143 Providing a substrate having surface bearing multiple copies of a protective group removable on exposure to an electric field or electric current; applying electric field or current to substrate; exposing to protected monomer, repeating |
| 12/11/2001 | US6329126 Developer solution for acitinic ray sensitive resist |
| 12/11/2001 | US6329125 An alkali-insoluble compound having a protected alkali soluble group in which protective group contains an alicyclic hydrocarbon group having bonded to a carbon atom and cleaved upon action of an acid generated from a photoacid geenerator |
| 12/11/2001 | US6329124 Method to produce high density memory cells and small spaces by using nitride spacer |
| 12/11/2001 | US6329123 Photoimageable compositions having improved flexibility and stripping ability |
| 12/11/2001 | US6329122 Treating anodized substrate with acidic aquesous solution; aluminum hydroxide by-product inhibition during rinsing |
| 12/11/2001 | US6329119 Alkali soluble resin, acid generator, crosslinking agent, and a basic compound that is either a dipyridyl compound or a bisaminobenzene compound; excellent pattern profile, small temperature dependency of the pattern dimensions, sensitivity |
| 12/11/2001 | US6329118 Method for patterning dual damascene interconnects using a sacrificial light absorbing material |
| 12/11/2001 | US6329117 Photoresist patterns, integrated circuits, acrylic ester copolymer with chromophore, |
| 12/11/2001 | US6329112 Method for measuring aberration of projection lens, method for forming patterns, mask, and method for correcting a projection lens |
| 12/11/2001 | US6329111 Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same |
| 12/11/2001 | US6329110 Photosensitive polymer composition, method for forming relief patterns, and electronic parts |
| 12/11/2001 | US6329107 Method of characterizing partial coherent light illumination and its application to serif mask design |
| 12/11/2001 | US6328905 Residue removal by CO2 water rinse in conjunction with post metal etch plasma strip |
| 12/11/2001 | US6327793 Method for two dimensional adaptive process control of critical dimensions during spin coating process |
| 12/08/2001 | CA2349829A1 Organometallic monoacylalkylphosphines |
| 12/06/2001 | WO2001093319A1 Gas supply system, exposure device, and method of producing device |
| 12/06/2001 | WO2001093318A1 Planarizing anti-reflective coating layer with improved light absorption |
| 12/06/2001 | WO2001092958A1 Photosensitive resin composition, photosensitive element, production method for resist pattern and production method for printed circuit board |
| 12/06/2001 | WO2001092176A1 Fused silica with constant induced absorption |
| 12/06/2001 | WO2001092024A2 Imaging media containing heat developable photosensitive microcapsules |
| 12/06/2001 | WO2001092014A1 Methods of preparing positive-working lithographic printing plates |
| 12/06/2001 | WO2001091993A1 Method for applying a layer containing at least polymeric material |
| 12/06/2001 | WO2001091855A1 Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
| 12/06/2001 | WO2001069320A3 Exposure device and method for compensating optical defects |
| 12/06/2001 | WO2001064975A3 Method and device for growing large-volume oriented monocrystals |
| 12/06/2001 | WO2001033615A3 Method and apparatus for supercritical processing of multiple workpieces |
| 12/06/2001 | US20010049811 Pattern distortion correction device, pattern distortion correction method, and recording medium recording a pattern distortion correction program |