| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/20/2001 | WO2001097346A1 Discharge laser having electrodes with sputter cavities and discharge peaks |
| 12/20/2001 | WO2001097345A1 Gas discharge laser long life electrodes |
| 12/20/2001 | WO2001097344A1 Flow shaping electrode with erosion pad for gas discharge laser |
| 12/20/2001 | WO2001097343A1 Gas discharge laser with blade-dielectric electrode |
| 12/20/2001 | WO2001097270A2 Substrate cleaning apparatus and method |
| 12/20/2001 | WO2001096964A1 Photoresist remover composition |
| 12/20/2001 | WO2001096963A1 Resist composition |
| 12/20/2001 | WO2001096962A2 Multiphoton absorption method using patterned light |
| 12/20/2001 | WO2001096961A2 Multipass multiphoton absorption method and apparatus |
| 12/20/2001 | WO2001096960A1 Negative-acting chemically amplified photoresist composition |
| 12/20/2001 | WO2001096959A2 Multidirectional photoreactive absorption method |
| 12/20/2001 | WO2001096958A2 Process for producing microfluidic articles |
| 12/20/2001 | WO2001096957A1 Method for creating an integrated circuit stage wherein fine and large patterns coexist |
| 12/20/2001 | WO2001096956A2 Method for producing a planar mask on surfaces having reliefs |
| 12/20/2001 | WO2001096952A2 Multicolor imaging using multiphoton photochemical processes |
| 12/20/2001 | WO2001096917A2 Multiphoton curing to provide encapsulated optical elements |
| 12/20/2001 | WO2001096915A2 Microfabrication of organic optical elements |
| 12/20/2001 | WO2001096452A2 Method for making or adding structures to an article |
| 12/20/2001 | WO2001096409A2 Multiphoton photosensitization system |
| 12/20/2001 | WO2001096317A1 Triazine-based compound comprising functionalized alkylthio groups, and photopolymerization initiator |
| 12/20/2001 | WO2001096119A1 Thermal digital lithographic printing plate |
| 12/20/2001 | US20010053964 Method of forming a pattern using proximity-effect-correction |
| 12/20/2001 | US20010053962 Method of determining movement sequence, alignment apparatus, method and apparatus of designing optical system, and medium in which program realizing the designing method |
| 12/20/2001 | US20010053834 Semiconductor device using polymer-containing photoresist, and process for manufacturing the same |
| 12/20/2001 | US20010053608 Lithography using quantum entangled particles |
| 12/20/2001 | US20010053590 Process for forming photoresist pattern by using gas phase amine treatment |
| 12/20/2001 | US20010053570 Infiltrating solution of organic solvent into film and reflowing, etching exposed region using film as mask |
| 12/20/2001 | US20010053519 Nucleotide sequences for use as tool in genetic engineering |
| 12/20/2001 | US20010053507 Heat processing apparatus of substrate |
| 12/20/2001 | US20010053502 Chlorofluorinated or bromofluorinated alkylene moiety with acrylate functions at both terminals; may be photocured in presence of photoinitiator into transparent polymers useful as optical waveguides |
| 12/20/2001 | US20010053500 Semiconductor device fabrication system and method of forming semiconductor device pattern using the same and photoresist for manufacturing semiconductor devices thereby |
| 12/20/2001 | US20010053498 Substrate, photosensitive resinous layer having sensitivity to light excepting infrared light and comprising elastomeric binder resin, polymerizable monomeric compound and polymerization initiator, barrier, masking layer |
| 12/20/2001 | US20010053496 Photoresist compositions and use of same |
| 12/20/2001 | US20010053493 Comprising alkali-soluble resin, quinonediazide ester, 4,4'-bis(diethylamino)benzophenone; high sensitivity and definition and improved focal depth |
| 12/20/2001 | US20010053489 Method of detecting aberrations of an optical imaging system |
| 12/20/2001 | US20010053488 Automated, flow-through, dual side, laser direct imaging process and apparatus which provides capability to simultaneously register and image both sides of substrate in continuous flow-through process |
| 12/20/2001 | US20010053487 Automated, flow-through, dual side, laser direct imaging process and apparatus which provides capability to simultaneously register and image both sides of substrate in continuous flow-through process |
| 12/20/2001 | US20010053486 Stacking plurality of photoresist films differing in sensitivity on film formed on semiconductor substrate, exposing, etching, embedding metal material in formed spacings to form plurality of wiring elements |
| 12/20/2001 | US20010053437 Cured film of acid- modified, vinyl group-containing epoxy resin, and an elastomer; heat resistance, humidity resistance adhesibility, mechanical characteristics, given elastic modulus |
| 12/20/2001 | US20010053291 Exposure apparatus, substrate processing unit and lithographic system, and device manufacturing method |
| 12/20/2001 | US20010053196 Weight compensation apparatus, stage apparatus using the same, and exposure apparatus |
| 12/20/2001 | US20010053164 Laser imaging apparatus |
| 12/20/2001 | US20010053017 Optical member for vacuum ultraviolet, and aligner and device manufacture method using same |
| 12/20/2001 | US20010052972 Image exposure apparatus |
| 12/20/2001 | US20010052970 Stage apparatus, exposure apparatus, and device manufacturing method |
| 12/20/2001 | US20010052969 Projection-microlithographic device |
| 12/20/2001 | US20010052968 Exposure apparatus and device manufacturing method |
| 12/20/2001 | US20010052967 Exposure apparatus, method of manufacturing semiconductor devices and plant therefor |
| 12/20/2001 | US20010052966 Scanning exposure method and system |
| 12/20/2001 | US20010052924 Method and device for integrated laser and UV exposure of printing plates |
| 12/20/2001 | US20010052629 Microlens for surface mount products |
| 12/20/2001 | US20010052579 Charged-particle-beam microlithography apparatus and methods including optical corrections made during subfield exposures |
| 12/20/2001 | US20010052576 Electron optical system array, method of manufacturing the same, charged-particle beam exposture apparatus, and device manufacturing method |
| 12/20/2001 | US20010052573 Target mark member, method for manufacturing, and electron beam exposure apparatus thereof |
| 12/20/2001 | US20010052467 Making thermally stable electromagnetic coil vanes, by photolithographically exposing high resolution, dense wire patterns in copper on both sides of ceramic substrate, plating additional copper and firing to eutectically bond |
| 12/20/2001 | US20010052354 Apparatus for processing substrate using process solutions having desired mixing ratios |
| 12/20/2001 | US20010052317 A board coating system |
| 12/20/2001 | US20010052299 Screen printing stencil prodcution |
| 12/20/2001 | DE10030005A1 Objektiv, insbesondere Projektionsobjektiv in der Halbleiter-Lithographie Lens, in particular the projection objective in semiconductor lithography |
| 12/20/2001 | DE10030004A1 Vorrichtung zur Lagerung eines optischen Elementes, zB einer Linse in einem Objektiv Device for storing an optical element such as a lens in a lens |
| 12/20/2001 | DE10029157A1 Vorsensibilisierte Druckplatte mit Rückseitenbeschichtung Presensitized printing plate with backside coating |
| 12/20/2001 | DE10028790A1 Laser lithographic manufacture of circuit board by direct marking by exposing photoresist at different wavelength than that used to expose latent mask |
| 12/20/2001 | DE10027984A1 Photolithographic system for semiconductor wafers corrects diffraction errors by phase filter in Fourier plane suits small structures |
| 12/19/2001 | EP1164629A1 Exposure apparatus, semiconductor device, and photomask |
| 12/19/2001 | EP1164438A1 Developing treatment method and developing treatment unit |
| 12/19/2001 | EP1164437A2 Lithographic system |
| 12/19/2001 | EP1164436A2 Operation of a lithographic projection apparatus |
| 12/19/2001 | EP1164435A1 Photosensitive polysilazane composition and method of forming patterned polysilazane film |
| 12/19/2001 | EP1164434A2 Radiation-sensitive resin composition |
| 12/19/2001 | EP1164433A1 Radiation-sensitive resin composition |
| 12/19/2001 | EP1164432A1 Optical proximity correction method utilizing serifs having variable dimensions |
| 12/19/2001 | EP1164407A2 Illumination system and scanning exposure apparatus using the same |
| 12/19/2001 | EP1164399A2 Projection objective lens, especially for microlithography |
| 12/19/2001 | EP1164398A2 Apparatus for mounting an optical element, e.g. a lens in an objective |
| 12/19/2001 | EP1164397A1 Lens mount especially suited for semiconductor lithography projection lens |
| 12/19/2001 | EP1163553A1 Oxime derivatives and the use thereof as photoinitiators |
| 12/19/2001 | EP1163552A1 Method of forming a masking pattern on a surface |
| 12/19/2001 | EP1163550A1 Hydroxy-amino thermally cured undercoat for 193 nm lithography |
| 12/19/2001 | EP1163549A1 Display screen and method of manufacture therefor |
| 12/19/2001 | EP1163548A1 Device for focussing light onto an object |
| 12/19/2001 | EP1163520A1 Porous coatings bearing ligand arrays |
| 12/19/2001 | EP1163374A2 Arrays of organic compounds attached to surfaces |
| 12/19/2001 | EP1019254B1 Presensitised printing plates |
| 12/19/2001 | EP0767931B1 Increasing the useful range of cationic photoinitiators in stereolithography |
| 12/19/2001 | CN1327596A Integral lens for high energy particle flow, method for producing such lenses and use thereof |
| 12/19/2001 | CN1327547A Photosensitive composition |
| 12/19/2001 | CN1327176A Laminated product of lithographic printing plate and laminating method of lithographic printing plate |
| 12/19/2001 | CN1326860A Sawada Hirokazu, Uesugi Akio (JP) |
| 12/19/2001 | CN1076488C Superthin photo sensitive coating type sensitive plate and its making method and use |
| 12/18/2001 | US6331885 Stage apparatus, scanning type exposure apparatus, and device produced with the same |
| 12/18/2001 | US6331711 Correction for systematic, low spatial frequency critical dimension variations in lithography |
| 12/18/2001 | US6331710 Reflective optical systems for EUV lithography |
| 12/18/2001 | US6331709 Alignment mark detection method, and alignment method, exposure method and device, and device production method making use of the alignment mark detection method |
| 12/18/2001 | US6331602 Monomer and a polymer obtained therefrom |
| 12/18/2001 | US6331489 Semiconductor device production method |
| 12/18/2001 | US6331383 Exposure of photosensitive material having photoacid generator and ph indicator to ultraviolet radiation; colorimetric analysis; masking, development |
| 12/18/2001 | US6331379 Photo-lithography process using multiple anti-reflective coatings |
| 12/18/2001 | US6331378 Pattern forming method |
| 12/18/2001 | US6331376 For use in the preparation of a printed circuit boards |
| 12/18/2001 | US6331375 Suitable for preparing a lithographic form plate for printing (machine plate) by directly writing digital data of a computer or the like |