| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/01/2002 | US6335145 Forming a photosensitive film on a substrate and radiating the photosensitive film on the substrate with a beam of a predetermined shape forming an exposed region of a desired shape butt-joining the exposed unit regions |
| 01/01/2002 | US6335144 For a lithographic printing plate precursor capable of plate-making by scanning exposure based on digital signals, used in optical image-forming, holography, and a color hard copy, production of electronic materials such as photoresists |
| 01/01/2002 | US6335143 Resist composition containing specific cross-linking agent |
| 01/01/2002 | US6335141 High alkali dissolution contrast, high sensitivity and high resolution |
| 01/01/2002 | US6335130 Fabricating a phase shifting mask comprising at least one unattentuated, halftoned, phase-shift feature; off-axis illuminating mask such that light passes through mask onto material |
| 01/01/2002 | US6335128 Generating a first mask/reticle to define a phase-shifting region to define boundaries of a structure in a first layer of the integrated circuit, generating second mask/reticle to define second region to define boundaries of structure |
| 01/01/2002 | US6335127 Charged beam mask having strut wider than charged beam, with shape that matches charged beam |
| 01/01/2002 | US6335125 Photomask and method of manufacturing same |
| 01/01/2002 | US6334960 Polymerization and solidification of fluid on transfer layer |
| 01/01/2002 | US6334392 Drawing apparatus having fixing member for clamping material on drum |
| 12/29/2001 | CA2351797A1 A photolithographic process for the formation of a one-piece needle |
| 12/27/2001 | WO2001099246A2 Laser wavelength control unit with piezoelectric driver |
| 12/27/2001 | WO2001099164A2 Patterning method using a removable inorganic antireflection coating |
| 12/27/2001 | WO2001099161A2 Method of reducing post-development defects in and around openings formed in photoresist by use of multiple development/rinse cycles |
| 12/27/2001 | WO2001099150A2 Enhanced overlay measurement marks |
| 12/27/2001 | WO2001099143A1 Plasma focus light source with tandem ellipsoidal mirror units |
| 12/27/2001 | WO2001098839A2 Dynamic beam steering interferometer |
| 12/27/2001 | WO2001098838A2 Method of forming optical images, mask for use in this method, method of manufacturing a device using this method, and apparatus for carrying out this method |
| 12/27/2001 | WO2001098837A1 Photoresist remover composition comprising ammonium fluoride |
| 12/27/2001 | WO2001098836A2 Method of reducing post-development defects in and around openings formed in photoresist by use of non-patterned exposure |
| 12/27/2001 | WO2001098835A1 Method for determining overlay measurement uncertainty |
| 12/27/2001 | WO2001098834A1 Resist composition |
| 12/27/2001 | WO2001098833A1 Positive type radiation-sensitive composition and process for producing pattern with the same |
| 12/27/2001 | WO2001098832A1 Photosensitive resin composition, photosensitive element comprising the same, process for producing resist pattern, and process for producing printed circuit board |
| 12/27/2001 | WO2001098831A1 Radiation-sensitive composition for black resist |
| 12/27/2001 | WO2001098830A2 Modification of mask layout data to improve mask fidelity |
| 12/27/2001 | WO2001098829A1 A method for individualised marking of circuit boards |
| 12/27/2001 | WO2001098761A1 Overlay alignment mark design |
| 12/27/2001 | WO2001098012A2 FOUR KHz GAS DISCHARGE LASER |
| 12/27/2001 | WO2001097725A2 Electro-optical mask controllable pattern |
| 12/27/2001 | WO2001097724A2 Liquid crystal mask for ophthamological laser surgery |
| 12/27/2001 | WO2001042855A3 Lithography device which uses a source of radiation in the extreme ultraviolet range and multi-layered mirrors with a broad spectral band in this range |
| 12/27/2001 | WO2001008444A3 Hearing aid |
| 12/27/2001 | WO2000054096A9 Imaging device and method for eliminating edge effects in spatial modulators |
| 12/27/2001 | US20010056174 Polyimide derived from a dianhydride and diamine having hydroxyl or carboxyl groups, which are modified with a diepoxide or unsaturated group-containing epoxide; curable; heat resistance, dielectric, film-forming |
| 12/27/2001 | US20010055826 Method for manufacturing optical element, optical element, optical system using optical element, optical apparatus and exposure apparatus using optical system, and method for manufacturing device |
| 12/27/2001 | US20010055733 Slits for light; synchronous conveying to transfer images of pattern; filter |
| 12/27/2001 | US20010055732 Method and apparatus for forming resist pattern |
| 12/27/2001 | US20010055731 Pattern forming method and apparatus for fabricating semiconductor device |
| 12/27/2001 | US20010055730 Using polymers; uniform embedding |
| 12/27/2001 | US20010055727 Resist material and method for pattern formation |
| 12/27/2001 | US20010055726 Positive radiation-sensitive composition |
| 12/27/2001 | US20010055725 Forming intergrated circuits; electroconductive layer on substrate |
| 12/27/2001 | US20010055724 Multilayer; support, layer containing microcapsules and developer |
| 12/27/2001 | US20010055720 Alignment method, overlay deviation inspection method and photomask |
| 12/27/2001 | US20010055522 Substrate processing apparatus |
| 12/27/2001 | US20010055461 Method for producing an optical waveguide |
| 12/27/2001 | US20010055422 System for reading two-dimensional images using ambient and/or projected light |
| 12/27/2001 | US20010055364 High-intensity sources of short-wavelength electromagnetic radiation for microlithography and other uses |
| 12/27/2001 | US20010055326 Exposure apparatus and device manufacturing method |
| 12/27/2001 | US20010055117 Alignment method, exposure method, exposure apparatus and device manufacturing method |
| 12/27/2001 | US20010055109 Photosensitive media cartridge having an ambient condition sensor |
| 12/27/2001 | US20010055107 Illumination optical system in exposure apparatus |
| 12/27/2001 | US20010055104 Exposure method and apparatus |
| 12/27/2001 | US20010055103 Exposure method and exposure apparatus |
| 12/27/2001 | US20010055102 Temperature adjustment apparatus, exposure apparatus having the temperature adjustment apparatus, and semiconductor device manufacturing method |
| 12/27/2001 | US20010055101 Exposure apparatus, exposure method, and device manufacturing method |
| 12/27/2001 | US20010055100 Exposure apparatus |
| 12/27/2001 | US20010055099 Optical device, method for cleaning the same, projection aligner, and method of producing the same |
| 12/27/2001 | US20010054778 Microfabricated elastomeric valve and pump systems |
| 12/27/2001 | US20010054700 Laser imaging apparatus |
| 12/27/2001 | US20010054697 Test method of mask for electron-beam exposure and method of electron-beam exposure |
| 12/27/2001 | US20010054690 Electron optical system array, method of fabricating the same, charged-particle beam exposure apparatus, and device manufacturing method |
| 12/27/2001 | US20010054600 Method and apparatus for simulating standard test wafers |
| 12/26/2001 | CN1328272A Polymerizable alkylene compounds containing tetrahydrofuran methyloxycarbonyl radical and potoresist containing it |
| 12/26/2001 | CN1328270A Active matrix substrate, display device and image sensor |
| 12/26/2001 | CN1327888A Treater for substrate surface |
| 12/26/2001 | CN1076836C Pattern alignment mark of semiconductor device |
| 12/25/2001 | US6333961 Reflection masks, microlithography apparatus using same, and integrated circuit manufacturing methods employing same |
| 12/25/2001 | US6333781 Projection optical system and exposure apparatus and method |
| 12/25/2001 | US6333780 Projection aligner |
| 12/25/2001 | US6333777 Exposure apparatus and device manufacturing method |
| 12/25/2001 | US6333776 Projection exposure apparatus |
| 12/25/2001 | US6333775 Extreme-UV lithography vacuum chamber zone seal |
| 12/25/2001 | US6333741 Boolean layer comparison slice |
| 12/25/2001 | US6333572 Article positioning apparatus and exposing apparatus having the article positioning apparatus |
| 12/25/2001 | US6333508 Illumination system for electron beam lithography tool |
| 12/25/2001 | US6333497 Probe with tip having micro aperture for detecting or irradiating light, near-field optical microscope, recording/reproduction apparatus, and exposure apparatus using the probe, and method of manufacturing the probe |
| 12/25/2001 | US6333268 Method and apparatus for removing post-etch residues and other adherent matrices |
| 12/25/2001 | US6333213 Method of forming photomask and method of manufacturing semiconductor device |
| 12/25/2001 | US6333203 Method of forming a resist pattern |
| 12/25/2001 | US6333142 Master for barrier rib transfer mold, and method for forming barrier ribs of plasma display panel using the same |
| 12/25/2001 | US6333141 Positioning layer of dielectric material comprising decomposable polymer and an organic polysilica, heating to condense polysilica; decomposing polymer; lithographically patterning dielectric layer; depositing a metallic film |
| 12/25/2001 | US6333140 Electrode for plasma display panel and process for producing the same |
| 12/25/2001 | US6333139 Providing polyimide precursor solution comprising a polyimide precursor and photosensitive agent on a long stainless steel foil; further providing conductor layer formed by laminating copper layer via chromium layer or titanium layer or directly |
| 12/25/2001 | US6333138 Exposure method utilizing partial exposure stitch area |
| 12/25/2001 | US6333137 Screen printing stencil |
| 12/25/2001 | US6333136 Carrier film and process for producing the same |
| 12/25/2001 | US6333135 Comprising a photosensitive layer and a first film having a 5% elongation and a breaking elongation of 50-1000% where the photosensitive layer is in contact with the substrate; conforming to surface uneveness; resolution; photosensitivity |
| 12/25/2001 | US6333134 For printing plate having excellent print quality without being thickened by impression |
| 12/25/2001 | US6333133 For direct plate making using an infrared laser based on digital signals outputted from a computer |
| 12/25/2001 | US6333003 Starting operation of removing unit, gathering air in process unit into removing unit; replenishing a new impurity remover; supplying to gas-liquid contact portion; stopping; discharging impurities; supplying biocide |
| 12/25/2001 | US6332924 Photoresist dispensing device |
| 12/25/2001 | US6332922 Manufacturing method for calcium fluoride and calcium fluoride for photolithography |
| 12/25/2001 | US6332724 Substrate processing apparatus |
| 12/25/2001 | US6332723 Substrate processing apparatus and method |
| 12/25/2001 | CA2215691C Scanning lithography system having double pass wynne-dyson optics |
| 12/25/2001 | CA2032602C 4-carbonyl-substituted coumarin compound |
| 12/22/2001 | CA2349771A1 Illumination system with spatially controllable partial coherence compensating for line width variances in a photolithographic system |
| 12/20/2001 | WO2001097347A1 Gas discharge laser electrode with reduced sensitivity to adverse boundary layer effects |