Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
01/2002
01/03/2002US20020001775 Blend of thermoplastic and thermosetting resins
01/03/2002US20020001773 Using laser beams
01/03/2002US20020001772 Hydrogenated polymer
01/03/2002US20020001771 Heat sensitive elements; lithography printing plates
01/03/2002US20020001770 Photoacid generators and photoresists comprising same
01/03/2002US20020001769 Positive photoresist composition
01/03/2002US20020001768 Exposure of photoresist to radiation to generate an acid
01/03/2002US20020001763 Polyimidesiloxane copolymers
01/03/2002US20020001760 Preferential positioning of coating on reticle; adjusting emission; heat exchanging
01/03/2002US20020001759 Generation laser beams; phase shifting
01/03/2002US20020001758 Optical proximity correction
01/03/2002US20020001679 Heat treatment
01/03/2002US20020001672 Vacuum deposition over aluminum diffraction grid
01/03/2002US20020001403 Focusing control mechanism, and inspection apparatus using same
01/03/2002US20020001363 X-ray sources that maintain production of rotationally symmetrical x-ray flux during use
01/03/2002US20020001142 Lens system, in particular projection lens system in semiconductor lithography
01/03/2002US20020001141 Optical projection system
01/03/2002US20020001134 Illumination optical system in exposure apparatus
01/03/2002US20020001090 Illumination device; and coordinate measuring instrument having an illumination device
01/03/2002US20020001088 Apparatus for wavefront detection
01/03/2002US20020001086 Method and apparatus for accurately compensating both long and short term fluctuations in the refractive index of air in an interferometer
01/03/2002US20020001083 Apparatus and method for measuring pattern alignment error
01/03/2002US20020001082 Projection exposure apparatus and method of controlling same
01/03/2002US20020001071 Method of correcting projection optical system and method of manufacturing semiconductor device
01/03/2002US20020001070 System for adjusting a photo-exposure time
01/03/2002US20020001069 Image forming method and image forming apparatus
01/03/2002US20020001028 Image-recording apparatus
01/03/2002US20020000904 Displacement device
01/03/2002US20020000766 Electron optical system, charged-particle beam exposure apparatus using the same, and device manufacturing method
01/03/2002US20020000557 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern
01/03/2002US20020000520 Surface position detection device and exposure apparatus and exposure method achieved by utilizing detection device
01/03/2002US20020000519 Contamination prevention in optical system
01/03/2002US20020000432 Heat treatment apparatus and substrate processing system
01/03/2002US20020000424 Method and device for removing an unnecessary film
01/03/2002US20020000193 Coating apparatus and mixing apparatus
01/03/2002US20020000029 Pipe structure, alignment apparatus, electron beam lithography apparatus, exposure apparatus, exposure apparatus maintenance method, semiconductor device manufacturing method, and semiconductor manufacturing factory
01/03/2002US20020000019 Multi functional cleaning module of manufacturing apparatus for flat panel display and cleaning apparatus using the same
01/03/2002DE10108283A1 Manufacture of semiconductor device involves using organic polymeric embedding material to embed hole patterns
01/03/2002DE10064198A1 Production of a semiconductor device comprises forming either an aluminum, a tungsten or a copper foil on a base layer on a substrate, forming an aluminum, tungsten or copper pattern
01/03/2002DE10030495A1 Verfahren zum Verbinden einer Vielzahl von optischen Elementen mit einem Grundkörper A method of connecting a plurality of optical elements comprising a base body
01/03/2002DE10029288A1 Verfahren zur Herstellung einer planaren Maske auf topologiehaltigen Oberflächen A process for producing a planar topology mask on surfaces containing
01/03/2002CA2413592A1 Method to restore hydrophobicity in dielectric films and materials
01/02/2002EP1168813A2 Compact multibeam laser light source and raster scan line interleaving method for exposing printing plates
01/02/2002EP1168376A1 Method for forming transparent conductive film by using chemically amplified resist
01/02/2002EP1168085A2 Reference plate for exposure apparatus
01/02/2002EP1168084A2 Drive mechanism and exposure apparatus having the same
01/02/2002EP1168083A2 Line width compensation using spatial variations in partial coherence
01/02/2002EP1168082A2 Device for exposure of the peripheral area of a film circuit board
01/02/2002EP1168081A1 Photopolymerizable composition and recording material and recording process using the same
01/02/2002EP1168080A2 Photopolymerizable composition
01/02/2002EP1168079A1 Photo-curable electrically conductive composition and plasma display panel having electrode formed by use of the same
01/02/2002EP1168078A2 A photosensitive media cartridge having an ambient condition sensor
01/02/2002EP1168077A2 An imaging assembly and media cartridge having cooperating linkage arrangements
01/02/2002EP1168076A2 An image forming device and a method of processing photosensitive media having microencapsulated imaging material
01/02/2002EP1168049A1 A color filter array having a red filter layer
01/02/2002EP1168047A1 A color filter array having a blue filter layer
01/02/2002EP1168046A1 A color filter array having a yellow filter layer
01/02/2002EP1168034A2 Illumination device and illuminated coordinate measuring device
01/02/2002EP1168028A2 Projection optical system, manufacturing method thereof, and projection exposure apparatus
01/02/2002EP1168006A2 Method for bonding a plurality of optical elements to a base
01/02/2002EP1167417A1 Flame-retardant vinyl esters, resins and resin compositions containing the same, and cured products thereof
01/02/2002EP1167349A1 Chemical amplifying type positive resist composition and sulfonium salt
01/02/2002EP1167063A2 Presensitized printing plate with pigmented back coating
01/02/2002EP1166816A2 A photolithographic process for the formation of a one-piece needle
01/02/2002EP1166342A1 Etch and ash photoresist removal process
01/02/2002EP1166325A1 Method for carrying out a plasma etching process
01/02/2002EP1166187A1 Holographic recording material
01/02/2002EP1166183A1 Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
01/02/2002EP1166182A1 Method for producing a pattern suitable for forming sub-micron width metal lines
01/02/2002EP1166181A1 Photosensitive pastes and substrates for plasma display panel using the same
01/02/2002EP1166180A1 Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system
01/02/2002EP1166084A1 Method and apparatus for measuring internal transmittance
01/02/2002EP1165708A1 Radiation curable water based cationic inks and coatings
01/02/2002EP1165704A1 Utilization of phenylglyoxilic acid esters as photoinitiators
01/02/2002EP1165627A1 Photopolymerizable vinyl ether based monomeric formulations and polymerizable compositions which may include certain novel spiroorthocarbonates
01/02/2002EP0919014B1 Aqueous antireflective coatings for photoresist compositions
01/02/2002EP0897577B1 Photorefractive composite
01/02/2002EP0834191B1 Removal of material by polarized radiation and back side application of radiation
01/02/2002EP0664925B1 Interconnection structure for integrated circuits and method for making same
01/02/2002CN1329727A Crossed grating photonic crystals and multiple processes for making them
01/02/2002CN1329358A Method for manufacturing semiconductor device and using filling material and semiconductor device
01/02/2002CN1329357A Aligning method, alignment checking method and photomask
01/02/2002CN1329287A Photoetching device and exposure method
01/02/2002CN1329286A 曝光装置 Exposure device
01/02/2002CN1329285A Photopolymer holographic recording material sesitive to green light and its preparation method
01/02/2002CN1329246A Method and equipment for measuring lamination
01/02/2002CN1329005A Organic metal monoacylalkylphosphine compound
01/02/2002CN1077300C Micro-miniature structures and method of fabrication thereof
01/02/2002CN1077114C Photosensitive resin composition for corrugated board printing plate
01/01/2002US6335787 Projection exposure apparatus
01/01/2002US6335786 Exposure apparatus
01/01/2002US6335785 Scan-type reducing projection exposure method and apparatus
01/01/2002US6335784 Scan type projection exposure apparatus and device manufacturing method using the same
01/01/2002US6335783 Lithography system
01/01/2002US6335635 Programmable reticle stitching
01/01/2002US6335537 Projection exposure apparatus and exposure method
01/01/2002US6335531 Modification of resist and/or resist processing with fluorescence detection
01/01/2002US6335152 Use of RTA furnace for photoresist baking
01/01/2002US6335149 High performance acrylate materials for optical interconnects
01/01/2002US6335146 Exposure apparatus and method