| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/10/2002 | US20020004179 Protective coatings |
| 01/10/2002 | US20020004178 Photosensitivity, resolution, chemical resistance |
| 01/10/2002 | US20020004177 Photosensitive resin composition |
| 01/10/2002 | US20020003855 X-ray illumination optical system and x-ray reduction exposure apparatus |
| 01/10/2002 | US20020003629 Positioning stage system and position measuring method |
| 01/10/2002 | US20020003626 Apparatus for detecting optical positional deviation |
| 01/10/2002 | US20020003616 Stage system for exposure apparatus and device manufacturing method using the same |
| 01/10/2002 | US20020003615 Alignment system and projection exposure apparatus |
| 01/10/2002 | US20020003613 Image recording device |
| 01/10/2002 | US20020003569 Forming an image on a printing plate using ultrashort laser pulses |
| 01/10/2002 | US20020003216 Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method |
| 01/10/2002 | US20020003211 Nanometer scale data storage device and associated positioning system |
| 01/10/2002 | US20020003130 Laser system and method for processing a memory link with a burst of laser pulses having ultrashort pulse widths |
| 01/10/2002 | US20020002946 Processing apparatus for processing sample in predetermined atmosphere |
| 01/10/2002 | DE19963588C2 Optische Anordnung Optical arrangement |
| 01/10/2002 | DE10129019A1 Targetmarke, Verfahren zu deren Herstellung und Elektronenstrahl-Belichtungsvorrichtung Target mark, to processes for their preparation and to electron beam exposure apparatus |
| 01/10/2002 | DE10063621A1 Production of a fine pattern used in the production of a semiconductor device and a liquid crystal display comprises producing a hard mask pattern by etching a hard mask film formed on working film on a substrate |
| 01/10/2002 | DE10031915A1 Kompakte Mehrstrahllaserlichtquelle und Interleafrasterscanlinien-Verfahren zur Belichtung von Druckplatten Compact multi-beam laser light source and interleaving method for exposing printing plates |
| 01/10/2002 | DE10031719A1 Beleuchtungseinrichtung und Koordinaten-Meßgerät mit einer Beleuchtungseinrichtung Illumination device and coordinate measuring instrument with a lighting device |
| 01/10/2002 | DE10031162A1 System for exposing print form moves image information fed to light switch array in parallel manner to hold image points on print form fixed while illumination head is moved at uniform speed |
| 01/09/2002 | EP1170982A1 Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 01/09/2002 | EP1170755A1 Integral lens for high energy particle flow, method for producing such lenses and use thereof in analysis devices and devices for radiation therapy and lithography |
| 01/09/2002 | EP1170636A2 Exposure apparatus and surface position adjustment unit |
| 01/09/2002 | EP1170635A2 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 01/09/2002 | EP1170634A1 Exposure apparatus and device manufacturing method using the same |
| 01/09/2002 | EP1170633A1 Exposure apparatus and device manufacturing method using the same |
| 01/09/2002 | EP1170632A1 Photosensitive resin composition for roll coating and method of roll coating |
| 01/09/2002 | EP1170603A2 Method of fabricating silica microstructures |
| 01/09/2002 | EP1170343A1 Infrared sensitive coating liquid |
| 01/09/2002 | EP1170315A1 Urethane oligomer, resin compositions thereof, and cured article thereof |
| 01/09/2002 | EP1170123A2 Negative-working planographic printing plate |
| 01/09/2002 | EP1170121A1 Direct-to-plate flexographic printing plate precursor |
| 01/09/2002 | EP1169670A2 Photolithography method and apparatus configuration for performing photolithography |
| 01/09/2002 | EP1169613A1 Systems and methods for characterizing and correcting cyclic errors in distance measuring and dispersion interferometry |
| 01/09/2002 | EP1169401A1 Radiation curable coating composition comprising a secondary curing agent |
| 01/09/2002 | EP1169357A1 Hydroxy-epoxide thermally cured undercoat for 193 nm lithography |
| 01/09/2002 | EP1137968A4 Novel photosensitive resin compositions |
| 01/09/2002 | EP0853613B1 Light-sensitive resist which can be developed in an aqueous-alkali manner and operates negatively |
| 01/09/2002 | CN1330779A Antireflective composition for deep ultraviolet photoresist |
| 01/09/2002 | CN1330778A Preparation of fractionated novolac resins by novel extraction technique |
| 01/09/2002 | CN1330402A Method for manufacturing semiconductor device |
| 01/09/2002 | CN1330394A Substrate treatment method |
| 01/09/2002 | CN1330292A Exposure device, substrate processing unit and photoetching system and device manufacture method |
| 01/09/2002 | CN1330291A Miniature multi-beam laser source and interlacing raster scanning line method for expossure printing plate |
| 01/09/2002 | CN1330290A Lamp box type ink-jet colour film |
| 01/09/2002 | CN1330289A Optical enhancement right photoetching rubber composite and sulfonium salt |
| 01/09/2002 | CN1330288A Photoresist composite with optical acid-generating agent containing optical free radical generating agent |
| 01/09/2002 | CN1330287A Attenuating phase shift mask and its preparing process |
| 01/09/2002 | CN1329987A Method fr making lithographic printing plate |
| 01/08/2002 | US6337735 Exposure apparatus for photoengraving stamps |
| 01/08/2002 | US6337734 Exposure control method, exposure apparatus and device manufacturing method |
| 01/08/2002 | US6337733 Apparatus including a motor-driven stage for exposing a photosensitive substrate, and method of making such apparatus |
| 01/08/2002 | US6337732 Exposure apparatus and device manufacturing method using the same in which a door lock mechanism is controlled on the basis of temperature and an operation sequence |
| 01/08/2002 | US6337486 Electron beam drawing process and electron beam drawing apparatus |
| 01/08/2002 | US6337484 Positioning device and lithographic projection apparatus comprising such a device |
| 01/08/2002 | US6337479 Object inspection and/or modification system and method |
| 01/08/2002 | US6337217 Method and apparatus for improved focus in optical processing |
| 01/08/2002 | US6337175 Performing a first exposure of the resist formed on the substrate with a given mask pattern; developing; supplying denaturing agent; exposure to form pattern |
| 01/08/2002 | US6337174 Method of stripping a photoresist from a semiconductor substrate dimethylacetamide or a combination of monoethanolamine and dimethylsulfoxide |
| 01/08/2002 | US6337172 Applying photoresist to insulating layer of semiconductor device structure; exposing photoresists at differfent areas of the semiconductor device to radiation; removing photoresist and insulating layer |
| 01/08/2002 | US6337171 As a resist applicable to far ultraviolet rays such as a krf excimer laser, charged particle rays such as electron beams, and x-rays |
| 01/08/2002 | US6337164 Charged-particle-beam microlithography methods exhibiting improved pattern-feature accuracy, and device manufacturing methods comprising same |
| 01/08/2002 | US6337163 Forming underlying film on work film; forming resist film; exposing to first energy beam of a pattern; forming resist pattern by subjecting resist film to a developing treatment; exposing a region of underlying film; dry-etching |
| 01/08/2002 | US6337162 Method of exposure, photomask, method of production of photomask, microdevice, and method of production of microdevice |
| 01/08/2002 | US6337161 Semiconductor |
| 01/08/2002 | US6337028 Process of forming a pattern on a substrate |
| 01/08/2002 | CA2056302C Method for preparing lithographic printing plate |
| 01/07/2002 | CA2349912A1 Setting an image on a printing plate using ultrashort laser pulses |
| 01/03/2002 | WO2002001922A1 Display |
| 01/03/2002 | WO2002001685A1 Extreme repetition rate gas discharge laser with improved blower motor |
| 01/03/2002 | WO2002001621A2 Method to restore hydrophobicity in dielectric films and materials |
| 01/03/2002 | WO2002001300A1 Stripping agent composition and method of stripping |
| 01/03/2002 | WO2002001299A1 Development defect preventing process and material |
| 01/03/2002 | WO2002001298A1 Multi-beam pattern generator |
| 01/03/2002 | WO2002001297A2 Method for photochemically structuring surfaces and articles structured by said method |
| 01/03/2002 | WO2002001296A2 Strongly water-soluble photoacid generator resist compositions |
| 01/03/2002 | WO2002001295A1 Apparatus and method for forming photoresist pattern with target critical dimension |
| 01/03/2002 | WO2002001294A1 Apparatus and method for compensating critical dimension deviations across photomask |
| 01/03/2002 | WO2002001292A1 Device and method for cleaning articles used in the production of semiconductor components |
| 01/03/2002 | WO2002001291A1 Lithographic plate having a conformal radiation-sensitive layer on a rough substrate |
| 01/03/2002 | WO2002000758A1 Accelerators useful for energy polymerizable compositions |
| 01/03/2002 | WO2002000757A1 Accelerators for cationic polymerization catalyzed by iron-based catalysts |
| 01/03/2002 | WO2002000735A1 Novel photoinitiators and applications therefor |
| 01/03/2002 | WO2001070502A3 Planographic thermal processless imaging member and methods of use |
| 01/03/2002 | WO2001048811A3 A method for efficiently computing a number of integrated circuit dies |
| 01/03/2002 | WO2001043967A3 One side matte multilayer coversheet |
| 01/03/2002 | WO2001040425A3 Post chemical-mechanical planarization (cmp) cleaning composition |
| 01/03/2002 | WO2001031402A8 Method for the production of nanometer range surface decorated substrates |
| 01/03/2002 | US20020002265 Novolac polymer planarization films with high temperature stability |
| 01/03/2002 | US20020002212 Epoxides, cycloepoxides, aromatic epoxides, having 1-18 carbon ateoms, wherein one or more carbon atoms can be replaced by ether, carbonyl, ester, silane, or amine |
| 01/03/2002 | US20020001978 Method for manufacturing double-faced semiconductor circuits |
| 01/03/2002 | US20020001975 Method of generating a circuit pattern used for fabricating a semiconductor device |
| 01/03/2002 | US20020001957 Method for forming fine patterns by thinning developed photoresist patterns using oxygen radicals |
| 01/03/2002 | US20020001915 Step & scan projection exposure apparatus, maintenance method therefor, and semiconductor device manufacturing method and semiconductor manufacturing factory using the apparatus |
| 01/03/2002 | US20020001781 Method for cleaning the surface of substrate to which residues of resist stick |
| 01/03/2002 | US20020001780 Method of reducing defects |
| 01/03/2002 | US20020001779 Method for performing photolithography |
| 01/03/2002 | US20020001778 Photolithography scheme using a silicon containing resist |
| 01/03/2002 | US20020001777 Multilaye rlaminate; dielectric substrate, patterned photoresist mask |
| 01/03/2002 | US20020001776 Controlled heating; applying activating radiation |