| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/17/2002 | US20020006574 Positive resist composition |
| 01/17/2002 | US20020006563 Calculating exposure dose at specified regions of the sensitive substrate to determine expected proximity effects at the specified regions; mathematical equations; making microelectronics |
| 01/17/2002 | US20020006561 Projection exposure apparatus and method |
| 01/17/2002 | US20020006560 Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured thereby |
| 01/17/2002 | US20020006558 Structure for pattern formation, method for pattern formation, and application thereof |
| 01/17/2002 | US20020006557 Masking particles within photosensitive material |
| 01/17/2002 | US20020006556 Low thermal distortion extreme-UV lithography reticle |
| 01/17/2002 | US20020006555 Resist film patterns are partly formed over substrate in addition to metal patterns to shorten time required to change or correct mask pattern |
| 01/17/2002 | US20020006553 Reducing line width difference due to pattern density without applying a load; lithographic process for multiplexing exposure |
| 01/17/2002 | US20020006474 Solvent prewet and method and apparatus to dispense the solvent prewet |
| 01/17/2002 | US20020006473 Solvent prewet and method and apparatus to dispense the solvent prewet |
| 01/17/2002 | US20020006180 X-ray projection exposure apparatus and a device manufacturing method |
| 01/17/2002 | US20020006149 Laser wavelength control unit with piezoelectric driver |
| 01/17/2002 | US20020006147 High power gas discharge laser with line narrowing unit |
| 01/17/2002 | US20020005990 Optical element formed with optical thin film and exposure apparatus |
| 01/17/2002 | US20020005940 Exposure apparatus, method for manufacturing thereof, method for exposing and method for manufacturing microdevice |
| 01/17/2002 | US20020005939 Lithographic projection apparatus, supporting assembly and device manufacturing method |
| 01/17/2002 | US20020005938 Projection optical system, exposure apparatus incorporating this projection optical system, and manufacturing method for micro devices using the exposure apparatus |
| 01/17/2002 | US20020005937 Rotational mask scanning exposure method and apparatus |
| 01/17/2002 | US20020005890 Compact multibeam laser light source and interleaving raster scan line method for exposing printing plates |
| 01/17/2002 | US20020005729 Method and system for probing, testing, burn-in, repairing and programming of integrated circuits in a closed environment using a single apparatus |
| 01/17/2002 | US20020005496 Apparatusn for determining exposure conditions, method for determining exposure conditions and process apparatus |
| 01/17/2002 | US20020005495 Exposure method and device manufacturing method using the same |
| 01/17/2002 | US20020005494 Charged-particle-beam microlithography apparatus and methods including proximity-effect correction |
| 01/17/2002 | US20020005491 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method |
| 01/17/2002 | US20020005392 Systems and methods for variable mode plasma enhanced processing of semiconductor wafers |
| 01/17/2002 | US20020005391 Methods and apparatus for forming submicron patterns on films |
| 01/17/2002 | US20020005051 Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same |
| 01/17/2002 | DE10127383A1 Stereo-Lithographie-Gerät und Verfahren zum Herstellen dreidimensionaler Objekte Stereolithography apparatus and method for manufacturing three-dimensional objects |
| 01/16/2002 | EP1172837A2 Electron beam lithography method and electron-optical lithography device |
| 01/16/2002 | EP1172699A1 Developing solution for photosensitive lithographic printing plate, plate-making method of lithographic printing plate, and photosensitive lithographic printing plate |
| 01/16/2002 | EP1172698A2 Lithographic projection apparatus, device manufacturing method, device manufactured thereby and gas composition |
| 01/16/2002 | EP1172697A2 Method of manufacturing lithographic printing plate |
| 01/16/2002 | EP1172696A1 Lithographic printing plate precursor |
| 01/16/2002 | EP1172695A1 Barrier layer |
| 01/16/2002 | EP1172694A1 Polymeric compound for photoresist and resin composition for photoresist |
| 01/16/2002 | EP1172693A1 Photocurable resin compositions |
| 01/16/2002 | EP1172670A2 Optical element formed with optical thin film and ultraviolet exposure apparatus |
| 01/16/2002 | EP1172384A1 Polymer for photoresists and resin compositions for photoresists |
| 01/16/2002 | EP1172228A2 Support for lithographic printing plate and pre-sensitized plate |
| 01/16/2002 | EP1171908A1 Method for removing residues with reduced etching of oxide |
| 01/16/2002 | EP1171803A1 Photo-curable polymer composition and flexographic printing plates containing the same |
| 01/16/2002 | EP1171802A1 Novel photosensitive resin compositions |
| 01/16/2002 | EP1171801A1 Novel photosensitive polybenzoxazole precursor compositions |
| 01/16/2002 | EP1171800A1 Stamp for use in a lithographic process, method of manufacturing a stamp, and method of manufacturing a patterned layer on a substrate |
| 01/16/2002 | EP1171799A1 Projection lithography photomask blanks, preforms and method of making |
| 01/16/2002 | EP1171502A1 Resin composition for photofabrication of three dimensional objects |
| 01/16/2002 | EP1171493A1 Photoactive polymers |
| 01/16/2002 | EP1171292A1 Process for direct digital printing of circuit boards |
| 01/16/2002 | EP0823977B1 Lithopraphic apparatus for step-and-scan imaging of a mask pattern |
| 01/16/2002 | CN1331812A Flexographic printing plate and original plate therefor |
| 01/16/2002 | CN1331632A Positive-working photosensitive lithographic printing plate and method for producing same |
| 01/16/2002 | CN1331486A Method of forming micro drawing of semiconductor device |
| 01/16/2002 | CN1331433A Anastigmatic gum carving compsns. contg. alicyclic dissolution inhibitor |
| 01/16/2002 | CN1331257A Organic anti-reflecting paint polymer, anti-reflecting paint compsns. and its prepn. method |
| 01/16/2002 | CN1331256A Organic anti-reflecting paint polymer, anti-reflecting paint compsns. and its prepn. method |
| 01/16/2002 | CN1331255A Organic anti-reflecting paint polymer, anti-reflecting paint compsns. contg. same and its prepn. method |
| 01/16/2002 | CN1331254A Organic anti-reflecting cladding polymer, anti-reflecting cladding compsns. contg. same and its prepn. method |
| 01/16/2002 | CN1331253A Organic anti-reflecting paint polymer, anti-reflecting paint compsns. and its prepn. method |
| 01/15/2002 | US6339634 Soft x-ray light source device |
| 01/15/2002 | US6339505 Method for radiation projection and lens assembly for semiconductor exposure tools |
| 01/15/2002 | US6339471 Projection exposure apparatus |
| 01/15/2002 | US6339467 Projection exposure apparatus and device manufacturing method |
| 01/15/2002 | US6339266 Planar motor device, stage unit, exposure apparatus and its making method, and device and its manufacturing method |
| 01/15/2002 | US6339217 Scanning probe microscope assembly and method for making spectrophotometric, near-field, and scanning probe measurements |
| 01/15/2002 | US6339028 Vacuum loadlock ultra violet bake for plasma etch |
| 01/15/2002 | US6338971 Method of correcting alignment |
| 01/15/2002 | US6338937 Lithography method and method for producing a wiring board |
| 01/15/2002 | US6338936 Resin with ester group, unsaturated bond, generation of acid by exposure to acid and catalysis |
| 01/15/2002 | US6338934 Photoresists, polymers and radiation then quenching |
| 01/15/2002 | US6338932 Hand application to fabric of heat transfers imaged with color copiers/printers |
| 01/15/2002 | US6338931 Photoacid generator of sulfonyldiazomethane compound |
| 01/15/2002 | US6338930 Positive photoresist layer and a method for using the same |
| 01/15/2002 | US6338926 Masking a pattern composed of a rectangle, gravity, separation, bars, over exposure and fitting |
| 01/15/2002 | US6338925 Semiconductor wafers, calibration, calculation and times |
| 01/15/2002 | US6338923 Photolithography mask having monitoring marks and manufacturing method thereof |
| 01/15/2002 | US6338922 Optimized alternating phase shifted mask design |
| 01/15/2002 | US6338921 Masking and image patterns, substrate radiation transparent, forming segments and layers |
| 01/15/2002 | US6338582 Substrate delivery apparatus and coating and developing processing system |
| 01/15/2002 | US6338409 Reticle SMIF pod in situ orientation |
| 01/15/2002 | US6338361 Apparatus with a check function for controlling a flow resistance of a photoresist solution |
| 01/10/2002 | WO2002003766A2 Process for thick film circuit patterning |
| 01/10/2002 | WO2002003512A1 High repetition rate gas discharge laser with precise pulse timing control |
| 01/10/2002 | WO2002003509A1 Extreme repetition rate gas discharge laser |
| 01/10/2002 | WO2002003426A2 Process for the post etch stripping of photoresist with hydrogen |
| 01/10/2002 | WO2002003143A2 Alkylene carbonate-based photoresist stripping compositions |
| 01/10/2002 | WO2002003142A2 Electric microcontact printing method and apparatus |
| 01/10/2002 | WO2001063359A3 Thin layer imaging process for microlithography using radiation at strongly attenuated wavelengths |
| 01/10/2002 | WO2001050523A3 Method to measure alignment using latent image grating structures |
| 01/10/2002 | WO2001038940A3 Method for surface patterning using a focused laser |
| 01/10/2002 | WO2001033613A3 Removal of photoresist and residue from substrate using supercritical carbon dioxide process |
| 01/10/2002 | US20020004714 Method and apparatus for application of proximity correction with unitary segmentation |
| 01/10/2002 | US20020004570 Polymer and photoresist compositions |
| 01/10/2002 | US20020004569 Polymer, chemically amplified resist composition and patterning process |
| 01/10/2002 | US20020004353 Composition for bulkhead of thin display panel |
| 01/10/2002 | US20020004316 Method of fabricating silica microstructures |
| 01/10/2002 | US20020004283 Method of forming an alignment feature in or on a multi-layered semiconductor structure |
| 01/10/2002 | US20020004182 Multi depth substrate fabrication processes |
| 01/10/2002 | US20020004181 Microminiaturization semiconductors, integrated circuits |
| 01/10/2002 | US20020004180 Electroconductive zones on dielectric |