| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/24/2002 | US20020008470 Paste, display member, and process for production of display member |
| 01/24/2002 | US20020008209 Electron-beam sources exhibiting reduced spherical aberration, and microlithography apparatus comprising same |
| 01/24/2002 | US20020008207 Charged-particle beam exposure apparatus, charged-particle beam exposure method, control data determination method, and device manufacturing method using this method |
| 01/24/2002 | US20020008081 Brush graining using abrasives |
| 01/24/2002 | US20020007910 Thermosettable pressure sensitive adhesive |
| 01/24/2002 | US20020007751 Lithographic printing plate precursor |
| 01/24/2002 | US20020007750 Process for roughening support material for printing plates |
| 01/24/2002 | US20020007742 Screen printing stencil production |
| 01/24/2002 | EP1145079A3 Method for determining misalignment between a reticle and a wafer |
| 01/24/2002 | DE19848861A1 Herstellungsprozeß einer Halbleitervorrichtung durch Elektronenstrahllithographie Manufacturing process of a semiconductor device by electron beam lithography |
| 01/24/2002 | DE10133717A1 New copolymers, used in antireflection coating compositions for semiconductor devices, have 9-anthracenemethyliminoalkyl, hydroxyalkyl, glycidyl and methyl (meth)acrylate units |
| 01/24/2002 | DE10034412A1 Verfahren zur Elektronenstrahl-Lithographie und elektronen-optisches Lithographiesystem A method of electron beam lithography and electron-optical lithography system |
| 01/24/2002 | DE10032282A1 Lithographic exposure and structuring process comprises applying anti-refection layer made up of several layers on substrate, and applying material layer to be treated |
| 01/24/2002 | DE10030797A1 Production of structurized surface, stamp profile or hydrophilic and hydrophobic areas by exposure with actinic radiation through mask uses photolyzable compound with hydrophobic unit and specified hydrophilic unit, e.g. trialkylsilyl unit |
| 01/24/2002 | DE10030016A1 Material used for nano-imprint lithography for producing embossed nano-structure in thin film on substrate, useful in optics, optoelectronics and microelectronics, is embossed above glass transition temperature |
| 01/24/2002 | DE10030015A1 Material used for nano-imprint lithography for producing embossed nano-structure in thin film on substrate, useful as embossing tool for thermoplastics, is curable and embossed above glass transition temperature |
| 01/23/2002 | EP1174965A1 An electrode material for a gas discharge laser |
| 01/23/2002 | EP1174911A2 Silicon nitride as anti-reflective coating |
| 01/23/2002 | EP1174770A2 Lithographic apparatus |
| 01/23/2002 | EP1174769A2 Lithographic projection apparatus and lithographic device manufacturing method |
| 01/23/2002 | EP1174768A1 Exposure apparatus and device manufacturing method using the same |
| 01/23/2002 | EP1174767A1 Photosensitive resin composition, photosensitive element comprising the same, process for producing resist pattern, and process for producing printed circuit board |
| 01/23/2002 | EP1174766A2 Process for patterning non-photoimagable ceramic tape |
| 01/23/2002 | EP1174765A1 Color filter and method for producing the same |
| 01/23/2002 | EP1174764A2 Assist features for use in lithographic projection |
| 01/23/2002 | EP1174749A2 High numerical aperture catadioptric lens |
| 01/23/2002 | EP1174679A2 Interferometer box |
| 01/23/2002 | EP1174026A2 Citric acid tri-alkylamide surfactants |
| 01/23/2002 | EP1174007A1 A method for making flexible circuits |
| 01/23/2002 | EP0986472B1 Heat sensitive plate precursors |
| 01/23/2002 | CN1332759A Accelerators useful for energy polymerizable compositions |
| 01/23/2002 | CN1332472A Fine graphic forming method and method for making semiconductor device using the same |
| 01/23/2002 | CN1332470A Exposure device, surface position regulating unit and method for making mask and device |
| 01/23/2002 | CN1332451A Method for manufacturing first generation disk of optical disk |
| 01/23/2002 | CN1332205A 辐射敏感树脂组合物 The radiation-sensitive resin composition |
| 01/23/2002 | CN1332055A Making image on printing plate using ultrashort laser pulse |
| 01/23/2002 | CN1078359C Management device of photoresists stripping liquid |
| 01/23/2002 | CN1078358C Illuminator and exposure device and method including same |
| 01/23/2002 | CN1078357C Waterborne photoresists having associate thickeners |
| 01/23/2002 | CN1078132C Heat-sensitive composition and method of making lithographic printing from it |
| 01/22/2002 | US6341029 Method and apparatus for shaping a laser-beam intensity profile by dithering |
| 01/22/2002 | US6341011 Exposure method |
| 01/22/2002 | US6341007 Exposure apparatus and method |
| 01/22/2002 | US6341006 Projection exposure apparatus |
| 01/22/2002 | US6340765 Photochromic dyes and development |
| 01/22/2002 | US6340734 Forming a protected hydroxy compound and a trihydroxysilane and alkyl group for photoresists |
| 01/22/2002 | US6340635 Resist pattern, process for the formation of the same, and process for the formation of wiring pattern |
| 01/22/2002 | US6340626 Method for making a metallic pattern by photolithography |
| 01/22/2002 | US6340559 In the manufacture of integrated circuits |
| 01/22/2002 | US6340557 Depositing anti-reflection coating of organic material for absorbing energy beam on etching target film formed on a semiconductor substrate, a photosensitive film including a sulfonyl compound is deposited; irradiating, removing |
| 01/22/2002 | US6340556 Photosensitive formulation is coated onto a substrate, exposed to activating energy to decompose the polymer in the imagewise exposed areas; and developed to remove the exposed nonimage areas thus producing a pattern of lines |
| 01/22/2002 | US6340553 Positive-working photoresist composition |
| 01/22/2002 | US6340552 Photosensitive composition containing a dissolution inhibitor and an acid releasing compound |
| 01/22/2002 | US6340551 Are capable of directly making a printing plate using an infrared laser based on digital signals outputted from a computer |
| 01/22/2002 | US6340550 Imaging transfer system and process for transferring image and non-image areas thereof to a receptor element |
| 01/22/2002 | US6340547 Method of forming circuit patterns on semiconductor wafers using two optical steppers having nonaligned imaging systems |
| 01/22/2002 | US6340546 Which, on heating, become heat-resistant polyimide polymers suitable for surface-protecting films, interlayer insulating films |
| 01/22/2002 | US6340545 Colored images with excellent light resistance, stability and photosensitivity |
| 01/22/2002 | US6340542 Transferring the selected function-block patterns sequentially to the wafer, thereby forming a desired pattern thereon by photolithography |
| 01/22/2002 | US6340526 Waterless planographic printing plate precursor and production method thereof |
| 01/22/2002 | US6340395 Salsa clean process |
| 01/22/2002 | US6340253 Resist peeling system and control method of a resist peeling solution |
| 01/21/2002 | CA2352088A1 High numerical aperture catadioptric lens |
| 01/17/2002 | WO2002005035A1 Lithographic gap-filler forming composition |
| 01/17/2002 | WO2002005034A1 Resist resin, chemical amplification type resist, and method of forming pattern with the same |
| 01/17/2002 | WO2002005033A1 Method of reducing metal ion content of film-forming resins using a liquid/liquid centrifuge |
| 01/17/2002 | WO2002005032A1 Method of manufacturing integrated circuit |
| 01/17/2002 | WO2002005030A1 Control technique for microlithography lasers |
| 01/17/2002 | WO2002005029A1 A method of illuminating a photomask using chevron illumination |
| 01/17/2002 | WO2002004885A1 Method and apparatus for high-speed thickness mapping of patterned thin films |
| 01/17/2002 | WO2002004698A2 Particle guidance system |
| 01/17/2002 | WO2002004564A2 Modified pigment products, dispersions thereof, and compositions comprising the same |
| 01/17/2002 | WO2002004532A1 Resins for resists and chemically amplifiable resist compositions |
| 01/17/2002 | WO2002004311A1 Smif container including an electrostatic dissipative reticle support structure |
| 01/17/2002 | WO2002004233A1 Compositions for cleaning organic and plasma etched residues for semiconductor devices |
| 01/17/2002 | WO2002004210A1 Printing plates comprising modified pigment products |
| 01/17/2002 | WO2001067179A3 Use of carboxyl group-containing acetal polymers in light-sensitive compositions and lithographic printing plates |
| 01/17/2002 | WO2001063732A3 Methods and apparatus for selectively tailored electromagnetic fields of linear motors |
| 01/17/2002 | WO2001050198A3 Method for production of three-dimensionally arranged conducting and connecting structures for volumetric and energy flows |
| 01/17/2002 | WO2001018860A3 Improved apparatus and methods for integrated circuit planarization |
| 01/17/2002 | WO2000044161A3 Multiple-beam, diode-pumped imaging system |
| 01/17/2002 | US20020007481 Apparatus and method of correcting layout pattern data, method of manufacturing semiconductor devices and recording medium |
| 01/17/2002 | US20020007031 Pendant ester groups on norbornene and 1,4:5,8-dimethanonaph-thalene backbone monomers, excellent reactivity; photosensitivity |
| 01/17/2002 | US20020007018 Hydroxyl-containing polymer, amino cross-linking agent, thermal acid generator; for use as undercoat layer in deep UV lithography |
| 01/17/2002 | US20020006737 Method and system for coating and developing |
| 01/17/2002 | US20020006734 Manufacturing method of semiconductor integrated circuit device |
| 01/17/2002 | US20020006730 Fine pattern formation method and semiconductor device or liquid crystal device manufacturing method employing this method |
| 01/17/2002 | US20020006713 Optical article, exposure apparatus or optical system using it, and process for producing it |
| 01/17/2002 | US20020006675 Semiconductor manufacturing apparatus and method of manufacturing semiconductor devices |
| 01/17/2002 | US20020006648 Free-form fabrication using multi-photon excitation |
| 01/17/2002 | US20020006588 Method for fabricating 3-D structures with smoothly-varying topographic features in photo-sensitized epoxy resists |
| 01/17/2002 | US20020006586 Optical devices made from radiation curable fluorinated compositions |
| 01/17/2002 | US20020006585 Overcoating with photoresist patterns |
| 01/17/2002 | US20020006583 Solution includes a photosensitive material and a plurality of masking particles within the photosenstive material; screen printing the solution over a substrate |
| 01/17/2002 | US20020006582 Chemical amplification type positive resist compositions and sulfonium salts |
| 01/17/2002 | US20020006581 Comprising a support and a photosensitive resin layer formed on the support directly or via an adhesive layer, the support having given hardness, thickness, transparency, such as a polyethylene terephthalate type resin; easy bending |
| 01/17/2002 | US20020006578 Positive resist composition |
| 01/17/2002 | US20020006577 Apparatus and method for coating treatment |
| 01/17/2002 | US20020006576 High in sensitivity, excellent in adhesion and giving a good resist pattern profile, polymer comprising units of hydroxyalkylacrylate, mercaptoalkylacrylate, or corresponding ethers and sulfides |
| 01/17/2002 | US20020006575 Positive-working mixture contains polymeric binder insoluble in water but soluble or swellable in alkaline solution and the cyanine dye having enolate of pyrimidine 2,4,6-trione and indolium, quinolinium, or benzothiazolium group |