| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/31/2002 | US20020011165 Planographic printing plate |
| 01/31/2002 | US20020011164 Pin registration system for mounting different width printing plates |
| 01/31/2002 | DE10134163A1 New copolymers, used in photoresist composition for producing resist image, contain recurring units derived from unsaturated carboxylic anhydride, allyltrimethylsilane and 2-alkyl-adamant-2-yl (meth)acrylate |
| 01/31/2002 | DE10122678A1 Mask data correction device with graphic correction stage generates transfer mask pattern shape for use in manufacturing process so as to prevent faults anticipated during manufacture |
| 01/31/2002 | CA2385253A1 Resist ink composition |
| 01/30/2002 | EP1176634A2 Method of anisotropic dry etching organic antireflection layers |
| 01/30/2002 | EP1176468A1 Resin bilayer for extreme ultraviolet photolithography and extreme ultraviolet photololithographic method |
| 01/30/2002 | EP1176467A1 Negative working photosensitive lithographic printing plate |
| 01/30/2002 | EP1176007A2 Negative image-recording material and method of image formation |
| 01/30/2002 | EP1176006A2 Method and apparatus for preparing a printing plate precursor from a pre-prepared support material |
| 01/30/2002 | EP1175811A1 Disposable modular hearing aid |
| 01/30/2002 | EP1175642A1 Improved method and apparatus for submicron ic design using edge fragment tagging |
| 01/30/2002 | EP0802854B1 Embossed substrate and photoreceptor device incorporating the same and method |
| 01/30/2002 | CN2475053Y Lift derice of exposure machine exposure gate |
| 01/30/2002 | CN2475052Y Circuit board counterpoint device of exposure machine |
| 01/30/2002 | CN1333999A Method of manufacturing an interlayer and a laminate precursor useful for same |
| 01/30/2002 | CN1333996A Production of photoresist coatings |
| 01/30/2002 | CN1333884A Color filters for flat panel display |
| 01/30/2002 | CN1333554A Alignment method and apparatus for array type optical probe scanning IC photoetching system |
| 01/30/2002 | CN1333553A Array type optical probe scanning IC photoetching method |
| 01/30/2002 | CN1333485A Holograph printing system and stereo holograph |
| 01/30/2002 | CN1333482A Emission photoetching method and device using transmitter with pattern |
| 01/30/2002 | CN1333138A Support frame and PS plate for lithographic printing plate |
| 01/30/2002 | CN1333137A Front body for lithographic printing plate |
| 01/30/2002 | CN1078740C Electronic beam unit projection stamp mark system |
| 01/30/2002 | CN1078592C Acid-stable borates for photopolymerization |
| 01/30/2002 | CN1078532C Inverted stamping process |
| 01/29/2002 | US6343370 Apparatus and process for pattern distortion detection for semiconductor process and semiconductor device manufactured by use of the apparatus or process |
| 01/29/2002 | US6342967 Photolithography lens |
| 01/29/2002 | US6342943 Exposure apparatus |
| 01/29/2002 | US6342942 Exposure apparatus, exposure control method, and device fabrication method using the exposure apparatus |
| 01/29/2002 | US6342941 Exposure apparatus and method preheating a mask before exposing; a conveyance method preheating a mask before exposing; and a device manufacturing system and method manufacturing a device according to the exposure apparatus and method |
| 01/29/2002 | US6342562 Polysilicate modified with alkylcarboxy siloxane; amplification; photoresist |
| 01/29/2002 | US6342542 Radiation-sensitive resin composition |
| 01/29/2002 | US6342412 Having a dram (dynamic random access memory), having a capacity as high as 16 mbits; improve the alpha-ray soft error withstand voltage; misfet |
| 01/29/2002 | US6342334 Chemically amplified resist compositions |
| 01/29/2002 | US6342333 Photosensitive resin composition, patterning method, and electronic components |
| 01/29/2002 | US6342332 Acrylic binder, multifunctional unsaturated polymerizable monomer, photoinitiator in an amount greater than 10%; ether solvent; resistant to blocking; negative photoresist |
| 01/29/2002 | US6342330 Photosensitive compositions and pattern formation method |
| 01/29/2002 | US6342329 Image-forming medium |
| 01/29/2002 | US6342322 Photosensitive composition and calcined pattern obtained by use thereof |
| 01/29/2002 | US6342321 Method of drying resinous composition layer, method of manufacturing color filter substrate using the same drying method, and liquid crystal display device |
| 01/29/2002 | US6342312 Calcium fluoride crystal, optical article and exposure apparatus for photo-lithography using the same |
| 01/29/2002 | US6342164 Pinhole-free dielectric films |
| 01/29/2002 | US6341932 Plate feeding apparatus and method |
| 01/29/2002 | US6341903 Substrate processing apparatus |
| 01/28/2002 | CA2350250A1 Method and apparatus for producing a print image carrier on prefabricated carrier material |
| 01/24/2002 | WO2002007211A2 Multi-layer registration control for photolithography processes |
| 01/24/2002 | WO2002007199A1 Fluid pressure imprint lithography |
| 01/24/2002 | WO2002006902A2 Method and system of automatic fluid dispensing for imprint lithography processes |
| 01/24/2002 | WO2002006901A2 Photoresist composition for deep uv and process thereof |
| 01/24/2002 | WO2002006899A2 Method for characterizing optical systems using holographic reticles |
| 01/24/2002 | WO2002006898A2 Material and method for making an electroconductive pattern |
| 01/24/2002 | WO2002006897A2 Dry multilayer inorganic alloy thermal resist film for lithographic processing and image creation |
| 01/24/2002 | WO2002006895A1 T-butyl cinnamate polymers and their use in photoresist compositions |
| 01/24/2002 | WO2002006700A1 Vibration isolating device using magnetic levitating device |
| 01/24/2002 | WO2002006402A1 Absorbing compounds for spin-on glass anti-reflective coatings for photolithography |
| 01/24/2002 | WO2001062400A3 Precision fabrication of diverse polymer microstructures by use of the hydrophobic effect |
| 01/24/2002 | WO2001041262A3 Method and apparatus for optically examining miniature patterns |
| 01/24/2002 | WO2001038939A3 Method for determining misalignment between a reticle and a wafer |
| 01/24/2002 | WO2001033300A3 High precision orientation alignment and gap control stages for imprint lithography processes |
| 01/24/2002 | WO2001029879A3 Systems and methods for photoresist strip and residue treatment in integrated circuit manufacturing |
| 01/24/2002 | US20020010906 Circuit pattern design method,exposure method, charged-particle beam exposure system |
| 01/24/2002 | US20020010905 Circuit pattern design method, circuit pattern design system, and recording medium |
| 01/24/2002 | US20020010264 Overcoat for light-sensitive materials comprising (1-vinylimidazole) polymer or copolymer |
| 01/24/2002 | US20020010065 Containing asenic, titanium oxide and fluorine |
| 01/24/2002 | US20020009901 Charged-particle beam exposure apparatus and device manufacturing method |
| 01/24/2002 | US20020009890 Manufacturing method of active matrix substrate |
| 01/24/2002 | US20020009881 Conductor member formation and pattern formation methods |
| 01/24/2002 | US20020009863 Method of etching a wafer layer using multiple layers of the same photoresistant material and structure formed thereby |
| 01/24/2002 | US20020009829 Surface treatment of darc films to reduce defects in subsequent cap layers |
| 01/24/2002 | US20020009813 Exposure apparatus, coating/developing apparatus, method of transferring a substrate, method of producing a device, semiconductor production factory, and method of maintaining an exposure apparatus |
| 01/24/2002 | US20020009676 Patterning layer of negative photoresist; miniaturization |
| 01/24/2002 | US20020009675 Method for reducing photolithographic steps in a semiconductor interconnect process |
| 01/24/2002 | US20020009674 Photoresist stripping composition and process for stripping photoresist |
| 01/24/2002 | US20020009671 Water insoluble binders; carbon black particles; infrared lasers |
| 01/24/2002 | US20020009670 Photoresist ovewcoatings; reduction reflection of exposure radiation |
| 01/24/2002 | US20020009668 Radiation-sensitive resin composition |
| 01/24/2002 | US20020009667 Radiation-sensitive resin composition |
| 01/24/2002 | US20020009666 Positive photoresist composition |
| 01/24/2002 | US20020009663 Positive or negative amplification |
| 01/24/2002 | US20020009657 Method and system for compensating exposure value for exposure process as well as exposure system and semiconductor Manufacturing system |
| 01/24/2002 | US20020009654 Pigment dispersion composition for color filter, production method thereof, and color filter for display |
| 01/24/2002 | US20020009635 Novel materials for use as electrolytic solutes |
| 01/24/2002 | US20020009595 Organic anti-reflective coating polymer and preparation thereof |
| 01/24/2002 | US20020009592 Evaluating method of hydrophobic process, forming method of resist pattern, and forming system of resist pattern |
| 01/24/2002 | US20020009574 Planographic printing plate precursor and manufacturing method of planographic printing plate |
| 01/24/2002 | US20020009176 X-ray exposure apparatus |
| 01/24/2002 | US20020009175 Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory |
| 01/24/2002 | US20020008911 Projection optical system with diffractive optical element |
| 01/24/2002 | US20020008877 Stage apparatus which supports interferometer, stage position measurement method, projection exposure apparatus, projection exposure apparatus maintenance method, semiconductor device manufacturing method, and semiconductor manufacturing factory |
| 01/24/2002 | US20020008869 Method of measuring aberration in an optical imaging system |
| 01/24/2002 | US20020008864 Substrate holding apparatus and exposure apparatus including substrate holding apparatus |
| 01/24/2002 | US20020008863 Projection exposure apparatus |
| 01/24/2002 | US20020008862 Projection exposure method, manufacturing method for device using same, and projection exposure apparatus |
| 01/24/2002 | US20020008861 Projection lens, in particular for microlithography |
| 01/24/2002 | US20020008860 Reticle system for measurement of effective coherence factors |
| 01/24/2002 | US20020008858 Optical arrangement and projection exposure system for microlithography with passive thermal compensation |
| 01/24/2002 | US20020008857 Developing method and developing apparatus |
| 01/24/2002 | US20020008855 Projection optical system and projection exposure apparatus |