Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2013
10/09/2013CN103345130A Photoresist reworking etching process
10/09/2013CN103345129A Method for measuring transmittance of full illumination system and components in photoetching machine
10/09/2013CN103345128A Illumination system of microlithographic projection exposure apparatus
10/09/2013CN103345127A Lithography apparatus using extreme UV radiation and having a volatile organic compounds sorbing member comprising a getter material
10/09/2013CN103345126A Three degree-of-freedom nanometer positioning micro-motion wafer stage
10/09/2013CN103345125A System and method for improving photolithography process capacity
10/09/2013CN103345124A Method for confirming photoetching technique window through accurate and quantitative defect detection
10/09/2013CN103345123A System and method for improving photolithography process capacity
10/09/2013CN103345122A System and method for improving photolithography process capacity
10/09/2013CN103345121A Preparation and application of multifunctional film lens based on nano photonic structure
10/09/2013CN103345120A Method for photolithography in semiconductor manufacturing
10/09/2013CN103345119A Ground hole-containing ceramic thin film circuit photoetching method
10/09/2013CN103345118A Photomask, glass substrate and manufacturing method of glass substrate
10/09/2013CN103345117A Mask and liquid crystal display manufacturing method
10/09/2013CN103345057A Miniature bridge-type structure and preparation method thereof
10/09/2013CN103345010A Micro-lens array element manufacturing method based on polydimethylsiloxane template
10/09/2013CN103345008A Flexible curved surface micro lens array and manufacturing method and application thereof
10/09/2013CN103343068A Glue stripping agent
10/09/2013CN103343014A Liquid crystal composition
10/09/2013CN102591159B Optical machining system and method
10/09/2013CN102532544B Light-sensitive polyimide
10/09/2013CN102532443B Phenolic resin and preparation method thereof
10/09/2013CN102455593B Method for forming photoresist pattern and manufacturing method of array substrate
10/09/2013CN102388345B Method for treating waste organic solvents
10/09/2013CN102375336B Manufacturing method of photosensitive resin composition and solidified embossing pattern, and semiconductor device
10/09/2013CN102249182B Method for preparing magnetic/polymer composite material three-dimensional micro/nano device capable of being remotely magnetically driven
10/09/2013CN102239539B Methods of fabricating substrates
10/09/2013CN102147574B Lithographic apparatus and device manufacturing method
10/09/2013CN102096339B Dual stage lithographic device
10/09/2013CN102027416B Inspection apparatus for lithography
10/09/2013CN101968608B Lithographic apparatus and device manufacturing method
10/09/2013CN101900939B Negative resist composition and patterning process using the same
10/09/2013CN101893827B Lithographic apparatus and device manufacturing method
10/09/2013CN101893824B Negative resist composition, patterning process, and testing process and preparation process of negative resist composition
10/09/2013CN101884016B Lithography system, method of clamping and wafer table
10/09/2013CN101819386B Exposure apparatus and device manufacturing method
10/09/2013CN101762980B Composition for simultaneously forming two isolated column spacer patterns
10/09/2013CN101650505B Thin film transistor display panel and method of manufacturing the same
10/08/2013US8553321 Imaging optical system
10/08/2013US8553204 Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
10/08/2013US8553203 Stage drive method and stage unit, exposure apparatus, and device manufacturing method
10/08/2013US8553201 Lithographic apparatus and device manufacturing method
10/08/2013US8552538 Methods of eliminating pattern collapse on photoresist patterns
10/08/2013US8551691 Method of forming mask pattern
10/08/2013US8551690 Methods of forming patterns
10/08/2013US8551689 Methods of manufacturing semiconductor devices using photolithography
10/08/2013US8551688 Photosensitive resin laminate and thermal processing of the same
10/08/2013US8551687 Alkali developable photosensitive resin composition and dry film manufactured by the same
10/08/2013US8551686 Antireflective composition for photoresists
10/08/2013US8551685 Ultraviolet-curing resin material for pattern transfer and magnetic recording medium manufacturing method using the same
10/08/2013US8551684 Polymer for forming resist protection film, composition for forming resist protection film, and method of forming patterns of semiconductor devices using the composition
10/08/2013US8551682 Metal conservation with stripper solutions containing resorcinol
10/08/2013US8551676 Pigment-dispersed composition, curable composition, and color filter and production method thereof
10/08/2013US8550144 Method and apparatus for production of a cast component
10/03/2013WO2013148299A2 Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor
10/03/2013WO2013147423A1 Triarylmethane blue dye compound, blue resin composition comprising same for color filter, and color filter using same
10/03/2013WO2013147422A1 Xanthene-based purple dye compound, colored resin composition comprising same for color filter, and color filter using same
10/03/2013WO2013147411A1 Siloxane-based compound, and photosensitive composition and photosensitive material including same
10/03/2013WO2013147325A1 Pattern forming method, method for selecting heating temperature in pattern forming method, extreme ultraviolet-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device
10/03/2013WO2013147315A1 Method of forming pattern, photomask and nanoimprint mold master
10/03/2013WO2013147311A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive composition used therein, resist film, manufacturing method of electronic device using the same, and electronic device
10/03/2013WO2013147286A1 Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same
10/03/2013WO2013147267A1 Composition for formation of overlay film for immersion lithography
10/03/2013WO2013147266A1 Immersion exposure photoresist composition, polymer and compound
10/03/2013WO2013147122A1 Maskless exposure device
10/03/2013WO2013147099A1 Triarylmethane compound, colored resin composiiton, color filter, liquid crystal display device, and organic el display device
10/03/2013WO2013147052A1 Lighting device provided with discharge lamp
10/03/2013WO2013147028A1 Resin composition, transparent film for touch panel sensors using same, and touch panel
10/03/2013WO2013147019A1 Light source device
10/03/2013WO2013147018A1 Photo-curable thermosetting resin composition, cured product, printed wiring board, and light source module
10/03/2013WO2013146812A1 Active-light-sensitive or radiation-sensitive composition, and resist film, resist coating mask blank, resist pattern formation method, and photomask employing same
10/03/2013WO2013146670A1 Resist underlayer film-forming composition which contains phenylindole-containing novolac resin
10/03/2013WO2013146600A1 Underlayer film forming composition for self-assembled films
10/03/2013WO2013146586A1 Photosensitive resin composition for ctp flexographic printing original plates and printing original plate obtained from same
10/03/2013WO2013146532A1 Radiation-sensitive resin composition for liquid immersion exposure and resist pattern forming method
10/03/2013WO2013146372A1 Black resin film, capacitive input device, processes for producing said film and device, and image display device equipped therewith
10/03/2013WO2013146360A1 Photosensitive resin composition
10/03/2013WO2013146322A1 Colored curable composition, color filter and method for producing color filter, and display device
10/03/2013WO2013146318A1 Mold manufacturing method and manufacturing device
10/03/2013WO2013146239A1 Photosensitive conductive paste and method for manufacturing conductive substrate with wiring
10/03/2013WO2013146184A1 Substrate processing device, processing device, and method for manufacturing device
10/03/2013WO2013146183A1 Photosensitive black resin composition and resin black matrix substrate
10/03/2013WO2013146130A1 Silane coupling agent, light-sensitive resin composition, cured film, and touch panel member
10/03/2013WO2013146107A1 Photosensitive conductive paste and method for producing conductive pattern
10/03/2013WO2013146060A1 Resist adhesion improver and method for producing copper wiring line
10/03/2013WO2013145987A1 Exposure drawing device, recording medium in which program is recorded, and exposure drawing method
10/03/2013WO2013145986A1 Exposure writing device and exposure writing method
10/03/2013WO2013145949A1 Original plate for lithographic printing plate, and method for printing same
10/03/2013WO2013145800A1 Mask conveyance device, mask holding device, mask substrate, substrate processing device, and method for producing device
10/03/2013WO2013145695A1 Resist development method, resist pattern formation method, mold manufacturing method, and developing solution used for same
10/03/2013WO2013145044A1 Photomask, method for forming pattern using same and exposure device
10/03/2013WO2013144695A1 Laser apparatus, laser system, and extreme ultraviolet light generation apparatus
10/03/2013WO2013143814A1 Metrology method and apparatus, lithographic system and device manufacturing method
10/03/2013WO2013143813A1 Methods of providing patterned templates for self-assemblable block copolymers for use in device lithography
10/03/2013WO2013143803A1 Optical system of a microlithographic projection exposure apparatus
10/03/2013WO2013143777A2 Substrate table system, lithographic apparatus and substrate table swapping method
10/03/2013WO2013143729A1 A lithography apparatus, a device manufacturing method, a method of manufacturing an attenuator
10/03/2013WO2013143723A1 Compact self-contained holographic and interferometric apparatus
10/03/2013WO2013143666A1 Measuring device for measuring an illumination property
10/03/2013WO2013143594A1 Apparatus and method for compensating a defect of a channel of a microlithographic projection exposure system
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