| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/06/2002 | EP1177429A2 Reticle for use in photolithography and methods for making same and inspecting |
| 02/06/2002 | EP1177275A1 Compositions for cleaning organic and plasma etched residues for semiconductor devices |
| 02/06/2002 | EP1177182A1 Novel photoinitiators and their applications |
| 02/06/2002 | EP1177105A1 Coated transfer sheet comprising a thermosetting or uv curable material |
| 02/06/2002 | EP0664033B1 Rasterizer for a pattern generation apparatus |
| 02/06/2002 | CN1334931A Novolac polymer planarization films with high temp. stability |
| 02/06/2002 | CN1334833A Coating agents which can be hardened by addition of isocyanate groups as well as by radiation-induced addition of activated c-c double covalent bonds |
| 02/06/2002 | CN1334491A Method for forming pattern of non-photo-imaging ceramic strip |
| 02/06/2002 | CN1334490A Negative image recording material and image forming method |
| 02/06/2002 | CN1334469A Method for making color filter and coloring photosensitive resin composition |
| 02/06/2002 | CN1334299A Citric trialkyl amide surfactant |
| 02/06/2002 | CN1334293A 光敏性热固树脂组合物 Photosensitive thermosetting resin composition |
| 02/06/2002 | CN1334202A Lithographic plate packaging structure and method |
| 02/05/2002 | US6345211 Method of using critical dimension mapping to optimize speed performance of microprocessor produced using an integrated circuit manufacturing process |
| 02/05/2002 | US6345210 Method of using critical dimension mapping to qualify a reticle used in integrated circuit fabrication |
| 02/05/2002 | US6345209 Method of using critical dimension mapping to qualify a new integrated circuit manufacturing process |
| 02/05/2002 | US6344896 Method and apparatus for measuring positional shift/distortion by aberration |
| 02/05/2002 | US6344892 Exposure apparatus and device manufacturing method using same |
| 02/05/2002 | US6344697 Semiconductor device comprising layered positional detection marks and manufacturing method thereof |
| 02/05/2002 | US6344655 Multicolumn charged-particle beam lithography system |
| 02/05/2002 | US6344432 Formulations including a 1,3-dicarbonyl compound chelating agent and copper corrosion inhibiting agents for stripping residues from semiconductor substrates containing copper structures |
| 02/05/2002 | US6344367 Method of fabricating a diffraction grating |
| 02/05/2002 | US6344309 Polysilane composition for forming a coating suitable for bearing a metal pattern, metal pattern forming method, wiring board preparing method |
| 02/05/2002 | US6344307 Photosensitive resin composition |
| 02/05/2002 | US6344305 Radiation sensitive silicon-containing resists |
| 02/05/2002 | US6344304 Radiation sensitive material and method for forming pattern |
| 02/05/2002 | US6344303 Subjecting at least one side of the support to a corona discharge treatment to modify the surface; dust removing treatment; image forming layer contains a resin containing a hydroxy, carboxylic or sulfonic acid group |
| 02/05/2002 | US6344300 Color filter, method of manufacturing color filter and photosensitive coloring composition |
| 02/05/2002 | US6344298 Use of masks to write gratings in used in optical waveguides |
| 02/05/2002 | US6344297 Holographic recording material |
| 02/05/2002 | US6344087 Board coating system |
| 02/05/2002 | CA2182145C Thin-metal lithographic printing members with visible tracking layers |
| 01/31/2002 | WO2002009170A2 Method and apparatus for performing final critical dimension control |
| 01/31/2002 | WO2002009163A1 Flare measuring method and flare measuring device, exposure method and exposure system, method of adjusting exposure system |
| 01/31/2002 | WO2002009135A2 Immersion lens with magnetic shield for charged particle beam system |
| 01/31/2002 | WO2002008836A2 Method and device for thermally treating a photoresist layer on a circuit substrate, especially a semiconductor wafer |
| 01/31/2002 | WO2002008835A2 High-resolution overlay alignment methods and systems for imprint lithography |
| 01/31/2002 | WO2002008834A1 Radiation sensitive compositions containing image quality and profile enhancement additives |
| 01/31/2002 | WO2002008833A1 Photoacid generators, photoresist compositions containing the same and patterning method with the use of the compositions |
| 01/31/2002 | WO2002008832A2 Method for an improved developing process in wafer photolithography |
| 01/31/2002 | WO2002008831A2 Reticle storage and retrieval system |
| 01/31/2002 | WO2002008347A2 Resist ink composition |
| 01/31/2002 | WO2002007982A1 Exposure system for recording media |
| 01/31/2002 | WO2002007918A1 Paste filled with metal powder and metal products obtained with same |
| 01/31/2002 | WO2001078889A3 A method of fabricating coded particles |
| 01/31/2002 | WO2001047003A3 Methods and apparatus for forming submicron patterns on films |
| 01/31/2002 | WO2001045958A3 Thermally imageable element and lithographic printing plate |
| 01/31/2002 | US20020013930 Method and system for producing semiconductor devices |
| 01/31/2002 | US20020013448 Novel monomers, polymers, methods of synthesis thereof and photoresist compositions |
| 01/31/2002 | US20020013380 Photopolymerizable vinyl ether based monomeric formulations and polymerizable compositions which may include certain novel spiroorthocarbonates |
| 01/31/2002 | US20020013240 Composition and method for removing resist and etching residues using hydroxylammonium carboxylates |
| 01/31/2002 | US20020013239 Polymer remover |
| 01/31/2002 | US20020013238 A semiconductor wafer cleaning formulation, including organic amine, water, 1,3-dicarbonyl compound chelating agent, nitrogen containing carboxylic acid or an imine, and 2-98% wt polar organic solvent; used in removing the inorganic residue |
| 01/31/2002 | US20020013208 Halogen-free |
| 01/31/2002 | US20020013069 Reticle chuck in exposure apparatus and semiconductor device manufacturing method using the same |
| 01/31/2002 | US20020013059 Pattern formation material and pattern formation method |
| 01/31/2002 | US20020012884 Method for patterning a radiation sensitive layer |
| 01/31/2002 | US20020012882 Method of manufacturing semiconductor device with improved removal of resist residues |
| 01/31/2002 | US20020012880 Positive sensitive resin composition and a process for forming a resist pattern therewith |
| 01/31/2002 | US20020012879 Novel photoresist monomers, polymers thereof, and photoresist compositions containing the same |
| 01/31/2002 | US20020012878 Photosensitive composition and its use for thermally imageable printing plates |
| 01/31/2002 | US20020012877 Offset printing; dimensional stable support |
| 01/31/2002 | US20020012876 Lithography structure |
| 01/31/2002 | US20020012875 Antireflective coating compositions comprising photoacid generators |
| 01/31/2002 | US20020012874 Photoresist composition |
| 01/31/2002 | US20020012873 Photoresist composition containing photo radical generator with photoacid generator |
| 01/31/2002 | US20020012872 Photopolymerization |
| 01/31/2002 | US20020012871 Polysiloxane |
| 01/31/2002 | US20020012870 Pattern formation material and pattern formation method |
| 01/31/2002 | US20020012869 Lithography; amplification |
| 01/31/2002 | US20020012868 Composition for forming electroconductive film such as electrode or wiring, method for forming electroconductive film such as electrode or wiring, and method for producing electron emitting device, electron source and image forming apparatus |
| 01/31/2002 | US20020012867 Forming pattern; exposure to light |
| 01/31/2002 | US20020012866 Positive photoresist composition |
| 01/31/2002 | US20020012865 Mixture of alkali soluble polymer and photosensitizers |
| 01/31/2002 | US20020012861 Calibrating exposure intensity; positioning |
| 01/31/2002 | US20020012860 Method and apparatus for emission lithography using patterned emitter |
| 01/31/2002 | US20020012859 Using both light beam exposure pattern and electron beam pattern |
| 01/31/2002 | US20020012858 Variations of exposure fields; overlapping; increased accuracy |
| 01/31/2002 | US20020012853 Electron beam writing pattern; transfer pattern high resolution |
| 01/31/2002 | US20020012809 Smokeless |
| 01/31/2002 | US20020012797 Heating mixture of ethylene glycol and isosorbide, terephthalic acid or its alkyl ester under pressure; removal of distillate comprising water or volatile alkanol products; continuing reaction in presence of polycondensation catalyst |
| 01/31/2002 | US20020012456 Method and apparatus for providing a bioinformatics database |
| 01/31/2002 | US20020012376 High repetition rate gas discharge laser with precise pulse timing control |
| 01/31/2002 | US20020012153 Multi-beam exposure apparatus |
| 01/31/2002 | US20020012112 Cleaning method for use in exposure apparatus |
| 01/31/2002 | US20020012110 Exposure device for printing plates and method of controlling same |
| 01/31/2002 | US20020012109 Projection exposure method and apparatus |
| 01/31/2002 | US20020012108 Anti-vibration system for exposure apparatus |
| 01/31/2002 | US20020012107 Projection exposure apparatus |
| 01/31/2002 | US20020012100 Microlithographic reduction projection catadioptric objective |
| 01/31/2002 | US20020012083 Color liquid crystal panel and color liquid crystal display apparatus |
| 01/31/2002 | US20020011965 Slot array antenna with reduced edge diffraction |
| 01/31/2002 | US20020011574 Charged beam exposure apparatus having blanking aperture and basic figure aperture |
| 01/31/2002 | US20020011573 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 01/31/2002 | US20020011462 Anisotropically dry etching organic antireflection layer with etching gas containing hydrogen and nitrogen |
| 01/31/2002 | US20020011257 Holding the substrate in tank; and filling said tank with a gas mixture comprising water, ozone and an additive acting as a scavenger; useful cleaning sequences or cleaning after VIA etching and other etch processes. |
| 01/31/2002 | US20020011208 Substrate processing apparatus |
| 01/31/2002 | US20020011207 Exposure apparatus, coating/developing system, device manufacturing system, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method |
| 01/31/2002 | US20020011185 Alkenyl or alkyl group containing 50-200 carbon atoms attached to pigment through an arylene, heteroarylene, or alkylene group and a spacer group, e.g., a polyisobutenylsuccinimidylphenyl group |
| 01/31/2002 | US20020011171 Planographic printing plate packaging structure and method for packaging planographic printing plate |