| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/14/2002 | US20020017616 Exposure apparatus and method |
| 02/14/2002 | US20020017209 Method and device for clearing a re-imageable printing form |
| 02/14/2002 | DE10133718A1 Novel compounds containing glycidylalkylacrylate and anthracene containing side groups are useful for the production of antireflective coatings in semiconductor device manufacture |
| 02/14/2002 | DE10131123A1 Photoresistzusammensetzung, die einen Photoradikalbildner und einen Photosäurebildner enthält A photoresist composition containing a photoradical generator and a photoacid |
| 02/14/2002 | DE10049296A1 Optical arrangement for producing light beams, e.g. for scanning microscopy, has correction device adaptive optical arrangement for radiation errors caused by deflector |
| 02/14/2002 | DE10037998A1 Verfahren und Vorrichtung zum Löschen einer wiederbebilderbaren Druckform Method and apparatus for canceling a print form wiederbebilderbaren |
| 02/14/2002 | DE10037870A1 6-Spiegel-Mikrolithographie-Projektionsobjektiv 6 levels microlithography projection lens |
| 02/13/2002 | EP1179750A1 Positive photosensitive composition |
| 02/13/2002 | EP1179749A1 Resist composition and method for manufacturing semiconductor device using the resist composition |
| 02/13/2002 | EP1179746A2 Kinematic optical mounting |
| 02/13/2002 | EP1179427A2 Planographic printing original plate |
| 02/13/2002 | EP1179422A1 Method for making a lithographic printing plate by inkjet printing |
| 02/13/2002 | EP1179028A1 Solvent resistant photosensitive compositions |
| 02/13/2002 | EP1023634A4 Improved thermosetting anti-reflective coatings at deep ultraviolet |
| 02/13/2002 | EP0949985B1 Powder blasting method using a non-metal blasting mask |
| 02/13/2002 | EP0894154A4 RECOVERY OF Mo/Si MULTILAYER COATED OPTICAL SUBSTRATES |
| 02/13/2002 | EP0638180B1 Production of 2d-arrays |
| 02/13/2002 | EP0616701B1 Photocurable cyclobutarene compositions |
| 02/13/2002 | CN1335945A Composition for antireflection coating |
| 02/13/2002 | CN1335659A Fine electrospark process of forming electrode |
| 02/12/2002 | US6347163 System for reading two-dimensional images using ambient and/or projected light |
| 02/12/2002 | US6346992 Drive system for a scanning or recording device for a reproduction appliance |
| 02/12/2002 | US6346979 Process and apparatus to adjust exposure dose in lithography systems |
| 02/12/2002 | US6346961 Device for producing a printing form |
| 02/12/2002 | US6346564 Paste comprising mixture of organic binder having acidic functional group, at least one polyvalent metal or polyvalent metallic compound, anion-adsorptive substance which adsorbs anion of binder |
| 02/12/2002 | US6346418 Efficient process using nitric acid solution and microwave heating to digest non-metals, hydrogen peroxide solution and heating to digest photoresist, evaporating, adding solution, analyzing using inductively coupled plasma mass spectrometry |
| 02/12/2002 | US6346413 Polymer arrays |
| 02/12/2002 | US6346363 Positive photoresist composition |
| 02/12/2002 | US6346362 Grafted with organosilicon,-germanium, or -tin compound and having protective group; resistance to reactive ion etching; photoresists |
| 02/12/2002 | US6346361 Method for synthesizing polymeric AZO dyes |
| 02/12/2002 | US6346354 Dividing a region to-be-exposed into smaller regions; shifting coordinates; computing optimum dose; accurate correction |
| 02/12/2002 | US6346183 Utilization of bottom antireflective coating to eliminate deleterious effects of unwanted reflected light during photo exposure step of photolithographic process |
| 02/12/2002 | CA2058391C Aqueous, developable photocurable composition, photosensitive articles having layers made therefrom and methods of improving those articles |
| 02/10/2002 | CA2354784A1 One base photosensitive imaging system |
| 02/07/2002 | WO2002011499A1 Method and apparatus for generating x-ray or euv radiation |
| 02/07/2002 | WO2002011193A2 Process for photoresist descumming and stripping in semiconductor applications by nh3 plasma |
| 02/07/2002 | WO2002011191A2 Near critical and supercritical ozone substrate treatment and apparatus for same |
| 02/07/2002 | WO2002011175A1 Methods to predict and correct resist heating during lithography |
| 02/07/2002 | WO2002011159A1 Pinhole-free dielectric films |
| 02/07/2002 | WO2002010859A1 Radiation-sensitive composition, insulating film and organic el display element |
| 02/07/2002 | WO2002010858A2 Process for manufacturing a microelectronic device |
| 02/07/2002 | WO2002010857A2 Process for making a periodic profile |
| 02/07/2002 | WO2002010721A2 Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography |
| 02/07/2002 | WO2002010480A2 Etching composition and use thereof with feedback control of hf in beol clean |
| 02/07/2002 | WO2002009890A1 Method of forming protective film |
| 02/07/2002 | WO2002009884A2 Methods for the lithographic deposition of materials containing nanoparticles |
| 02/07/2002 | US20020016646 Method of aligning dies of wafer(s) with exposure equipment in the fabricating of semiconductor devices |
| 02/07/2002 | US20020016477 Novel lactone compounds having alicyclic structure and their manufacturing method |
| 02/07/2002 | US20020016431 Monomer having diol structure, polymer thereof, and negative photoresist composition and pattern forming method using the same background of the invention |
| 02/07/2002 | US20020016015 Microelectronic-device fabrication method |
| 02/07/2002 | US20020015918 Method of fabricating liquid crystal display device having shorting bars |
| 02/07/2002 | US20020015917 Multi-oxygen containing compound for preventing acid diffusion, and photoresist composition containing the same |
| 02/07/2002 | US20020015916 Containing acid generator |
| 02/07/2002 | US20020015913 Containing acid generator |
| 02/07/2002 | US20020015912 Photoresist monomers, polymers thereof and photoresist compositions containing the same |
| 02/07/2002 | US20020015911 Image-formation material and infrared absorber |
| 02/07/2002 | US20020015910 Semiconductor substrates |
| 02/07/2002 | US20020015909 Mixture of polymer and dye |
| 02/07/2002 | US20020015908 Multilayer; heat sensitive elements; melting; adhesion |
| 02/07/2002 | US20020015907 Solvent patterning coating layers |
| 02/07/2002 | US20020015906 Micropatterns |
| 02/07/2002 | US20020015904 Pattern forming method using photolithography |
| 02/07/2002 | US20020015901 Mixture of pigment, binder polymer, radiation sensitive compound and acid |
| 02/07/2002 | US20020015899 Optically transferring lithography patterns |
| 02/07/2002 | US20020015838 Photosensitive transfer sheet and method of forming photosensitive transfer sheet |
| 02/07/2002 | US20020015826 Zwitterionic iodonium compounds and methods of application |
| 02/07/2002 | US20020015633 Smif pod including independently supported wafer cassette |
| 02/07/2002 | US20020015595 Image-recording device |
| 02/07/2002 | US20020015506 Remote programming and control means for a hearing aid |
| 02/07/2002 | US20020015158 Focus measurement in projection exposure apparatus |
| 02/07/2002 | US20020015156 Position detecting method and system for use in exposure apparatus |
| 02/07/2002 | US20020015142 Illumination optical system and exposure apparatus having the same |
| 02/07/2002 | US20020015141 Exposure apparatus with a pulsed laser |
| 02/07/2002 | US20020015140 Stage device and exposure apparatus, and method of manufacturing a device |
| 02/07/2002 | US20020015139 A stage control method using a temperature |
| 02/07/2002 | US20020015088 Imaging device, imaging method, and printing device |
| 02/07/2002 | US20020014673 Method of making membrane integrated circuits |
| 02/07/2002 | US20020014600 Scanning exposure method |
| 02/07/2002 | US20020014599 Plasma focus light source with tandem ellipsoidal mirror units |
| 02/07/2002 | US20020014598 Plasma focus light source with active and buffer gas control |
| 02/07/2002 | US20020014577 Circuit for machine-vision system |
| 02/07/2002 | US20020014174 Input nip roller system for external drum imaging system |
| 02/07/2002 | US20020014084 Substrate-processing apparatus |
| 02/07/2002 | DE10133719A1 Organic anti-reflective polymer, for fabricating ultrafine patterns of semiconductor devices, has specific composition |
| 02/07/2002 | DE10133716A1 Organic anti-reflective polymer, for fabricating ultrafine patterns and 4G DRAM semiconductor devices as it eliminates standing waves caused by optical properties of lower layers on the wafer and by thickness changes of the photoresist |
| 02/07/2002 | DE10128813A1 Image forming device e.g. for printer, generates laser radiation having ultra short pulses with duration less than one nanosecond |
| 02/07/2002 | DE10128706A1 Production of print carrier in printing machine involves unrolling ready-made carrier material onto printing cylinder and coating contact surface of this material with layer of influenceable polymer |
| 02/07/2002 | DE10035430A1 Verfahren und Vorrichtung zur thermischen Behandlung einer Fotolackschicht auf einem Schaltungssubstrat, insbesondere Halbleiterwafer Method and apparatus for thermal treatment of a photoresist layer on a circuit substrate, in particular semiconductor wafers |
| 02/06/2002 | EP1178359A2 Stripping composition |
| 02/06/2002 | EP1178358A2 Stripper |
| 02/06/2002 | EP1178357A1 Lithographic apparatus |
| 02/06/2002 | EP1178356A2 6 mirror microlithography projection system |
| 02/06/2002 | EP1178355A2 Control system for photolithographic processes |
| 02/06/2002 | EP1178354A1 Antireflective coating compositions |
| 02/06/2002 | EP1177914A2 Method and apparatus to reclaim a reusable printing plate |
| 02/06/2002 | EP1177713A1 System and method for providing a lithographic light source for a semiconductor manufacturing process |
| 02/06/2002 | EP1177574A1 Anti-reflective coatings and methods regarding same |
| 02/06/2002 | EP1177479A1 Streamlined ic mask layout optical and process correction through correction reuse |
| 02/06/2002 | EP1177478A1 Photosensitive composition |
| 02/06/2002 | EP1177468A1 Methods of photosensitizing glasses with hydrogen or deuterium and waveguides resulting therefrom |