| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/21/2002 | US20020020832 Photosensitive resin composition |
| 02/21/2002 | US20020020822 Electron beam illumination apparatus, electron beam exposure apparatus, and device manufacturing method |
| 02/21/2002 | US20020020821 Method of manufacturing an optically scannable information carrier |
| 02/21/2002 | US20020020820 Electron beam exposure apparatus and device manufacturing method |
| 02/21/2002 | US20020020751 Substrate transfer apparatus, semiconductor manufacturing apparatus, and semiconductor device manufacturing method |
| 02/21/2002 | US20020020318 Printing plates comprising modified pigment products |
| 02/21/2002 | US20020020315 Method and device for balancing rotating bodies |
| 02/21/2002 | US20020020220 Apparatus and method for measuring internal stress of reticle membrane |
| 02/21/2002 | DE10128606A1 Balancing rotating bodies involves fixing weight element along defined path preferably at uniform radial distance from rotation axis, fixing in various balancing positions by shape locking |
| 02/21/2002 | CA2417112A1 Process for producing coatings using surface-active photoinitiators |
| 02/20/2002 | EP1180784A2 Method and apparatus for charged particle beam exposure |
| 02/20/2002 | EP1180769A2 Information recording apparatus, information recording method and information recording medium |
| 02/20/2002 | EP1180728A2 Quality control method for planographic printing plate |
| 02/20/2002 | EP1180726A2 Illumination system for microlithography |
| 02/20/2002 | EP1180725A2 Semiconductor substrate for improving pattern formation in photolithographic process |
| 02/20/2002 | EP1180554A2 Method of depositing organosilicate layers |
| 02/20/2002 | EP1180251A1 Wafer alignment |
| 02/20/2002 | EP0914626A4 Seamless, maskless lithography system using spatial light modulator |
| 02/20/2002 | CN2478143Y Sunlight solarization platemaking appts. |
| 02/20/2002 | CN1337014A Chemical filtering for optimising the light transmittance of a gas |
| 02/20/2002 | CN1337013A Photosensitive composition, and optical waveguide element and process for producing the same |
| 02/20/2002 | CN1336573A Photoetching process |
| 02/20/2002 | CN1336282A Method and apparatus for mfg. printed imaging carrier on preformed carrier material |
| 02/20/2002 | CN1079548C Method for forming photoresist patterns |
| 02/20/2002 | CN1079547C 光敏树脂组合物 The photosensitive resin composition |
| 02/19/2002 | US6349085 High density recording medium with pit width to track pitch ratio in the range of 0.4 to 0.55 for push-pull tracking servo control |
| 02/19/2002 | US6349005 Microlithographic reduction objective, projection exposure equipment and process |
| 02/19/2002 | US6348941 Printing plate exposure apparatus for recording image data spirally |
| 02/19/2002 | US6348418 Etching tungsten silicide with hydrogen peroxide; exposing metal silicide film to hexamethyldisilazane diluted with xylene to make hydrophobic; coating with amplification photoresist; photolithograpy |
| 02/19/2002 | US6348405 Interconnection forming method utilizing an inorganic antireflection layer |
| 02/19/2002 | US6348404 Wiring forming method |
| 02/19/2002 | US6348357 Exposure apparatus with a pulsed laser |
| 02/19/2002 | US6348303 Lithographic projection apparatus |
| 02/19/2002 | US6348301 Baking to expand laterally; reducing width; etching film using photoresist as mask; semiconductors |
| 02/19/2002 | US6348300 Irradiating periphery with light having specified wavelength until free of stickiness without impairing photosensitivity |
| 02/19/2002 | US6348299 Forming photoresist pattern by providing on substrate layer containing polymer having pendant beta-hydroxy groups and tetralkoxy titanate, zirconate or hafnate, imagewise exposing to irradiation, developing |
| 02/19/2002 | US6348298 Radiation sensitive composition |
| 02/19/2002 | US6348297 Chemical amplification type positive resist |
| 02/19/2002 | US6348296 Copolymer resin, preparation thereof, and photoresist using the same |
| 02/19/2002 | US6348295 Methods for manufacturing electronic and electromechanical elements and devices by thin-film deposition and imaging |
| 02/19/2002 | US6348294 Optical disk master |
| 02/19/2002 | US6348289 System and method for controlling polysilicon feature critical dimension during processing |
| 02/19/2002 | US6348288 Resolution enhancement method for deep quarter micron technology |
| 02/19/2002 | US6348239 Depositing amorphous film of metal precursor complex on substrate, irradiating film to cause metal complex to undergo reaction which transforms metal complex into metal containing material adherent to substrate |
| 02/19/2002 | US6348098 Flow controller |
| 02/19/2002 | US6347891 Engraving system and method comprising different engraving devices |
| 02/19/2002 | CA2023410C Device for generating x-radiation with a plasma source |
| 02/14/2002 | WO2002013226A2 Spatial light modulator driven photocathode source electron beam pattern generator |
| 02/14/2002 | WO2002013194A1 Method of manufacturing an optically scannable information carrier |
| 02/14/2002 | WO2002012962A1 Aqueous surfactant solution for developing coating film layer |
| 02/14/2002 | WO2002012961A1 System and method for making smooth diagonal components with a digital photolithography system |
| 02/14/2002 | WO2002012960A2 Method of laminating a photoresist sheet to a substrate |
| 02/14/2002 | WO2002012959A1 Photolithographic mask |
| 02/14/2002 | WO2002012948A2 Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems |
| 02/14/2002 | WO2002012928A2 Diffraction spectral filter for use in extreme-uv lithography condenser |
| 02/14/2002 | WO2002012927A2 Method and device for producing an optically antireflective surface |
| 02/14/2002 | WO2002012871A1 X-ray measuring and testing system |
| 02/14/2002 | WO2002012826A1 Dual-domain lateral shearing interferometer |
| 02/14/2002 | WO2002012372A1 Hydroxypolyamides and photosensitive resin compositions containing the same |
| 02/14/2002 | WO2002012350A2 Photoinitiated reactions |
| 02/14/2002 | WO2001065600A3 Nanoscale patterning for the formation of extensive wires |
| 02/14/2002 | WO2001062511A3 Dual-layer self-contained recording paper incorporating hollow microspheres |
| 02/14/2002 | WO2001042996A3 Design of photomasks for semiconductor device fabrication |
| 02/14/2002 | WO2000065301A9 Helium-neon laser light source generating two harmonically related, single-frequency wavelengths for use in displacement and dispersion measuring interferometry |
| 02/14/2002 | WO2000046643A9 Masks for use in optical lithography below 180 nm |
| 02/14/2002 | US20020019968 Method and apparatus for verifying mask pattern data according to given rules |
| 02/14/2002 | US20020019729 Visual inspection and verification system |
| 02/14/2002 | US20020019560 Novel photoresist cross-linker and photoresist composition comprising the same |
| 02/14/2002 | US20020019558 Diamine and acid anhydride |
| 02/14/2002 | US20020019545 Microstructure patterns for photoresists |
| 02/14/2002 | US20020019500 Epoxy acrylates |
| 02/14/2002 | US20020019136 Method of manufacturing optical element |
| 02/14/2002 | US20020018965 Methods for reducing profile variation in photoresist trimming |
| 02/14/2002 | US20020018964 Method of fabricating a suspended micro-structure with a sloped support and a suspended microstructure fabricated by the method |
| 02/14/2002 | US20020018962 Photosensitive lithographic printing plate and method for making a printing plate |
| 02/14/2002 | US20020018960 High etching resistance, heat resistance and adhesiveness; low ultraviolet light absorbance; can be developed in aqueous tetramethylammonium hydroxide solution; for fabricating circuits for high integration semiconductors |
| 02/14/2002 | US20020018959 Solid imaging compositions for preparing polypropylene-like articles |
| 02/14/2002 | US20020018946 Wherein lowering of brightness is suppressed in a plasma display panel |
| 02/14/2002 | US20020018943 Color filters, liquid crystals display |
| 02/14/2002 | US20020018942 Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks |
| 02/14/2002 | US20020018941 Lithography; thin film covering pattern of absorptive material |
| 02/14/2002 | US20020018861 Methods for the lithographic deposition of materials containing nanoparticles |
| 02/14/2002 | US20020018857 Process and apparatus for coating on printing cylinders |
| 02/14/2002 | US20020018599 Mask data correction apparatus, fourier transformation apparatus, up sampling apparatus, down sampling apparatus, method of manufacturing transfer mask, and method of manufacturing device having pattern structure |
| 02/14/2002 | US20020018505 Wavelength and bandwidth monitor for excimer or molecular fluorine laser |
| 02/14/2002 | US20020018309 Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
| 02/14/2002 | US20020018217 Optical critical dimension metrology system integrated into semiconductor wafer process tool |
| 02/14/2002 | US20020018197 Illumination system and scanning exposure apparatus using the same |
| 02/14/2002 | US20020018195 Moving mechanism in exposure apparatus, and exposure apparatus having the same |
| 02/14/2002 | US20020018194 Lithographic projection apparatus and device manufacturing method |
| 02/14/2002 | US20020018193 Exposure apparatus and device producing method using the same |
| 02/14/2002 | US20020018192 Stage apparatus, scanning type exposure apparatus, and device produced with the same |
| 02/14/2002 | US20020018191 Exposure apparatus and method of controlling the same |
| 02/14/2002 | US20020018190 Exposure apparatus and device manufacturing method |
| 02/14/2002 | US20020018189 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 02/14/2002 | US20020018188 Image-recording apparatus |
| 02/14/2002 | US20020018111 Method for controlling exposure and scan-exposure apparatus |
| 02/14/2002 | US20020017890 Electromagnetic alignment and scanning apparatus |
| 02/14/2002 | US20020017889 Exposure apparatus and method utilizing isolated reaction frame |
| 02/14/2002 | US20020017669 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same |