Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
02/2002
02/27/2002EP1182700A2 Process for the selective manufacturing of a T-shaped gate
02/27/2002EP1182512A1 Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate
02/27/2002EP1182511A1 Lithographic apparatus
02/27/2002EP1182510A1 Lithographic projection apparatus and mask handling device
02/27/2002EP1182509A2 Lithographic apparatus
02/27/2002EP1182508A2 Method of exposing a layout comprising several levels on a wafer
02/27/2002EP1182507A2 Projection exposure system
02/27/2002EP1182506A1 Crosslinked positive-working photoresist composition
02/27/2002EP1182505A2 Device and process for exposing a radiation-sensitive coating using charged particles and mask therefor
02/27/2002EP1182468A2 Method for forming grating pattern on glass substrate
02/27/2002EP1182201A1 4-Methylene-1,3-dioxolanes as cross-linking agents
02/27/2002EP1182032A2 Planographic printing plate and method of producing the same
02/27/2002EP1181848A1 Ultraviolet curable silver composition and related method
02/27/2002EP1181714A1 Method to produce high density memory cells and small spaces by using nitride spacer
02/27/2002EP1152037A9 Squarylium compounds and optical recording media made by using the same
02/27/2002EP0954383B1 Method for minimizing waste when coating a fluid with a slide coater
02/27/2002EP0791188B1 Dimensionally stable flexographic printing plates
02/27/2002EP0729945B1 Photopolymerizable composition containing squarylium compound
02/27/2002EP0678200B1 On-demand production of lat imaging films
02/27/2002CN1337905A Thermal transfer element for forming multi-layer devices
02/27/2002CN1337727A Ferroelectric emitter
02/27/2002CN1337601A Scanner with array light source for IC photo etching system
02/27/2002CN1337600A Phase shifting mask etching process of producing T-shaped grid through one photo-etching step
02/27/2002CN1079958C Stable ionomeric photoresist emulsion and process of preparation and use thereof
02/26/2002US6351684 Mask identification database server
02/26/2002US6351515 High contrast ratio membrane mask
02/26/2002US6351512 X-ray exposure apparatus
02/26/2002US6351305 Exposure apparatus and exposure method for transferring pattern onto a substrate
02/26/2002US6351304 Multiple exposure method
02/26/2002US6351041 Stage apparatus and inspection apparatus having stage apparatus
02/26/2002US6350992 Charged particle beam exposure method and charged particle beam exposure device
02/26/2002US6350977 Pattern distortion detecting method and apparatus and recording medium for pattern distortion detection
02/26/2002US6350818 Polyhydroxystyrene polymers, or polyhydroxystyrene-acrylate copolymers, or novalak polymers modified by reaction with a diazonaphthoquinone halide in a solvent in the presence of an amine; semiconductor lithography
02/26/2002US6350620 Method for producing micro-carrier and test method by using said micro-carrier
02/26/2002US6350560 Rinse composition
02/26/2002US6350559 Method for creating thinner resist coating that also has fewer pinholes
02/26/2002US6350558 Curing layered composite of dry photoresist film and artwork stencil with ultraviolet radiation; washing non-uv exposed portions with developer to create relief images; painting; overexposure to uv light to form texture
02/26/2002US6350555 Direct write imaging medium
02/26/2002US6350548 Semiconductors with marks on layers, nesting, measurement targets and layers
02/26/2002US6350403 Viscosity stabilization of radiation-curable filled compositions
02/26/2002US6350391 Laser stripping improvement by modified gas composition
02/26/2002US6350360 Method of fabricating a 3-dimensional tool master
02/26/2002US6350344 Solventless primers which are hardenable by radiation
02/26/2002CA2266607C Photoimageable composition having improved photoinitiator system
02/26/2002CA2252240C Photoimageable compositions
02/26/2002CA2171472C Presensitized lithographic printing plate and method for preparing lithographic printing plate
02/21/2002WO2002015252A2 A method for producing a metal film, a thin film device having such metal film and a liquid crystal display device having such thin film device
02/21/2002WO2002015251A1 Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process
02/21/2002WO2002015249A2 Integrated shallow trench isolation process
02/21/2002WO2002015242A1 Method of producing semiconductor integrated circuit device and method of producing multi-chip module
02/21/2002WO2002015238A2 Device and method for optical inspection of semiconductor wafer
02/21/2002WO2002015223A1 An electron beam lithography system using a photocathode with a pattern of apertures for creating a transmission resonance
02/21/2002WO2002014954A2 Antireflective coating compositions
02/21/2002WO2002014953A1 Resin composition sensitive to actinic energy ray and method of forming polymer pattern from the resin composition
02/21/2002WO2002014952A2 Scan butting error reduction in a raster scan pattern generation system
02/21/2002WO2002014924A1 Relay image optical system, and illuminating optical device and exposure system provided with the optical system
02/21/2002WO2002014439A2 Process for producing coatings using surface-active photoinitiators
02/21/2002WO2002014386A1 Photopolymerizable resin composition for optical recording media and optical recording media
02/21/2002WO2002014382A1 Photosensitive resin compositions for color filter applications
02/21/2002WO2002014078A2 Deformable stamp for patterning three-dimensional surfaces
02/21/2002WO2002014071A1 Thermal digital lithographic printing plate
02/21/2002WO2001075523A3 Method and apparatus for multi-pass, interleaved imaging with offline rasterization
02/21/2002WO2001061409A3 Apparatus and method of cleaning reticles for use in a lithography tool
02/21/2002WO2001051679A3 Anti-reflective coating process and apparatus
02/21/2002WO2001020646A3 Fill strategies in the optical kerf
02/21/2002US20020022894 Enhanced fieldbus device alerts in a process control system
02/21/2002US20020022377 Film forming method and film forming apparatus
02/21/2002US20020022364 Method for producing a metal film, a thin film device having such metal film and a liquid crystal display device having such thin film device
02/21/2002US20020022353 Semiconductor device and manufacturing method thereof
02/21/2002US20020022276 Individually addressable micro-electromagnetic unit array chips
02/21/2002US20020022197 Using polymer
02/21/2002US20020022196 Planarizing antireflective coating compositions
02/21/2002US20020022195 Substrate processing method and substrate processing apparatus
02/21/2002US20020022194 Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
02/21/2002US20020022193 Resist composition and method for manufacturing semiconductor device using the resist composition
02/21/2002US20020022192 Optical disk master
02/21/2002US20020022191 Material and method for making an electroconductive pattern
02/21/2002US20020022186 Photosensitive solution for forming picture cell
02/21/2002US20020022124 Designer particles of micron and submicron dimension
02/21/2002US20020021735 Device for on-line control of output power of vacuum-uv laser
02/21/2002US20020021730 Laser with versatile output energy
02/21/2002US20020021728 Four KHz gas discharge laser
02/21/2002US20020021507 Method of connecting a multiplicity of optical elements to a basic body
02/21/2002US20020021503 Device for mounting an optical element, for example a lens element in a lens
02/21/2002US20020021460 System and method for characterizing optical systems using holographic reticles
02/21/2002US20020021449 Data age adjustments
02/21/2002US20020021435 Substrate conveying system in exposure apparatus
02/21/2002US20020021434 Evaluation mask, focus measuring method and aberration measuring method
02/21/2002US20020021433 scanning exposure apparatus
02/21/2002US20020021432 Method and instrument for measuring vacuum ultraviolet light beam, method of producing device and optical exposure apparatus
02/21/2002US20020021431 Projection exposure apparatus
02/21/2002US20020021430 Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby
02/21/2002US20020021428 Charged-particle-beam microlithography stage including actuators for moving a reticle or substrate relative to the stage, and associated methods
02/21/2002US20020021427 Cantilever reticle stage for electron beam projection lithography system
02/21/2002US20020021426 Lens system for maskless photolithography
02/21/2002US20020021425 Lithographic apparatus, device manufacturing method, and device manufactured thereby
02/21/2002US20020021424 Projection exposure apparatus
02/21/2002US20020021423 Stage apparatus, and exposure apparatus and device manufacturing method using the same
02/21/2002US20020021422 Method of manufacturing exposure apparatus and method for exposing a pattern on a mask onto a substrate
02/21/2002US20020021091 Short arc tube having an intermediate layer between the side tube and the retaining body