| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/07/2002 | US20020027125 Screen printing stencil production |
| 03/07/2002 | US20020026894 Coating film forming method and coating apparatus |
| 03/07/2002 | US20020026878 Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a method |
| 03/07/2002 | DE10139755A1 Forming marking for measuring alignment of more than two layers of semiconductor wafer by matching discontinuity in respective patterns |
| 03/07/2002 | DE10135351A1 Resist layer exposure for semiconductors, involves exposing resist layer comprising polymeric material satisfying preset relation between oxygen content ratio and density, with specific rays |
| 03/07/2002 | DE10132435A1 Mask formation method for micro-lenses such as anamorphic lens, involves exposing photosensitive material using ultraviolet/electron beam to write pattern onto photosensitive material |
| 03/07/2002 | DE10041658A1 System for interferometric testing of test piece with aspherical surface has refractive optical elements for forming spherical wave whose remaining error is measured by calibrated mirror |
| 03/07/2002 | DE10041040A1 Vorrichtung und Verfahren zur Belichtung einer strahlungsempfindlichen Schicht mittels geladener Teilchen sowie Maske hierfür Apparatus and method for exposing a radiation-sensitive layer by means of charged particles as well as mask for this |
| 03/07/2002 | DE10037243A1 Regelsystem für photolithographische Prozesse Control system for photolithographic processes |
| 03/07/2002 | CA2424366A1 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization |
| 03/07/2002 | CA2387716A1 Radiation sensitive refractive index changing composition and refractive index changing method |
| 03/06/2002 | EP1184896A1 Pattern matching method and device, position determining method and device, position aligning method and device, exposing method and device, and device and its production method |
| 03/06/2002 | EP1184895A2 Substrate processing apparatus and substrate inspection method |
| 03/06/2002 | EP1184891A1 Electron beam lithography |
| 03/06/2002 | EP1184727A1 Lithographic apparatus |
| 03/06/2002 | EP1184726A1 Transmission system for synchrotron radiation light |
| 03/06/2002 | EP1184725A1 Method for adjusting a lithographic tool |
| 03/06/2002 | EP1184724A1 Electronic device for a lithography mask container and method using the same |
| 03/06/2002 | EP1184723A2 Negative resist composition, process for forming resist patterns, and process for manufacturing electronic device |
| 03/06/2002 | EP1184590A2 Procedure and apparatus for balancing a rotating body |
| 03/06/2002 | EP1184565A2 Perforated disk especially for injection valves and process for producing it |
| 03/06/2002 | EP1183737A1 Microlens for surface mount products |
| 03/06/2002 | EP1183571A1 Fluorinated polymers, photoresists and processes for microlithography |
| 03/06/2002 | EP1011984B1 Thermal waterless lithographic printing plate |
| 03/06/2002 | EP0876195B1 Method of filtering the organic solutions arising in the production of circuit boards |
| 03/06/2002 | EP0871573B1 Transfer printing medium |
| 03/06/2002 | CN1338643A Optical filter and manufacture thereof |
| 03/06/2002 | CN1080456C High speed ashing method |
| 03/05/2002 | US6353470 Microlithography reduction objective and projection exposure apparatus |
| 03/05/2002 | US6353271 Extreme-UV scanning wafer and reticle stages |
| 03/05/2002 | US6353232 Holder assembly system and method in an emitted energy system for photolithography |
| 03/05/2002 | US6353219 Object inspection and/or modification system and method |
| 03/05/2002 | US6352937 Generating radicals in gas mainly composed of fluorine-based gas, stripping organic film formed on layered unit having organic low dielectric constant insulating film with radicals |
| 03/05/2002 | US6352936 Method for stripping ion implanted photoresist layer |
| 03/05/2002 | US6352818 Photoresist development method employing multiple photoresist developer rinse |
| 03/05/2002 | US6352817 Methodology for mitigating formation of t-tops in photoresist |
| 03/05/2002 | US6352815 Production of large-format composite relief printing plates by laser positioning and subsequent image recording by means of a laser |
| 03/05/2002 | US6352813 Acrylic polymer |
| 03/05/2002 | US6352812 Thermal digital lithographic printing plate |
| 03/05/2002 | US6352811 Positive-working thermal imaging element comprising substrate, thermally sensitive composite structure having first layer of polymer which is soluble or dispersible in aqueous solution and solubility inhibitor, second layer of insoluble polymer |
| 03/05/2002 | US6352802 Mask for electron beam exposure and method of manufacturing semiconductor device using the same |
| 03/05/2002 | US6352800 Reticle for use in exposing semiconductor, method of producing the reticle, and semiconductor device |
| 03/05/2002 | US6352589 Apparatus for spin-coating semiconductor substrate and method of doing the same |
| 03/05/2002 | US6351871 Aqueous quaternary ammonium hydroxide as a screening mask cleaner |
| 03/05/2002 | CA2238778C Hardenable photoimageable compositions |
| 03/05/2002 | CA2233543C Adjustable slit and method for varying line width |
| 02/28/2002 | WO2002017383A2 Flexure based translation stage |
| 02/28/2002 | WO2002017382A1 Alignment device |
| 02/28/2002 | WO2002017347A1 Electron-beam curing and patterning of sol-gel |
| 02/28/2002 | WO2002017020A1 Method for producing organically developable, photopolymerizable flexographic printing elements on flexible metallic supports |
| 02/28/2002 | WO2002017019A2 Oxime sulfonate and n-oxyimidosulfonate photoacid generators and photoresists comprising same |
| 02/28/2002 | WO2002016993A1 Optical element holding device |
| 02/28/2002 | WO2002016992A1 Optical element holding device |
| 02/28/2002 | WO2002016477A2 Organosilicate resins as hardmasks for organic polymer dielectrics in fabrication of microelectronic devices |
| 02/28/2002 | WO2002016466A1 Polyester film as support for dry film resist |
| 02/28/2002 | WO2002016106A2 Differentially cured materials and process for forming same |
| 02/28/2002 | WO2001099246A3 Laser wavelength control unit with piezoelectric driver |
| 02/28/2002 | WO2001075939A3 Method and apparatus for increased workpiece throughput |
| 02/28/2002 | WO2000002090A3 Periodic porous and relief nanostructured articles |
| 02/28/2002 | US20020026627 Streamlined IC mask layout optical and process correction through correction reuse |
| 02/28/2002 | US20020026626 Optical proximity correction |
| 02/28/2002 | US20020026624 Correction of layout pattern data during semiconductor patterning process |
| 02/28/2002 | US20020026260 Exposure apparatus |
| 02/28/2002 | US20020026049 Organometallic monoacylalkylphosphines |
| 02/28/2002 | US20020026022 Resist compositions containing polymers having dialkyl malonate groups for use in chemically amplified resists |
| 02/28/2002 | US20020025992 Using light shielding vessel |
| 02/28/2002 | US20020025588 Position detection mark and position detection method |
| 02/28/2002 | US20020025495 Positive resist composition and base material carrying layer of the positive resist composition |
| 02/28/2002 | US20020025494 Photosensitive polyimide precursor compositions |
| 02/28/2002 | US20020025492 Composite relief image printing elements |
| 02/28/2002 | US20020025482 Exposure method |
| 02/28/2002 | US20020025481 Forming pattern using alkaline developers; photopolymerization |
| 02/28/2002 | US20020025480 Calibration pattern |
| 02/28/2002 | US20020025479 Resolution |
| 02/28/2002 | US20020025019 Exposure method |
| 02/28/2002 | US20020024741 Projection optical system and projection exposure apparatus |
| 02/28/2002 | US20020024738 Broad band controlled angle analog diffuser and associated methods |
| 02/28/2002 | US20020024714 Pattern generator |
| 02/28/2002 | US20020024671 Aligning method, aligner, and device manufacturing method |
| 02/28/2002 | US20020024650 Projection exposure apparatus, and device manufacturing method using the same |
| 02/28/2002 | US20020024649 Exposure apparatus and method, device manufacturing method, and discharge lamp |
| 02/28/2002 | US20020024648 Exposure apparatus and exposure method |
| 02/28/2002 | US20020024647 Exposure apparatus, lithography system and conveying method, and device manufacturing method and device |
| 02/28/2002 | US20020024646 Exposure apparatus and device manufacturing method using the same |
| 02/28/2002 | US20020024645 Load-lock chamber and exposure apparatus using the same |
| 02/28/2002 | US20020024644 Alignment system and alignment method in exposure apparatus |
| 02/28/2002 | US20020024643 Projection exposure apparatus having aberration measurement device |
| 02/28/2002 | US20020024642 Two-sided substrate imaging using single-approach projection optics |
| 02/28/2002 | US20020024086 Localized masking for semiconductor structure development |
| 02/28/2002 | US20020024020 Electron-beam drawing appraratus electron-beam drawing method |
| 02/28/2002 | US20020024019 Mask defect checking method and device for electron beam exposure |
| 02/28/2002 | US20020024008 Method of detecting arrangement of beam spots |
| 02/28/2002 | US20020024005 Interference system and semiconductor exposure apparatus having the same |
| 02/28/2002 | US20020023565 Lithographic printing plate precursor |
| 02/28/2002 | DE10040929A1 Verfahren zur Herstellung organisch entwickelbarer, fotopolymerisierbarer Flexodruckelemente auf flexiblen metallischen Trägern Process for the preparation of organically developable, photopolymerizable flexographic printing on flexible metallic supports |
| 02/28/2002 | DE10040898A1 Beleuchtungssystem für die Mikrolithographie An illumination system for microlithography |
| 02/28/2002 | DE10038928A1 Photolithographische Maske Photolithographic mask |
| 02/28/2002 | DE10038749A1 Verfahren und Vorrichtung zur Herstellung einer optisch antireflektierenden Oberfläche Method and apparatus for producing an optically antireflective surface |
| 02/28/2002 | DE10037957C1 Verfahren zum anisotropen Trockenätzen organischer Antireflexionsschichten A method for anisotropic dry etching organic anti-reflective layers |
| 02/27/2002 | EP1182912A1 Liquid sprays as the target for a laser-plasma extreme ultraviolet light source |