| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/13/2002 | EP1187186A1 Exposure method and device |
| 03/13/2002 | EP1187169A2 Corpuscular optical components and assembly using same |
| 03/13/2002 | EP1186959A2 Method for calibrating a lithographic projection apparatus |
| 03/13/2002 | EP1186958A2 Lithographic projection apparatus |
| 03/13/2002 | EP1186957A2 Lithographic projection apparatus |
| 03/13/2002 | EP1186956A2 Projection exposure apparatus |
| 03/13/2002 | EP1186955A2 Masks and mask precursors, electronic part precursors and electronic parts |
| 03/13/2002 | EP1186624A1 Organosiloxane polymers and photo-curable resin compositions |
| 03/13/2002 | EP1186407A1 Negative image-recording material |
| 03/13/2002 | EP1186013A1 Differential trench open process |
| 03/13/2002 | EP1185904A1 Photosensitive material employing microcapsules |
| 03/13/2002 | EP1185475A1 Cassette buffering within a minienvironment |
| 03/13/2002 | EP1185364A1 Device and method for photolithographically irradiating biological substances |
| 03/13/2002 | EP1171802A4 Novel photosensitive resin compositions |
| 03/13/2002 | EP1027703B1 A method for manufacturing an optical memory device and fluorescent composition |
| 03/13/2002 | EP0958718B1 Process and apparatus for the coating of boards |
| 03/13/2002 | EP0950212B1 Method for controlling an exposure device |
| 03/13/2002 | EP0941502B1 Optical structures for diffusing light |
| 03/13/2002 | CN1339995A Laser processing power output stabilization |
| 03/13/2002 | CN1339988A Method and device for treating substrates |
| 03/13/2002 | CN1339722A Process for producing etched grid |
| 03/13/2002 | CN1339715A Light polarization membrane for light imaging |
| 03/13/2002 | CN1080929C Method for forming fine patterns of semiconductor device |
| 03/13/2002 | CN1080896C Masks for lithographic patterning using off-axis illumination |
| 03/13/2002 | CN1080895C A reticle and a method for measuring blind setting accuracy using the same |
| 03/12/2002 | US6356682 Device for making grid structures in optical fibers |
| 03/12/2002 | US6356616 Apparatus and methods for detecting position of an object along an axis |
| 03/12/2002 | US6356576 Deep ultraviolet catadioptric anamorphic telescope |
| 03/12/2002 | US6356345 In-situ source metrology instrument and method of use |
| 03/12/2002 | US6356341 Exposure device, beam shape setting device and illuminating area setting device |
| 03/12/2002 | US6356340 Piezo programmable reticle for EUV lithography |
| 03/12/2002 | US6356338 Semiconductor production system with an in-line subsystem |
| 03/12/2002 | US6356337 Two-sided substrate imaging using single-approach projection optics |
| 03/12/2002 | US6356300 Automatic visual inspection apparatus automatic visual inspection method and recording medium having recorded an automatic visual inspection program |
| 03/12/2002 | US6356018 Short ARC tube having an intermediate layer between the side tube and the retaining body |
| 03/12/2002 | US6355994 Precision stage |
| 03/12/2002 | US6355993 Linear motor having polygonal shaped coil units |
| 03/12/2002 | US6355703 Liquid curable resin composition, coating, and cured coating therefrom |
| 03/12/2002 | US6355491 Individually addressable micro-electromagnetic unit array chips |
| 03/12/2002 | US6355432 Collection of plurality of beads which have binding polymers of different target specific sequence attached thereto; said beads being coded with encoding system whereby target specific sequence of polymer attached to beads can be identified |
| 03/12/2002 | US6355400 Etching organic antireflection film containing photoabsorptive compound with concentration gradient using resist film which has pattern formed using exposure light as etching mask, removing resist film from semiconductor |
| 03/12/2002 | US6355398 Method of actinically imaging |
| 03/12/2002 | US6355397 Method and apparatus for improving resist pattern developing |
| 03/12/2002 | US6355396 Photosensitive composition and planographic printing plate precursor using same |
| 03/12/2002 | US6355395 Tack-free and exhibits outstanding ink acceptace; flexography |
| 03/12/2002 | US6355388 Method for controlling photoresist strip processes |
| 03/12/2002 | US6355383 Electron-beam exposure system, a mask for electron-beam exposure and a method for electron-beam exposure |
| 03/12/2002 | US6355310 Employing the applicator means for applying a substantially water-free, water-washable, energy-curable, polymer-forming formulation; washing applicator means with water |
| 03/12/2002 | US6355270 Particles for oral delivery of peptides and proteins |
| 03/12/2002 | US6355105 Protecting photoresist coating system by photochopper sensor |
| 03/12/2002 | US6354200 Mask for screen printing, the method for producing same and circuit board produced by screen printing with such mask |
| 03/12/2002 | CA2041023C Photocurable elements and flexographic printing plates prepared therefrom |
| 03/07/2002 | WO2002019781A1 Electromagnetic radiation generation using a laser produced plasma |
| 03/07/2002 | WO2002019415A1 Overlay marks, methods of overlay mark design and methods of overlay measurements |
| 03/07/2002 | WO2002019406A1 Cleaning solution for removing residue |
| 03/07/2002 | WO2002019401A1 Exposure method and device |
| 03/07/2002 | WO2002019040A2 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization |
| 03/07/2002 | WO2002019037A1 Photosensitive polysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof |
| 03/07/2002 | WO2002019036A1 Fabrication of nanoelectronic circuits |
| 03/07/2002 | WO2002019035A1 Photosensitive resin composition for flexographic printing plates |
| 03/07/2002 | WO2002019034A1 Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern |
| 03/07/2002 | WO2002019033A2 Photoacid generators and photoresists comprising same |
| 03/07/2002 | WO2002019032A2 Pretreated sheet product for lithographic plates |
| 03/07/2002 | WO2002018982A1 Method of forming optical thin film and optical element provided with optical thin film |
| 03/07/2002 | WO2002018332A1 Sulfonium salt compound |
| 03/07/2002 | WO2001063362A3 Resist materials for 157-nm lithography |
| 03/07/2002 | WO2001059891A3 Energy stabilized gas discharge laser |
| 03/07/2002 | WO2001052311A3 Method of preparing a semiconductor substrate for subsequent silicide formation |
| 03/07/2002 | US20020029094 Three-dimensional molding apparatus |
| 03/07/2002 | US20020029086 Remote maintenance system |
| 03/07/2002 | US20020028523 Process for making photomask pattern data and photomask |
| 03/07/2002 | US20020028410 Process for patterning non-photoimagable ceramic tape |
| 03/07/2002 | US20020028409 Positive resist laminate |
| 03/07/2002 | US20020028408 Etch resistant antireflective coating compositions |
| 03/07/2002 | US20020028407 Fine pattern |
| 03/07/2002 | US20020028406 Partially crosslinked polymer for bilayer photoresist |
| 03/07/2002 | US20020028405 Photoresist is mixture of polymers |
| 03/07/2002 | US20020028404 Image-forming material and planographic printing original plate using same |
| 03/07/2002 | US20020028403 Process for the production of back-coating recording material for the production of offset printing plates |
| 03/07/2002 | US20020028398 Charged particle beam exposure method and charged particle beam exposure apparatus |
| 03/07/2002 | US20020028393 Optical proximity correction method utilizing serifs having variable dimensions |
| 03/07/2002 | US20020028391 Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo mask |
| 03/07/2002 | US20020028390 Techniques for fabricating and packaging multi-wavelength semiconductor laser array devices (chips) and their applications in system architectures |
| 03/07/2002 | US20020027996 Disposable modular hearing aid |
| 03/07/2002 | US20020027974 X-ray exposure method including M-shell and/or L-shell absorption edges at predetermined wavelengths |
| 03/07/2002 | US20020027945 Temperature measuring method in pattern drawing apparatus |
| 03/07/2002 | US20020027936 Device for on-line control of output power of vacuum-UV laser |
| 03/07/2002 | US20020027762 Electrostatic chuck |
| 03/07/2002 | US20020027719 Optical reduction system with control of illumination polarization |
| 03/07/2002 | US20020027718 Optical reduction system with elimination of reticle diffraction induced bias |
| 03/07/2002 | US20020027662 Method and apparatus for optical system coherence testing |
| 03/07/2002 | US20020027648 Method of operating a lithographic apparatus, lithographic apparatus, method of manufacturing a device, and device manufactured thereby |
| 03/07/2002 | US20020027647 Photolithographic system for exposing a wafer using a programmable mask |
| 03/07/2002 | US20020027646 Exposure system |
| 03/07/2002 | US20020027645 Temperature control method and exposure apparatus thereby |
| 03/07/2002 | US20020027644 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 03/07/2002 | US20020027301 Method for manufacture of optical element |
| 03/07/2002 | US20020027300 Precision fabrication of diverse polymer microstructures by use of the hydrophobic effect, including microlens arrays, microlenses self-aligned to optical fibers, conductive bump bonds self-aligned to bump pads, and bonds between mutually perpendicular substrates |
| 03/07/2002 | US20020027204 Electron beam exposure apparatus, device for shaping a beam of charged particles and method for manufacturing the device |
| 03/07/2002 | US20020027198 Method and apparatus for charged particle beam exposure |