| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/20/2002 | EP1044251A4 Ammonium borate containing compositions for stripping residues from semiconductor substrates |
| 03/20/2002 | EP0633502B1 Pattern forming material |
| 03/20/2002 | CN1341279A 半导体器件 Semiconductor devices |
| 03/20/2002 | CN1341274A Methods utilizing scanning probe microscope tips and products therefor or produced method thereby |
| 03/20/2002 | CN1341234A Photosensitive pastes and substrates for plasma display panel using the same |
| 03/20/2002 | CN1341222A Methods of photosensitizing glasses with hydrogen or deuterium and waveguides resulting therefrom |
| 03/20/2002 | CN1340743A Supporting body for lithographic printing plate and the lithographic printing plate |
| 03/20/2002 | CN1340742A Pattern forming material and forming method, and manufacture method of mask for exposure |
| 03/19/2002 | US6360134 Method for creating and improved image on a photomask by negatively and positively overscanning the boundaries of an image pattern at inside corner locations |
| 03/19/2002 | US6360012 In situ projection optic metrology method and apparatus |
| 03/19/2002 | US6359969 Filter for extreme ultraviolet lithography |
| 03/19/2002 | US6359922 Single chamber gas discharge laser with line narrowed seed beam |
| 03/19/2002 | US6359688 Projection exposure apparatus and method of controlling same |
| 03/19/2002 | US6359679 Positioning device, exposure device, and device manufacturing method |
| 03/19/2002 | US6359678 Exposure apparatus, method for producing the same, and exposure method |
| 03/19/2002 | US6359677 Stage apparatus, exposure apparatus using the same, and a device manufacturing method |
| 03/19/2002 | US6359153 Photoresist monomers and preparation thereof |
| 03/19/2002 | US6359078 Resist materials for use in lithography, for example, in the production of integrated circuits |
| 03/19/2002 | US6358869 Li2O-Al2O3-SiO2 type transparent crystallized glass |
| 03/19/2002 | US6358856 Bright field image reversal for contact hole patterning |
| 03/19/2002 | US6358843 Method of making ultra small vias for integrated circuits |
| 03/19/2002 | US6358793 Method for localized masking for semiconductor structure development |
| 03/19/2002 | US6358676 Semiconductor substrate, underlays and photoresists |
| 03/19/2002 | US6358675 Silicon-containing alcohols and polymers having silicon-containing tertiary ester groups made therefrom |
| 03/19/2002 | US6358673 Multistage reaction and photoresists, exposure and rinsing |
| 03/19/2002 | US6358672 Method of forming semiconductor device pattern including cross-linking and flow baking a positive photoresist |
| 03/19/2002 | US6358670 Enhancement of photoresist plasma etch resistance via electron beam surface cure |
| 03/19/2002 | US6358669 Thermal digital lithographic printing plate |
| 03/19/2002 | US6358666 Photoresists, acid generators and styrene polymers |
| 03/19/2002 | US6358665 Radiation-sensitive composition of chemical amplification type |
| 03/19/2002 | US6358664 Electronically active primer layers for thermal patterning of materials for electronic devices |
| 03/19/2002 | US6358660 Multilayer sheet with barriers, release agent layer for transferring |
| 03/19/2002 | US6358559 Dielectric films from organohydridosiloxane resins with low organic content |
| 03/19/2002 | US6358326 Process for the preparation of flexible blocks from photopolymer plates using offset brushes |
| 03/19/2002 | US6357938 Coating and developing process system |
| 03/19/2002 | US6357352 Lithographic printing plates for use with laser imaging apparatus |
| 03/19/2002 | US6357131 Overlay reliability monitor |
| 03/14/2002 | WO2002021583A1 Aligner and method of manufacturing a device |
| 03/14/2002 | WO2002021217A1 Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks |
| 03/14/2002 | WO2002021216A2 Polymers and photoresist compositions comprising electronegative groups |
| 03/14/2002 | WO2002021215A1 On-press development of thermosensitive lithographic plates |
| 03/14/2002 | WO2002021214A2 Use of acetal/ketal polymers in photoresist compositions suitable for short wave imaging |
| 03/14/2002 | WO2002021213A2 Novel polymers and photoresist compositions for short wavelength imaging |
| 03/14/2002 | WO2002021212A2 Fluorinated phenolic polymers and photoresist compositions comprising same |
| 03/14/2002 | WO2002021211A2 Polymers and photoresist compositions for short wavelength imaging |
| 03/14/2002 | WO2002021207A1 Modular exposure apparatus with removable optical device and improved isolation of the optical device |
| 03/14/2002 | WO2002021187A1 Object lens system, observing device equipped with the object lens system, and exposure system equipped with the observing device |
| 03/14/2002 | WO2002021075A1 Determination of center of focus by diffraction signature analysis |
| 03/14/2002 | WO2002020255A1 Seamless master and method of making same |
| 03/14/2002 | WO2001092024A3 Imaging media containing heat developable photosensitive microcapsules |
| 03/14/2002 | WO2001075932A3 An enhanced resist strip in a dielectric etcher using downstream plasma |
| 03/14/2002 | WO2001075524A3 Solid imaging compositions for preparing polypropylene-like articles |
| 03/14/2002 | WO2001071778A3 Nanometric scale coherently controlled deposition |
| 03/14/2002 | WO2001059521A3 Photopolymerizable composition sensitive to light in a green to infrared region of the optical spectrum |
| 03/14/2002 | WO2001042964A3 Method and apparatus for structure prediction based on model curvature |
| 03/14/2002 | WO2001040869A3 Mask design and method for controlled profile fabrication |
| 03/14/2002 | WO2001027695A3 Removable cover for protecting a reticle, system including and method of using the same |
| 03/14/2002 | WO2001024228A3 Temporary bridge for micro machined structures |
| 03/14/2002 | WO2000057629A9 Laser pattern generator |
| 03/14/2002 | US20020032273 Containing a 1H-tetrazole or a 5,5'-bis-1H-tetrazole |
| 03/14/2002 | US20020032271 Multilayer structure comprising at least one antistatic layer containing an organic (e.g., sulfonated polyaniline) or inorganic (e.g., carbon black) conductive material |
| 03/14/2002 | US20020031732 Selecting wafer to be imprinted with wafer-identifying information; forming a resist layer, exposing resist layer, using a mask, to light for forming latent image of wafer-identifying information; forming patterned resist layer |
| 03/14/2002 | US20020031729 Antireflective coating compositions |
| 03/14/2002 | US20020031726 Method of photolithography |
| 03/14/2002 | US20020031724 Applying ink; exposure to radiation; removal wastes;continuous cycles |
| 03/14/2002 | US20020031723 Photopolymerizable composition |
| 03/14/2002 | US20020031722 Positive-working photoresist composition |
| 03/14/2002 | US20020031721 Photoresist composition for top-surface imaging processes by silylation |
| 03/14/2002 | US20020031720 Novel copolymer, photoresist composition , and process for forming resist pattern with high aspect ratio |
| 03/14/2002 | US20020031719 Radiation transparent; sensitivity |
| 03/14/2002 | US20020031718 Resist composition |
| 03/14/2002 | US20020031717 Pattern Formation |
| 03/14/2002 | US20020031716 Encapsulation color development |
| 03/14/2002 | US20020031712 Photomask making method and alignment method |
| 03/14/2002 | US20020031604 Method of and apparatus for coating a wafer with a minimal layer of photoresist |
| 03/14/2002 | US20020031248 Defect inspection method and apparatus therefor |
| 03/14/2002 | US20020031159 Gas performance control system for gas discharge lasers |
| 03/14/2002 | US20020031158 Narrow band excimer laser with a resonator containing an optical element for making wavefront corrections |
| 03/14/2002 | US20020031157 Gas performance control system for gas discharge lasers |
| 03/14/2002 | US20020030890 Diffractive optical element and optical system having the same |
| 03/14/2002 | US20020030863 Hologram print system and holographic stereogram |
| 03/14/2002 | US20020030826 Method and apparatus for high-speed thickness mapping of patterned thin films |
| 03/14/2002 | US20020030802 Projection exposure apparatus |
| 03/14/2002 | US20020030801 Electron beam aligner, outgassing collection method and gas analysis method |
| 03/14/2002 | US20020030800 Method of forming optical images, mask for use in this method, method of manufacturing a device using this method, and apparatus for carrying out this method |
| 03/14/2002 | US20020030799 Projection exposure apparatus and manufacturing and adjusting methods thereof |
| 03/14/2002 | US20020030796 Photolithographic process for producing etched patterns on the surface of fine tubes, wires, or other three dimensional structures |
| 03/14/2002 | US20020030496 Apparatus for measuring the focus of a light exposure system used for fabricating a semiconductor device |
| 03/14/2002 | US20020030214 Semiconductor device and method for manufacturing the same |
| 03/14/2002 | US20020030178 Etching solutions and processes for manufacturing flexible wiring boards |
| 03/14/2002 | US20020030165 Proximity exposure method by oblique irradiation with light |
| 03/14/2002 | US20020029744 Photoresist dispense arrangement by compensation for substrate reflectivity |
| 03/14/2002 | US20020029740 Flow controller |
| 03/14/2002 | US20020029711 Methods of preparing positive-working lithographic printing plates for laser-imageable computer-to-press systems |
| 03/14/2002 | US20020029709 Support for lithographic printing plate and presensitized plate |
| 03/14/2002 | US20020029608 Semiconductor calibration structures, semiconductor calibration wafers, calibration methods of calibrating semiconductor wafer coating systems, semiconductor processing methods of ascertaining layer alignment during processing and calibration methods of calibrating multiple semiconductor wafer coating systems |
| 03/14/2002 | DE10136747A1 Image correction during print forme exposure, with forme exposed to position compensating temperature profile during exposure |
| 03/14/2002 | DE10118902A1 Fotolackzusammensetzungen aus zyklischen Olefinpolymeren mit Laktonanteil Photoresist compositions of cyclic olefin polymers with Laktonanteil |
| 03/14/2002 | DE10106430A1 Verfahren zum Ausbilden eines Halbleitervorrichtungsmusters, Verfahren zur Konstruktion eines Photomaskenmusters, Photomaske und Prozeß für eine Photomaske A method for forming a semiconductor device pattern, method of designing a photomask pattern for a photomask and photomask process |
| 03/14/2002 | DE10040998A1 Projektionsbelichtungsanlage Projection exposure apparatus |