G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2002
03/26/2002	US6362926 Projection exposure apparatus and method
03/26/2002	US6362871 Lithographic apparatus
03/26/2002	US6362491 Method of overlay measurement in both X and Y directions for photo stitch process
03/26/2002	US6362248 Photochromic polymerizable composition
03/26/2002	US6362116 Method for controlling photoresist baking processes
03/26/2002	US6362110 Enhanced resist strip in a dielectric etcher using downstream plasma
03/26/2002	US6361929 Method of removing a photo-resist layer on a semiconductor wafer
03/26/2002	US6361928 Forming a photoresist layer on the dielectric layer, wherein a compound is added to the photoresist layer; exposing and developing photoresist layer to form opening; providing ultraviolet light to irradiate to expand photoresist layer
03/26/2002	US6361926 Acid functional polymers based on benzocyclobutene
03/26/2002	US6361925 Photoinitiator mixtures and compositions with alkylphenylbisacylphosphine oxides
03/26/2002	US6361924 Applied, in the form of coatings, onto substrates such as printed circuit boards
03/26/2002	US6361921 Bonding a photoresists to a substrate with aqueous printing composition
03/26/2002	US6361911 Computer support softwear, design patterns
03/26/2002	US6361909 Illumination aperture filter design using superposition
03/26/2002	US6361908 Layout designing method of a display device
03/26/2002	US6361907 Exposing method in which different kinds of aligning and exposing apparatuses are used
03/26/2002	US6361903 Method for predicting pattern width on semiconductor wafer and method for correcting mask pattern therethrough
03/26/2002	US6361712 Comprised of water, hydroxylammonium salt, carboxylic acid, fluorine-containing compounds, and base; removes residues left after chemical-mechanical polishing and etching
03/26/2002	US6361612 Process for making pictorial reproductions
03/26/2002	US6361611 Using alkaline water-based solution; forming alumina-silica
03/26/2002	US6361599 Mechanism for dispensing liquid onto an integrated circuit wafer with minimized back-splash
03/26/2002	US6361313 Ladder boat for supporting wafers
03/26/2002	US6361176 Reflection reduction projection optical system
03/21/2002	WO2002023961A1 Method for producing an electrically conductive structure on a non-planar surface and the use of said method
03/21/2002	WO2002023845A2 Method for improving image quality and for increasing writing speed during exposure of light-sensitive layers
03/21/2002	WO2002023598A2 A method to reduce post-development defects without sacrificing throughput
03/21/2002	WO2002023580A1 Field emission photocathode array for lithography system and lithography system provided with such an array
03/21/2002	WO2002023576A1 Field emission photocathode array comprising an additional layer to improve the yield and electron optical imaging system using the same
03/21/2002	WO2002023278A2 Device and method for exposing photosensitive plates for printing presses
03/21/2002	WO2002023277A1 Machine for the treatment of printing plates
03/21/2002	WO2002023276A1 Negative photosensitive polyimide composition and method of forming image from the same
03/21/2002	WO2002023275A1 Ultraviolet-curing resin composition and photo solder resist ink containing the same
03/21/2002	WO2002023274A2 Photoresist composition
03/21/2002	WO2002023273A2 Photosensitive composition, cured article thereof, and printed circuit board using the same
03/21/2002	WO2002023272A1 Dual layer reticle blank and manufacturing process
03/21/2002	WO2002023131A1 Position measuring device
03/21/2002	WO2002022372A1 Use of electronically active primer layers in thermal patterning of materials
03/21/2002	WO2002022360A2 Printing plate
03/21/2002	WO2002001621A3 Method to restore hydrophobicity in dielectric films and materials
03/21/2002	WO2001096964A8 Photoresist remover composition
03/21/2002	WO2001095031A3 Imageable element and waterless printing plate
03/21/2002	WO2001094123B1 Polymers and their use in imagable products and image-forming methods
03/21/2002	WO2001090819A3 Method and system for selective linewidth optimization during a lithographic process
03/21/2002	WO2001090814A3 Maskless exposure system
03/21/2002	WO2001088467A3 Data age adjustments
03/21/2002	WO2001086647A3 Phase contrast variation of a photo-induced refractive material
03/21/2002	WO2001063360A3 Encapsulated inorganic resists
03/21/2002	WO2001055789A3 Chemically amplified short wavelength resist
03/21/2002	WO2001048812A3 Method and system for efficiently computing a number of integrated circuit dies
03/21/2002	US20020035701 Capacitive sensing and data input device power management
03/21/2002	US20020035461 Visual analysis and verification system using advanced tools
03/21/2002	US20020035279 Novel ester compounds having alicyclic and oxirane structures and method for preparing the same
03/21/2002	US20020035199 Composition (e.g. ink or varnish) which can undergo cationic and/or radical polymerization and/or crosslinking by irradiation, based on an organic matrix, a silicone diluent and a photoinitiator
03/21/2002	US20020035196 Mixture containing tetrazole
03/21/2002	US20020035194 Mixture of borosilicate glass and crystalline glass
03/21/2002	US20020034870 Covering an interconnection having a bonding pad with an insulating film; forming a photoresist film; anisotropic etching; removing, with an amine-based organic solvent a metal polymer film formed on an inner side surface of second opening
03/21/2002	US20020034831 Alignment method and exposure apparatus using the method
03/21/2002	US20020034714 Method and apparatus for heat processing of substrate
03/21/2002	US20020034711 Coating a first photosensitive formulation comprising admixture of free radical polymerizable monomer, oligomer or polymer and photoinitiator; imagewise exposure to polymerize; removing non-image area to form core; coating, polymerization
03/21/2002	US20020034707 Printing plate having printinging layer with changeable affinity for printing fluid
03/21/2002	US20020034706 Handleability, and is water-developable
03/21/2002	US20020034704 For giving a patterned resist layer with high pattern resolution and excellent resistance against etching, used for photolithographic patterning works in the manufacture of electronic devices
03/21/2002	US20020034697 For use liquid crystal display devices, light fastness
03/21/2002	US20020034696 Used in in printing inks
03/21/2002	US20020034695 Manufacturing method of a phase shift mask, method of forming a resist pattern and manufacturing method of a semiconductor device
03/21/2002	US20020034694 Phaseshift mask and manufacturing the same
03/21/2002	US20020034611 Process of forming a pattern on a substrate
03/21/2002	US20020034345 Static pressure air bearing
03/21/2002	US20020034209 Line narrowed laser with spatial filter
03/21/2002	US20020034208 Line narrowing unit with flexural grating mount
03/21/2002	US20020034207 Beam delivery system for molecular fluorine (F2) laser
03/21/2002	US20020033945 Spectroscopic scatterometer system
03/21/2002	US20020033936 Projection exposure method and apparatus
03/21/2002	US20020033935 Exposure apparatus, imaging performance measurement method, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method
03/21/2002	US20020033934 Projection exposure apparatus and device manufacturing method
03/21/2002	US20020033912 Color liquid crystal panel and color liquid crystal display apparatus
03/21/2002	US20020033877 Optical recording method and optical recording apparatus employing the same
03/21/2002	US20020033458 Charged particle beam exposure system
03/21/2002	US20020033457 Pattern lock system
03/21/2002	US20020033186 Processes and apparatus for treating electronic components
03/21/2002	US20020033136 Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system
03/21/2002	US20020033109 Image forming method
03/21/2002	US20020033107 Method and device for producing a printing image carrier on prefabricated carrier material
03/21/2002	DE10136510A1 Optisches Beleuchtungssystem in einer Belichtungseinheit Illumination optical system in an exposure unit
03/21/2002	DE10133715A1 Novel anthracene compounds are useful for the production of anti-reflective coatings for semiconductor devices
03/21/2002	DE10111709A1 Manufacturing method for semiconductor device involves transferring basic pattern to first process, measuring dimension of transfer pattern and correcting optical distortion for every region
03/21/2002	DE10045265A1 Vorrichtung zum Bündeln der Strahlung einer Lichtquelle Apparatus for bundling the radiation from a light source
03/21/2002	DE10043948A1 Alignment error compensation method for exposure system used for semiconductor circuit manufacture calculates adjustment correction values dependent on alignment error between exposure planes
03/20/2002	EP1189242A2 X-ray exposure apparatus and method, semiconductor manufacturing apparatus and microstructure
03/20/2002	EP1189112A2 Projection exposure apparatus
03/20/2002	EP1189111A1 Production device for printed board, production method for printed board and printed board
03/20/2002	EP1189089A2 Device for concentrating radiation of a light source
03/20/2002	EP1189018A2 Six axes positioning system with a space free from magnetic field
03/20/2002	EP1188579A1 Method of lithographic printing with a reusable substrate
03/20/2002	EP1188578A1 Method of lithographic printing with a reusable substrate
03/20/2002	EP1188560A2 Thermal transfer foil with reactive polymer composition for laser-induced imaging
03/20/2002	EP1188184A2 Method to measure alignment using latent image grating structures
03/20/2002	EP1188183A2 A method for efficiently computing a number of integrated circuit dies
03/20/2002	EP1188095A1 Production of an integrated optical device
03/20/2002	EP1165627A4 Photopolymerizable vinyl ether based monomeric formulations and polymerizable compositions which may include certain novel spiroorthocarbonates

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