| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/02/2002 | US6365323 High performance curable polymers and processes for the preparation thereof |
| 04/02/2002 | US6365322 Photoresist composition for deep UV radiation |
| 04/02/2002 | US6365321 Blends of hydroxystyrene polymers for use in chemically amplified positive resist formulations |
| 04/02/2002 | US6365319 Fluorinated polymers, inorganic oxides, and inorganic nitrides barrier layer; melamine-formaldehyde microcapsules; phenolic resin developer; photohardenable; better image quality and more consistence sensitometric response to pressure |
| 04/02/2002 | US6365306 Photosensitive polymer composition, method for forming relief patterns, and electronic parts |
| 04/02/2002 | US6365305 Polycaprolactone crystalline polymer and polyester thermoplastic polymer; vinyl acrylic copolymer deformable cushion layer; reduced mottle: lower lamination temperatures; better adhesion between colors |
| 04/02/2002 | US6365302 Automatic overlap process using a plurality of linear patterns; faster with greater reproducibility and reliability semiconductor substrate with a photoresist film |
| 04/02/2002 | US6365265 Photosensitive insulating paste and thick-film multi-layer circuit substrate |
| 04/02/2002 | US6365263 Method for forming cross-linking photoresist and structures formed thereby |
| 04/02/2002 | US6365059 Method for making a nano-stamp and for forming, with the stamp, nano-size elements on a substrate |
| 04/02/2002 | US6364595 Reticle transfer system |
| 04/02/2002 | US6364544 Automatic developing apparatus and method of replenishing replenisher for developer for said apparatuses |
| 04/02/2002 | US6364465 Ink jet heads having photoresist layer containing poly (amic acid) |
| 04/02/2002 | US6363950 Apparatus for processing substrate using process solutions having desired mixing ratios |
| 04/02/2002 | US6363809 Precision scanning apparatus and method with fixed and movable guide members |
| 04/02/2002 | CA2324942C Multiple-beam, diode-pumped imaging system |
| 03/28/2002 | WO2002026003A1 Method for converting laser radiation into x-radiation, in particular, into extreme ultraviolet (euv) radiation using a plasma generated by the laser radiation |
| 03/28/2002 | WO2002025724A2 Correction of overlay offset between inspection layers in integrated circuits |
| 03/28/2002 | WO2002025711A1 Method of measuring image characteristics and exposure method |
| 03/28/2002 | WO2002025710A1 Exposure system, exposure method, and production method for device |
| 03/28/2002 | WO2002025708A2 Methods and systems for semiconductor fabrication processes |
| 03/28/2002 | WO2002025379A1 Developing solution for photoresist |
| 03/28/2002 | WO2002025378A1 Ultraviolet-curable resin composition and photosolder resist ink containing the composition |
| 03/28/2002 | WO2002025377A1 Photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board |
| 03/28/2002 | WO2002025376A2 Oxime derivatives and the use thereof as latent acids |
| 03/28/2002 | WO2002025375A2 Pinhole defect repair by resist flow |
| 03/28/2002 | WO2002025374A2 Antireflective composition |
| 03/28/2002 | WO2002025373A2 Method of design and fabrication of integrated circuits using regular arrays and gratings |
| 03/28/2002 | WO2002024774A1 Carboxylated photosensitive resin, alkali-developable photocurable/heat-curable composition containing the same, and cured article obtained therefrom |
| 03/28/2002 | WO2001091204A3 Displacement device |
| 03/28/2002 | WO2001087634A3 Aqueous dispersions for color imaging |
| 03/28/2002 | WO2001086352A3 Polymers for photoresist compositions for microlithography |
| 03/28/2002 | WO2001065317A3 Method for evaluation of reticle image using aerial image simulator |
| 03/28/2002 | WO2001065314A3 Patterning methods and systems using reflected interference patterns |
| 03/28/2002 | WO2001063662A3 Resistor arrays for mask-alignment detection |
| 03/28/2002 | WO2001037047A3 Nitrile/fluoroalcohol polymer-containing photoresists and associated processes for microlithography |
| 03/28/2002 | US20020037991 Photosensitive resin composition |
| 03/28/2002 | US20020037820 Compositions for cleaning organic and plasma etched residues for semiconductor devices |
| 03/28/2002 | US20020037819 Removal polymer residues; mixture of water, alcohol and water soluble amines in solvent |
| 03/28/2002 | US20020037625 Method of producing exposure mask |
| 03/28/2002 | US20020037599 Semiconductor substrate, method of manufacturing the semiconductor substrate, semiconductor device and pattern forming method |
| 03/28/2002 | US20020037479 Photoresist strippers containing reducing agents to reduce metal corrosion |
| 03/28/2002 | US20020037476 Resist pattern forming method, frame plating method and manufacturing method of thin-film magnetic head |
| 03/28/2002 | US20020037475 Photosensitive resin laminate, and signboard plate and signboard made of the laminate |
| 03/28/2002 | US20020037472 Novel polymers and photoresist compositions comprising labile polymer backbones for short wave imaging |
| 03/28/2002 | US20020037471 Resist film formed from polymer of acrylonitrile, acrylic acid and hydroxystyrene derivatives with an acid generator; excimer laser irradiated; given/specified exposure wavelength bands |
| 03/28/2002 | US20020037462 Resist pattern forming apparatus and method thereof |
| 03/28/2002 | US20020037461 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 03/28/2002 | US20020037460 Stage unit, measurement unit and measurement method, and exposure apparatus and exposure method |
| 03/28/2002 | US20020037366 Dropping a coating solution containing solute and a solvent through discharge nozzle onto surface of substrate, mounted on horizontal turn table and turning substrate, soaking and holding a nozzle tip in soaking solution |
| 03/28/2002 | US20020037363 Imaging an external appearance of the resin extruded from a resin application device; and automatically adjusting an amount of the resin extruded from the resin application device based on the external appearance |
| 03/28/2002 | US20020036904 Illumination system with plural light sources, and exposure apparatus having the same |
| 03/28/2002 | US20020036832 Partial objective in an illuminating systems |
| 03/28/2002 | US20020036777 Light receiving apparatus, mark detecting apparatus using light receiving apparatus, exposing apparatus, maintenance method of exposing apparatus, manufacturing method of semiconductor device using exposing apparatus and semiconductor manufacturing plant |
| 03/28/2002 | US20020036763 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 03/28/2002 | US20020036762 Projection exposure method and apparatus |
| 03/28/2002 | US20020036761 Apparatus and method applied to exposure by charged beam |
| 03/28/2002 | US20020036760 Exposure apparatus and device manufacturing method |
| 03/28/2002 | US20020036759 Automatic exposing apparatus for both sides and exposing method thereof for works |
| 03/28/2002 | US20020036758 Method of operating an optical imaging system, lithographic projection apparatus, device manufacturing method, and device manufactured thereby |
| 03/28/2002 | US20020036357 Semiconductor device comprising layered positional detection marks and manufacturing method thereof |
| 03/28/2002 | US20020036332 Residue-free overlay target |
| 03/28/2002 | US20020036273 Methods for manufacturing reticles for charged-particle-beam microlithography exhibiting reduced proximity effects, and reticles produced using same |
| 03/28/2002 | US20020036272 Charged-particle-beam microlithography methods and apparatus providing reduced reticle heating |
| 03/28/2002 | US20020036188 Method for determining laser-induced compaction in fused silica |
| 03/28/2002 | US20020036183 Method for forming pattern |
| 03/28/2002 | US20020036006 Wet cleaning process and wet cleaning equipment |
| 03/28/2002 | US20020036001 A container which retains the substrate has an inlet port for introducing a solution into the container in controllable manner and an outlet for discharging the solution, an oxygen water high concentration inlet pipe for feeding oxygen-water |
| 03/28/2002 | US20020035938 Printing form and method of modifying the wetting characteristics of the printing form |
| 03/28/2002 | DE10047779A1 Method for converting laser beams into X-rays like EUV rays uses amplitude/phase-modulated sub-nanosecond impulses to create plasma that has high radiation conversion efficiency and is generated by the laser beams. |
| 03/28/2002 | DE10046379A1 System zur gezielten Deformation von optischen Elementen System for targeted deformation of optical elements |
| 03/28/2002 | CA2421206A1 Oxime derivatives and the use thereof as latent acids |
| 03/27/2002 | EP1191580A1 Stage device and exposure device |
| 03/27/2002 | EP1191572A2 Short-arc discharge lamp |
| 03/27/2002 | EP1191400A2 Stamper manufacturing method |
| 03/27/2002 | EP1191378A1 Reflection/refraction optical system and projection exposure apparatus comprising the optical system |
| 03/27/2002 | EP1191377A2 System for the controlled deformation of optical elements |
| 03/27/2002 | EP1190850A2 Method for measuring strength of image forming surface of planographic printing plate, planographic printing plate and packaging structure for planographic printing plates |
| 03/27/2002 | EP1190434A1 Real-time prediction of proximity resist heating and correction of raster scan electron beam lithography |
| 03/27/2002 | EP1190277A1 Spin-on-glass anti-reflective coatings for photolithography |
| 03/27/2002 | EP1189994A2 Oil soluble radiation curable metal-containing compounds and compositions |
| 03/27/2002 | EP1189974A1 Polybenzoxazole precursors |
| 03/27/2002 | EP1189964A1 Radiation curable coating containing polyfluorooxetane |
| 03/27/2002 | EP1189760A1 Thermal transfer of a black matrix containing carbon black |
| 03/27/2002 | EP1036488B1 Method and device for producing extreme ultraviolet and soft x-rays from a gaseous discharge |
| 03/27/2002 | EP1025281A4 Synthesis of onium hydroxides from onium salts |
| 03/27/2002 | EP0986777B1 Lithography system |
| 03/27/2002 | EP0948756B1 A method for reducing metal ion contaminants in photoresist compositions containing an organic polar solvent by ion exchange |
| 03/27/2002 | EP0906588B1 Photodefinable dielectric compositions |
| 03/27/2002 | EP0900239B1 Photo-addressable substrates and photo-addressable side-group polymers with highly inducible double refraction |
| 03/27/2002 | EP0801329B1 Radiation-sensitive composition and recording medium produced therefrom |
| 03/27/2002 | CN2483832Y Glass casing for light source with raster |
| 03/27/2002 | CN2483738Y Sebsemimicro projection photoetching objective lens |
| 03/27/2002 | CN1342273A Photosensitive resin composition, photosensitive element comprising the same, process for producing resist pattern, and process for producing printed circuit board |
| 03/27/2002 | CN1341517A 平版印刷版 Lithographic printing plate |
| 03/27/2002 | CN1341516A Equipment and method for manufacturing lithographic printing plate |
| 03/27/2002 | CN1341512A Seal-making equipment and its function change-over mechanism, exposition device and seal-making object detection device |
| 03/26/2002 | US6363294 Method and system for semiconductor wafer fabrication process real-time in-situ interactive supervision |
| 03/26/2002 | US6363167 Method for measuring size of fine pattern |
| 03/26/2002 | US6363094 Gas discharge laser electrode with reduced sensitivity to adverse boundary layer effects |