| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/09/2002 | US6368697 Method of manufacturing an interlayer via and a laminate precursor useful for same |
| 04/09/2002 | US6368523 Method and composition for producing ultraviolet blocking lenses |
| 04/09/2002 | US6368421 Composition for stripping photoresist and organic materials from substrate surfaces |
| 04/09/2002 | US6368400 Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
| 04/09/2002 | US6367928 Method and composition for producing ultraviolet blocking lenses |
| 04/09/2002 | US6367486 Ethylenediaminetetraacetic acid or its ammonium salt semiconductor process residue removal process |
| 04/09/2002 | US6367381 Laser imaged printing plates comprising a multi-layer slip film |
| 04/09/2002 | CA2046711C Multilayer optically variable element |
| 04/04/2002 | WO2002027872A1 High-peak-power laser device and application to the generation of light in the extreme ultraviolet |
| 04/04/2002 | WO2002027409A1 Photoresist stripper/cleaner compositions containing aromatic acid inhibitors |
| 04/04/2002 | WO2002027408A2 Dynamic mask projection stereo micro lithography |
| 04/04/2002 | WO2002027407A1 Resist pattern, process for producing the same, and utilization thereof |
| 04/04/2002 | WO2002027406A2 Illumination system particularly for microlithography |
| 04/04/2002 | WO2002027405A2 Illumination system particularly for microlithography |
| 04/04/2002 | WO2002027403A1 Method of compensating flare-induced cd changes |
| 04/04/2002 | WO2002027402A2 Illumination system particularly for microlithography |
| 04/04/2002 | WO2002027401A2 Illumination system particularly for microlithography |
| 04/04/2002 | WO2002027400A2 Illumination system particularly for microlithography |
| 04/04/2002 | WO2002027073A1 Method for producing metal mask and metal mask |
| 04/04/2002 | WO2002006897A3 Dry multilayer inorganic alloy thermal resist film for lithographic processing and image creation |
| 04/04/2002 | WO2002003766A3 Process for thick film circuit patterning |
| 04/04/2002 | WO2002001685A8 Extreme repetition rate gas discharge laser with improved blower motor |
| 04/04/2002 | WO2001098839A3 Dynamic beam steering interferometer |
| 04/04/2002 | WO2001096409A3 Multiphoton photosensitization system |
| 04/04/2002 | WO2001078108A3 Wafer chuck having piezoelectric elements and method |
| 04/04/2002 | WO2001077752A3 Self-contained imaging assembly having improved peel strength |
| 04/04/2002 | WO2001071425A3 Method for two dimensional adaptive process control of critical dimensions during spin coating process |
| 04/04/2002 | WO2001059521B1 Photopolymerizable composition sensitive to light in a green to infrared region of the optical spectrum |
| 04/04/2002 | WO2001056788A3 Device for exposing thermosensitive media |
| 04/04/2002 | US20020040251 Remote maintenance system |
| 04/04/2002 | US20020039845 Exposure apparatus, semiconductor device manufacturing method, exposure apparatus maintenance method and semiconductor manufacturing factory |
| 04/04/2002 | US20020039841 Patterning method, thin film transistor matrix substrate manufacturing method, and exposure mask |
| 04/04/2002 | US20020039829 Semiconductor device manufacturing system and electron beam exposure apparatus |
| 04/04/2002 | US20020039828 Method for exposing a layout comprising multiple layers on a wafer |
| 04/04/2002 | US20020039820 Fabricating an integrated circuit includes placing at least two antireflective coating layers chosen so radiation reflected mutally cancels when combined, between a reflective surface and another material |
| 04/04/2002 | US20020039705 Shortening a time taken for manufacturing a stamper without requiring special equipment such as a dry etching device. |
| 04/04/2002 | US20020039704 Lithographic and etching process using a hardened photoresist layer |
| 04/04/2002 | US20020039701 Resist composition and patterning process |
| 04/04/2002 | US20020039700 Pattern formation material and pattern formation method |
| 04/04/2002 | US20020039694 On-the-Fly leveling is conducted using a setpoint derived by filtering the output of the combination of the output of a level sensor and another position sensor |
| 04/04/2002 | US20020039691 Production of a regular configuration of resist dots or holes; at least one photomask is a phase mask; useful for production of MRAM memories, having elliptically shaped magnetic memory elements of high density. |
| 04/04/2002 | US20020039516 Three degree of freedom joint |
| 04/04/2002 | US20020039291 Illumination optical system and exposure apparatus having the same |
| 04/04/2002 | US20020039209 In-line holographic mask for micromachining |
| 04/04/2002 | US20020039180 Projection exposure apparatus and exposure method |
| 04/04/2002 | US20020039179 Stage apparatus providing multiple degrees of freedom of movement while exhibiting reduced magnetic disturbance of a charged particle beam |
| 04/04/2002 | US20020039178 Exposure apparatus, exposure method, and semiconductor device manufacturing method |
| 04/04/2002 | US20020039175 Projection exposure lens with aspheric elements |
| 04/04/2002 | US20020038852 Magnetic shielding method for charged particle beam microlithography apparatus |
| 04/04/2002 | US20020038767 Method of manufacturing a stent |
| 04/04/2002 | US20020038625 Manufacturing method for calcium fluoride and calcium fluoride for photolithography |
| 04/04/2002 | DE10142489A1 Three axis, six direction system for positioning wafers prior to measurement or treatment with radiation, etc. in which highly accurate positioning enables very fine structures to be measured or irradiated in lithography processes |
| 04/04/2002 | DE10135047A1 Verfahren zum Herstellen eines Leiters und Verfahren zur Bildung eines Musters A method of manufacturing a conductor and method for forming a pattern |
| 04/04/2002 | DE10046518A1 Verfahren zur Verbesserung der Bildqualität und zur Erhöhung der Schreibgeschwindigkeit bei Belichtung lichtempfindlicher Schichten A method for improving image quality and for increasing the writing speed at exposure of photosensitive layers |
| 04/04/2002 | DE10045774A1 Thermotransferfolie mit reaktiver Polymermasse zur laserinduzierten Beschichtung Thermal transfer film with reactive polymer composition for laser-induced coating |
| 04/04/2002 | DE10045072A1 Verfahren zur Herstellung einer elektrisch leitfähigen Struktur auf einer nichtplanen Oberfläche und Verwendung des Verfahrens A process for producing an electrically conductive pattern on a non-planar surface, and using the method |
| 04/04/2002 | CA2423468A1 Photoresist stripper/cleaner compositions containing aromatic acid inhibitors |
| 04/03/2002 | EP1193733A1 Short arc discharge lamp |
| 04/03/2002 | EP1193558A2 Radiation-sensitive resin composition |
| 04/03/2002 | EP1193557A1 Use of a radiation sensitive resin composition for the formation of cathode separator, cathode separator and electroluminescent display device |
| 04/03/2002 | EP1193556A1 Positive resist composition |
| 04/03/2002 | EP1193555A1 Negative resist composition |
| 04/03/2002 | EP1193553A2 Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure |
| 04/03/2002 | EP1193552A2 Process for establishing mask lay-out data for simulating a lithographic process and for defining an optimized mask lay-out data; corresponding equipment and programs |
| 04/03/2002 | EP1193540A2 Liquid crystal display color filter and photosensitive resin composition |
| 04/03/2002 | EP1193059A1 Device for controlling the fan-out of a web |
| 04/03/2002 | EP1193056A1 Silicone elastomer stamp with hydrophilic surfaces and method of making same |
| 04/03/2002 | EP1192798A2 Multiple-beam, diode-pumped imaging system |
| 04/03/2002 | EP1192689A1 Tangential fan with cutoff assembly and vibration control for electric discharge laser |
| 04/03/2002 | EP1192509A1 Method and apparatus for recording a hologram from a mask pattern by the use of total internal reflection holography and hologram manufacture by the method |
| 04/03/2002 | EP1192506A1 Photoresist removal process using forming gas plasma |
| 04/03/2002 | EP1192505A1 Methods for patterning polymer films, and use of the methods |
| 04/03/2002 | EP1192421A1 A non-invasive system and method for diagnosing potential malfunctions of semiconductor equipment components |
| 04/03/2002 | EP1192410A1 Helium-neon laser light source generating two harmonically related, single-frequency wavelengths for use in displacement and dispersion measuring interferometry |
| 04/03/2002 | EP1192041A1 Method and device for producing an object by means of stereolithography |
| 04/03/2002 | EP0927209B1 Liquid curable resin composition |
| 04/03/2002 | EP0879257B1 Polymerizable substances based on epoxides |
| 04/03/2002 | CN1343326A Method for producing pattern suitable for forming sub-micron width metal lines |
| 04/03/2002 | CN1343325A Photosensitive resin composition for roll coating and method of roll coating |
| 04/03/2002 | CN1343000A Electronic cyclotron resonance dusting device for treatment of glass chip or chip |
| 04/03/2002 | CN1082244C Apparatus for forming photoresist film in semiconductor device and method of forming it |
| 04/02/2002 | US6366639 X-ray mask, method of manufacturing the same, and X-ray exposure method |
| 04/02/2002 | US6366413 Method of straightening the supporting surfaces of supporting elements for optical elements |
| 04/02/2002 | US6366410 Reticular objective for microlithography-projection exposure installations |
| 04/02/2002 | US6366404 Projection optical system, production method thereof, and projection exposure apparatus using it |
| 04/02/2002 | US6366342 Drive apparatus, exposure apparatus, and method of using the same |
| 04/02/2002 | US6366341 Exposure method and exposure apparatus |
| 04/02/2002 | US6366192 Structure of making a thick film low value high frequency inductor |
| 04/02/2002 | US6365903 Method of forming a quadrupole device for projection lithography by means of charged particles |
| 04/02/2002 | US6365771 Curable vinyl ether or methacrylate derivatives of 4,7 methanoindene or indane; photoresists, optics, and coatings |
| 04/02/2002 | US6365765 9-anthracene carboxy-methyl triethoxysilane, absorbs strongly and uniformly in the deep ultraviolet spectral region; developers; heat resistance; esterification with chloromethyl triethoxy silane; |
| 04/02/2002 | US6365720 Method for producing thermally cleavable, soluble pigment derivatives |
| 04/02/2002 | US6365644 Photo-curable resin composition used for photo-fabrication of three-dimensional object |
| 04/02/2002 | US6365643 Photoinitiators for cationic curing |
| 04/02/2002 | US6365529 Method for patterning dual damascene interconnects using a sacrificial light absorbing material |
| 04/02/2002 | US6365422 Automated variation of stepper exposure dose based upon across wafer variations in device characteristics, and system for accomplishing same |
| 04/02/2002 | US6365333 Low temperature anti-reflective coating for IC lithography |
| 04/02/2002 | US6365330 Concentrate and aqueous developer produced therefrom for imagewise exposed recording materials |
| 04/02/2002 | US6365325 Polymethylmethacrylate thermally reflowed and is not treated with uv radiation prior to use as mask during etching of blanket target layer |
| 04/02/2002 | US6365324 Diaminopolysiloxane, carboxyl diamine and an aromatic or alicyclic diamine with 4,4' hexafluoroisopropylidene diphthalic acid dianhydride polyimide |