| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 10/17/2013 | WO2013152877A1 Rotatable frame for a lithographic apparatus |
| 10/17/2013 | WO2013152600A1 Chemical conveying apparatus, developing device and developing system |
| 10/17/2013 | WO2013124101A3 Fuel stream generator, source collector apparatus and lithographic apparatus |
| 10/17/2013 | US20130273479 Processess and compositions for removing substances from substrates |
| 10/17/2013 | US20130273476 Pattern-forming method, resist underlayer film, and composition for forming resist underlayer film |
| 10/17/2013 | US20130273475 Grid Refinement Method |
| 10/17/2013 | US20130273474 Grid Refinement Method |
| 10/17/2013 | US20130273473 Direct drawing-type waterless lithographic printing original plate |
| 10/17/2013 | US20130273388 Heat dissipation substrate and manufacturing method thereof |
| 10/17/2013 | US20130271945 Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
| 10/17/2013 | US20130271741 Optical system, in particular of a microlithographic projection exposure apparatus |
| 10/17/2013 | US20130271739 Exposure apparatus and device manufacturing method |
| 10/17/2013 | US20130271738 Movable body apparatus, exposure apparatus, and device manufacturing method |
| 10/17/2013 | US20130270223 Photoresist composition, method of manufacturing a polarizer and method of manufacturing a display substrate using the same |
| 10/17/2013 | DE102012221186A1 Reflective optical element for extreme UV and soft X-ray wavelength region, has several layers serving as diffusion barrier intermediate layer, between which material with lower real portion of refractive index is arranged |
| 10/17/2013 | DE102012219540A1 Optical arrangement for e.g. extreme UV lithography, has optical element in which internal channels for transit of fluid are provided, where ends of fluid conduits are directly joined with optical element at connecting section points |
| 10/17/2013 | DE102012206287A1 Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage An optical system, in particular of a microlithographic projection exposure apparatus |
| 10/17/2013 | DE102012206153A1 Optisches System einer mikrolithographischen Projektionsbelichtungsanlage The optical system of a microlithography projection exposure apparatus |
| 10/17/2013 | DE102012206148A1 Optisches System einer mikrolithographischen Projektionsbelichtungsanlage, sowie Verfahren zur Justage eines optischen Systems The optical system of a microlithography projection exposure apparatus, and method for adjusting an optical system |
| 10/17/2013 | DE102012205886A1 Beleuchtungsintensitäts-Korrekturvorrichtung zur Vorgabe einer Beleuchtungsintensität über ein Beleuchtungsfeld einer lithographischen Projektionsbelichtungsanlage Illumination intensity correction apparatus for providing an illumination intensity of a light field of a lithographic projection exposure apparatus |
| 10/16/2013 | EP2650730A2 Optical element and method |
| 10/16/2013 | EP2650729A1 Composition for forming resist underlayer film containing hydroxyl group-containing carbazole novolac resin |
| 10/16/2013 | EP2649494A2 Criss-cross writing strategy |
| 10/16/2013 | EP2649493A1 Illumination system of a microlithographic projection exposure apparatus |
| 10/16/2013 | EP2649034A2 Benzylidene substituted 2,4-pentanedione compounds and use thereof as stabilizers |
| 10/16/2013 | CN203241699U Liquid metallic target generating device for plasma light source |
| 10/16/2013 | CN203241698U Flexible panel continuous mask-less photoetching device |
| 10/16/2013 | CN103353710A Exposure device, system and method |
| 10/16/2013 | CN103353709A Mask lithography for printed circuit board production |
| 10/16/2013 | CN103353708A Multilayer negative photoresist mold manufacturing method |
| 10/16/2013 | CN103353707A Coating compositions for photoresists |
| 10/16/2013 | CN103353706A Antireflective coating compositions |
| 10/16/2013 | CN103353630A Manufacturing method for electrode of lithium niobate optical waveguide device |
| 10/16/2013 | CN103353627A Manufacturing method of micro lens array mold |
| 10/16/2013 | CN103353209A Vacuum drying device and photolithographic process |
| 10/16/2013 | CN103351465A Photoresist monomer, photoresist, preparation method of photoresist monomer and photoresist and color filter |
| 10/16/2013 | CN102540708B 压印光刻 Imprint lithography |
| 10/16/2013 | CN102540707B 压印光刻 Imprint lithography |
| 10/16/2013 | CN102540298B Soft X-ray double-frequency gratings and manufacture method thereof |
| 10/16/2013 | CN102445853B Photosensitive resin composition and color filter as well as preparation method thereof |
| 10/16/2013 | CN102436146B Photosensitive resin composition |
| 10/16/2013 | CN102393611B Magnetic preloading balance positioning system for photoetching machine workpiece stage |
| 10/16/2013 | CN102262353B Manufacturing method of multicolour dimming mask and pattern transfer method |
| 10/16/2013 | CN102077141B Photosensitive composition, partition wall, color filter, and organic EL device |
| 10/16/2013 | CN102016718B Positive-type photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device each comprising the cured film |
| 10/16/2013 | CN101971100B Lithographic apparatus, plasma source, and reflecting method |
| 10/16/2013 | CN101907828B Radiation-sensitive composition, protective film and inter layer insulating film, and process for forming the same |
| 10/16/2013 | CN101861547B Method of making a lithographic printing plate |
| 10/16/2013 | CN101825847B Cleanup method for optics in immersion lithography |
| 10/16/2013 | CN101793989B Monolithic polarization controlled angle diffusers and associated methods |
| 10/16/2013 | CN101673052B Coloring radioactive composition, a color filter and a colorful LCD device |
| 10/16/2013 | CN101032003B Method for stripping photoresist from etched wafer |
| 10/15/2013 | US8558989 Lithographic apparatus and device manufacturing method |
| 10/15/2013 | US8558987 Exposure apparatus and device fabrication method |
| 10/15/2013 | US8557509 Negative resist composition, patterning process, and testing process and preparation process of negative resist composition |
| 10/15/2013 | US8557508 Method of fabricating capacitive touch panel |
| 10/15/2013 | US8557507 Fabrication of nano-twinned nanopillars |
| 10/15/2013 | US8557506 Method of fabricating a metallic microstructure and microstructure obtained via the method |
| 10/15/2013 | US8557505 Dynamic masking method for micro-truss foam fabrication |
| 10/15/2013 | US8557504 Thermally ablatable lithographic printing plate precursors |
| 10/15/2013 | US8557502 Negative photosensitive composition, partition walls for optical device using it and optical device having the partition walls |
| 10/15/2013 | US8557501 Developable bottom antireflective coating compositions especially suitable for ion implant applications |
| 10/15/2013 | US8557500 Salt and photoresist composition comprising the same |
| 10/15/2013 | US8557498 Photosensitive resin composition |
| 10/15/2013 | US8557144 Material for forming conductive antireflection film, method for forming conductive antireflection film, method for forming resist pattern, semiconductor device, and magnetic head |
| 10/15/2013 | US8556418 Curved lenses and related methods |
| 10/15/2013 | US8556298 Personalisable support including anti-forgery device and fabrication process of such supports |
| 10/15/2013 | CA2743541C Base material for screen-printing |
| 10/10/2013 | WO2013152070A1 Techniques for generating three dimensional structures |
| 10/10/2013 | WO2013151167A1 Negative photosensitive siloxane composition |
| 10/10/2013 | WO2013151166A1 Negative photosensitive siloxane composition |
| 10/10/2013 | WO2013151146A1 Exposure device and exposure method |
| 10/10/2013 | WO2013150955A1 Pattern formation method, pattern formation device, and computer-readable storage medium |
| 10/10/2013 | WO2013150898A1 Mask moving device, mask holding device, exposure device, and substrate processing device |
| 10/10/2013 | WO2013150790A1 Exposure device, method for manufacturing flat panel display, and method for manufacturing device |
| 10/10/2013 | WO2013150788A1 Moving body device, exposure device, flat panel display manufacturing method, and device manufacturing method |
| 10/10/2013 | WO2013150787A1 Object transfer system, exposure apparatus, method for manufacturing flat panel display, device manufacturing method, object holding apparatus, object transfer apparatus, object transfer method, and object replacing method |
| 10/10/2013 | WO2013149961A1 Particulate contamination measurement method and apparatus |
| 10/10/2013 | WO2013149444A1 Nano-patterned system and magnetic-field applying device thereof |
| 10/10/2013 | WO2013120927A3 Optical component |
| 10/10/2013 | US20130266901 Method of manufacturing liquid ejection head |
| 10/10/2013 | US20130266900 Photosensitive element, method for forming resist pattern, and method for producing printed circuit board |
| 10/10/2013 | US20130266899 Method and composition of a dual sensitive resist |
| 10/10/2013 | US20130266898 Transparent conductive films, articles, and methods |
| 10/10/2013 | US20130266778 Negative photosensitive resin composition, partition walls for optical device and production process thereof, process for producing optical device having the partition walls, and ink repellent solution |
| 10/10/2013 | US20130266777 Negative pattern forming method and resist pattern |
| 10/10/2013 | US20130266682 Nano-imprint lithography templates |
| 10/10/2013 | US20130265560 EUV Lithography System |
| 10/10/2013 | US20130265559 Illumination optical system, exposure apparatus, and device manufacturing method |
| 10/10/2013 | US20130265558 Control apparatus, lithography apparatus, and method of manufacturing article |
| 10/10/2013 | US20130265557 Temperature control in euv reticle inspection tool |
| 10/10/2013 | US20130265556 Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium |
| 10/10/2013 | US20130265555 Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium |
| 10/10/2013 | US20130264099 Novel photosensitive resin composition and use thereof |
| 10/10/2013 | DE102012205790A1 Vorrichtung zur Homogenisierung von Laserstrahlung sowie Verfahren zu ihrer Herstellung An apparatus for homogenizing the laser radiation, as well as processes for their preparation |
| 10/09/2013 | EP2648027A1 Projection objective lens system and microlithography system using the same |
| 10/09/2013 | EP2646876A1 Developer and its use to pepare lithographic printing plates |
| 10/09/2013 | EP2646875A1 Optical device, laser apparatus including the optical device, and extreme ultraviolet light generation system including the laser apparatus |
| 10/09/2013 | CN103348289A Radiation-sensitive composition, cured film of same, and method for forming cured film |
| 10/09/2013 | CN103345197A Six-freedom-degree decoupling modeling method of workpiece platform micro-motion part |