| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/11/2002 | WO2002029448A2 Photocurable resin composition and optical material |
| 04/11/2002 | WO2001096956A3 Method for producing a planar mask on surfaces having reliefs |
| 04/11/2002 | WO2001064975A8 Method and device for growing large-volume oriented monocrystals |
| 04/11/2002 | US20020042906 Apparatus for and method of preparing pattern data of electronic part |
| 04/11/2002 | US20020042664 Evaluation method, position detection method, exposure method and device manufacturing method, and exposure apparatus |
| 04/11/2002 | US20020042531 Polymers derived from an unsaturated fused cyclic hydrocarbon (such as perhydro-2,3-didehydro-1,4:5,8-dimethanonaphthalene) joined by a linker to an ester group having one or two protected hydroxyls; use as photoresist |
| 04/11/2002 | US20020042485 Repeating units of maleic anhydride, norbornene with an acid-labile group, and a vinyl with a silicon containing group |
| 04/11/2002 | US20020042203 Method of forming a fine pattern |
| 04/11/2002 | US20020042029 Method for fabricating a resist pattern, a method for patterning a thin film and a method for manufacturing a micro device |
| 04/11/2002 | US20020042028 Overcoating with polymethylglutarimide; forming photoresists; exposure; development |
| 04/11/2002 | US20020042027 Lithography; integrated circuits |
| 04/11/2002 | US20020042026 Optical lithography and a method of inducing transmission in optical lithography preforms |
| 04/11/2002 | US20020042025 Method of preparing barrier rib master pattern for barrier rib transfer and method of forming barrier ribs |
| 04/11/2002 | US20020042024 Method of manufacturing an element with multiple-level surface, such as a diffractive optical element |
| 04/11/2002 | US20020042023 Method and apparatus for exposing semiconductor wafers in a manner that promotes radial processing uniformity |
| 04/11/2002 | US20020042022 For addition compounds; coating substrates |
| 04/11/2002 | US20020042021 Mat interface layer; efficient evacuation |
| 04/11/2002 | US20020042020 Organo polysilica materials including one or more chromophores; relief images |
| 04/11/2002 | US20020042019 Using chemically amplified photoresist comprising mixture of polymeric resin, photoacid generator, pH-dependent fluorophore |
| 04/11/2002 | US20020042018 Positive chemically amplified resist and method for forming its pattern |
| 04/11/2002 | US20020042017 Contains carboxyl or phenolic hydroxyl group-containing resin soluble in alkaline solution, in which acid labile groups are incorporated into some of hydrogen atoms on carboxyl or phenolic hydroxyl groups to make resin alkali insoluble |
| 04/11/2002 | US20020042016 Improved dry etching resistance, adhesiveness to underlying material layers, line edge roughness of line patterns, contrast characteristics |
| 04/11/2002 | US20020042010 When critical dimension is reduced to first reference value, serif/hammerhead is added to pattern, when critical dimension is reduced to second reference value, assist feature is added, corrected pattern transferred to wafer with improved fidelity |
| 04/11/2002 | US20020042009 Configuring charged particle beam to have within projected subfield at projected-image plane distribution and cutoff half-angles such that at maximum lateral deflection of beam blur is held to no greater than threshold values |
| 04/11/2002 | US20020042008 Color filter array having a blue filter layer |
| 04/11/2002 | US20020042007 Fabrication method of semiconductor integrated circuit device |
| 04/11/2002 | US20020042006 Scattering-reticle assemblies for electron-beam microlithography including a scattering-stencil reticle portion and a scattering-membrane reticle portion |
| 04/11/2002 | US20020042005 Technique of exposing a resist using electron beams having different accelerating voltages, and method of manufacturing a photomask using the technique |
| 04/11/2002 | US20020042004 Phase contrast variation of a photo-induced refractive material |
| 04/11/2002 | US20020041935 Coating unit and coating method |
| 04/11/2002 | US20020041933 Citric acid tri-alkylamide surfactants |
| 04/11/2002 | US20020041614 Beam delivery system for molecular fluorine (F2) laser |
| 04/11/2002 | US20020041420 Digital optical chemistry micromirror imager |
| 04/11/2002 | US20020041418 Method and apparatus for shaping a laser-beam intensity profile by dithering |
| 04/11/2002 | US20020041380 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 04/11/2002 | US20020041377 Aerial image measurement method and unit, optical properties measurement method and unit, adjustment method of projection optical system, exposure method and apparatus, making method of exposure apparatus, and device manufacturing method |
| 04/11/2002 | US20020041373 Determination of center of focus by diffraction signature analysis |
| 04/11/2002 | US20020041369 Method and device for improved lithographic critical dimension control |
| 04/11/2002 | US20020041368 Apparatus and method for pattern exposure and method for adjusting the apparatus |
| 04/11/2002 | US20020041367 Position detection apparatus having a plurality of detection sections, and exposure apparatus |
| 04/11/2002 | US20020041312 Liquid discharging apparatus and method for discharging liquid |
| 04/11/2002 | US20020040986 Semiconductor device having a dummy pattern |
| 04/11/2002 | DE10044257A1 Verfahren zum Erzeugen von Masken-Layout-Daten für die Lithografiesimulation und von optimierten Masken-Layout-Daten sowie zugehörige Vorrichtung und Programme A method for generating mask data for the layout and lithography simulation of the optimized mask layout data, and associated apparatus and programs |
| 04/10/2002 | EP1195811A1 Semiconductor device |
| 04/10/2002 | EP1195797A2 Method for plasma hardening photoresist in etching of semiconductor and superconductor films |
| 04/10/2002 | EP1195647A1 Surface position detecting method and scanning exposure method using the same |
| 04/10/2002 | EP1195646A1 Photosensitive lithographic printing plate precursor |
| 04/10/2002 | EP1195645A1 Protective layers for photocurable elements |
| 04/10/2002 | EP1195524A2 Liquid discharging apparatus and method for discharging liquid |
| 04/10/2002 | EP1195390A1 Polymer, resist composition and patterning process |
| 04/10/2002 | EP1194816A1 Method for producing a digitally imaged screen for use in a screen printing process |
| 04/10/2002 | EP1194815A1 Ceramic blank with a photostructurable functional layer containing platinum and method for production thereof |
| 04/10/2002 | EP1194803A1 Broad band ultraviolet catadioptric imaging system |
| 04/10/2002 | EP1194732A1 Gas insensitive interferometric apparatus and methods |
| 04/10/2002 | EP1194731A1 Interferometric apparatus and method that compensate refractive index fluctuations |
| 04/10/2002 | EP1194693A2 Microfabricated elastomeric valve and pump systems |
| 04/10/2002 | EP0956516B1 Method and apparatus for the production of a structure by focused laser radiation on a photosensitively coated substrate |
| 04/10/2002 | CN1344302A Radiation curable water based cationic inks and coatings |
| 04/10/2002 | CN1344286A Urethane oligomer, resin compsns. thereof, and cured article thereof |
| 04/10/2002 | CN1343568A Method for mfg. support body for lithographic plate printing plate |
| 04/10/2002 | CN1082679C Photosensitive resin compsn. for sandblast resist layer |
| 04/10/2002 | CN1082678C Photosensitive compsn. |
| 04/10/2002 | CN1082677C Method of adopting ion exchange resin in polar solvent for reducing metal ion content |
| 04/10/2002 | CN1082676C Positive photosensitive compsn. |
| 04/09/2002 | US6370441 Method and apparatus of correcting design-patterned data, method of electron beam and optical exposure, method of fabricating semiconductor and photomask devices |
| 04/09/2002 | US6370174 Injection seeded F2 lithography laser |
| 04/09/2002 | US6370004 Electrostatic chuck |
| 04/09/2002 | US6369936 Pixel intensity control in electro-optic modulators |
| 04/09/2002 | US6369888 Method and apparatus for article inspection including speckle reduction |
| 04/09/2002 | US6369886 Pattern reading apparatus |
| 04/09/2002 | US6369877 System, method and article of manufacture for direct image processing of printed circuit boards |
| 04/09/2002 | US6369876 Exposure apparatus and method, device manufacturing method, and discharge lamp |
| 04/09/2002 | US6369874 Photoresist outgassing mitigation system method and apparatus for in-vacuum lithography |
| 04/09/2002 | US6369845 Exposure system for recording media |
| 04/09/2002 | US6369508 Mercury short-arc lamp with niobium getter |
| 04/09/2002 | US6369493 Microwave plasma applicator having a thermal transfer medium between a plasma containing tube and a cooling jacket |
| 04/09/2002 | US6369398 Method of lithography using vacuum ultraviolet radiation |
| 04/09/2002 | US6369379 Scanning probe microscope assembly and method for making confocal, spectrophotometric, near-field, and scanning probe measurements and associated images |
| 04/09/2002 | US6369181 Copolymer resin, preparation thereof, and photoresist using the same |
| 04/09/2002 | US6369143 Copolymer of maleic anhydride and carboxylic acid-grafted norbornene derivatives, photoacid generator, and solvent; dry etch resistance, bonding strength, transparency |
| 04/09/2002 | US6368985 Dual track/stepper interface configuration for wafer processing |
| 04/09/2002 | US6368980 Resist mark having measurement marks for measuring the accuracy of overlay of a photomask disposed on semiconductor wafer and method for manufacturing semiconductor wafer having it |
| 04/09/2002 | US6368924 Amorphous carbon layer for improved adhesion of photoresist and method of fabrication |
| 04/09/2002 | US6368883 Method for identifying and controlling impact of ambient conditions on photolithography processes |
| 04/09/2002 | US6368879 Process control with control signal derived from metrology of a repetitive critical dimension feature of a test structure on the work piece |
| 04/09/2002 | US6368877 Self-assembling peptide surfaces for cell patterning and interactions |
| 04/09/2002 | US6368777 Performance of printing plates |
| 04/09/2002 | US6368775 Determinating wavelength which changes refractive index; radiation |
| 04/09/2002 | US6368774 Radiation sensitive composition |
| 04/09/2002 | US6368773 Photoresist cross-linker and photoresist composition comprising the same |
| 04/09/2002 | US6368772 Preparation of crosslinkable water-soluble or water-dispersible compositions and radiation-sensitive mixtures obtainable therefrom |
| 04/09/2002 | US6368771 Photoresist polymers and photoresist compositions containing the same |
| 04/09/2002 | US6368770 Photoresist monomers, polymers thereof, and photoresist compositions containing the same |
| 04/09/2002 | US6368769 Aromatic sulfonium compounds, photoacid generators comprising the same, photopolymerizable compositions containing the same, stereolithographic resin compositions, and stereolithographic process |
| 04/09/2002 | US6368768 Organic anti-reflective coating material and its preparation |
| 04/09/2002 | US6368763 Imaging by means of imaging system a circular phase structure on a photoresist, developing the resist and scanning it with a scanning detection device which is coupled to an image processor; accuracy |
| 04/09/2002 | US6368762 Active mask exposure compensation of underlying nitride thickness variation to reduce critical dimension (CD) variation |
| 04/09/2002 | US6368761 Procedure of alignment for optimal wafer exposure pattern |
| 04/09/2002 | US6368756 Forming optic patterns |
| 04/09/2002 | US6368755 Masks for use in optical lithography below 180 nm |