| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/18/2002 | US20020045105 Forming a mask by providing a photosensitive material; performing at least one pass to write a pattern onto the photosensitive material; and developing the photosensitive material. |
| 04/18/2002 | US20020045103 Forming a hologram; using it to illuminate a photosensitive media, over an entire desired width; and forming features in the photosensitive media over the entire desired width, based on the illumination with the hologram. |
| 04/18/2002 | US20020045052 For protecting a water-soluble oxidization preventing layer; air permeability of between about 15 seconds and about 300 seconds. |
| 04/18/2002 | US20020045011 Coating solution spread via rotary table; uniformly in small quantities; adhesive layer insulating film on semiconductor; regulating temperature |
| 04/18/2002 | US20020045008 Cleaning semiconductor wafers; removal of photoresists with ozone and steam; pressurization with gas while feeding solvent vapor reduces contamination |
| 04/18/2002 | US20020044856 Reticle storage system |
| 04/18/2002 | US20020044689 Apparatus and method for global and local feature extraction from digital images |
| 04/18/2002 | US20020044629 Method and apparatus for generating X-ray or EUV radiation |
| 04/18/2002 | US20020044587 Extreme repetition rate gas discharge laser with improved blower motor |
| 04/18/2002 | US20020044586 Very narrow band, two chamber, high rep rate gas discharge laser system |
| 04/18/2002 | US20020044332 Optical arrangement, and method for the deflection of light beams |
| 04/18/2002 | US20020044287 Point diffraction interferometer, manufacturing method for reflecting mirror, and projection exposure apparatus |
| 04/18/2002 | US20020044269 Exposure apparatus and its control method, stage apparatus, and device manufacturing method |
| 04/18/2002 | US20020044268 Pattern forming apparatus and pattern forming method |
| 04/18/2002 | US20020044267 Silica-based light-weight EUV lithography stages |
| 04/18/2002 | US20020044266 Electronic device for a lithography mask container, semiconductor manufacturing system, and method |
| 04/18/2002 | US20020044260 Projection optical system, manufacturing method thereof, and projection exposure apparatus |
| 04/18/2002 | US20020043725 Manufacturing process for semiconductor device, photomask, and manufacturing apparatus for semiconductor device |
| 04/18/2002 | US20020043629 Process for electron beam lithography, and electron-optical lithography system |
| 04/18/2002 | US20020043615 Optical proximity effect correcting method and mask data forming method in semiconductor manufacturing process, which can sufficiently correct optical proximity effect, even under various situations with regard to size and shape of design pattern, and space width and position relation between design patterns |
| 04/18/2002 | US20020043541 Photoresist developing nozzle, photoresist developing apparatus, and photoresist developing method |
| 04/18/2002 | US20020043214 Treatment solution supply apparatus and treatment solution supply method |
| 04/18/2002 | US20020043163 Low distortion kinematic reticle support |
| 04/18/2002 | DE10130999A1 Multifunktions-Reinigungsmodul einer Herstellungseinrichtung für Flachbildschirme und Reinigungsgerät mit Verwendung desselben The same multi-function cleaning module a manufacturing facility for flat screens and cleaner with use |
| 04/17/2002 | EP1197998A2 Antireflective porogens |
| 04/17/2002 | EP1197824A1 Vibration isolating apparatus for table for mounting device sensitive to vibrations and method therefor |
| 04/17/2002 | EP1197803A2 Lithographic apparatus |
| 04/17/2002 | EP1197802A2 Optical proximity correction |
| 04/17/2002 | EP1197801A1 Lithographic device with two object holders |
| 04/17/2002 | EP1197800A1 Photosensitive composition |
| 04/17/2002 | EP1197776A2 System for temperature compensation of thermally loaded bodies having a low heat conductivity, especially of supports for reflective layers or substrates in optics |
| 04/17/2002 | EP1197511A1 Antireflective composition |
| 04/17/2002 | EP1196949A1 Acid blend for removing etch residue on semiconductor substrates |
| 04/17/2002 | EP1196820A2 Method for production of three-dimensionally arranged conducting and connecting structures for volumetric and energy flows |
| 04/17/2002 | EP1196788A1 Merged-mask micro-machining process |
| 04/17/2002 | EP1177468A4 Methods of photosensitizing glasses with hydrogen or deuterium and waveguides resulting therefrom |
| 04/17/2002 | EP1016182A4 Magnetically-positioned x-y stage having six-degrees of freedom |
| 04/17/2002 | EP0907906B1 Lithography exposure device |
| 04/17/2002 | EP0877972B1 Fabrication of covered microchannels |
| 04/17/2002 | EP0539384B1 Process for producing a marker indicating the orientation of the crystal lattice of a wafer |
| 04/17/2002 | CN1345342A Photoactive polymers |
| 04/17/2002 | CN1345085A Monocrystalline silicon wafer crystal orientation calibrating method |
| 04/17/2002 | CN1344923A Method for measuring imaging surface strength of lithoprint plate, lithoprint plate and packaging member of lithoprint plate |
| 04/17/2002 | CN1344628A Etched decorative metal board and its making process |
| 04/17/2002 | CN1344590A Multi-functional cleaning module and cleaning apparatus using the module |
| 04/17/2002 | CN1083116C Light control device in stepper exposure machine |
| 04/17/2002 | CN1083115C Castable composition and rough dielectric sheet |
| 04/17/2002 | CN1082903C Method and system for manufacture of typified image |
| 04/16/2002 | US6374398 Efficient database for die-per-wafer computations |
| 04/16/2002 | US6374397 Lot determination apparatus, lot determination method, and recording medium for storing the method |
| 04/16/2002 | US6373976 Method and apparatus to accurately correlate defect coordinates between photomask inspection and repair systems |
| 04/16/2002 | US6373619 Pattern generator with improved address resolution |
| 04/16/2002 | US6373555 Apparatus for projecting a mask pattern onto a wafer with reduced degradation of optical elements |
| 04/16/2002 | US6373554 Optical system with improved durability for projection exposure apparatus and method for manufacturing optical system for projection exposure apparatus |
| 04/16/2002 | US6373553 Photo-lithographic method to print a line-space pattern with a pitch equal to half the pitch of the mask |
| 04/16/2002 | US6373552 Optical correction plate, and its application in a lithographic projection apparatus |
| 04/16/2002 | US6373189 Mercury lamp of the short arc type having specific relationship with various dimensions of the bulb and UV emission device |
| 04/16/2002 | US6373153 Stage device, and exposure apparatus with linear motor having polygonal shaped coil units |
| 04/16/2002 | US6373072 Lithographic projection apparatus |
| 04/16/2002 | US6373071 Real-time prediction of proximity resist heating and correction of raster scan electron beam lithography |
| 04/16/2002 | US6372935 Monomer comprising 5-hydroxy-6-norbornyl(meth)acrylate derivative |
| 04/16/2002 | US6372854 Hydrogenated ring-opening metathesis polymer and its use and production |
| 04/16/2002 | US6372658 Reducing contamination induced scumming, for semiconductor device, by ashing |
| 04/16/2002 | US6372646 Optical article, exposure apparatus or optical system using it, and process for producing it |
| 04/16/2002 | US6372642 Method for patterning semiconductor devices with a resolution down to 0.12 μm on a silicon substrate using oxynitride film and deep UV lithography |
| 04/16/2002 | US6372415 Developing the resist with a resist developer comprising basic organic compound; salt of the basic organic compound and organic compound by lithography to produce semiconductor or liquid crystal display device |
| 04/16/2002 | US6372414 Coating substrate with layer of liquid positive photoresist; soft baki to remove solvent from photoresist layer; contacting with aqueous alkaline developer; placing mask containing a pattern over photoresist; exposure to actinic radiation |
| 04/16/2002 | US6372413 Method for cleaning the surface of substrate to which residues of resist stick |
| 04/16/2002 | US6372412 Method of producing an integrated circuit chip using frequency doubling hybrid photoresist and apparatus formed thereby |
| 04/16/2002 | US6372411 Polymer pattern forming method |
| 04/16/2002 | US6372410 Resist stripping composition |
| 04/16/2002 | US6372408 Method of reducing post-development defects in and around openings formed in photoresist by use of multiple development/rinse cycles |
| 04/16/2002 | US6372407 Photocurable and photopatternable hydrogel matrix based on azlactone copolymers |
| 04/16/2002 | US6372406 Deactivated aromatic amines as additives in acid-catalyzed resists |
| 04/16/2002 | US6372403 Photosensitive resin composition |
| 04/16/2002 | US6372395 Exposure method for overlaying one mask pattern on another |
| 04/16/2002 | US6372391 Template mask lithography utilizing structured beam |
| 04/16/2002 | US6372389 Method and apparatus for forming resist pattern |
| 04/16/2002 | US6372292 Insulating paste composition for rib formation and method of rib pattern formulation |
| 04/16/2002 | US6372285 Liquid output portion above semiconductor substrate with determined film formation regions; uniform thickness, flat surface; contamination supression |
| 04/16/2002 | US6372173 Process for production of three-dimensional objects by means of stereolithography |
| 04/16/2002 | US6372150 High vapor plasma strip methods and devices to enhance the reduction of organic residues over metal surfaces |
| 04/16/2002 | US6372050 Non-corrosive stripping and cleaning composition |
| 04/16/2002 | US6372042 System for processing semiconductor wafers producing a downward laminar flow of clean air in front of baking units |
| 04/16/2002 | US6371134 Stripping the patterned resist from the semiconductor structure; contacting carbon containing resist debris remaining on the semiconductor structure with ozone to reduc the amount of carbon debris thereon. |
| 04/16/2002 | US6371021 Input nip roller system for external drum imaging system |
| 04/16/2002 | US6370793 Apparatus for controlling the temperature of a wafer located at a pre-alignment stage |
| 04/11/2002 | WO2002029879A1 Method for etching organic anti-reflecting coatings |
| 04/11/2002 | WO2002029870A1 Method of determining exposure conditions, exposure method, device producing method and recording medium |
| 04/11/2002 | WO2002029869A1 Projection aligner and method of producing device using this aligner |
| 04/11/2002 | WO2002029868A1 Electron beam exposure system |
| 04/11/2002 | WO2002029867A1 Method for correcting electron beam and electron beam exposure system |
| 04/11/2002 | WO2002029866A1 Electron beam exposure system and method for calibrating irradiating position of electron beam |
| 04/11/2002 | WO2002029864A1 Device and method for manufacturing semiconductor |
| 04/11/2002 | WO2002029496A1 Resist stripping process |
| 04/11/2002 | WO2002029495A1 Mountable and removable sensor |
| 04/11/2002 | WO2002029494A1 Positive photosensitive polyimide resin composition |
| 04/11/2002 | WO2002029493A1 Photoresist composition for forming insulation film, insulation film for organic electroluminescence element and method for its formation |
| 04/11/2002 | WO2002029492A1 Photolithography methods and systems |
| 04/11/2002 | WO2002029491A1 Method for high yield reticle formation |