| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/25/2002 | DE10061675A1 Silikonhaltiges Vinylcopolymer und Resist-Zusammensetzungen Silicone vinyl copolymer and resist compositions |
| 04/25/2002 | DE10052289A1 8-Spiegel-Mikrolithographie-Projektionsobjektiv 8 Mirror microlithography projection lens |
| 04/25/2002 | DE10051466A1 Mask arrangement for lithography, esp. EUV lithography, includes device for applying a potential difference between each electrode plate electrode and membrane mask |
| 04/25/2002 | DE10050125A1 Vorrichtung zum Temperaturausgleich für thermisch belastete Körper mit niederer Wärmeleitfähigkeit, insbesondere für Träger reflektierender Schichten oder Substrate in der Optik Apparatus for temperature compensation for thermally stressed body with low thermal conductivity, in particular for vehicle reflective layers or substrates in optics |
| 04/25/2002 | DE10046218A1 Projektionsbelichtungsanlage Projection exposure apparatus |
| 04/25/2002 | CA2425613A1 Stabilized alkaline compositions for cleaning microelectronic substrates |
| 04/25/2002 | CA2422655A1 Blends of quinone alkide and nitroxyl compounds as polymerization inhibitors |
| 04/25/2002 | CA2324794A1 Organic-inorganic hybrid photocurable compositions |
| 04/24/2002 | EP1199739A2 A device and method for suppressing space charge induced abberations in charged-particle projection lithography systems |
| 04/24/2002 | EP1199606A1 Plate-making method of lithographic printing plate |
| 04/24/2002 | EP1199605A1 Recording material having a pigment-coloured radiation-sensitive layer |
| 04/24/2002 | EP1199604A1 Method for forming polyimide pattern using photosensitive polyimide and composition for use therein |
| 04/24/2002 | EP1199603A1 Positive photosensitive composition |
| 04/24/2002 | EP1199602A2 Embossing surface and embossing process using photo definable polyimide film |
| 04/24/2002 | EP1199601A2 Photomask fabrication method, photomask, and exposure method thereof |
| 04/24/2002 | EP1199590A1 8 mirror microlithography projection lens |
| 04/24/2002 | EP1198725A1 Moru/be multilayers |
| 04/24/2002 | EP1198344A1 Method for producing microcomponents |
| 04/24/2002 | EP1017770A4 Aqueous rinsing composition |
| 04/24/2002 | EP0850397B1 Methods for detecting striae |
| 04/24/2002 | CN1346061A Method for making microlens array |
| 04/24/2002 | CN1083612C Exposure device for cathode-ray tube panel |
| 04/24/2002 | CN1083582C Pressure indicator |
| 04/23/2002 | US6377655 Reflective mirror for soft x-ray exposure apparatus |
| 04/23/2002 | US6377651 Laser plasma source for extreme ultraviolet lithography using a water droplet target |
| 04/23/2002 | US6377338 Exposure apparatus and method |
| 04/23/2002 | US6377337 Projection exposure apparatus |
| 04/23/2002 | US6377336 Projection exposure apparatus |
| 04/23/2002 | US6377334 Method for controlling image size of integrated circuits on wafers supported on hot plates during post exposure baking of the wafers |
| 04/23/2002 | US6377333 Method of adjusting projection optical apparatus |
| 04/23/2002 | US6377332 Optical member for photolithography and photolithography apparatus |
| 04/23/2002 | US6377329 Substrate processing apparatus |
| 04/23/2002 | US6376985 Gated photocathode for controlled single and multiple electron beam emission |
| 04/23/2002 | US6376849 Charged particle beam exposure apparatus mask and charged particle beam exposure apparatus |
| 04/23/2002 | US6376848 Apparatus and methods for charged-particle-beam microlithography exhibiting reduced aberrations caused by beam deflection to correct errors in stage-position control |
| 04/23/2002 | US6376700 Alicyclic compound |
| 04/23/2002 | US6376632 Norbornene compound containing carboxy groups |
| 04/23/2002 | US6376609 Soldering photoresists for printed circuits |
| 04/23/2002 | US6376392 Forming silicon oxycarbide; antirefelctive coatings |
| 04/23/2002 | US6376292 Self-aligning photolithography and method of fabricating semiconductor device using the same |
| 04/23/2002 | US6376157 Method of manufacturing a semiconductor device, chemical solution to form fine pattern, and semiconductor device |
| 04/23/2002 | US6376155 Before wet etching, surface treating by novolak coating, base treatment, or irradiating the patterned chemical amplification resist layer to form an insoluble layer on the resist layer, improving wet etching resistance |
| 04/23/2002 | US6376154 Pattern forming material and pattern forming method |
| 04/23/2002 | US6376153 Comprising an addition polymerizable ethenically unsaturated compound, photoinitiator, an oxide of at least one of copper, iron, manganese, chromium, cobalt, nickel, and aluminum, halogen-free; storage stability |
| 04/23/2002 | US6376152 Mixture of a compound which generates an acid upon radiation, resin and nitrogen-containing compound |
| 04/23/2002 | US6376151 Positive resist composition |
| 04/23/2002 | US6376150 Mixture containing diazo resin |
| 04/23/2002 | US6376149 Methods and compositions for imaging acids in chemically amplified photoresists using pH-dependent fluorophores |
| 04/23/2002 | US6376139 Exposure amount and a focus value are set in transferring a circuit pattern on a mask onto a resist formed on a wafer by the exposure apparatus |
| 04/23/2002 | US6376137 Charged-particle-beam microlithography apparatus and methods including correction of stage-positioning errors using a deflector |
| 04/23/2002 | US6376136 Scanning a mask formed on sample with charged beams; pattern exposure; applying calibration voltage |
| 04/23/2002 | US6376134 Automated, flow-through, dual side, laser direct imaging process and apparatus which provides capability to simultaneously register and image both sides of substrate in continuous flow-through process |
| 04/23/2002 | US6376096 Nanochannel glass replica membranes |
| 04/23/2002 | US6376013 Multiple nozzles for dispensing resist |
| 04/23/2002 | US6375903 Method and apparatus for synthesis of arrays of DNA probes |
| 04/23/2002 | US6375870 Replicating a nanoscale pattern |
| 04/23/2002 | US6375859 Partial chlorine removal by exposure to plasma; minimization of erosion; removing remainder residue with solvent |
| 04/23/2002 | US6374738 Lithographic imaging with non-ablative wet printing members |
| 04/23/2002 | US6374639 Silica glass and its manufacturing method |
| 04/18/2002 | WO2002032197A1 Method and apparatus for generating x-ray or euv radiation |
| 04/18/2002 | WO2002031932A1 Very narrow band, two chamber, high rep rate gas discharge laser system |
| 04/18/2002 | WO2002031870A1 Projection optical system, aligner comprising the projection optical system, and method for manufacturing apparartus comprising the aligner |
| 04/18/2002 | WO2002031600A1 Deep grayscale etching of silicon |
| 04/18/2002 | WO2002031599A2 Aqueous developer for negative working lithographic printing plates |
| 04/18/2002 | WO2002031598A2 Resist methods and materials for uv and electron-beam lithography with reduced outgassing |
| 04/18/2002 | WO2002031597A1 Reticle storage system |
| 04/18/2002 | WO2002031596A1 Co2-processes photoresists, polymers, and photoactive compounds for microlithography |
| 04/18/2002 | WO2002031595A2 Dissolution inhibitors in photoresist compositions for microlithography |
| 04/18/2002 | WO2002031570A1 Method of evaluating imaging performance |
| 04/18/2002 | WO2002031011A2 Fractionation of resins using a static mixer and a liquid-liquid centrifuge |
| 04/18/2002 | WO2002008347A3 Resist ink composition |
| 04/18/2002 | WO2001098836A3 Method of reducing post-development defects in and around openings formed in photoresist by use of non-patterned exposure |
| 04/18/2002 | WO2001096962A3 Multiphoton absorption method using patterned light |
| 04/18/2002 | WO2001096961A3 Multipass multiphoton absorption method and apparatus |
| 04/18/2002 | WO2001071426A3 Apparatus for generating a laser pattern on a photomask and associated methods |
| 04/18/2002 | WO2001070511A3 Ablatable processes imaging member and method of use |
| 04/18/2002 | WO2000074109A9 Laser writing method and apparatus |
| 04/18/2002 | WO2000066969A9 Interferometry system having a dynamic beam-steering assembly for measuring angle and distance |
| 04/18/2002 | US20020046140 Information providing method and system |
| 04/18/2002 | US20020045674 4-Methylene-1,3-dioxolanes as cross-linking agents |
| 04/18/2002 | US20020045297 Membrane 3D IC fabrication |
| 04/18/2002 | US20020045136 Method of design and fabrication of integrated circuits using regular arrays and gratings |
| 04/18/2002 | US20020045134 Improve resolution of patterns; reduce size difference of patterns in the coarse region and fine region; improve size accuracy of patterns existing at the boundary of the coarse region and fine region. |
| 04/18/2002 | US20020045133 Occurrence of defects in the patterned resist layer can be greatly suppressed resulting in increased reliability of the semiconductor devices and productivity thereof. |
| 04/18/2002 | US20020045132 Pattern forming method and pattern forming apparatus |
| 04/18/2002 | US20020045130 Positive-working photoresist composition and resist patterning method using same |
| 04/18/2002 | US20020045129 Block copolymer comprising at least two blocks A of polymerised mono-vinyl aromatic monomer, at least one block B of polymerised conjugated diene monomer; total polymerised mono-vinyl aromatic monomer content is 5-25% |
| 04/18/2002 | US20020045128 Can be imagewise-exposed by IR radiation from IR lasers and enables direct image formation from digital data of a computer or the like. |
| 04/18/2002 | US20020045127 Polyimides, process for producing the same and photosensitive composition containing the same |
| 04/18/2002 | US20020045126 (A) a compound having a cyclohexene oxide structure, (B) a cationic photoinitiator, (C) an ethylenically unsaturated polymer, (D) a radical photo-initiator, and (E) spherical silica particles |
| 04/18/2002 | US20020045125 Preferred non-aromatic compounds of the invention are conjugated aliphatic and alicyclic compounds which greatly enhance the plasma etch rate of the composition. |
| 04/18/2002 | US20020045124 Aqueous developer soluble polymer, such as a phenolic resin; a compound that reduces the aqueous developer solubility of the polymer such as quaternized nitrogen atom, such as quinolinium compounds and benzothiazolium compounds |
| 04/18/2002 | US20020045123 Photosensitive laminate, process for forming resist pattern using same and positive resist compostion |
| 04/18/2002 | US20020045122 Sulfonium salt compound and resist composition and pattern forming method using the same |
| 04/18/2002 | US20020045121 Self-contained; developer and photosensitive microcapsules encapsulating a photosensitive composition and a color precursor; protective coating on the imaging layer |
| 04/18/2002 | US20020045113 Lithographic projection apparatus, device manufacturing method, device manufactured thereby and gas composition |
| 04/18/2002 | US20020045112 Colored resist material set and color filter |
| 04/18/2002 | US20020045110 Photomask fabrication method, photomask, and exposure method thereof |
| 04/18/2002 | US20020045109 Mask for beam exposure having membrane structure and stencil structure and method for manufacturing the same |
| 04/18/2002 | US20020045106 Isolated areas that contrast with a background and represent features to be printed, arranged generally in an array; and a plurality of assist features smaller than said isolated areas and positioned so as to make said array more symmetric. |