| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/30/2002 | US6381002 Process for controlling a gap between a mask and a workpiece in proximity exposure and a proximity exposure device |
| 04/30/2002 | US6380554 Test structure for electrically measuring the degree of misalignment between successive layers of conductors |
| 04/30/2002 | US6380518 Heat treatment apparatus and substrate processing system |
| 04/30/2002 | US6380339 Repeating units of maleic anhydride, norbornene with an acid-labile group, and a vinyl with a silicon containing group |
| 04/30/2002 | US6380317 Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations |
| 04/30/2002 | US6380101 Providing substrate coated with metal oxide selected from indium zinc oxide and indium tin oxide; providing stamp having indentation and coating with fluoroalkyl phosphonic acid compound; positioning coated stamp on surface of metal oxide |
| 04/30/2002 | US6380077 Method of forming contact opening |
| 04/30/2002 | US6380006 Infiltrating solution of organic solvent into film and reflowing, etching exposed region using film as mask |
| 04/30/2002 | US6379895 Photolithographic and other means for manufacturing arrays |
| 04/30/2002 | US6379875 Removal of polymeric material from electronic substrate |
| 04/30/2002 | US6379874 Using block copolymers as supercritical fluid developable photoresists |
| 04/30/2002 | US6379871 Method for fabricating a mask for a LIGA process |
| 04/30/2002 | US6379870 Coating with dielectric, depositing photoresist, imagewise patterning and development, etching, cleaving across trenches; removal of oxidized portions with solvent; evaluation for defects |
| 04/30/2002 | US6379869 Method of improving the etch resistance of chemically amplified photoresists by introducing silicon after patterning |
| 04/30/2002 | US6379868 Lithographic process for device fabrication using dark-field illumination |
| 04/30/2002 | US6379867 Moving exposure system and method for maskless lithography system |
| 04/30/2002 | US6379866 Stereolithography utilizing photosensitive compound comprising epoxide, aromatic/cylcoaliphatic acrylic material, hydroxy compound, and photoinitiator which is cured with actinic radition |
| 04/30/2002 | US6379865 Protective coatings deposited by electrophoresis; high electrical resistance; |
| 04/30/2002 | US6379862 Phenolic resins comprising methylolated bisphenols condensed with phenols; alkali-soluble resin, acid generator, and crosslinking agent; heat resistance; liquid crystal displays; semiconductors |
| 04/30/2002 | US6379861 Poly(meth)acrylate ester with tertiary or quaternary carbon and photoactive compound; high resolution relief images; chemically-amplified positives |
| 04/30/2002 | US6379860 Positive photosensitive composition |
| 04/30/2002 | US6379859 Positive photoresist composition and process for forming resist pattern using same |
| 04/30/2002 | US6379851 Agglomerating flashes during energy beam lithography; defining cell upon impact of flash; writing subsequent flash; determination if termination; constructing library of standard cells; integrated circuits |
| 04/30/2002 | US6379849 Method for forming binary intensity masks |
| 04/30/2002 | US6379848 Generating photomask; cell includes test pattern and reference marker positioned to orient crosshair in microscope to evaluate degree of corner rounding; determination of pass/fail; semiconductors |
| 04/30/2002 | US6379847 Photolithography; computer controlled |
| 04/30/2002 | US6379778 Method of checking the accuracy of the result of a multistep etching process |
| 04/30/2002 | US6379773 Multilayer; plastic layer and patterned polytetrafluoroethylene |
| 04/30/2002 | US6379744 Spinning |
| 04/30/2002 | US6379576 Systems and methods for variable mode plasma enhanced processing of semiconductor wafers |
| 04/30/2002 | US6379558 Process for treating development waste liquor |
| 04/30/2002 | US6379057 Resist developing process |
| 04/30/2002 | US6379014 Graded anti-reflective coatings for photolithography |
| 04/30/2002 | US6378672 Active vibration isolation device and its control method |
| 04/25/2002 | WO2002033492A1 Nonlinear image distortion correction in printed circuit board manufacturing |
| 04/25/2002 | WO2002033491A2 Aqueous developer for lithographic printing plates |
| 04/25/2002 | WO2002033490A1 Method and apparatus for developing photosensitive resin relief printing plate |
| 04/25/2002 | WO2002033489A2 Compositions for microlithography |
| 04/25/2002 | WO2002033488A1 Positive photosensitive resin composition, positive photosensitive dry film and method for forming patterns |
| 04/25/2002 | WO2002033487A1 Negative photosensitive resin composition, negative photosensitive dry film and method for forming patterns |
| 04/25/2002 | WO2002033485A1 Silica-based light-weight euv lithography stages |
| 04/25/2002 | WO2002033467A1 8-mirrored microlithographic projector lens |
| 04/25/2002 | WO2002033033A1 Stabilized alkaline compositions for cleaning microelectronic substrates |
| 04/25/2002 | WO2002033026A1 Blends of quinone alkide and nitroxyl compounds as polymerization inhibitors |
| 04/25/2002 | WO2002032966A1 Photosensitive resin composition, solder resist comprising the same, cover lay film, and printed circuit board |
| 04/25/2002 | WO2001096915A3 Microfabrication of organic optical elements |
| 04/25/2002 | WO2001096452A3 Method for making or adding structures to an article |
| 04/25/2002 | US20020049287 Novel polymers for photoresist and photoresist compositions using the same |
| 04/25/2002 | US20020048922 Semiconductor processing methods and structures for determining alignment during semiconductor wafer processing |
| 04/25/2002 | US20020048895 Method of improving planarity of a photoresist |
| 04/25/2002 | US20020048857 System for manufacturing semiconductor device utilizing photolithography technique, method of manufacturing semiconductor device, and semiconductor device manufactured thereby |
| 04/25/2002 | US20020048834 Method of increasing the conductivity of a transparent conductive layer |
| 04/25/2002 | US20020048833 Manufacturing method and manufacturing device of microstructure |
| 04/25/2002 | US20020048731 Pressurizing supercritical carbon dioxide and stripper chemical, then flushing |
| 04/25/2002 | US20020048730 For front or back plate of panel, comprises conductive paste and black pigment |
| 04/25/2002 | US20020048726 Photosensitive polyimide precursor and its use for pattern formation |
| 04/25/2002 | US20020048725 Negative working photosensitive lithographic printing plate |
| 04/25/2002 | US20020048724 Acrylic resin containing hexafluoroisopropanol units having high transmittance to ultraviolet radiation having high transparency, substrate adhesion, alkali development, and acid-elimination capability for lithographic microprocessing |
| 04/25/2002 | US20020048723 Photoresist composition for resist flow process |
| 04/25/2002 | US20020048722 Planographic printing plate and method of producing the same |
| 04/25/2002 | US20020048721 Photosensitive composition and photosensitive lithographic printing plate |
| 04/25/2002 | US20020048720 Positive photoresist composition comprises a resin having a specific silicon-containing group on the side chain, the solubility of which resin in an akali developer increases under action of an acid |
| 04/25/2002 | US20020048719 Ion-type photoacid generator containing naphthol and photosensitive polyimide composition prepared by using the same |
| 04/25/2002 | US20020048717 Photocurable liquid resin composition |
| 04/25/2002 | US20020048715 Photoresist adhesive and method |
| 04/25/2002 | US20020048714 Subjecting the surface of the aluminum alloy plate to alkali etching followed by an electrochemical gaining treatment |
| 04/25/2002 | US20020048709 Color filter array having a yellow filter layer |
| 04/25/2002 | US20020048708 For making a mask for optically transferring a lithographic pattern corresponding to an integrated circuit from the mask onto semiconductor substrate, using an optical exposure tool |
| 04/25/2002 | US20020048707 Controlled annular illumination |
| 04/25/2002 | US20020048631 Using polyvinylphenols substituted with alkoxymethyl groups and with acid-unstabilizing groups; acid generator; carboxymethyl-substituted aromatic compound |
| 04/25/2002 | US20020048630 Constructed to prevent corners from peeling and raising off a substrate; has a spiral configuration and includes straight lines and corners connected to the straight lines. |
| 04/25/2002 | US20020048341 X-ray exposure apparatus and method, semiconductor manufacturing apparatus, and microstructure |
| 04/25/2002 | US20020048294 Wavemeter for gas discharge laser |
| 04/25/2002 | US20020048288 Laser spectral engineering for lithographic process |
| 04/25/2002 | US20020048096 Optical element deformation system |
| 04/25/2002 | US20020048085 Optical unit and optical instrument having the same |
| 04/25/2002 | US20020048026 Laser interferometer displacement measuring system, exposure apparatus, and elecron beam lithography apparatus |
| 04/25/2002 | US20020048020 Process and apparatus for manufacturing semiconductor device |
| 04/25/2002 | US20020048018 Method for measuring coma aberration in optical system |
| 04/25/2002 | US20020048009 Balanced positioning system for use lithographic apparatus |
| 04/25/2002 | US20020048008 Projection exposure apparatus |
| 04/25/2002 | US20020048007 Illuminance measurement apparatus, exposure apparatus, and exposure method |
| 04/25/2002 | US20020048006 Scan type projection exposure apparatus and device manufacturing method using the same |
| 04/25/2002 | US20020048004 Environmental control apparatus for exposure apparatus |
| 04/25/2002 | US20020048003 Extreme-UV lithography vacuum chamber zone seal |
| 04/25/2002 | US20020048002 Extreme-UV lithography vacuum chamber zone seal |
| 04/25/2002 | US20020047967 Liquid-crystal-on-silicon display with photolithographic alignment posts and optical interference layers |
| 04/25/2002 | US20020047542 Exposure system |
| 04/25/2002 | US20020047499 Packaged strain actuator |
| 04/25/2002 | US20020047321 Linear motors and stages comprising same that produce reduced magnetic fields at an optical axis for charged-particle-beam lithography |
| 04/25/2002 | US20020047234 Sheet feeder and sheet feeding method for plate-shaped mebers |
| 04/25/2002 | US20020047229 Photopolymerization, especially using lasers, to form multilayer coatings of shaped articles |
| 04/25/2002 | US20020047202 Semiconductor wafer assemblies comprising photoresist over silicon nitride materials |
| 04/25/2002 | US20020047095 Method and device for correcting pattern film on a semiconductor substrate |
| 04/25/2002 | US20020047089 Optical proximity effect correcting method and mask data forming method in semiconductor manufacturing process, which can sufficiently correct optical proximity effect, even under various situations with regard to size and shape of design pattern, and space width and position relation between design patterns |
| 04/25/2002 | US20020046809 Placing the semiconductor wafer inside the vacuum plasma etching device, selectively exposing the photoresist pattern to ultraviole light while the semiconductor wafer is inside the vacuum plasma etching device, etching the wafer |
| 04/25/2002 | US20020046703 Semi-spherical ridge portion having apex formed by abutting molds; upwardly sloping ramp prevents trapped air bubbles |
| 04/25/2002 | US20020046671 Printing plate receiving guide mechanism and method of receiving and guiding printing plate |
| 04/25/2002 | DE10136075A1 Belichtungsverfahren Exposure method |
| 04/25/2002 | DE10134162A1 Neuartiges Copolymeres, Photoresistzusammensetzung und Verfahren zur Herstellung eines Photoresistmusters mit hohem Seitenverhältnis Novel copolymer, the photoresist composition and process for producing a photoresist pattern with a high aspect ratio |