| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/07/2002 | US6383709 Positive resist composition comprising N-(n-octylsulfonyloxy) succinimide |
| 05/07/2002 | US6383708 Positive resist composition |
| 05/07/2002 | US6383707 Multilayer element with support |
| 05/07/2002 | US6383697 Lithographic imaging and printing, photoresists with mask, demagnification |
| 05/07/2002 | US6383694 Method of manufacturing a color filter for a reflective liquid crystal display |
| 05/07/2002 | US6383693 Transparent sustrate, blanket masking layer and photoresists and latent image patterns |
| 05/07/2002 | US6383692 Flexographic printing plate precursor comprising a (photo)thermographic recording layer |
| 05/07/2002 | US6383690 Platemaking system and method using an imaging mask made from photochromic film |
| 05/07/2002 | US6383357 Three-dimensional metallic structure |
| 05/07/2002 | US6383331 Device for discharging two or more media with media nozzles |
| 05/02/2002 | WO2002035588A1 Production method of semiconductor device and production system of semiconductor device |
| 05/02/2002 | WO2002035288A1 System and method for facilitating wafer alignment by mitigating effects of reticle rotation on overlay |
| 05/02/2002 | WO2002035287A2 Edge bead remover for thick film photoresists |
| 05/02/2002 | WO2002035273A1 Catadioptric system and exposure device having this system |
| 05/02/2002 | WO2002034714A1 Base-proliferating prepolymers |
| 05/02/2002 | WO2002034675A1 Process for recovering onium hydroxides from solutions containing onium compounds |
| 05/02/2002 | WO2002016466A9 Polyester film as support for dry film resist |
| 05/02/2002 | WO2002016106A3 Differentially cured materials and process for forming same |
| 05/02/2002 | WO2002008832A3 Method for an improved developing process in wafer photolithography |
| 05/02/2002 | WO2002006898A3 Material and method for making an electroconductive pattern |
| 05/02/2002 | WO2001096959A3 Multidirectional photoreactive absorption method |
| 05/02/2002 | WO2001096958A3 Process for producing microfluidic articles |
| 05/02/2002 | WO2001077716A3 High fill-factor microlens array and fabrication method |
| 05/02/2002 | WO2001042853A3 Photoresist composition for deep uv radiation |
| 05/02/2002 | WO2000054107A9 Step and flash imprint lithography |
| 05/02/2002 | US20020052301 Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
| 05/02/2002 | US20020052127 Method of manufacturing anti-reflection layer |
| 05/02/2002 | US20020052125 Applying organosilicate precursor comprising curable polymers based on divinylsiloxane-bis-benzocyclobutene or hydrolyzed products of alkoxysilanes or acyloxysilanes; etch-stop layer |
| 05/02/2002 | US20020052122 Polypropylene and a triclosan sodium salt physically trapped within the fibers |
| 05/02/2002 | US20020052114 Enhanced resist strip in a dielectric etcher using downstream plasma |
| 05/02/2002 | US20020052107 Wiring forming method |
| 05/02/2002 | US20020052100 Photomask and method for manufacturing the same |
| 05/02/2002 | US20020052088 Method of manufacturing photomask, photomask, and method of manufacturing semiconductor integrated circuit device |
| 05/02/2002 | US20020051944 Light of a specific wavelength, which hardens a plating resist, is absorbed by the catalytic layer and does not cause any halation at a boundary between the catalytic layer and the plating resist |
| 05/02/2002 | US20020051943 Method of manufacturing an electronic device and a semiconductor integrated circuit device |
| 05/02/2002 | US20020051942 Photo-or heat-curable resin composition and multilayer printed wiring board |
| 05/02/2002 | US20020051940 Photoresist monomer comprising bisphenol derivatives and polymers thereof |
| 05/02/2002 | US20020051938 Vinylphenol-cyclohexyl methacrylate-2,6-difluorostyrene terpolymer |
| 05/02/2002 | US20020051937 Polymers, resist compositions and patterning process |
| 05/02/2002 | US20020051936 Polymers, resist compositions and patterning process |
| 05/02/2002 | US20020051935 Resist compositions and patterning process |
| 05/02/2002 | US20020051934 Negative image-recording material |
| 05/02/2002 | US20020051933 Positive photosensitive composition |
| 05/02/2002 | US20020051932 Photoresists for imaging with high energy radiation |
| 05/02/2002 | US20020051929 Using a fluorine-containing polymer in the photosensitive resin composition to give high contrast of printing plate image while maintaining press life |
| 05/02/2002 | US20020051928 Crosslinked polymeric particles and a photoactive component, wherein the polymeric particles comprise cleavable group(s); free of surfactant; forming relief images |
| 05/02/2002 | US20020051927 Using a specific boron anion type photopolymerization initiator; high contrast images |
| 05/02/2002 | US20020051926 Cyanine-based organic dyes, photopolymerizable compositions, and recording materials |
| 05/02/2002 | US20020051915 Manufacturing apparatus for printed boards, manufacturing method of printed boards and the printed board |
| 05/02/2002 | US20020051913 Method and apparatus for making photomasks with improved inside corner resolution |
| 05/02/2002 | US20020051866 Differentially cured materials and process for forming same |
| 05/02/2002 | US20020051864 Laminated substrate including electroconductive film layer and layer of polytetrafluorethylene etched with synchrotron radiation light for use in plastic machinery |
| 05/02/2002 | US20020051644 Substrate processing apparatus |
| 05/02/2002 | US20020051567 Method of adjusting a lithographic tool |
| 05/02/2002 | US20020051564 Method and device for optically monitoring fabrication processes of finely structured surfaces in a semiconductor production |
| 05/02/2002 | US20020051478 Discharge laser with porous insulating layer covering anode discharge surface |
| 05/02/2002 | US20020051358 System and method for providing a lithographic light source for a semiconductor manufacturing process |
| 05/02/2002 | US20020051127 Method of lithography |
| 05/02/2002 | US20020051126 Exposure apparatus |
| 05/02/2002 | US20020051125 Scanning exposure apparatus and method |
| 05/02/2002 | US20020051124 Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
| 05/02/2002 | US20020051123 Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
| 05/02/2002 | US20020050576 Scanning exposure method and apparatus |
| 05/02/2002 | US20020050572 Exposure apparatus, device manufacturing method and environmental control method of exposure apparatus |
| 05/02/2002 | US20020050571 Long stroke mover for a stage assembly |
| 05/02/2002 | US20020050247 Device for providing solution |
| 05/02/2002 | US20020050220 Deformable stamp for patterning three-dimensional surfaces |
| 05/02/2002 | EP1202329A2 Mask Restraining method and apparatus |
| 05/02/2002 | EP1202291A2 Illumination system with a grid unit |
| 05/02/2002 | EP1202119A1 Method and apparatus for fast aerial image simulation |
| 05/02/2002 | EP1202118A2 Device for step-and-repeat exposure of a substrate |
| 05/02/2002 | EP1202117A1 Exposure method and exposure apparatus |
| 05/02/2002 | EP1202101A2 Variable illumination system |
| 05/02/2002 | EP1202100A2 Illumination system with reduced heat load |
| 05/02/2002 | EP1201638A1 Photocurable composition containing iodonium salt compound |
| 05/02/2002 | EP1201425A1 Method for producing waterless lithographic printing plates |
| 05/02/2002 | EP1201424A1 Printing plate receiving guide mechanism and method of receiving and guiding printing plate |
| 05/02/2002 | EP1200987A2 Method of preparing a semiconductor substrate for subsequent silicide formation |
| 05/02/2002 | EP1200979A1 Minimization of electron fogging in electron beam lithography |
| 05/02/2002 | EP1200978A1 Electron beam column using high numerical aperture illumination of the photocathode |
| 05/02/2002 | EP1200879A1 Control of the distribution of lighting in the exit pupil of an euv lighting system |
| 05/02/2002 | EP1200878A2 Multi mirror system for an illumination system |
| 05/02/2002 | EP1200854A1 Fluoride lens crystal for optical microlithography systems |
| 05/02/2002 | EP1200448A1 Organo-silicon compounds and their use as photoinitiators |
| 05/02/2002 | EP1200341A1 Patterned carbon nanotube films |
| 05/02/2002 | DE10144659A1 Position measuring device for detecting the relative position of a scanning unit, comprising at least one scanning grating unit, a deviating element in the form of a ridge prism, and a plurality of optoelectric detectors |
| 05/02/2002 | DE10053587A1 Beleuchtungssystem mit variabler Einstellung der Ausleuchtung Lighting system with variable adjustment of illumination |
| 05/02/2002 | DE10048151A1 Photomaske und ihre Verwendung zum lithographischen Strukturieren einer Photoresistschicht und zum Herstellen von magnetischen Speicherelementen Photomask, and their use for the lithographic patterning of a photoresist layer and for the manufacture of magnetic memory elements |
| 05/01/2002 | CN1347519A Method for maximizing integrated circuit die production |
| 05/01/2002 | CN1347518A Method for forming micro-pattern on substrate |
| 05/01/2002 | CN1347268A Method for mfg. electroluminescent element |
| 05/01/2002 | CN1347137A Filmforming method and device |
| 05/01/2002 | CN1347136A Liquid state film drying method and device |
| 05/01/2002 | CN1347013A Process for stripping polyvinyl amine film in procedure of preparing photoelectric and semiconductor devices |
| 05/01/2002 | CN1346747A Shaft seal structure and method for mfg. planographic printing plate |
| 05/01/2002 | CN1346746A Component delivery device and method for mfg. planographic printing plate |
| 04/30/2002 | US6381257 Very narrow band injection seeded F2 lithography laser |
| 04/30/2002 | US6381077 Scanning microlithographic apparatus and method for projecting a large field-of-view image on a substrate |
| 04/30/2002 | US6381005 Mask holding device, exposure apparatus and device manufacturing method |
| 04/30/2002 | US6381004 Exposure apparatus and device manufacturing method |