| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/14/2002 | US6387012 A metal complex solution comprising an organic solvent, and a complex composed of an organic acid salt of at least one metal and an organic amine or organic ketone compound, dissolved in the organic solvent |
| 05/14/2002 | US6386715 Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
| 05/14/2002 | CA2361905A1 Apparatus for automatic plate-coating and-cleaning |
| 05/10/2002 | WO2002037629A1 Annealed copper alloy electrodes for fluorine containing gas discharge lasers |
| 05/10/2002 | WO2002037626A1 Anode with porous insulating layer for discharge lasers |
| 05/10/2002 | WO2002037574A1 Method of patterning thin film and tft array substrate using it and production method therefor |
| 05/10/2002 | WO2002037545A1 Exposure method and system |
| 05/10/2002 | WO2002037544A1 Electron beam exposure apparatus and electron beam exposure method |
| 05/10/2002 | WO2002037538A2 Amorphous carbon layer for improved adhesion of photoresist |
| 05/10/2002 | WO2002037186A1 Process control for micro-lithography |
| 05/10/2002 | WO2002037185A1 Photosensitive resin composition |
| 05/10/2002 | WO2002037184A1 Positive photosensitive resin composition, process for its preparation, and semiconductor devices |
| 05/10/2002 | WO2002037183A2 Inverse resist coating process |
| 05/10/2002 | WO2002037144A1 Optical lithography and a method of inducing transmission in optical lithography preforms |
| 05/10/2002 | WO2002036652A2 Photopatternable sorbent and functionalized films |
| 05/10/2002 | WO2002036646A1 High-molecular compounds for photoresists, monomeric compounds, photosensitive resin compositions, method for forming patterns with the compositions, and process for production of electronic components |
| 05/10/2002 | WO2002036533A1 Monomers having electron-withdrawing groups and processes for preparing the same |
| 05/10/2002 | WO2001096952A3 Multicolor imaging using multiphoton photochemical processes |
| 05/10/2002 | WO2001096917A3 Multiphoton curing to provide encapsulated optical elements |
| 05/10/2002 | WO2001028950A9 A method and apparatus for treating a substrate with an ozone-solvent solution |
| 05/09/2002 | US20020056074 System and method for generating a flat mask design for projecting a circuit pattern to a spherical semiconductor device |
| 05/09/2002 | US20020055550 Containing units from 4,4'-(9H-fluoren-9-ylidene) bis((2-propenyl) phenol) |
| 05/09/2002 | US20020055276 Equipment for fabricating a semiconductor product |
| 05/09/2002 | US20020055264 Method for forming photoresist pattern and manufacturing method of magnetoresistive effect thin-film magnetic head |
| 05/09/2002 | US20020055252 Method for shrinking critical dimension |
| 05/09/2002 | US20020055066 Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate |
| 05/09/2002 | US20020055065 Polymers having silicon-containing acetal or ketal functional groups |
| 05/09/2002 | US20020055064 Anti-reflective coating composition, multilayer photoresist material using the same, and method for forming pattern |
| 05/09/2002 | US20020055063 Coating composition for chemically amplified positive resist and method of patterning resist using the same |
| 05/09/2002 | US20020055062 Photosensitive resin composition and circuit board |
| 05/09/2002 | US20020055061 A photoactive component and a resin with photoacid-labile deblocking groups and substituted with electronegative moieties; positives; imaged at sub-200-300 nm, preferably 157 nm; microstructure; printed circuits |
| 05/09/2002 | US20020055060 Novel polymers and photoresist compositions for short wavelength imaging |
| 05/09/2002 | US20020055059 Radiation sensitive resin composition, cathode separator and el display device |
| 05/09/2002 | US20020055058 Lithographic printing plate precursor |
| 05/09/2002 | US20020055056 System preferably using microcapsule technology, and a method of applying a photographic image to a receptor element; CYCOLOR films or prints having images directly transferred e.g. shirt, without requiring the use of commercial equipment |
| 05/09/2002 | US20020055049 Method and apparatus for forming resist pattern |
| 05/09/2002 | US20020055048 For transferring a pattern onto a photosensitive layer by a photolithography process |
| 05/09/2002 | US20020055000 Efficiency; coating materials for deep ultraviolet photolithography |
| 05/09/2002 | US20020054981 Applying imagewise an insolubilizing chemical to the coating for imaging a printing plate having a coating comprising diazo compounds |
| 05/09/2002 | US20020054660 Projection exposure apparatus and method, and illumination optical system thereof |
| 05/09/2002 | US20020054398 Method and apparatus for modifying raster data |
| 05/09/2002 | US20020054284 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 05/09/2002 | US20020054283 Exposure apparatus, method for manufacturing thereof and method for manufacturing microdevice |
| 05/09/2002 | US20020054282 Projection exposure apparatus |
| 05/09/2002 | US20020054280 Driving apparatus and exposure apparatus |
| 05/09/2002 | US20020054231 Exposure method, exposure apparatus, and process of production of device |
| 05/09/2002 | US20020053748 Phaseshift mask and manufacturing the same |
| 05/09/2002 | US20020053644 Exposure apparatus and control method for correcting an exposure optical system on the basis of an estimated magnification variation |
| 05/09/2002 | US20020053321 Coating film forming apparatus and coating film forming method |
| 05/09/2002 | US20020053319 Solution treatment method and solution treatment unit |
| 05/09/2002 | US20020053296 Method of lithographic printing with a reusable substrate |
| 05/08/2002 | EP1204003A1 Process for developing exposed radiation-sensitive printing plate precursors |
| 05/08/2002 | EP1204002A2 EUV lithography system with thin-film coating for protection from laser-produced plasma |
| 05/08/2002 | EP1204001A1 Resist composition and patterning process |
| 05/08/2002 | EP1204000A1 Photosensitive lithographic printing plate |
| 05/08/2002 | EP1203999A2 Photoinitiator comprising a borane and an electron donating compound |
| 05/08/2002 | EP1203660A1 Lithographic printing plate precursor |
| 05/08/2002 | EP1203427A1 High pulse rate pulse power system with liquid cooling |
| 05/08/2002 | EP1203402A1 Exposure during rework for enhanced resist removal |
| 05/08/2002 | EP1203266A1 Flexible piezoelectric chuck |
| 05/08/2002 | EP1203265A1 Lithography using quantum entangled particles |
| 05/08/2002 | EP1203264A1 Apparatus and method of image enhancement through spatial filtering |
| 05/08/2002 | EP1203257A2 Scanning interferometric near-field confocal microscopy |
| 05/08/2002 | EP1203033A1 Composition that hardens with visible light and use thereof |
| 05/08/2002 | EP1203031A1 Optical devices made from radiation curable fluorinated compositions |
| 05/08/2002 | EP1027702B1 A method of manufacturing a stamper for producing optical discs, a stamper thus obtained and an optical disc obtained by using such a stamper |
| 05/08/2002 | EP1007333B1 Fabrication method and apparatus for fabricating an object as a plurality of successive laminae |
| 05/08/2002 | DE10141422A1 Verfahren zur Prüfung auf Maskenfehler und Gerät zur Elektronenstrahlbelichtung Method to check for errors and mask device for electron beam exposure |
| 05/08/2002 | DE10126946A1 Projection objective lens e.g. for lithography, includes positive refractive power lens in group of negative refractive power lenses |
| 05/08/2002 | DE10054070A1 Precision process to determine the position of moving wafer bench and photo mask bench relative to each other |
| 05/08/2002 | DE10053899A1 Bearing system for precision optical system minimises distortion from dynamic forces |
| 05/08/2002 | CN1348602A Exposure method and device |
| 05/08/2002 | CN1348553A Method for patterning thin films |
| 05/08/2002 | CN1348552A Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system |
| 05/08/2002 | CN1347808A Anti-fake seal engraving process |
| 05/08/2002 | CN1084485C Optical mask with developing rate measuring pattern and method for measuring development rate uniformity |
| 05/07/2002 | US6385498 Manufacturing method for microlithography apparatus |
| 05/07/2002 | US6385497 Remote maintenance system |
| 05/07/2002 | US6385352 System and method for reading and comparing two-dimensional images |
| 05/07/2002 | US6385290 X-ray apparatus |
| 05/07/2002 | US6384900 Photosensitive media cartridge having an ambient condition sensor |
| 05/07/2002 | US6384899 Lithographic projection apparatus |
| 05/07/2002 | US6384898 Projection exposure apparatus |
| 05/07/2002 | US6384894 Developing method and developing unit |
| 05/07/2002 | US6384264 Nitration of an aromatic aldehyde/ketone to an o-nitro derivative and reducing it to an alcohol, reacting the alcohol with a mono/diisocyanates to provide a 2-nitrobenzyl urethane capable of generating free amines upon irradiation |
| 05/07/2002 | US6384169 Polyhydroxystyrene with acid labile group, modified at ends with alkyls, esters or alcohols; increased dissolution rate, high sensitivity and resolution; resist patterns have plasma etching resistance, heat resistance, reproducibility |
| 05/07/2002 | US6384103 Composition containing alkali-soluble resin and photosensitizer having quinonediazide group, wherein resin is novolak treated by thin film distillation method to partially and selectively remove monomers and dimers |
| 05/07/2002 | US6383947 Anti-reflective coating used in the fabrication of microcircuit structures in 0.18 micron and smaller technologies |
| 05/07/2002 | US6383944 Micropatterning method |
| 05/07/2002 | US6383940 Exposure method and apparatus |
| 05/07/2002 | US6383724 Organic removal process |
| 05/07/2002 | US6383723 Method to clean substrate and improve photoresist profile |
| 05/07/2002 | US6383719 Forming patterns in photosensitive coatings on substrates, masking, light sensitive, illumination and exposure |
| 05/07/2002 | US6383718 Photomask and pattern forming method employing the same |
| 05/07/2002 | US6383717 Images formed by exposure of radiation sensitive layer and development and filtration |
| 05/07/2002 | US6383716 Resin with bis(3,5-di-t-butyl-4-hydroxy-benzyl) sulfide. the photosensitive resin composition of this invention, as it contains a stabilizer |
| 05/07/2002 | US6383715 Strongly water-soluble photoacid generator resist compositions |
| 05/07/2002 | US6383713 Chemical amplification type positive resist composition |
| 05/07/2002 | US6383712 Polymer-bound sensitizer |
| 05/07/2002 | US6383710 Hand application to fabric of heat transfers imaged with color copiers/printers |