| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 05/16/2002 | WO2002039185A1 Optical recording materials |
| 05/16/2002 | WO2002039184A1 Optical recording materials |
| 05/16/2002 | WO2002039183A1 Optical recording materials |
| 05/16/2002 | WO2002039182A1 Systems and methods for exposing substrate periphery |
| 05/16/2002 | WO2002039066A1 Position measuring device and method for determining a position |
| 05/16/2002 | WO2002017383A3 Flexure based translation stage |
| 05/16/2002 | WO2002014952A3 Scan butting error reduction in a raster scan pattern generation system |
| 05/16/2002 | WO2001098012A3 FOUR KHz GAS DISCHARGE LASER |
| 05/16/2002 | WO2001079374A3 Stabilized cationically polymerizable composition, and adhesive film and conductor circuit comprising the same |
| 05/16/2002 | WO2001050161A9 CALCIUM FLUORIDE (CaF2) STRESS PLATE AND METHOD OF MAKING THE SAME |
| 05/16/2002 | WO2001036901A9 Systems and methods for quantifying nonlinearities in interferometry systems |
| 05/16/2002 | US20020059557 Method of forming fine patterns in semiconductor device |
| 05/16/2002 | US20020058425 Method of structuring a photoresist layer |
| 05/16/2002 | US20020058397 Hydrogen plasma photoresist strip and polymeric residue cleanup process for low dielectric constant materials |
| 05/16/2002 | US20020058383 Amorphous carbon layer for improved adhesion of photoresist and method of fabrication |
| 05/16/2002 | US20020058370 Method for forming metal wire interconnection in semiconductor devices using dual damascene process |
| 05/16/2002 | US20020058348 Pattern formation method using two alternating phase shift masks |
| 05/16/2002 | US20020058207 Method for forming a positive image |
| 05/16/2002 | US20020058206 Positive resist composition |
| 05/16/2002 | US20020058205 High molecular weight silicone compounds, resist compositions, and patterning method |
| 05/16/2002 | US20020058204 Planarizing underlayers for multilayer lithography are characterized by the presence of a polymer containing a cyclic ether monomer, a saturated polycyclic monomer, and aromatic monomer, and an acid generator |
| 05/16/2002 | US20020058203 Chemically amplified resist compositions |
| 05/16/2002 | US20020058202 Positive-working photoresist composition and photosensitive material using same |
| 05/16/2002 | US20020058201 Radiation-sensitive resin composition |
| 05/16/2002 | US20020058200 A positive resist comprising: a resin capable of decomposing by the action of an acid to increase solubility in an alkali developer, and a compound capable of generating aromatic sulfonic acid substituted with a fluorine containing group |
| 05/16/2002 | US20020058199 Novel polymers and photoresist compositions comprising electronegative groups |
| 05/16/2002 | US20020058198 Applying a photoresist formulation on a substrate, comprising a resin and a photoactive component, the resin comprising fluorine-substituted phenolic units and photoacid-labile groups, exposing and developing the photoresist |
| 05/16/2002 | US20020058197 A negative resist composition comprising a constituent component which has a vinyl ether structure protected with an acetal in a molecule is a film forming polymer soluble in basic solution and has an alkali soluble group |
| 05/16/2002 | US20020058196 Uv-absorbing support layers and flexographic printing elements comprising same |
| 05/16/2002 | US20020057724 Performance control system and method for gas discharge lasers |
| 05/16/2002 | US20020057495 Measuring system for performance of imaging optical system |
| 05/16/2002 | US20020057427 Method and apparatus for article inspection including speckel reduction |
| 05/16/2002 | US20020057425 Exposure apparatus, device manufacturing method, gas substituting apparatus, and gas substituting method |
| 05/16/2002 | US20020057424 Exposure apparatus, method of manufacturing semiconductor devices, semiconductor manufacturing plant, method of maintaining exposure apparatus, and position detector |
| 05/16/2002 | US20020057423 Exposure apparatus |
| 05/16/2002 | US20020057422 Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method using the apparatus, and semiconductor manufacturing factory |
| 05/16/2002 | US20020056816 Surface plasmon enhanced illumination system |
| 05/16/2002 | US20020056815 6-mirror microlithography projection objective |
| 05/16/2002 | US20020056813 Target locking system for electron beam lithography |
| 05/16/2002 | US20020056640 Method for electrophoresis in polycarbonate electrophoretic devices |
| 05/16/2002 | US20020056512 Laminator and laminating method for lamination to substrate |
| 05/16/2002 | US20020056382 Replaceable imaging device for creating images on printing forms |
| 05/16/2002 | US20020056205 Alignment marks |
| 05/16/2002 | DE10147132A1 Herstellungssystem für Halbleiterbauteile sowie Elektronenstrahl-Belichtungsvorrichtung Manufacturing system for semiconductor devices as well as electron beam exposure apparatus |
| 05/16/2002 | DE10128904A1 Substrat-Verarbeitungsvorrichtung Substrate processing apparatus |
| 05/16/2002 | DE10054121A1 Structuring of photoresist layer in integrated circuit manufacture involves exposing photoresist layer comprising film-forming polymer and photosensitive acid generator to light, contacting layer with base and developing after heating |
| 05/15/2002 | EP1205807A1 Exposure apparatus and exposure method |
| 05/15/2002 | EP1205806A1 Method for exposing a semiconductor wafer |
| 05/15/2002 | EP1205805A1 Anti-reflection coating forming composition |
| 05/15/2002 | EP1205804A2 Photosensitive resin composition and circuit board |
| 05/15/2002 | EP1205803A1 Photosensitive composition for sandblasting and photosensitive film using the same |
| 05/15/2002 | EP1205802A1 Photosensitive element, photosensitive element roll, process for producing resist pattern with the same, resist pattern, substrate with overlying resist pattern, process for producing wiring pattern, and wiring pattern |
| 05/15/2002 | EP1205792A1 Apparatus and method for recording or reconstructing colour image information by means of a black & white film |
| 05/15/2002 | EP1205009A1 Aperture coupled slot array antenna |
| 05/15/2002 | EP1204902A1 Apparatus and method for compensating critical dimension deviations across photomask |
| 05/15/2002 | EP1204888A1 Collimator and focusing optic |
| 05/15/2002 | EP1204875A1 System for aligning rectangular wafers |
| 05/15/2002 | EP1015518B1 Isoxindigos useful as colorants and preparation thereof |
| 05/15/2002 | CN1349376A Etching liquid, and mehtod for mfg. flexible distributing board |
| 05/15/2002 | CN1349252A Pattern testing device, explosure equipment control system |
| 05/15/2002 | CN1349246A Semiconductor integrated circuit device mfg. method, and its mask making method |
| 05/15/2002 | CN1349245A Method of improving outline of photoresist pattern |
| 05/15/2002 | CN1349133A Developer solution for silver salt diffusing and transferring aluminium-base offset plate and its use |
| 05/15/2002 | CN1349132A Photosensitive composite |
| 05/15/2002 | CN1349131A Mask used for beam exposing, and mfg. method therefor |
| 05/15/2002 | CN1348864A Super-thin thermosensitive computer direct plate and its making process and developer |
| 05/15/2002 | CN1084680C Device for making seal |
| 05/14/2002 | US6389106 Method and device for producing extreme ultraviolet and soft X-rays from a gaseous discharge |
| 05/14/2002 | US6389052 Laser gas replenishment method |
| 05/14/2002 | US6388823 Optical system, especially a projection light facility for microlithography |
| 05/14/2002 | US6388747 Inspection method, apparatus and system for circuit pattern |
| 05/14/2002 | US6388737 Exposure method and apparatus |
| 05/14/2002 | US6388736 Imaging method using phase boundary masking with modified illumination |
| 05/14/2002 | US6388735 Projection exposure system |
| 05/14/2002 | US6388734 Projection exposure apparatus |
| 05/14/2002 | US6388733 Exposure apparatus with an anti-vibration structure |
| 05/14/2002 | US6388731 Projection aligner and exposure method using the same |
| 05/14/2002 | US6388261 Charged-particle-beam microlithography apparatus and methods exhibiting reduced astigmatisms and linear distortion |
| 05/14/2002 | US6388253 Integrated critical dimension control for semiconductor device manufacturing |
| 05/14/2002 | US6388101 Methacrylic acid ester of 3-hydroxy-3-methyl-1-oxacyclopentan-2-one |
| 05/14/2002 | US6388039 Acrylated resin |
| 05/14/2002 | US6387975 Organometallic compound complex |
| 05/14/2002 | US6387822 Application of an ozonated DI water spray to resist residue removal processes |
| 05/14/2002 | US6387808 Method of correcting topographical effects on a micro-electronic substrate |
| 05/14/2002 | US6387787 Lithographic template and method of formation and use |
| 05/14/2002 | US6387602 Apparatus and method of cleaning reticles for use in a lithography tool |
| 05/14/2002 | US6387600 Multilayer; indium tin oxide, aluminu and protective coatings |
| 05/14/2002 | US6387599 Mixing benzotriazole with development solution |
| 05/14/2002 | US6387598 Pattern forming material and pattern forming method |
| 05/14/2002 | US6387597 Image exposure of photoresist; heating to transition temperature; focusing |
| 05/14/2002 | US6387596 Method of forming resist images by periodic pattern removal |
| 05/14/2002 | US6387595 Exposure to actinic radiation; hardening; lithography printing plates |
| 05/14/2002 | US6387593 Self-trapping and self-focusing of optical beams in photopolymers |
| 05/14/2002 | US6387592 Pattern forming material and pattern forming method |
| 05/14/2002 | US6387590 Positive photoresist composition |
| 05/14/2002 | US6387589 Copolymer; semiconductor |
| 05/14/2002 | US6387587 Mixture of copolymer, acid generator and amine |
| 05/14/2002 | US6387585 Photohardening; multilayer |
| 05/14/2002 | US6387579 Method for direct image processing of printed circuit boards |
| 05/14/2002 | US6387578 Polymethyl methacrylate microstructure; smoothness surfaces |