| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/23/2002 | WO2001070385A3 Method for producing microcapsules having improved wall characteristics |
| 05/23/2002 | WO2001055767A3 Microlithographic reduction projection catadioptric objective |
| 05/23/2002 | US20020062319 Gene expression and evaluation system |
| 05/23/2002 | US20020062206 Method and apparatus for fast aerial image simulation |
| 05/23/2002 | US20020061649 Holding substrate having resist mask formed through an insulating film in chamber of ashing apparatus; applying radio frequency electric power to activate oxygen-containing gas introduced in chamber to perform ashing of resist mask |
| 05/23/2002 | US20020061473 Providing an azo coupled polymer; dissolving the azo coupled polymer in a solvent, and thereby producing an antireflective coating formulation which is suitable for use in photolithography |
| 05/23/2002 | US20020061472 Directing multiple two-dimensional patterns of irradiating energy toward a volume of photosensitive material so that multiple patterns intersect; further processing irradiated photosensitive material to create a persistent 3D structure |
| 05/23/2002 | US20020061471 Exposing predetermined pattern through a phase-shift mask while moving at least one of said phase-shift mask and substrate by a constant distance along an optical axis |
| 05/23/2002 | US20020061470 Depositing layered photoresist above a substrate, patterning the first lower layer using the patterned first upper layer as a hard mask; depositing a second layered photoresist above the first layer photoresist, patterning |
| 05/23/2002 | US20020061469 Projection apparatus, method of manufacturing the apparatus,method of exposure using the apparatus, and method of manufacturing circuit devices by using the apparatus |
| 05/23/2002 | US20020061468 Laser thermal-transfer film |
| 05/23/2002 | US20020061467 Negative-working photoresist composition |
| 05/23/2002 | US20020061466 Adhesiveness to a wafer, and is developable in aqueous tetramethylammonium hydroxide solution, suitable for photolithography |
| 05/23/2002 | US20020061465 Polymer, resist composition and patterning process |
| 05/23/2002 | US20020061464 Positive resist composition |
| 05/23/2002 | US20020061463 Sensitive to high-energy radiation, resolution, and etching resistance |
| 05/23/2002 | US20020061462 Negative resist composition |
| 05/23/2002 | US20020061461 Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same |
| 05/23/2002 | US20020061460 Infrared-imageable recording material and offset printing plates produced from it |
| 05/23/2002 | US20020061459 Hand application to fabric of heat transfers imaged with color copiers/printers |
| 05/23/2002 | US20020061458 Can form a resist pattern mixture including both a dense pattern and an isolation pattern with good shapes and can especially minimize the formation of a back taper shape of an isolation pattern induced by shift of focus |
| 05/23/2002 | US20020061453 Method for forming pattern |
| 05/23/2002 | US20020061245 Processing system and device manufacturing method using the same |
| 05/23/2002 | US20020061243 Wafer stage chamber |
| 05/23/2002 | US20020060815 Method for measuring strength of image forming surface of planographic printing plate, planographic printing plate and packaging structure for planographic printing plates |
| 05/23/2002 | US20020060793 Optical positional displacement measuring apparatus and adjustment method thereof |
| 05/23/2002 | US20020060771 Photosensitive resin composition and liquid crystal display color filter |
| 05/23/2002 | US20020060296 Lithographic apparatus, integrated circuit device manufacturing method, and integrated circuit device manufactured thereby |
| 05/23/2002 | US20020059810 Silica with low compaction under high energy irradiation |
| 05/23/2002 | DE10057141A1 Ultraviolet- and blue-sensitive photosensitizers for photopolymerization comprise 5-(2-(2-oxazolidinylidene)ethylidene)-2,4,6-pyrimidinetriones and related merocyanines |
| 05/23/2002 | DE10056782A1 Method for dynamic manipulation and/or adjustment in the position of a subassembly in an optical system in a sub-mm range, uses actuators with motion detectors and interconnected sensors to move the subassembly |
| 05/23/2002 | CA2429173A1 Radiation curable compositions |
| 05/23/2002 | CA2427923A1 Positive type photosensitive epoxy resin composition and printed circuit board using the same |
| 05/22/2002 | EP1207425A2 Exposure apparatus and maintenance method |
| 05/22/2002 | EP1207424A1 Photosolder resist composition |
| 05/22/2002 | EP1207423A1 Chemically amplifying type positive resist composition |
| 05/22/2002 | EP1207141A1 Synthetic quartz glass member, photolithography apparatus, and method for producing photolithography apparatus |
| 05/22/2002 | EP1207122A2 Package for planographic printing plates and method for packaging planographic printing plates |
| 05/22/2002 | EP1206895A2 Hearing aid |
| 05/22/2002 | EP1206819A1 Narrow band gas discharge laser with gas additive |
| 05/22/2002 | EP1206795A2 Method of etching a wafer layer using multiple layers of the same photoresistant material and structure formed thereby |
| 05/22/2002 | CN1350660A 光敏组合物 Photosensitive composition |
| 05/22/2002 | CN1350659A Methods for patterning polymer films, and use of the methods |
| 05/22/2002 | CN1350321A Method for manufacturing semiconductor integrated circuit device |
| 05/22/2002 | CN1350205A 曝光方法 Exposure method |
| 05/22/2002 | CN1350185A Multi-layer reflector for EUV, its wavefront light run error correcting method and EUV optical system comprising the same |
| 05/22/2002 | CN1350037A Photo-curing composition and its curing method |
| 05/22/2002 | CN1085351C Water base female pattern pre-coating photosensitive plate and making method and usage thereof |
| 05/22/2002 | CN1085350C Positive-negative interoperable chemical amplifying photoresist photoetching process |
| 05/21/2002 | US6393604 Process for preparing data for direct-writing by a charged particle ray, process for verifying data for direct-writing by a charged particle ray, process for displaying data for direct-writing by a charged particle ray, and exposure device |
| 05/21/2002 | US6392825 Assembly comprising an optical element and a mount |
| 05/21/2002 | US6392822 Dual-imaging optical system |
| 05/21/2002 | US6392808 Broad band controlled angle analog diffuser and associated methods |
| 05/21/2002 | US6392800 Radial polarization-rotating optical arrangement and microlithographic projection exposure system incorporating said arrangement |
| 05/21/2002 | US6392793 High NA imaging system |
| 05/21/2002 | US6392792 Method of fabricating reflection-mode EUV diffraction elements |
| 05/21/2002 | US6392752 Phase-measuring microlens microscopy |
| 05/21/2002 | US6392743 Control technique for microlithography lasers |
| 05/21/2002 | US6392742 Illumination system and projection exposure apparatus |
| 05/21/2002 | US6392741 Projection exposure apparatus having active vibration isolator and method of controlling vibration by the active vibration isolator |
| 05/21/2002 | US6392740 Projection exposure apparatus |
| 05/21/2002 | US6392738 Lithographic projection apparatus |
| 05/21/2002 | US6392243 Electron beam exposure apparatus and device manufacturing method |
| 05/21/2002 | US6392240 Sample table for pattern exposure machine |
| 05/21/2002 | US6392229 AFM-based lithography metrology tool |
| 05/21/2002 | US6391800 Method for patterning a substrate with photoresist |
| 05/21/2002 | US6391791 Dry-etching method and apparatus, photomasks and method for the preparation thereof, and semiconductor circuits and methods for the fabrication thereof |
| 05/21/2002 | US6391786 Etching process for organic anti-reflective coating |
| 05/21/2002 | US6391677 Aperture for an exposure apparatus for forming a fine pattern on a semiconductor wafer |
| 05/21/2002 | US6391530 Measuring activity and electrical conductivity of alkaline developer as function of unit throughput to determine amount of hydroxide ion and suppressing agent required to replenish |
| 05/21/2002 | US6391529 (Meth)acrylate, polymer photoresist composition, and pattern forming process making use of the composition |
| 05/21/2002 | US6391526 Thick film low value high frequency inductor, and method of making the same |
| 05/21/2002 | US6391525 Forming template mask comprising silicon oxynitride, nitride, photoresist or low k polymer; etching; high resolution photolithography; microelectronics, semiconductors |
| 05/21/2002 | US6391524 Article having imagable coatings |
| 05/21/2002 | US6391523 Epoxidized polyfunctional bisphenol a-formaldehyde novolak resin and photoacid generator in coating solvent of cyclopentanone |
| 05/21/2002 | US6391521 Resist compositions containing bulky anhydride additives |
| 05/21/2002 | US6391520 Compounds for photoresist and resin composition for photoresist |
| 05/21/2002 | US6391518 Copolymer of 5-norbornene-2,3-dicarboxylic acid and 5-norbornene-2-carboxylate derivatives; semiconductors, photolithography |
| 05/21/2002 | US6391514 Film forming resin, photosensitizer; and alkylene glycol alkyl ether, alkyl amyl ketone, and/or alkyl alkoxy propionate; coating onto silicon wafer; exposure, development, imaging; resolution |
| 05/21/2002 | US6391513 Positively photosensitive resin composition |
| 05/21/2002 | US6391512 Light sensitive layer with acid generator, cyanine dye infrared absorber, binder of novolak, acrylic, or polyvinyltoluene resin; storage stability |
| 05/21/2002 | US6391503 Scanning exposure methods |
| 05/21/2002 | US6391502 Photolithographic process for producing etched patterns on the surface of fine tubes, wires or other three dimensional structures |
| 05/21/2002 | US6391500 Border portion between transparent and opaque portions includes some coated patterned structures; smoothness, roundness; photolithography |
| 05/21/2002 | US6391426 High capacitance storage node structures |
| 05/21/2002 | US6391217 Methods and apparatus for forming submicron patterns on films |
| 05/21/2002 | US6391111 Coating apparatus |
| 05/21/2002 | US6391090 Method for purification of lens gases used in photolithography |
| 05/21/2002 | US6390694 Imaging assembly and media cartridge having cooperating linkage arrangements |
| 05/21/2002 | US6389702 Method and apparatus for motion control |
| 05/21/2002 | US6389686 Process for fabricating a thin multi-layer circuit board |
| 05/21/2002 | CA2037490C Wet-etch process and composition |
| 05/16/2002 | WO2002039793A2 Multi-layer printed circuit board fabrication system and method |
| 05/16/2002 | WO2002039720A2 Apparatus and method for global and local feature extraction in digital images |
| 05/16/2002 | WO2002039491A1 Optical device, exposure device and device manufacturing method |
| 05/16/2002 | WO2002039489A2 Method for removing etch residue resulting from a process for forming a via |
| 05/16/2002 | WO2002039189A1 Pattern transfer device using pc projector |
| 05/16/2002 | WO2002039188A1 Method for exposing a semiconductor wafer |
| 05/16/2002 | WO2002039187A1 Compositions for under-resist film and processes for producing the same, and under-resist films and processes for producing the same |
| 05/16/2002 | WO2002039186A2 Photoacid generators in photoresist compositions for microlithography |