| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/30/2002 | US20020064603 Ink, ink-jet recording method using the same, and photopolymerization initiator |
| 05/30/2002 | US20020064411 Sheet body fixing device |
| 05/30/2002 | US20020064202 Injection seeded F2 laser with pre-injection filter |
| 05/30/2002 | US20020064005 Spin-valve giant magnetoresistive head and method of manufacturing the same |
| 05/30/2002 | US20020063865 Exposure apparatus and a device manufacturing method using the same |
| 05/30/2002 | US20020063856 Stage unit and exposure apparatus |
| 05/30/2002 | US20020063769 Image-recording method and image-recording system |
| 05/30/2002 | US20020063222 Electron beam photolithographic process |
| 05/30/2002 | US20020063221 Gap adjustment apparatus and gap adjustment method for adjusting gap between two objects |
| 05/30/2002 | US20020063212 Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
| 05/30/2002 | US20020062838 Aiming a high- pressure jet of water that contains an activated interface agent at substrate for removing residual photoresist material on a transistor substrate after development of a patterned color photoresist layer |
| 05/30/2002 | US20020062633 Recovery of iron value and concentration of zinc for use as a feed |
| 05/29/2002 | EP1209528A1 Photoresist composition |
| 05/29/2002 | EP1209527A1 Photoresist composition |
| 05/29/2002 | EP1209526A1 Litographic apparatus and integrated circuit device manufacturing method |
| 05/29/2002 | EP1209525A1 Chemical amplification resist composition |
| 05/29/2002 | EP1209524A1 Photosensitive structural body for flexographic printing plate |
| 05/29/2002 | EP1209523A2 Composition of positive photosensitive resin precursor, and display device made thereof |
| 05/29/2002 | EP1209503A2 Lithographic apparatus and device manufacturing method |
| 05/29/2002 | EP1209502A2 Method for the dynamic adjustment of the position of an element in an optical system |
| 05/29/2002 | EP1209500A2 Arrangement for mounting an optical element |
| 05/29/2002 | EP1209492A1 Formation of materials such as waveguides with a refractive index step |
| 05/29/2002 | EP1209184A1 Photosensitive low-permittivity polyimide and method of forming positive polyimide film pattern from the same |
| 05/29/2002 | EP1208973A1 Processless lithographic printing plate |
| 05/29/2002 | EP1208972A1 Method of lithographic printing with a reusable substrate. |
| 05/29/2002 | EP1208592A1 Method and apparatus for run-to-run controlling of overlay registration |
| 05/29/2002 | EP1208408A1 Antireflective coating material for photoresists |
| 05/29/2002 | EP1208399A2 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices |
| 05/29/2002 | EP1208349A1 Interferometers utilizing polarization preserving optical systems |
| 05/29/2002 | EP1208146A1 Screen coating composition and method for applying same |
| 05/29/2002 | EP1208014A2 Positive acting photoresist composition and imageable element |
| 05/29/2002 | EP1207959A1 Individually addressable micro-electromagnetic unit array chips |
| 05/29/2002 | EP1098859A4 Alkaline water-based solution for cleaning metallized microelectronic workpieces and methods of using same |
| 05/29/2002 | EP1031066B1 Photoresist composition containing a condensation polymer |
| 05/29/2002 | EP0966355B1 Method of imaging lithographic printing plates with high intensity laser |
| 05/29/2002 | EP0966354B1 Lithographic printing plates with a sol-gel layer |
| 05/29/2002 | EP0956517B1 Radiation sensitive diazo sulfo-acrylic adducts |
| 05/29/2002 | EP0954890A4 Excimer laser with greater spectral bandwidth and beam stability |
| 05/29/2002 | EP0910480B1 Device for wet coating, in particular printed circuit boards with lacquer |
| 05/29/2002 | EP0865455B1 Isolation of novolak resin without high temperature distillation and photoresist composition therefrom |
| 05/29/2002 | EP0683507B1 Manufacture of a display device |
| 05/29/2002 | DE10144646A1 Phasenverschiebungsmaskenrohling, Photomaskenrohling, und Vorrichtung und Verfahren zum Herstellen von Rohlingen Phase shift mask blank, photomask blank, and apparatus and methods for the manufacture of blanks |
| 05/29/2002 | DE10134501A1 Verfahren zum Bilden von Mikromustern eines Halbleiterbauelementes A method of forming micropatterns of a semiconductor device |
| 05/29/2002 | CN1351759A Differential trench open process |
| 05/29/2002 | CN1351756A Electrostatically focused addressable field emission arraychips (AFEA' s) for high-speed maskless digital e-beam direct write lithography and scanning electron microscopy |
| 05/29/2002 | CN1351721A Method for error reduction in lithography |
| 05/29/2002 | CN1351280A Photopolymerible composition and photosensitive composition for explosure by short wavelength semiconductor laser, and method therefor |
| 05/29/2002 | CN1085889C Compositions for diffusion patterning |
| 05/29/2002 | CN1085681C Isolation of novolak resin by low temp. subsurface forced steam distillation |
| 05/29/2002 | CN1085628C Method for treating photolithographic developer and stripper waste streame containing resist or solder mask and gamma butyrolactone or benzyl alcohol |
| 05/28/2002 | US6396900 Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application |
| 05/28/2002 | US6396646 Multi-beam optical system |
| 05/28/2002 | US6396635 Beam shaping element for use in a lithographic system |
| 05/28/2002 | US6396582 Wavelength reference for laser |
| 05/28/2002 | US6396569 Image displacement test reticle for measuring aberration characteristics of projection optics |
| 05/28/2002 | US6396568 Exposure apparatus and method |
| 05/28/2002 | US6396567 Method and apparatus for controlling the dose of radiations applied to a semiconductor wafer during photolithography |
| 05/28/2002 | US6396566 Stage system for exposure apparatus and device manufacturing method in which a stage supporting member and a countermass supporting member provide vibration isolation |
| 05/28/2002 | US6396563 Exposure apparatus |
| 05/28/2002 | US6396562 Microdevice manufacturing apparatus |
| 05/28/2002 | US6396561 Method and device for exposing both sides of a sheet |
| 05/28/2002 | US6396160 Fill strategies in the optical kerf |
| 05/28/2002 | US6396071 Scanning exposure method and apparatus |
| 05/28/2002 | US6396067 Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
| 05/28/2002 | US6396062 Portable laser beam monitor |
| 05/28/2002 | US6396054 Scanning probe microscope assembly and method for making confocal, spectrophotometric, near-field, and scanning probe measurements and associated images |
| 05/28/2002 | US6395657 Fluoride crystalline optical lithography lens element blank |
| 05/28/2002 | US6395563 Device for manufacturing semiconductor device and method of manufacturing the same |
| 05/28/2002 | US6395491 Coding and storing information on substrate; code biopolymer sequence, attach to substrate, recover information by replication of biopolymer sequence |
| 05/28/2002 | US6395458 Mixing benzotriazole with development solution |
| 05/28/2002 | US6395457 Method for manufacturing a semiconductor device |
| 05/28/2002 | US6395456 Semiconductor device achieving higher integration, method of manufacturing thereof, and method of forming resist pattern used therefor |
| 05/28/2002 | US6395455 Low thermal distortion Extreme-UV lithography reticle and method |
| 05/28/2002 | US6395453 Using an a,b unsaturated ketone |
| 05/28/2002 | US6395452 Photoresist ink |
| 05/28/2002 | US6395451 Photoresist composition containing photo base generator with photo acid generator |
| 05/28/2002 | US6395450 Positive working photoresist composition |
| 05/28/2002 | US6395449 Mixture containing polyglutarimide and solvent |
| 05/28/2002 | US6395447 Resist material and fabrication method thereof |
| 05/28/2002 | US6395446 Containing sulfonyldiazomethane compound as acid generator |
| 05/28/2002 | US6395438 Masking design data; phase shifting; using computers |
| 05/28/2002 | US6395432 Forming semiconductor using mask; detection radiation intensity profile |
| 05/28/2002 | US6395397 Submicrolithography, e.g., an argon fluoride (arf) light source; crosslinked acrylic tetramer of high absorbance at specific wavelengths based on a 4-(hydroxyphenoxy)alkyl-carbonyloxy-alkyl(-hydroxy) acrylic ester |
| 05/28/2002 | US6395102 Applying a gas, exhaustion, measurement the particle count, placing the reticle in a stepper |
| 05/28/2002 | US6394670 Parts maintenance managing system |
| 05/28/2002 | US6393714 Resistor arrays for mask-alignment detection |
| 05/28/2002 | CA2251802C Method of making color screens for fed and other cathodoluminscent displays |
| 05/28/2002 | CA2063982C Photosensitive composition based on acrylates |
| 05/23/2002 | WO2002041389A2 A method for monitoring line width of electronic circuit patterns |
| 05/23/2002 | WO2002041374A1 Electron beam exposure system, electron beam correction method, electron beam exposure method, and method of producing semiconductor element |
| 05/23/2002 | WO2002041373A1 Electron beam correction method and electron beam exposure system |
| 05/23/2002 | WO2002041372A1 Electron beam exposure system, electron beam exposure method, and production method for semiconductor element |
| 05/23/2002 | WO2002041196A1 Digital photolithography system for making smooth diagonal components |
| 05/23/2002 | WO2002041081A1 Method for forming pattern and treating agent for use therein |
| 05/23/2002 | WO2002041080A2 Process for reducing edge roughness in patterned photoresist |
| 05/23/2002 | WO2002041079A2 Positive type photosensitive epoxy resin composition and printed circuit board using the same |
| 05/23/2002 | WO2002041078A2 Radiation curable compositions |
| 05/23/2002 | WO2002041076A2 Photolithographic mask |
| 05/23/2002 | WO2002004564A3 Modified pigment products, dispersions thereof, and compositions comprising the same |
| 05/23/2002 | WO2001095381A3 Post chemical-mechanical planarization (cmp) cleaning composition |