| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 06/06/2002 | DE10133663A1 Process for removing a photoresist used in the production of semiconductor devices comprises treating the substrate with a removal agent based on fluorine, washing the substrate with water, drying, and repeating the process at least twice |
| 06/06/2002 | DE10121188A1 Verfahren zum Entfernen eines restlichen Metall enthaltenden Polymermaterials und von ionenimplantiertem Photoresistmaterial in einem stromabwärtigen atmosphärischen Plasmabearbeitungssystem A method of removing a residual polymeric material containing metal and ion-implanted photoresist material in a downstream atmospheric plasma processing system |
| 06/06/2002 | DE10058216C1 Periodic structure spacing measuring method for semiconductor wafer or photomask uses distance between detected maxima in Fourier transformation of image of periodic structure |
| 06/06/2002 | DE10051577A1 Aufzeichnungsmaterial mit pigmentgefärbter strahlungsempfindlicher Schicht Recording material with pigment dyed radiation-sensitive layer |
| 06/06/2002 | DE10044199A1 Teilchenoptische Komponente und System mit Teilchenoptischer Komponente A particle component and system with particle-component |
| 06/05/2002 | EP1211918A1 Method of stopping ions and small debris in extreme-ultraviolet and soft x-rays plasma sources by using krypton |
| 06/05/2002 | EP1211564A2 Non-corrosive cleaning composition for removing plasma etching residues |
| 06/05/2002 | EP1211563A1 Resist stripper |
| 06/05/2002 | EP1211562A1 Lithographic apparatus and device manufacturing method |
| 06/05/2002 | EP1211561A2 Illumination apparatus |
| 06/05/2002 | EP1211560A1 Gas-actuated stages including reaction-force-canceling mechanisms for use in charged-particle-beam microlithography systems |
| 06/05/2002 | EP1211559A1 Photosensitive resin composition, fabricating method for patterned substrate, and device comprising this substrate |
| 06/05/2002 | EP1211252A1 Process for preparing thioxanthone and derivatives thereof |
| 06/05/2002 | EP1210731A2 Method and system for efficiently computing a number of integrated circuit dies |
| 06/05/2002 | EP1210652A2 Method and system for selective linewidth optimization during a lithographic process |
| 06/05/2002 | EP1210651A1 Antireflective coating for photoresist compositions |
| 06/05/2002 | EP1210650A1 Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same |
| 06/05/2002 | EP1169613A4 Systems and methods for characterizing and correcting cyclic errors in distance measuring and dispersion interferometry |
| 06/05/2002 | EP1060499B1 Device and method for forming lithographic patterns using an interferometer |
| 06/05/2002 | CN1352763A Production on an integrated optical device |
| 06/05/2002 | CN1352762A Photosensitive material employing micro capsules |
| 06/04/2002 | US6400794 Illumination system, particularly for EUV lithography |
| 06/04/2002 | US6400516 Kinematic optical mounting |
| 06/04/2002 | US6400456 Plane positioning apparatus |
| 06/04/2002 | US6400445 Method and apparatus for positioning substrate |
| 06/04/2002 | US6400444 Exposure apparatus and device producing method using the same |
| 06/04/2002 | US6400441 Projection exposure apparatus and method |
| 06/04/2002 | US6400090 Electron emitters for lithography tools |
| 06/04/2002 | US6400089 High electric field, high pressure light source |
| 06/04/2002 | US6399954 Charged-particle beam lithography apparatus and system capable of readily detecting abnormality in controlling on-off operation |
| 06/04/2002 | US6399805 Organometallic monoacylarylphosphines |
| 06/04/2002 | US6399792 Photoresist cross-linker and photoresist composition comprising the same |
| 06/04/2002 | US6399672 Oil soluble unsaturated compounds and photoinitiators |
| 06/04/2002 | US6399551 Mixture containing chelate compound and solvent |
| 06/04/2002 | US6399543 Low foam N,N′-dialkyltartaramide wetting agents |
| 06/04/2002 | US6399518 Resist coating and developing processing apparatus |
| 06/04/2002 | US6399481 Process control; accuracy; forming transparent undercoating on semiconductor; applying water soluble antireflective coating; exposure to light; development |
| 06/04/2002 | US6399287 Method for forming fluorescent film in PDP by using a photopolymerizable photosensitive phosphor paste composition |
| 06/04/2002 | US6399285 Method for forming a thin film and for manufacturing a thin film |
| 06/04/2002 | US6399284 Sub-lithographic contacts and vias through pattern, CVD and etch back processing |
| 06/04/2002 | US6399283 Exposure method and aligner |
| 06/04/2002 | US6399282 Method for forming conductive pattern and producing ceramic multi-layer substrate |
| 06/04/2002 | US6399281 Composite relief image printing plates |
| 06/04/2002 | US6399279 Exposing an image-forming material comprising a substrate and a positive photosensitive layer containing novolak resin and a photo-thermal conversion material which absorbs light and converts it to heat, followed by alkali development |
| 06/04/2002 | US6399278 Photosensitive compositions and clean running photopolymer printing plates |
| 06/04/2002 | US6399277 Photopolymerizable thermosetting resin composition |
| 06/04/2002 | US6399275 Negative-working photolithographic patterning material and method for the preparation of ion-implanted and metal-plated substrates by using the same |
| 06/04/2002 | US6399274 Resist composition and patterning process |
| 06/04/2002 | US6399273 Water-processable photoresist compositions |
| 06/04/2002 | US6399272 Phenylenediamine derivative-type additive useful for a chemically amplified photoresist |
| 06/04/2002 | US6399271 Planographic printing |
| 06/04/2002 | US6399269 Bottom anti-reflective coating material composition for photoresist and method of forming resist pattern using the same |
| 06/04/2002 | US6399268 Processless direct write imaging member containing polymer grafted carbon and methods of imaging and printing |
| 06/04/2002 | US6399267 Radiation sensitive resin composition and use of the same in an interlaminar insulating film |
| 06/04/2002 | US6399261 Pattern generator with improved precision |
| 06/04/2002 | US6399260 Pattern exposure method having no uniformity in pattern density or configuration |
| 06/04/2002 | US6399258 Focusing laser beams |
| 06/04/2002 | US6399256 Reticle having accessory pattern divided into sub-patterns |
| 06/04/2002 | US6399088 Citric acid tri-alkylamide surfactants |
| 06/04/2002 | US6399044 Dihydroxyacetone tanning composition containing source of sulphite ion to suppress formation of formaldehyde or formic acid |
| 06/04/2002 | US6398874 Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same |
| 06/04/2002 | US6398868 Substrate coating apparatus |
| 06/04/2002 | US6398640 Light-sensitive resist which can be developed in an aqueous-alkali manner and operates negatively |
| 06/04/2002 | US6398476 Automatic storage unit and automatic storing method |
| 06/04/2002 | US6398430 Semiconductor device fabrication system |
| 06/04/2002 | US6398429 Developing method and developing apparatus |
| 06/04/2002 | US6398374 Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography |
| 06/04/2002 | US6398373 Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems |
| 06/04/2002 | US6398032 SMIF pod including independently supported wafer cassette |
| 05/30/2002 | WO2002043140A2 Imaging layer as hard mask for organic low-k materials |
| 05/30/2002 | WO2002043123A1 Aligner, aligning method and method for fabricating device |
| 05/30/2002 | WO2002043122A2 Parallel plate development with the application of a differential voltage |
| 05/30/2002 | WO2002043121A2 Bright field image reversal for contact hole patterning |
| 05/30/2002 | WO2002043102A1 Electron-beam generating apparatus and electron-beam exposure apparatus |
| 05/30/2002 | WO2002042846A2 Fabrication of integrated circuit |
| 05/30/2002 | WO2002042845A2 Photoacid generators and photoresists comprising same |
| 05/30/2002 | WO2002042844A2 Stamp, method and apparatus for using said stamp |
| 05/30/2002 | WO2002042825A1 Light modulation device and system |
| 05/30/2002 | WO2002042339A1 Crosslinkable material containing a chromophore, crosslinked material, optical integrated circuit comprising said material and method for preparing same |
| 05/30/2002 | WO2002023278A3 Device and method for exposing photosensitive plates for printing presses |
| 05/30/2002 | WO2002019040A3 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization |
| 05/30/2002 | WO2002008831A3 Reticle storage and retrieval system |
| 05/30/2002 | WO2001098838A3 Method of forming optical images, mask for use in this method, method of manufacturing a device using this method, and apparatus for carrying out this method |
| 05/30/2002 | WO2001095361A3 Method of producing rib plasma for display panel substrate |
| 05/30/2002 | US20020065331 Having low dielectric constants useful in electronic component manufacture |
| 05/30/2002 | US20020065204 Formulations including a 1,3-dicarbonyl compound chelating agent and copper corrosion inhibiting agents for stripping residues from semiconductor substrates containing copper structures |
| 05/30/2002 | US20020064958 Exposure method |
| 05/30/2002 | US20020064796 Generating preferential amino acid sequences on substrate; obtain substrate, deblock, expose to amino acids, recover preferential particles |
| 05/30/2002 | US20020064732 Process for making pictorial reproductions |
| 05/30/2002 | US20020064731 Radiation-sensitive mixture and production of relief structures |
| 05/30/2002 | US20020064730 Method for forming cross-linking photoresist and structures forrmed thereby |
| 05/30/2002 | US20020064729 Selective electroplating method employing annular edge ring cathode electrode contact |
| 05/30/2002 | US20020064728 Near IR sensitive photoimageable/photopolymerizable compositions, media, and associated processes |
| 05/30/2002 | US20020064727 Positive photoresist composition |
| 05/30/2002 | US20020064726 Presensitized plate useful for preparing a lithographic printing plate |
| 05/30/2002 | US20020064719 Energized light sources deliver signals that are compared, then error signal is delivered in response to detecting significant difference between signals; for notification of the need for maintanence/servicing |
| 05/30/2002 | US20020064717 For imaging a lithographic printing-plate cylinder, for offset printing, by laser-induced transfer |
| 05/30/2002 | US20020064716 For use in mixed mode photomask wherein binary mask curve and phase shift mask curve which reflect the relationship between critical dimensions of the photomask and original pattern are combined to create optical characteristic curve |
| 05/30/2002 | US20020064715 Increasing integration of semiconductor devices via narrowing the width of the pattern formed in the mask pattern and the distance between; photolithography; semiconductors; integrated circuits |
| 05/30/2002 | US20020064714 Mask for manufacturing semiconductor device and method of manufacture thereof |