Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2013
10/23/2013CN103365120A Substrate processing device and method
10/23/2013CN103365119A Dynamic gas lock for spiral gas flow
10/23/2013CN103365118A Calibration method and calibration device for light beam monitoring system of mask aligner
10/23/2013CN103365117A Fluid extraction system, lithographic apparatus and device manufacturing method
10/23/2013CN103365116A Drawing apparatus, drawing method, and method of manufacturing article
10/23/2013CN103365115A Exposure apparatus, method of controlling the same and method of manufacturing device
10/23/2013CN103365114A Exposure marking device
10/23/2013CN103365113A Projection exposure apparatus with at least one manipulator and method of operating same
10/23/2013CN103365112A Exposure device and exposure method, and method for manufacturing pattern film
10/23/2013CN103365111A Exposure device and exposure method, and method for manufacturing pattern film
10/23/2013CN103365110A Extreme ultraviolet lithography process and mask
10/23/2013CN103365109A Workbench protector of manual-type direct exposure device
10/23/2013CN103365108A Control method based on gravity compensator
10/23/2013CN103365107A Matching and calibrating method for multi-off-axis aligning system
10/23/2013CN103365106A Silicon wafer exposure method and device
10/23/2013CN103365105A Method for screening and correcting light intensity sampling points in alignment process
10/23/2013CN103365104A Variable polarization illumination system
10/23/2013CN103365103A Focusing and leveling device and method
10/23/2013CN103365102A Photoetching system and method for automatically acquiring photoetching parameters
10/23/2013CN103365101A Nano-imaging system and magnetic field applying device thereof
10/23/2013CN103365100A Photolithographic process distributing system and method
10/23/2013CN103365099A Focusing and leveling signal processing method
10/23/2013CN103365098A Alignment mark for exposure device
10/23/2013CN103365097A Focusing and levelling measurement device
10/23/2013CN103365096A Focusing and leveling system for photoetching equipment and measurement method
10/23/2013CN103365095A Back off-axis alignment system based on array photoelectric sensor, and photoetching device and method
10/23/2013CN103365094A Dual tone photoresist structure and processing method thereof
10/23/2013CN103365093A Photo-curing polysiloxan composition, protective film and element containing protective film
10/23/2013CN103365092A Dual-photoresist and processing method thereof
10/23/2013CN103365091A Mask liquid for surface roughening of LED (light emitting diode) chip or substrate as well as preparation method and application thereof
10/23/2013CN103365090A Positive ion-free radical mixed photopolymerisable lithographic plate printing plate material based on vinylpyrrolidone copolymer resin
10/23/2013CN103365089A Colored resin composition for color filter, color filter, liquid crystal display and organic EL display device
10/23/2013CN103365088A Colored curable resin composition
10/23/2013CN103365087A Photosensitive resin composition for formation of insulating film, insulating film, a method for forming insulating film
10/23/2013CN103365086A Positive ion-free radical mixed photopolymerisable imaging component based on vinylpyrrolidone copolymer resin
10/23/2013CN103365085A Metal hard-mask composition
10/23/2013CN103365084A Photocurable resin composition, dry film, cured product and printed wiring board
10/23/2013CN103365083A Photopolymer composition, making method of pattern, hardening film, organic EL display device, and making method of liquid crystal display device
10/23/2013CN103365082A Flame-retardant curable resin composition, dry membrane, flame-retardant covering membrane, and printed circuit board
10/23/2013CN103365081A Colored composition, color filter, display element and pigment dispersion liquid
10/23/2013CN103365080A Colored photopolymer composition
10/23/2013CN103365079A Making method of photonasty substrate composition for shielding layer formation
10/23/2013CN103365078A Method and composition of a dual sensitive resist
10/23/2013CN103365077A Silicone rubber material for soft lithography
10/23/2013CN103365076A Photosensitive material and photolithography method
10/23/2013CN103365075A Photolithographic process method for eliminating lathe work on surface of wafer
10/23/2013CN103365072A Method for generating mask pattern
10/23/2013CN103364963A Optical system, exposure device and equipment making method
10/23/2013CN103364928A Projection objective lens optical system
10/23/2013CN103364927A Optical system for lithography machine illuminating system polarization measurement
10/23/2013CN103364860A Color filter, organic EL display element and colored composition
10/23/2013CN103364857A Wide-spectrum polarization-irrelevant transmission-type grating and preparation method thereof
10/23/2013CN103360790A Colorant Dispersion liquid
10/23/2013CN103360788A Blue pigment dispersion composition for color filter and blue pigment dispersion anti-corrosion composition for color filter containing the same
10/23/2013CN103360786A Organic pigment composition used for color filter, method for manufacturing thereof, and color filter
10/23/2013CN103358632A Laminated structure, dry film and method of producing laminated structure
10/23/2013CN103357346A Pigment dispersing agent, pigment dispersion liquid, colorized photoresist, and preparation and application thereof
10/23/2013CN102483571B Photosensitive composition and printed wiring board
10/23/2013CN102483570B Photosensitive resin composition containing copolymer, cured film and microlens
10/23/2013CN102308260B Hardmask process for forming reverse tone image using polysilazane
10/23/2013CN102193335B Cover for substrate table, substrate table for lithographic apparatus, lithographic apparatus, and device manufacturing method
10/23/2013CN102193331B Lithographic apparatus and method
10/23/2013CN102047184B Cleaning solution of plasma etching residues
10/23/2013CN102023429B TFT-LCK array substrate and method for manufacturing same and method for repairing broken lines
10/23/2013CN101526741B Radioactive ray sensitive composition, color filter and colourful liquid crystal display device for forming dyed layer
10/22/2013US8566757 Layout of phase shifting photolithographic masks with refined shifter shapes
10/22/2013US8563950 Energy beam drawing apparatus and method of manufacturing device
10/22/2013US8563438 Method for manufacturing semiconductor device
10/22/2013US8563231 Patterning process and materials for lithography
10/22/2013US8563229 Process of semiconductor fabrication with mask overlay on pitch multiplied features and associated structures
10/22/2013US8563228 Methods of forming patterns on substrates
10/22/2013US8563227 Method and system for exposure of a phase shift mask
10/22/2013US8563226 Mould for galvanoplasty and method of fabricating the same
10/22/2013US8563225 Forming a self-aligned hard mask for contact to a tunnel junction
10/22/2013US8563223 Photosensitive resin composition and laminate
10/22/2013US8563222 Lithographic printing plate precursor
10/22/2013US8563221 Phototools having a protective layer
10/22/2013US8563220 High resolution, solvent resistant, thin elastomeric printing plates
10/22/2013US8563219 Resist composition and method for producing resist pattern
10/22/2013US8563218 Resist composition and method for producing resist pattern
10/22/2013US8563217 Resist composition and method for producing resist pattern
10/22/2013US8563215 Diazonaphthoquinonesulfonic acid bisphenol derivative useful in photo lithographic sub micron patterning and a process for preparation thereof
10/22/2013US8563214 Radiation sensitive resin composition and method of forming an interlayer insulating film
10/22/2013US8563213 Methods for producing photosensitive microparticles
10/22/2013US8563212 Methods for producing photosensitive microparticles, non-aqueous dispersions thereof and articles prepared therewith
10/22/2013US8563198 Device and method for providing wavelength reduction with a photomask
10/22/2013US8562795 Nanoscale electric lithography
10/22/2013US8562323 Imprint apparatus and method for producing article
10/22/2013US8562242 Reinforced splines and their manufacture
10/22/2013CA2538322C Process for chemical etching of parts fabricated by sterolithography
10/17/2013WO2013154210A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, electronic device manufacturing method using the same, and electronic device
10/17/2013WO2013154180A1 Developing device and developing method for waterless planographic printing plate original plate and manufacturing method for waterless planogarphic printing plate
10/17/2013WO2013153965A1 Liquid immersion member and exposure apparatus
10/17/2013WO2013153939A1 Liquid immersion member and exposure apparatus
10/17/2013WO2013153873A1 Photosensitive compound, photosensitive resin, and photosensitive composition
10/17/2013WO2013153465A1 Method of fabrication of micro-optics device with curved surface defects
10/17/2013WO2013153183A2 Composite resin composition and method for producing dental components by means of stereo-lithography
10/17/2013WO2013152951A1 Illumination intensity correction device for predefining an illumination intensity over an illumination field of a lithographic projection exposure apparatus
10/17/2013WO2013152928A1 Methods of providing patterned epitaxy templates for self-assemblable block copolymers for use in device lithography
10/17/2013WO2013152921A1 Pellicle, reticle assembly and lithographic apparatus
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