| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/12/2002 | EP1213617A1 Process and device for in-situ decontamination of an EUV exposure apparatus |
| 06/12/2002 | EP1213616A2 Photosensitive flexographic printing element having an infrared ablatable layer comprising a polyether-polyurethane |
| 06/12/2002 | EP1213615A2 Photosensitive flexographic printing element having at least two infrared ablatable layers |
| 06/12/2002 | EP1213612A2 Radiation curable resin composition, manufacturing process and article made using such a composition |
| 06/12/2002 | EP1213327A1 Photosensitive resin composition of aqueous emulsion type |
| 06/12/2002 | EP1213140A1 Method of processing a printing plate material with a single-fluid ink |
| 06/12/2002 | EP1212784A1 Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidification |
| 06/12/2002 | EP1212660A1 Device and method for wavelength dependent light outcoupling |
| 06/12/2002 | EP1212659A1 Methods for enhancing images on relief image printing plates |
| 06/12/2002 | EP1212151A1 Process and apparatus for treating a workpiece such as a semiconductor wafer |
| 06/12/2002 | EP1076835A4 Broadband diffractive diffuser and associated methods |
| 06/12/2002 | EP0977747B1 Photoactive coumarin derivatives |
| 06/12/2002 | EP0952925B1 Lithographic plate precursor |
| 06/12/2002 | EP0787254B1 Perforated disc, especially for injection valves |
| 06/12/2002 | CN1353743A Photosensitive resin composition of aqueous emulsion type |
| 06/12/2002 | CN1353341A Photosensitive lithographic printing plate |
| 06/12/2002 | CN1353340A Photosensitive lithographic printing plate |
| 06/12/2002 | CN1353140A Photosensitive composition used in sand milling and photosensitive membrane using said composition |
| 06/12/2002 | CN1353047A Manufacturing method of supporting body for use on offset printing plate and manufacturing device |
| 06/11/2002 | US6405096 Method and apparatus for run-to-run controlling of overlay registration |
| 06/11/2002 | US6404505 Positioning stage system and position measuring method |
| 06/11/2002 | US6404499 Lithography apparatus with filters for optimizing uniformity of an image |
| 06/11/2002 | US6404483 Substrate handler for use in lithographic projection apparatus |
| 06/11/2002 | US6404482 Projection exposure method and apparatus |
| 06/11/2002 | US6404481 Adaptive lithography membrane masks |
| 06/11/2002 | US6404107 Packaged strain actuator |
| 06/11/2002 | US6403978 Test pattern for measuring variations of critical dimensions of wiring patterns formed in the fabrication of semiconductor devices |
| 06/11/2002 | US6403973 Electron beam exposure method and apparatus and semiconductor device manufactured using the same |
| 06/11/2002 | US6403971 Beam-adjustment methods and apparatus for charged-particle-beam microlithography |
| 06/11/2002 | US6403957 Nucleic acid reading and analysis system |
| 06/11/2002 | US6403905 Reticle stocking and sorting management system |
| 06/11/2002 | US6403823 Ester compounds having alicyclic structure and method for preparing same |
| 06/11/2002 | US6403822 Nucleophilic addition of alicyclic carbonyl and metal enolate of acetate; polycarbon monomers for photoresists; high reactivity and substrate affinity |
| 06/11/2002 | US6403694 Borosilicate glass powder, crystalline sio2 powder dispersed with photopolymerization initiator, photocurable monomer, and binder comprising an acrylic/modified-cellulosic copolymer having carboxyl group and ethylenic unsaturated side chain |
| 06/11/2002 | US6403544 Semiconductor wafers or chips; supercritical co2 gas as a dense phase fluid and modifier selected from the group consisting of propylene carbonate, ethylene carbonate, butylene carbonate, propylene glycol methyl ether acetate |
| 06/11/2002 | US6403508 Optical elements for lasers and in microlithography; silica glass where the concentration of silicon atoms bonded to three oxygen atoms and to one hydrogen atom and the amount of molecular hydrogen is controlled |
| 06/11/2002 | US6403500 Cross-shaped resist dispensing system and method |
| 06/11/2002 | US6403477 Method for correcting an optical proximity effect in an interconnect pattern by shortening the legs of cutout patterns to avoid linewidth reduction |
| 06/11/2002 | US6403320 Support bound probes and methods of analysis using the same |
| 06/11/2002 | US6403291 Multiple exposure method |
| 06/11/2002 | US6403289 Alkaline solution containing photopolymerizable polyamic acid, benzyltrialkylammonium (or phosphonium) salt or benzyltriarylammonium (or phosphonium) salt and base; semiconductors |
| 06/11/2002 | US6403288 Coating with copolymer comprising hydroxystyrene derivative monomer having acid dissociable group; exposure to radiation; development |
| 06/11/2002 | US6403287 Spin coating heated photoresist on wafer; exposure to light; development; semiconductors |
| 06/11/2002 | US6403285 Method for exposing semiconductor wafers in a manner that promotes radial processing uniformity |
| 06/11/2002 | US6403284 Process for producing photosensitive resin printing plate and treating solution |
| 06/11/2002 | US6403283 Negative working image recording material |
| 06/11/2002 | US6403281 Alkylene glycol di(meth)acrylate or alkylene glycol di(2-norbornene-5-carboxylate) crosslinking monomers; durability, contrast, resolution, adhesion; photolithography; semiconductors |
| 06/11/2002 | US6403280 Terpolymer comprising maleic anhydride, norbornene ester derivative, and alicyclic (meth)acrylate monomers; durability to dry etching; transparency, storage stability |
| 06/11/2002 | US6403269 Addition-condensation copolymer comprising poly(ether)urethane reacted with hydroxyalkyl (meth)acrylate exposed to actinic radiation; durability, quality; flexographic printing |
| 06/11/2002 | US6403267 Etching tranparent substrate to form trenches; treating with aqueous solution of ammonium hydroxide and hydrogen peroxide; photolithograpy; microminiaturized semiconductors and integrated circuits |
| 06/11/2002 | US6403221 Epoxy resin containing phosphorus, phenolic curing agent, bisphenol s phenolic resin and accelerator; heat resistance; peeling strength |
| 06/11/2002 | US6402886 Use of a chemically active reticle carrier for photomask etching |
| 06/11/2002 | US6402876 Method of forming a monolayer of particles, and products formed thereby |
| 06/11/2002 | US6402845 Process liquid dispense method and apparatus |
| 06/11/2002 | US6402399 Developing method and developing apparatus |
| 06/06/2002 | WO2002045215A2 Nanolithography methods and products therefor and produced thereby |
| 06/06/2002 | WO2002045148A2 Cleaning solution for semiconductor wafers in the back-end-of-line |
| 06/06/2002 | WO2002045123A1 Electron beam generating device, and testing device |
| 06/06/2002 | WO2002044845A2 Protecting groups in polymers, photoresists and processes for microlithography |
| 06/06/2002 | WO2002044817A2 Making an integrated circuit using polarized light |
| 06/06/2002 | WO2002044816A2 Antireflective layer for use in microlithography |
| 06/06/2002 | WO2002044815A2 Multilayer elements containing photoresist compositions and their use in microlithography |
| 06/06/2002 | WO2002044814A2 Photoresist compositions comprising bases and surfactants for microlithography |
| 06/06/2002 | WO2002044813A1 Improved water-developable photosensitive resin for flexography |
| 06/06/2002 | WO2002044811A2 Polymers blends and their use in photoresist compositions for microlithography |
| 06/06/2002 | WO2002044805A2 Method of increasing the conductivity of a transparent conductive layer |
| 06/06/2002 | WO2002044786A2 Catadioptric projection system for 157 nm lithography |
| 06/06/2002 | WO2002021213A3 Novel polymers and photoresist compositions for short wavelength imaging |
| 06/06/2002 | WO2002003426A3 Process for the post etch stripping of photoresist with hydrogen |
| 06/06/2002 | WO2001078103A3 Bi-directional electron beam scanning apparatus |
| 06/06/2002 | US20020068803 High transparency at 193 nm wavelength, provides increased etching resistance; formed without 5-norbonen-2-carboxylate monomers which do not have offensive odors of the free acid |
| 06/06/2002 | US20020068801 Photosensitive diacrylate and dimethacrylate compositions |
| 06/06/2002 | US20020068685 Post plasma ashing wafer cleaning formulation |
| 06/06/2002 | US20020068684 Aliphatic C3-5 dicarboxylic acid corrosion inhibitor; hydrogen fluoride free; pH of at least 8.5 |
| 06/06/2002 | US20020068417 Stereolithographic method and apparatus for fabricating spacers for semiconductor devices and resulting structures |
| 06/06/2002 | US20020068244 Alternative photoresist stripping solutions |
| 06/06/2002 | US20020068243 Photoresist layers are superposed in a way that spaces between the patterns for each photoresist layers overlapped with each other for form openings that expose the underlying wafer layers; exposed wafer layers are etched |
| 06/06/2002 | US20020068242 Exposing a resist layer of a polymer material that has at least one saturated alicycle substitited with fluorine atoms to vacuum ultraviolet rays for patterning into a predetermined shape |
| 06/06/2002 | US20020068240 On-press developable thermosensitive lithographic printing plates |
| 06/06/2002 | US20020068238 Positive-working photoresist composition |
| 06/06/2002 | US20020068237 Photocurable resin with photosensitive groups crosslinkable by light irradiation, photoacid generators and photosensitizer of a benzopyran condensed ring compound |
| 06/06/2002 | US20020068236 Resin, photoacid generator and photosensitizer of a benzopyran condensed ring |
| 06/06/2002 | US20020068235 Photosensitive composition |
| 06/06/2002 | US20020068234 Recording material having a pigment-coloured radiation-sensitive layer |
| 06/06/2002 | US20020068227 Method and apparatus for making an integrated circuit using polarization properties of light |
| 06/06/2002 | US20020068226 Method for improving the performance of photolithographic equipment and for increasing the lifetime of the optics thereof |
| 06/06/2002 | US20020068225 Polymerizable acrylic monomers and light absorbing quinone dyes |
| 06/06/2002 | US20020068223 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization |
| 06/06/2002 | US20020068188 Method for depositing metal and metal oxide films and patterned films |
| 06/06/2002 | US20020068181 Ether-like compound including a siliconethoxy, silicondiethoxy, or silicontriethoxy species attached to a naphthalene or anthracene chromophore via an oxygen linkage |
| 06/06/2002 | US20020067981 Wafer transport system |
| 06/06/2002 | US20020067585 Electrostatic wafer chucks and charged-particle-beam exposure apparatus comprising same |
| 06/06/2002 | US20020067550 Illumination apparatus and projection exposure apparatus |
| 06/06/2002 | US20020067490 Pattern inspecting apparatus, pattern inspecting method, aligner, and method of manufacturing electronic device |
| 06/06/2002 | US20020067478 Method of and apparatus for article inspection including speckle reduction |
| 06/06/2002 | US20020067477 Patten inspection apparatus, and exposure apparatus control system using same |
| 06/06/2002 | US20020067473 Reference plate, exposure apparatus, device manufacturing system, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method |
| 06/06/2002 | US20020067315 Aperture coupled slot array antenna |
| 06/06/2002 | US20020066692 SMIF container including an electrostatic dissipative reticle support structure |
| 06/06/2002 | DE10151724A1 Verfahren und Vorrichtung zum Korrigieren eines Musterfilms auf einem Halbleitersubstrat Method and apparatus for correcting a pattern film on a semiconductor substrate |