| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/19/2002 | EP0892942B1 layered medium and method for creating a pattern |
| 06/19/2002 | EP0787256B1 Process for producing a perforated disc |
| 06/19/2002 | CN1354763A Resin composition for photofabrication of three dimensional objects |
| 06/19/2002 | CN1354494A Photoetching making method capable of reducing kindred effect |
| 06/19/2002 | CN1354395A Regulating device and method of position deviation optical detecting device |
| 06/19/2002 | CN1354394A Thermal sensitive lithographic printing front body |
| 06/19/2002 | CN1354393A Sensitive or thermal-induction image forming material |
| 06/19/2002 | CN1354392A 化学放大型正光刻胶组合物 Chemical amplification type positive resist composition |
| 06/19/2002 | CN1354391A Portrait appraising method and lithographic printing quality management method |
| 06/19/2002 | CN1086512C Charged-beam exposure mask and charged-beam exposure method |
| 06/19/2002 | CN1086399C Photogeneration of amine by using alpha-amino acetophenone |
| 06/18/2002 | US6408260 Laser lithography quality alarm system |
| 06/18/2002 | US6408045 Stage system and exposure apparatus with the same |
| 06/18/2002 | US6407814 Method for correcting alignment, method for manufacturing a semiconductor device and a semiconductor device |
| 06/18/2002 | US6407799 Stage control method using a temperature |
| 06/18/2002 | US6407443 Nanoscale patterning for the formation of extensive wires |
| 06/18/2002 | US6407398 Electron beam exposure apparatus and exposure method |
| 06/18/2002 | US6407397 Charged particle beam exposure apparatus |
| 06/18/2002 | US6407396 Wafer metrology structure |
| 06/18/2002 | US6407385 Methods and apparatus for removing particulate foreign matter from the surface of a sample |
| 06/18/2002 | US6407006 Method for integrated circuit planarization |
| 06/18/2002 | US6406844 Screening an array for affinity with a receptor, two different molecules are polypeptides, amino acid sequences |
| 06/18/2002 | US6406836 Method of stripping photoresist using re-coating material |
| 06/18/2002 | US6406834 Projecting image onto target; masking; radiation |
| 06/18/2002 | US6406831 Chemically amplified resist compositions |
| 06/18/2002 | US6406830 Bis(sulfonium methyl)ketone bisperfluoroalkanesulfonate acid generator with triphenylsulfonium or diphenyliodonium salts, and a resin having a unit unstable to an acid, such as 2-alkyl-2-adamantyl (meth)acrylate; resolution |
| 06/18/2002 | US6406829 Blend of alkali-soluble resin, onium salt and ethyleneurea compound |
| 06/18/2002 | US6406828 N-heterocycle polymers |
| 06/18/2002 | US6406827 Comprising alkali-soluble resin, quinonediazide ester, 4,4'-bis(diethylamino)benzophenone; high sensitivity and definition and improved focal depth |
| 06/18/2002 | US6406820 Transferring pattern formed on a mask onto a substrate |
| 06/18/2002 | US6406607 Method for forming a nozzle plate having a non-wetting surface of uniform thickness and an orifice wall of tapered contour, and nozzle plate |
| 06/18/2002 | US6406573 Pellicle frame and static bonding method for temporary and permanent attachment of pellicle frame to photomask substrate |
| 06/18/2002 | US6406245 Processing system and device manufacturing method using the same |
| 06/18/2002 | US6405659 Monolithic stage |
| 06/18/2002 | US6405648 Intaglio printing method, intaglio printer and touch panel |
| 06/18/2002 | US6405647 Intaglio printing method, intaglio printer and touch panel |
| 06/18/2002 | CA2122564C Protected image, and process for the production thereof |
| 06/13/2002 | WO2002047135A1 Electron beam exposure system and electron lens |
| 06/13/2002 | WO2002047133A1 Substrate, position measuring method, position measuring device, exposure method and exposure system and device production method |
| 06/13/2002 | WO2002047132A1 X-ray projection exposure device, x-ray projection exposure method, and semiconductor device |
| 06/13/2002 | WO2002047131A1 Electron beam exposure system, irradiating position detecting method, and electron detector |
| 06/13/2002 | WO2002047130A1 Observation device and its manufacturing method, exposure device, and method for manufacturing micro device |
| 06/13/2002 | WO2002047124A1 Resist nozzle calibration tool and method therefor |
| 06/13/2002 | WO2002046842A1 Assembly comprising a plurality of mask containers |
| 06/13/2002 | WO2002046841A1 Active components and photosensitive resin compositions containing the same |
| 06/13/2002 | WO2002046840A1 Photocurable and thermosetting resin composition |
| 06/13/2002 | WO2002046829A2 Dynamically stabilized contact lenses |
| 06/13/2002 | WO2002046507A2 Onium salts and the use therof as latent acids |
| 06/13/2002 | WO2002046179A1 (meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns |
| 06/13/2002 | WO2002045475A2 Protective overcoat for replicated diffraction gratings |
| 06/13/2002 | WO2002023598A3 A method to reduce post-development defects without sacrificing throughput |
| 06/13/2002 | WO2002014439A3 Process for producing coatings using surface-active photoinitiators |
| 06/13/2002 | WO2002011193A3 Process for photoresist descumming and stripping in semiconductor applications by nh3 plasma |
| 06/13/2002 | WO2001098012A9 FOUR KHz GAS DISCHARGE LASER |
| 06/13/2002 | WO2001075944A3 Dry silylation plasma etch process |
| 06/13/2002 | US20020072579 Novel tertiary alcohol compounds having alicyclic structure |
| 06/13/2002 | US20020072251 Method for manufacturing semiconductor device |
| 06/13/2002 | US20020072194 Aligner having shared rotation shaft |
| 06/13/2002 | US20020072139 Method for producing electroluminescent element |
| 06/13/2002 | US20020072131 In-line method of measuring effective three-leaf aberration coefficient of lithography projection systems |
| 06/13/2002 | US20020072074 Solid support for use as diagnostic tool in the analysis and separation of biopolymers |
| 06/13/2002 | US20020072016 Etching with a energized process gas, and before, during, or after exposing to an energized cleaning gas, exposing substrate to energized treating gas of a halogen species and a hydrogen species to enhance cleaning |
| 06/13/2002 | US20020072014 Semiconductor substrate etching masking layer to which a pattern to be etched can be transferred by photolithography at EUV wavelengths that is resistant to plasma etching |
| 06/13/2002 | US20020072013 Image-wise exposing a non-ablative image-recording layer (hydrophobic polymer particles) which is removable in a single-fluid ink to heat or light, and processing with an emulsion of an ink phase and a non-aqueous polar phase |
| 06/13/2002 | US20020072012 Charged beam exposure method and charged beam exposure apparatus |
| 06/13/2002 | US20020072011 Contains a colored layer containing filter dye besides an oxygen cutoff layer; solves safelight fog problem; use as computer-to-plate lithographic printing plate precursor |
| 06/13/2002 | US20020072009 Photosensitive polymer containing Si, Ge or Sn and resist composition comprising the same |
| 06/13/2002 | US20020072007 Intermediate image receiving sheet for a thermal transfer recording method |
| 06/13/2002 | US20020072003 Photolithography for making semiconductors; scatterometry; neural networks; variation of the process parameters affects the diffraction signature of a patterned structure being processed |
| 06/13/2002 | US20020072001 Altering parameter(s) of a process module configured to perform a lithography step to reduce within-wafer variation of a critical metric, such as critical dimension |
| 06/13/2002 | US20020072000 Exposure apparatus, exposure method and semiconductor device fabricated with the exposure method |
| 06/13/2002 | US20020071999 Ambient condition sensor for a photosensitive media cartridge |
| 06/13/2002 | US20020071998 Forming a reticle by exposing a first portion of a photoresist layer to a first writing pattern, then exposing a second portion of the photoresist to a second writing pattern; photolithography |
| 06/13/2002 | US20020071996 Lithographic projection apparatus; includes beam shaping device, positioning device for moving the beam, and a sensor dependent on the number of charged particles impinging on a mark region of a mask |
| 06/13/2002 | US20020071995 A coating is provided over a fresh layer of resist, such as chemically amplified resist (CAR), the overcoat stabilizes process control and makes it possible to precoat the CAR on wafer or mask blanks some time prior to exposure |
| 06/13/2002 | US20020071994 Dividing the mask into partial areas, forming partial masks which have apertures with patterns identical with plurality of partial areas, exposing the patterns of masks on a mask substrate by electron beam proximity exposure method |
| 06/13/2002 | US20020071993 Improved resolution capability of photolithography machines |
| 06/13/2002 | US20020071943 Stamping; etching; useful in the manufacture of microelectronic circuitry, biosensors, and high-density assay; biosensors |
| 06/13/2002 | US20020071929 Positive photoresist for information recording medium, and manufacturing method of information recording medium by making use of the positive photoresist and the information recording medium |
| 06/13/2002 | US20020071468 Injection seeded F2 laser with pre-injection filter |
| 06/13/2002 | US20020071226 Combination current sensor and relay |
| 06/13/2002 | US20020071112 Method and apparatus for self-referenced projection lens distortion mapping |
| 06/13/2002 | US20020071108 Irradiation control method and apparatus for pulsed light source used in exposure apparatus |
| 06/13/2002 | US20020071107 Layout designing method of a dispaly device |
| 06/13/2002 | US20020071106 Exposure apparatus and method |
| 06/13/2002 | US20020071105 Exposure apparatus and exposure method |
| 06/13/2002 | US20020071094 Dynamically stabilized contact lenses |
| 06/13/2002 | US20020071079 Photo-alignment material and liquid crystal display device and its manufacturing method using the same |
| 06/13/2002 | US20020070699 Stage apparatus including non-containing gas bearings and microlithography apparatus comprising same |
| 06/13/2002 | US20020070356 Electron beam proximity exposure apparatus and mask unit therefor |
| 06/13/2002 | US20020070355 Exposure method and apparatus, method of making exposure apparatus, device and device manufacturing method |
| 06/13/2002 | US20020070354 Manufacturing method of mask for electron beam proximity exposure and mask |
| 06/13/2002 | US20020070345 Evacuation use sample chamber and circuit pattern forming apparatus using the same |
| 06/13/2002 | US20020069777 Printing sleeves and cylinders applied with a photopolymer composition |
| 06/13/2002 | DE10061480A1 System for flushing inner chambers of lens used in semiconductor lithography comprises using mixture of at least two inert gases so that resulting refractive index corresponds to refractive index of air |
| 06/13/2002 | DE10061116A1 Fotoempfindliches flexographisches Druckelement mit mindestens zwei IR-ablativen Schichten A photosensitive flexographic printing element having at least two IR-ablative layers |
| 06/13/2002 | DE10061114A1 Fotoempfindliches flexographisches Druckelement mit Polyether-Polyurethane umfassender IR-ablativer Schicht A photosensitive flexographic printing element with polyether polyurethanes comprehensive IR-ablative layer |
| 06/13/2002 | CA2431059A1 Dynamically stabilized contact lenses |
| 06/12/2002 | EP1213619A1 Method for preparing lithographic printing plate |
| 06/12/2002 | EP1213618A1 Method and apparatus for detecting aberrations in an optical system |