Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2002
06/25/2002US6408878 Microfabricated elastomeric valve and pump systems
06/25/2002US6408767 Low stiffness suspension for a stage
06/20/2002WO2002049084A1 Exposure method and system, and device producing method
06/20/2002WO2002049080A2 Method and apparatus for inspecting a substrate
06/20/2002WO2002049078A2 Method for cleaning post-etch residues from a substrate
06/20/2002WO2002049066A1 Charged particle beam microscope, charged particle beam application device, charged particle beam microscopic method, charged particle beam inspecting method, and electron microscope
06/20/2002WO2002048797A2 Exposure apparatus and method using active tiling
06/20/2002WO2002048796A2 Projection system for euv lithography
06/20/2002WO2002048795A1 Substrate for material to be exposed
06/20/2002WO2002048794A1 Solder resist ink
06/20/2002WO2002048793A1 High-resolution photosensitive resin composition usable with i-line and method of forming pattern
06/20/2002WO2002048264A1 Radiation-sensitive composition changing in refractive index and method of changing refractive index
06/20/2002WO2002048226A1 Ultraviolet-curable resin composition and photosolder resist ink containing the composition
06/20/2002WO2002048217A1 Polymer for photoresist and resin compositions therefor
06/20/2002WO2002048204A1 Surface-active photoinitiators
06/20/2002WO2002048203A1 Surface-active photoinitiators
06/20/2002WO2002048202A1 Surface-active photoinitiators
06/20/2002WO2002047917A2 Receiver element for adjusting the focus of an imaging laser
06/20/2002WO2002021214A3 Use of acetal/ketal polymers in photoresist compositions suitable for short wave imaging
06/20/2002WO2002021211A3 Polymers and photoresist compositions for short wavelength imaging
06/20/2002WO2002011191A3 Near critical and supercritical ozone substrate treatment and apparatus for same
06/20/2002WO2002006899A3 Method for characterizing optical systems using holographic reticles
06/20/2002WO2002001296A3 Strongly water-soluble photoacid generator resist compositions
06/20/2002WO2001090817A3 Data storage medium comprising colloidal metal and preparation process thereof
06/20/2002WO2000067074A9 Streamlined ic mask layout optical and process correction through correction reuse
06/20/2002US20020078430 Manufacturing method of semiconductor device
06/20/2002US20020078429 Design method for control system, control system, adjustment method for control system, exposure method, and exposure apparatus
06/20/2002US20020078427 Integrated circuit layout and verification method
06/20/2002US20020077720 Quasi-continuous wave lithography apparatus and method
06/20/2002US20020077503 Used to prepare one-pot systems with base-catalysable oligomers or monomers having storage stability; catalysts
06/20/2002US20020077493 Novel onium salts, photoacid generators, resist compositions, and patterning process
06/20/2002US20020077426 For forming resist layer in the manufacture of semiconductor devices; comprises acrylic resin and triazine compound to serve as crosslinking agent
06/20/2002US20020077259 Stabilized alkaline compositions for cleaning microlelectronic substrates
06/20/2002US20020077244 Photolithography methods and systems
06/20/2002US20020076937 Pattern formation method
06/20/2002US20020076935 Plasma etching polymeric insulating layer in a reaction chamber containing a gaseous mixture of oxygen and an inert gas in a predermined ratio to avoid spontaneous etching
06/20/2002US20020076934 Method of removaling photoresistance
06/20/2002US20020076931 Method and system for reducing ARC layer removal during removal of photoresist
06/20/2002US20020076843 Semiconductor structure having a silicon oxynitride ARC layer and a method of forming the same
06/20/2002US20020076840 Test wafer and method for investigating electrostatic discharge induced wafer defects
06/20/2002US20020076660 Forming a resist pattern having a shrinkage-inhibiting effect on a substrate, baking pattern to release gas, film forming an electrode while keping the substrate below the baking temperature of the resist pattern, separating the resist
06/20/2002US20020076659 Apparatus and method of thermal processing and method of pattern formation
06/20/2002US20020076658 Coating and developing apparatus and pattern forming method
06/20/2002US20020076657 Coating the photosensitive paste on a substrate to a thickness in consideration of the photocurable depth known beforehand, exposing, developing; rectangular cross-section and superior high-frequency transmission
06/20/2002US20020076656 Change in temperature of the photoresist material with crosslinking polymers leads only to a minor change in critical dimension, giving a larger processing window for carrying out thermal flow
06/20/2002US20020076654 Pattern in chip areas of a photomask is transferred onto an internal area of a semiconductor wafer as ship areas including defects among the chip areas of the photomask are shielded with a light shielding body; shortens time
06/20/2002US20020076653 Using a Fence Creation and Elimination (FCE) planarization process; for VLSI (Very Large Scale Integration) technology; replaces chemical mechanical polishing to eliminate it associated defects
06/20/2002US20020076652 Photopolymerizable urethane (meth)acrylate oligomer, an acrylic copolymer containing a monomer unit having a benzene ring or a cyclohexyl group, and a photopolymerization initiator
06/20/2002US20020076651 Epoxidized polyfunctional bisphenol A formaldehyde novolak resin and photoacid generator(s), in a coating solvent of mainly cyclopentanone; use in micro electromechanical machines (MEMS)
06/20/2002US20020076650 I-line photoresist compositions
06/20/2002US20020076649 Acid generator and terpolymer, e.g. of p-tert-butoxystyrene, p-hydroxystrene and tert-butyl (alpha-isobornyloxymethyl) acrylate; dry-etching resistance, forms a patterned resist with a good sectional shape
06/20/2002US20020076645 Radiation sensitive material and method for forming pattern
06/20/2002US20020076644 Of unsaturated, high molecular weight, endgroup-modified polymers such as styrene-isoprene block living polymer terminated with methacryloyl chloride, and photoinitiator; lower solvent swell, increased softness
06/20/2002US20020076643 Novel onium salts, photoacid generators, resist compositions, and patterning process
06/20/2002US20020076642 Crosslinked polymeric particles including one or more chromophore units such as anthracenyl methacrylate; relief images
06/20/2002US20020076641 Photosensitive polymer having fused aromatic ring and photoresist composition containing the same
06/20/2002US20020076629 Exposure method and exposure system the same
06/20/2002US20020076628 Projection aligner, exposing method and semiconductor device
06/20/2002US20020076626 Method of extending the stability of a photoresist during direct writing of an image upon the photoresist
06/20/2002US20020076623 Photo mask to be used for photolithography, method of inspecting pattern defect, and method of manufacturing semiconductor device through use of the mask
06/20/2002US20020076620 Structures and structure forming methods
06/20/2002US20020076499 Coating device and coating method
06/20/2002US20020076495 Method of making electronic materials
06/20/2002US20020076306 Substrate processing system and substrate processing method
06/20/2002US20020075574 Oscillation damping system
06/20/2002US20020075481 System for reading two-dimensional images using ambient and/or projected light
06/20/2002US20020075469 Stage device and exposure apparatus and method
06/20/2002US20020075468 Projection exposure device
06/20/2002US20020075467 Exposure apparatus and method
06/20/2002US20020075466 Projection exposure system
06/20/2002US20020075458 Method for correcting spherical aberration of a projection lens in an exposure system
06/20/2002US20020074666 Semiconductor device having identification number, manufacturing method thereof and electronic device
06/20/2002US20020074635 Exposure apparatus, holder container, device manufacturing method, and device manufacturing unit
06/20/2002US20020074554 Microoptical system and fabrication method therefor
06/20/2002US20020074529 Method for dynamic manipulation of a position of a module in an optical system
06/20/2002US20020074524 Magnetically shielded electromagnetic lens assemblies for charged-particle-beam microlithography systems
06/20/2002US20020074518 Method for measuring step difference in a semiconductor device and apparatus for performing the same
06/20/2002US20020074516 Positioning stage with stationary and movable magnet tracks
06/20/2002US20020074510 Curved I-core
06/20/2002US20020074506 Multiple numerical aperture electron beam projection lithography system
06/20/2002US20020074474 Vibration isolating apparatus for table for mounting device sensitive to vibrations and method therefor
06/20/2002US20020074115 Temperature compensation apparatus for thermally loaded bodies of low thermal conductivity
06/20/2002US20020074015 Placing the substrate (with coating) in a closed chamber, contacting color filter array coating with dry ozone to remove acrylic polymer coating from the substrate and washing the substrate with ultrapure water to reuse it
06/20/2002US20020073861 Stamp, method, and apparatus
06/20/2002DE10155038A1 Imaging device for printing form image setter, has base plate of subassembly having laser diode, for detachedly connecting with counter plate of holding element
06/20/2002DE10109242C1 Illumination system has grid element(s), physical stop(s) in stop plane after grid element in beam path from object plane to field plane, collector unit producing convergent light beam
06/20/2002DE10062786A1 System zur Dämpfung von Schwingungen A system for damping vibrations
06/20/2002DE10058951A1 Production of a lithography mask comprises forming a first lacquer layer on a substrate, forming a second silylatable lacquer layer, structuring, forming a third lacquer layer
06/20/2002DE10043315C1 Projektionsbelichtungsanlage Projection exposure apparatus
06/20/2002CA2431619A1 Surface-active photoinitiators
06/20/2002CA2431358A1 Radiation sensitive refractive index changing composition and refractive index changing method
06/20/2002CA2430705A1 Surface-active photoinitiators
06/19/2002EP1215805A2 Linear motor and exposure apparatus using the same
06/19/2002EP1215524A2 Polarized light illuminator with a polarized light beam splitter
06/19/2002EP1215044A2 A laser engravable flexographic printing element and a method for forming a printing plate from the element
06/19/2002EP1214987A2 Method and apparatus for producing planographic printing plate precursors
06/19/2002EP1214731A1 Improved ladder boat for supporting wafers
06/19/2002EP1214718A1 Extreme ultraviolet soft x-ray projection lithographic method system and lithography elements
06/19/2002EP1214630A2 Microfabricated devices and method of manufacturing the same
06/19/2002EP1214614A1 Photonic crystal materials
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