| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/27/2002 | US20020081534 Method of reworking photoresist layer |
| 06/27/2002 | US20020081533 Photolithography; stabilizing resist image (of high aspect ratio) via overcasting then removing a stabilizing layer, removal of carbon dioxide removes the topcoat and dries the resist image without distortion; semiconductors |
| 06/27/2002 | US20020081529 Does not require dampening water to produce prints; development via removing silicone rubber layer in the laser-exposed area to form an image |
| 06/27/2002 | US20020081528 Exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method |
| 06/27/2002 | US20020081527 Plate-making method of lithographic printing plate |
| 06/27/2002 | US20020081526 Method for obtaining a lithographic printing surface |
| 06/27/2002 | US20020081524 Excellent in transmittance for the wavelength of fluorine excimer light, suitable for fine processing of semiconductors |
| 06/27/2002 | US20020081523 Chemical amplification type positive resist composition |
| 06/27/2002 | US20020081522 Which can be used as an offset printing master; printing plates |
| 06/27/2002 | US20020081521 Acid labile groups increase alkali solubility; having increased alkali dissolution rate before and after radiation exposure, high sensitivity, high resolution, and etching resistance |
| 06/27/2002 | US20020081520 Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applications |
| 06/27/2002 | US20020081519 For offset printing; imaging element comprises hydrophobic polymer particles in aqueous medium, a substance for converting light into heat, and an inorganic salt; for printing long run lengths on lower quality paper |
| 06/27/2002 | US20020081518 Positive resist fluid and positive resist composition |
| 06/27/2002 | US20020081517 Photolithography; contains coatings which are imageable by ultraviolet or visible radiation; photopolymerization |
| 06/27/2002 | US20020081506 Method for producing a semiconductor device |
| 06/27/2002 | US20020081505 A photosensitive material containing epoxides, cyclic or aromatic acrylic ester, a cationic photoinitiator, a free-radical photoinitiator, when exposed to actinic radiation shows specific mechanical properties |
| 06/27/2002 | US20020081504 Coating the photoresist resin containing a thermal acid generator, on a substrate to form photoresist film, exposing and developing the exposed photoresist film to obtain a pattern and heating the photoresist pattern |
| 06/27/2002 | US20020081502 Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device |
| 06/27/2002 | US20020081501 A photomask having a pattern formed with a resist on at least one face of a transparent plate, and the resist is not provided on the face atleast at a contact point with a photomask equipment |
| 06/27/2002 | US20020081500 First mask and the second mask define a transistor gate |
| 06/27/2002 | US20020081499 Novel polymers and photoresist compositions for short wavelength imaging |
| 06/27/2002 | US20020081498 Lithography mask configuration |
| 06/27/2002 | US20020081118 Substrate processing apparatus and processing method by use of the apparatus |
| 06/27/2002 | US20020080840 Spinodal copper alloy electrodes |
| 06/27/2002 | US20020080834 Light source device |
| 06/27/2002 | US20020080498 Projection optical system |
| 06/27/2002 | US20020080491 Diffractive optical element, method of fabricating the element, illumination device provided with the element, projection exposure apparatus, exposure method, optical homogenizer, and method of fabricating the optical homogenizer |
| 06/27/2002 | US20020080486 Polarized light illuminator for optical alignment |
| 06/27/2002 | US20020080485 Polarized light illuminator with a polarized light beam splitter |
| 06/27/2002 | US20020080459 Laser imaging apparatus |
| 06/27/2002 | US20020080365 Method of measuring alignment of a substrate with respect to a reference alignment mark |
| 06/27/2002 | US20020080364 Method of measuring overlay |
| 06/27/2002 | US20020080348 Method of and apparatus for article inspection including speckle reduction |
| 06/27/2002 | US20020080339 Stage apparatus, vibration control method and exposure apparatus |
| 06/27/2002 | US20020080338 Projection exposure apparatus |
| 06/27/2002 | US20020080228 Exposure system for polymeric materials |
| 06/27/2002 | US20020079467 Alignment-mark patterns defined on a stencil reticle and detectable, after lithographic transfer to a substrate, using an optical-based detector |
| 06/27/2002 | US20020079464 Lithographic apparatus, device manufacturing mehtod, and device manufactured thereby |
| 06/27/2002 | US20020079462 Alignment mark detection method, and alignment method, exposure method and device, and device production method, making use of the alignment mark detection method |
| 06/27/2002 | US20020079461 Six-axis positioning system having a zero-magnetic-field space |
| 06/27/2002 | US20020079276 Substrate positioning apparatus and exposure apparatus |
| 06/27/2002 | US20020078770 Method for confirming alignment of a substrate support mechanism in a semiconductor processing system |
| 06/27/2002 | DE10162971A1 Chemisch verstärkende, positiv arbeitende Resistmasse Chemically amplified positive resist composition |
| 06/27/2002 | DE10152582A1 Device for depicting structures using laser as source of radiation in specified region comprises objective having number of lenses |
| 06/27/2002 | DE10061248A1 Verfahren und Vorrichtung zur In-situ-Dekontamination eines EUV-Lithographiegerätes Method and apparatus for in situ decontamination of an EUV lithography device |
| 06/26/2002 | EP1217450A2 Light integrator for an irradiation device |
| 06/26/2002 | EP1217449A2 Device for exposure of a peripheral area of a film circuit board |
| 06/26/2002 | EP1217448A2 Exposure method and system |
| 06/26/2002 | EP1217447A1 Radiation-sensitive recording material having a structured back |
| 06/26/2002 | EP1217446A1 Recording material having a negative-working, radiation-sensitive layer which comprises additives for promoting developability |
| 06/26/2002 | EP1217438A2 Stereolithography using different types of vector scanning |
| 06/26/2002 | EP1217424A1 Polarized light illuminator for optical alignment |
| 06/26/2002 | EP1217412A2 Lithography objective with a first lens group comprising lenses of positive power only |
| 06/26/2002 | EP1216830A2 Negative photo- or heat- sensitive lithographic printing plate |
| 06/26/2002 | EP1216436A2 Method and apparatus for thermal processing a photosensitive element |
| 06/26/2002 | EP1216435A1 Method for synchronising positioning and exposure processes |
| 06/26/2002 | EP1216156A1 Thermal transfer element with a plasticizer-containing transfer layer and thermal transfer process |
| 06/26/2002 | EP1216146A2 Filmable material with characteristics selectively modifiable by administration of particular types of energy |
| 06/26/2002 | EP1216107A1 Method and apparatus for controlling air over a spinning microelectronic substrate |
| 06/26/2002 | CN1355449A Conformal photosensitive compoistion and lithographic printing plate made by it |
| 06/26/2002 | CN1355448A 光敏平版印版 The photosensitive planographic printing plate |
| 06/26/2002 | CN1355445A Single-base photosensitive imaging system |
| 06/26/2002 | CN1086811C Photomask for the measurement of resolution of exposure equipment |
| 06/26/2002 | CN1086630C Embossed substrate and photoreceptor device incorporating the same and method |
| 06/25/2002 | USRE37762 Scanning exposure apparatus and exposure method |
| 06/25/2002 | US6411642 Techniques for fabricating and packaging multi-wavelength semiconductor laser array devices (chips) and their applications in system architectures |
| 06/25/2002 | US6411426 Apparatus, system, and method for active compensation of aberrations in an optical system |
| 06/25/2002 | US6411387 Stage apparatus, projection optical apparatus and exposure method |
| 06/25/2002 | US6411384 Optical element made from fluoride single crystal, method for manufacturing optical element, method for calculating birefringence of optical element and method for determining direction of minimum birefringence of optical element |
| 06/25/2002 | US6411368 Projection exposure method, projection exposure apparatus, and methods of manufacturing and optically cleaning the exposure apparatus |
| 06/25/2002 | US6411367 Modified optics for imaging of lens limited subresolution features |
| 06/25/2002 | US6411366 Exposure device for printing plates including digitally controlled micromirror picture-generating unit and method of triggering same |
| 06/25/2002 | US6411365 Exposure method and exposure apparatus |
| 06/25/2002 | US6411364 Exposure apparatus |
| 06/25/2002 | US6411362 Rotational mask scanning exposure method and apparatus |
| 06/25/2002 | US6411023 Vacuum processing apparatus and ion pump capable of suppressing leakage of ions and electrons from ion pump |
| 06/25/2002 | US6410928 EUV illumination system |
| 06/25/2002 | US6410927 Semiconductor wafer alignment method using an identification scribe |
| 06/25/2002 | US6410748 Alicycli c group-containing monomer |
| 06/25/2002 | US6410670 Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same |
| 06/25/2002 | US6410628 Photoactivatable nitrogen-containing bases based on alpha-amino ketones |
| 06/25/2002 | US6410453 Method of processing a substrate |
| 06/25/2002 | US6410445 Manufacturing method for integrated sensor arrays |
| 06/25/2002 | US6410421 Semiconductor device with anti-reflective structure and methods of manufacture |
| 06/25/2002 | US6410262 Secretion factors for gram-positive microorganisms genes encoding them and methods of using it |
| 06/25/2002 | US6410213 Direct patterning of photosensitive material with single step variable dose electromagnetic radiation creating surface relief profile; lenses and gratings |
| 06/25/2002 | US6410209 Forming photoresist relief image |
| 06/25/2002 | US6410207 Using alkali developer |
| 06/25/2002 | US6410206 Mixture of (meth)acrylic acid, acrylated ester and epoxycompound |
| 06/25/2002 | US6410205 Photosensitive recording material provided with a covering layer |
| 06/25/2002 | US6410204 Containing acid generator |
| 06/25/2002 | US6410203 Positive-type planographic printing material |
| 06/25/2002 | US6410202 Thermal switchable composition and imaging member containing cationic IR dye and methods of imaging and printing |
| 06/25/2002 | US6410201 Thermal transfer element and process for forming organic electroluminescent devices |
| 06/25/2002 | US6410194 Resist film forming method and resist coating apparatus |
| 06/25/2002 | US6410192 Forming pattern |
| 06/25/2002 | US6410080 Continually dropping fluid while moving both delivery unit and surface being coated; maintaining constant contact angle |
| 06/25/2002 | US6409932 Method and apparatus for increased workpiece throughput |
| 06/25/2002 | US6409842 Method for treating surfaces of substrates and apparatus |
| 06/25/2002 | US6409072 Chemical microreactors and method for producing same |