| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/04/2002 | US20020085187 Exposure device |
| 07/04/2002 | US20020085185 Method and system of varying optical imaging performance in the presence of refractive index variations |
| 07/04/2002 | US20020085184 Exposure apparatus and pressure correction method |
| 07/04/2002 | US20020085183 Purging gas from a photolithography enclosure between a mask protective device and a patterned mask |
| 07/04/2002 | US20020085176 Projection optical system, production method thereof, and projection exposure apparatus using it |
| 07/04/2002 | US20020084429 Electron-beam patterning of functionalized self-assembled monolayers |
| 07/04/2002 | US20020084428 Extreme ultraviolet radiation transparent structure in a vacuum chamber wall, e.g. for use in a lithographic projection apparatus |
| 07/04/2002 | US20020084425 Self-cleaning optic for extreme ultraviolet lithography |
| 07/04/2002 | US20020084422 Particle-optical component and system comprising a particle-optical component |
| 07/04/2002 | US20020084186 Producing high resolution displays; grille having a set of holes applied to the screening surface that exposes a first set of areas; photoresist layer on the grille and the exposed areas of screening surface. |
| 07/04/2002 | US20020084179 Photoresponsive surfaces |
| 07/04/2002 | US20020083957 Translating the reticle within the lithography system; directing an ionized gas (especially N2) onto a mask surface of the reticle; and removing contaminants from the mask surface of the reticle. |
| 07/04/2002 | US20020083863 Metal complex solution, photosensitive metal complex solution and method for forming metallic oxide films |
| 07/04/2002 | DE10115812A1 Diaphragm for objective lens system is in region of system which is in path of projected light beam |
| 07/04/2002 | DE10064685A1 Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft Lithography lens with a first lens group consisting exclusively of lenses having a positive refractive power |
| 07/03/2002 | EP1220041A2 Method for preparing lithographic printing plate |
| 07/03/2002 | EP1220040A2 Exposure apparatus and method, device manufacturing method, and discharge lamp |
| 07/03/2002 | EP1220039A1 Multi-mirror system for illumination system |
| 07/03/2002 | EP1220038A1 Lithographic apparatus and device manufacturing method |
| 07/03/2002 | EP1220037A2 Exposure apparatus and method of manufacturing an exposure apparatus |
| 07/03/2002 | EP1220034A2 Photomask blank and photomask |
| 07/03/2002 | EP1220012A2 Optical mount unit and oscillation damping system |
| 07/03/2002 | EP1219680A1 Ultraviolet-curable resin composition |
| 07/03/2002 | EP1219668A2 Process for producing fine polymer particles and lithographic printing plate precursor containing the same |
| 07/03/2002 | EP1219660A2 Process for direct substitution of high performance polymers with unsaturated ester groups |
| 07/03/2002 | EP1219417A2 Production of masks for the production of printing forms |
| 07/03/2002 | EP1219358A2 Coating device and coating method |
| 07/03/2002 | EP1218986A1 Narrow band laser with fine wavelength control |
| 07/03/2002 | EP1218985A1 High power gas discharge laser with line narrowing unit |
| 07/03/2002 | EP1218984A1 Laser chamber with fully integrated electrode feedthrough main insulator |
| 07/03/2002 | EP1218980A1 Very narrow band injection seeded f 2? lithography laser |
| 07/03/2002 | EP1218933A1 Method and apparatus for performing run-to-run control in a batch manufacturing environment |
| 07/03/2002 | EP1218918A2 Immersion lens with magnetic shield for charged particle beam system |
| 07/03/2002 | EP1218800A2 Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition |
| 07/03/2002 | EP1218798A1 Method and apparatus for determining phase shifts and trim masks for an integrated circuit |
| 07/03/2002 | EP1218796A1 Extreme ultraviolet soft x-ray projection lithographic method and mask devices |
| 07/03/2002 | EP1218791A2 Multi-beam scanner including a dove prism array |
| 07/03/2002 | EP1007737A4 System for providing a polymorphism database |
| 07/03/2002 | EP1002264A4 Method and apparatus for providing a bioinformatics database |
| 07/03/2002 | EP0968202B1 Process for preparing photoactive coumarin dervatives |
| 07/03/2002 | EP0960347B1 Phase mask with spatially variable diffraction efficiency |
| 07/03/2002 | EP0919012B1 Positive photoresist composition containing a 2,4-dinitro-1-naphthol |
| 07/03/2002 | CN2498632Y Equivalent optical scanning plate printing device |
| 07/03/2002 | CN1357116A Fluorinated polymers, photoresists and processes for microlithography |
| 07/03/2002 | CN1357010A Optical devices made from radiation curable fluorinated compsns. |
| 07/03/2002 | CN1356595A Linear-array light source for photoetching scanner of array-type integrated circuit |
| 07/03/2002 | CN1356594A Photoresist, chemically reinforced photoresist composition and method for generating pattern |
| 07/03/2002 | CN1356593A Photosensitive planographic plate |
| 07/03/2002 | CN1356592A Process for preparing light mask |
| 07/03/2002 | CN1356356A Normal Photosensitive resin precursor composition and display using it |
| 07/03/2002 | CN1087099C Simulation method in lithographic process |
| 07/03/2002 | CN1087080C Polymer and application thereof in compsn. capable of optical imaging |
| 07/02/2002 | US6414979 Gas discharge laser with blade-dielectric electrode |
| 07/02/2002 | US6414857 Pulse width modulated control apparatus and method of using the same |
| 07/02/2002 | US6414744 Mask handling apparatus for lithographic projection apparatus |
| 07/02/2002 | US6414743 Exposure apparatus, exposure method using the same and method of manufacture of circuit device |
| 07/02/2002 | US6414742 Stage apparatus, and exposure apparatus and device manufacturing method using the same |
| 07/02/2002 | US6414326 Technique to separate dose-induced vs. focus-induced CD or linewidth variation |
| 07/02/2002 | US6414325 Charged particle beam exposure apparatus and exposure method capable of highly accurate exposure in the presence of partial unevenness on the surface of exposed specimen |
| 07/02/2002 | US6414313 Multiple numerical aperture electron beam projection lithography system |
| 07/02/2002 | US6413923 Non-corrosive cleaning composition for removing plasma etching residues |
| 07/02/2002 | US6413914 Aqueous solutions; reducing surface tension; renewable-based surfactants |
| 07/02/2002 | US6413885 Method for patterning semiconductor devices on a silicon substrate using oxynitride film |
| 07/02/2002 | US6413701 Radiation system, masking table |
| 07/02/2002 | US6413699 Layer of solid photocurable material comprises a phosphine compound as an oxygen scavenger |
| 07/02/2002 | US6413698 Photohardenable resin composition providing heat-resistant photohardened product |
| 07/02/2002 | US6413697 Photopolymerization |
| 07/02/2002 | US6413696 Liquid, radiation-curable composition, especially for producing cured articles by stereolithography having heat deflection temperatures |
| 07/02/2002 | US6413695 Enantiomorphs; exposure, development |
| 07/02/2002 | US6413687 Transfer foil and image recording material, and method for preparing image recording material |
| 07/02/2002 | US6413686 Resin composition for color filter |
| 07/02/2002 | US6413685 Method of reducing optical proximity effect |
| 07/02/2002 | US6413587 Creating patterned surfaces by masking substrate with functionalized self-assembled monolayer (sam) material bonded to polymer, while unmasked surface is non-functionalized sam; for use in microelectronics and sensors |
| 07/02/2002 | US6413400 Polycarbonate electrophoretic devices |
| 07/02/2002 | US6413147 Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
| 07/02/2002 | US6412498 For semiconductors; process control |
| 07/02/2002 | US6412497 Reduction/oxidation material removal method |
| 07/02/2002 | US6412413 Media clamp for external drum imaging system |
| 07/02/2002 | US6412326 Semiconductor calibration structures, semiconductor calibration wafers, calibration methods of calibrating semiconductor wafer coating systems, semiconductor processing methods of ascertaining layer alignment during processing and calibration methods of |
| 06/27/2002 | WO2002050877A1 Electron beam exposure system, correcting member, correcting method, and exposure method |
| 06/27/2002 | WO2002050613A2 Method of curing a photosensitive material using evanescent wave energy |
| 06/27/2002 | WO2002050583A2 Optical devices made from radiation curable fluorinated compositions |
| 06/27/2002 | WO2002050506A1 Wavefront measuring apparatus and its usage, method and apparatus for determining focusing characteristics, method and apparatus for correcting focusing characteristics, method for managing focusing characteristics, and method and apparatus for exposure |
| 06/27/2002 | WO2002023273A3 Photosensitive composition, cured article thereof, and printed circuit board using the same |
| 06/27/2002 | WO2002019032A3 Pretreated sheet product for lithographic plates |
| 06/27/2002 | WO2001099150A3 Enhanced overlay measurement marks |
| 06/27/2002 | WO2001085811A3 Copolymers for photoresists and processes therefor |
| 06/27/2002 | WO2001083580A3 Polymerizable composition, cured material thereof and method for manufacturing the same |
| 06/27/2002 | WO2001083388A8 Glass preform and methods and apparatus for manufacture thereof |
| 06/27/2002 | WO2001069963A3 Through-hole and surface mount technologies for highly-automatable hearing aid receivers |
| 06/27/2002 | WO2001044875A3 Micromolds fabricated using mems technology and methods of use therefor |
| 06/27/2002 | US20020083409 Process and device for in-situ decontamination of a EUV lithography device |
| 06/27/2002 | US20020083408 Generating mask layout data for simulation of lithographic processes |
| 06/27/2002 | US20020083401 Method for efficient manufacturing of integrated circuits |
| 06/27/2002 | US20020082801 Shape measuring method, shape measuring unit, exposure method, exposure apparatus and device manufacturing method |
| 06/27/2002 | US20020082157 Synthetic silica glass member, photolithography apparatus and process for producing photolithography apparatus |
| 06/27/2002 | US20020081860 Method for manufacturing semiconductor wafer having resist mask with measurement marks for measuring the accuracy of overlay of a photomask |
| 06/27/2002 | US20020081758 Method of manufacturing semiconductor integrated circuit device |
| 06/27/2002 | US20020081582 Making multimers such as DNA or peptides in chemical reactor by solution-based photochemical reactions involving reagents generated in situ by irradiation |
| 06/27/2002 | US20020081539 Peeling-off and white-powder adhesion is prevented; antistatic layer comprises acicular metal oxide grains |