| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/10/2002 | CN1358328A Method for removing residues with reduced ethcing of oxide |
| 07/10/2002 | CN1358281A Photosensitive element, photosensitive element roll, process for producing resist pattern with the same, resist pattern, substrate with overlying resist pattern, process for producing wiring pattern |
| 07/10/2002 | CN1358224A Stripper composition for negative chemically amplified resist |
| 07/10/2002 | CN1358131A Method for producing of three-dimensionally arranged conducting and connecting structures for volumetric and energy flows |
| 07/10/2002 | CN1357802A Light-limiting polyimide film for surface to be knurled |
| 07/10/2002 | CN1357799A Photosensitive planographic plate |
| 07/10/2002 | CN1087464C Method of manufacturing optical information carrier, arrangement for carrying out the method and optical information carrier obtained by means of the method |
| 07/10/2002 | CN1087445C Developing device for semiconductor device fabrication and its controlling method |
| 07/10/2002 | CN1087444C Exposure method and apparatus |
| 07/10/2002 | CN1087443C Ultraviolet-curable composition and method for forming cured-product patterns therefrom |
| 07/10/2002 | CN1087442C Energy ray hardened resin composition and its preparing method |
| 07/09/2002 | US6418353 Automating photolithography in the fabrication of integrated circuits |
| 07/09/2002 | US6418352 Integrated material management module |
| 07/09/2002 | US6418187 X-ray mask structure, and X-ray exposure method and apparatus using the same |
| 07/09/2002 | US6417974 Objective, in particular an objective for a semiconductor lithography projection exposure machine, and a production method |
| 07/09/2002 | US6417929 Optical measurement of lithographic power bias of minimum features |
| 07/09/2002 | US6417927 Method and apparatus for accurately compensating both long and short term fluctuations in the refractive index of air in an interferometer |
| 07/09/2002 | US6417922 Alignment device and lithographic apparatus comprising such a device |
| 07/09/2002 | US6417914 Stage device and exposure apparatus |
| 07/09/2002 | US6417912 Method and apparatus for controlling optical-parameters in a stepper |
| 07/09/2002 | US6417677 Antistatic conductive pin mounting apparatus for a photomask |
| 07/09/2002 | US6417559 Semiconductor wafer assemblies comprising photoresist over silicon nitride materials |
| 07/09/2002 | US6417516 Electron beam lithographing method and apparatus thereof |
| 07/09/2002 | US6417362 Piperazine derivatives; arteriosclerosis, pancreatitis, and cardiovascular disorder treatment; side effect reduction |
| 07/09/2002 | US6417317 Condensation polymerization of trifunctional phenolic compound with ortho- and para-positioned hydrogens in presence of aldehyde or ketone; positive photoresists, coatings; heat resistance |
| 07/09/2002 | US6417243 Monomers, oligomers and polymers comprising terminal oxirane groups, their process of preparation and their cationic polymerization under irradiation |
| 07/09/2002 | US6417117 Spin coating spindle and chuck assembly |
| 07/09/2002 | US6417113 Multilayer structure with electroconductive layer, silicide layer, silicon nitride layer, patterns of germanium silicon alloy and removal |
| 07/09/2002 | US6417112 Removal of etch residues from integrated circuits with dielectric and copper material with water or solvents |
| 07/09/2002 | US6417080 Method of processing residue of ion implanted photoresist, and method of producing semiconductor device |
| 07/09/2002 | US6416952 Photolithographic and other means for manufacturing arrays |
| 07/09/2002 | US6416939 Method for negative image recording |
| 07/09/2002 | US6416938 Forming a film with plasma deposition on photosensitive film on substrate and silicon donor with silane, disilane and nonsilicon exposure to ultraviolet radiation |
| 07/09/2002 | US6416936 Top surface imaging technique for top pole tip width control in magnetoresistive read/write head processing |
| 07/09/2002 | US6416934 Manufacturing method of a surface acoustic wave device |
| 07/09/2002 | US6416932 Producing patterns on substrates, coating on polymer, phenolic resin, heat sensitive, reduced adhesive interaction with inks for use in waterless lithographic printing |
| 07/09/2002 | US6416931 Wherein lowering of brightness is suppressed in a plasma display panel |
| 07/09/2002 | US6416930 Copolymers of vinylimidazole with a water-soluble film-forming monmer other than vinylimidazole and a fluorine containing surfactant; a semiconductor device can be produced without clogging of waste fluids in a waste pipe |
| 07/09/2002 | US6416928 Onium salts, photoacid generators, resist compositions, and patterning process |
| 07/09/2002 | US6416927 Chemically amplified resist compositions |
| 07/09/2002 | US6416926 Terpolymer of thiabicycloester, norbornene acids and esters, and maleic anhydride; excellent adhesion; inexpensive |
| 07/09/2002 | US6416925 Photoresists comprised of adamantane-containing addition polymers and acid generators; good resolution under very short ultraviolet radiation; uniform material |
| 07/09/2002 | US6416922 Dry processing photography |
| 07/09/2002 | US6416913 Scanning mask and work-piece to transfer pattern and changing imaging characteristics to correct for changes caused by thermal properties; reduced magnification error and distortion |
| 07/09/2002 | US6416909 Alternating phase shift mask and method for fabricating the alignment monitor |
| 07/09/2002 | US6416908 Projection lithography on curved substrates |
| 07/09/2002 | US6416907 Phase shift masks that reliably print densely-packed circuit layouts with small circuit features; reduced variation between print and circuit layouts; computer used to automate conversion of layout to phase shift mask; improved efficiency |
| 07/09/2002 | US6416583 Film forming apparatus and film forming method |
| 07/04/2002 | WO2002052624A1 Exposure device, optical member mounting member, optical member detaching jig, and method of manufacturing device |
| 07/04/2002 | WO2002052623A1 Electron beam exposure system and electron beam irradiation position calibrating member |
| 07/04/2002 | WO2002052622A1 Exposure mask, method for manufacturing the mask, and exposure method |
| 07/04/2002 | WO2002052620A1 Wavefront aberration measuring instrument, wavefront aberration measuring method, exposure apparatus, and method for manufacturing microdevice |
| 07/04/2002 | WO2002052351A1 Method of measuring overlay |
| 07/04/2002 | WO2002052350A1 Method of measuring alignment of a substrate with respect to a reference alignment mark |
| 07/04/2002 | WO2002052349A2 Process for removal of photoresist after post ion implantation |
| 07/04/2002 | WO2002052348A1 Projection lithography using a phase shifting aperture |
| 07/04/2002 | WO2002052347A1 Mitigation of radiation induced surface contamination |
| 07/04/2002 | WO2002052346A1 Objective with at least one aspherical lens |
| 07/04/2002 | WO2002052345A1 Method and device for mask cleaning, and device manufacturing system |
| 07/04/2002 | WO2002052344A2 Manufacturing integrated circuits using phase-shifting masks |
| 07/04/2002 | WO2002052303A2 Projection lens |
| 07/04/2002 | WO2002052061A1 Radiation-induced self-terminating protective coatings |
| 07/04/2002 | WO2002051637A1 Method for obtaining a lithographic printing surface |
| 07/04/2002 | WO2002051636A1 Thermally convertible lithographic printing precursor |
| 07/04/2002 | WO2002036652A3 Photopatternable sorbent and functionalized films |
| 07/04/2002 | WO2002027406A3 Illumination system particularly for microlithography |
| 07/04/2002 | WO2002027401A3 Illumination system particularly for microlithography |
| 07/04/2002 | WO2002025724A3 Correction of overlay offset between inspection layers in integrated circuits |
| 07/04/2002 | WO2002014954A3 Antireflective coating compositions |
| 07/04/2002 | US20020087943 Exposure method, exposure system and recording medium |
| 07/04/2002 | US20020087033 Novel tertiary alcohol compounds having an alicyclic structure |
| 07/04/2002 | US20020086968 Polybenzoxazole precursors, photoresist solution, polybenzoxazole, and process for preparing a polybenzoxazole precursor |
| 07/04/2002 | US20020086934 Anti-reflection coating forming composition |
| 07/04/2002 | US20020086549 Resist mask having measurement marks for measuring the accuracy of overlay of a photomask disposed on semiconductor wafer |
| 07/04/2002 | US20020086245 Method and apparatus for the manufacturing of reticles |
| 07/04/2002 | US20020086244 Forming a protective layer on aluminum layer, thereby exposing protective layer to solution while reducing surface area of aluminum layer exposed to solution, to inhibit diffusion of solution through aluminum layer into tin oxide layer |
| 07/04/2002 | US20020086242 Novel low defect developer rinse process for 0.15 micron cmos technology |
| 07/04/2002 | US20020086239 Photosensitive composition |
| 07/04/2002 | US20020086236 Suitable as electrically insulating protective layers for delicate, fragile conductive traces of the type produced by etching copper layers to form printed circuits |
| 07/04/2002 | US20020086235 Planographic printing |
| 07/04/2002 | US20020086234 Ammonium salt of organic acid and resist composition containing the same |
| 07/04/2002 | US20020086233 Useful in a lithographic printing plates |
| 07/04/2002 | US20020086232 Disposing active primer between receptor substrate and a thermal transfer donor; disposing transfer assist layer on active primer; selectively thermally transferring portion of transfer layer from donor to receptor |
| 07/04/2002 | US20020086226 Photosensitive resin composition, resist composition, fabricating method for patterned substrate, and device |
| 07/04/2002 | US20020086224 For use in photolithography for fabricating semiconductor devices, image pick-up devices, display devices such as liquid crystal panels, and magnetic heads |
| 07/04/2002 | US20020086223 Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method |
| 07/04/2002 | US20020086222 Photomask and manufacturing method of an electronic device therewith |
| 07/04/2002 | US20020086221 Efficiency |
| 07/04/2002 | US20020085842 Apparatus and method for recording on a black & white film information comprising a pattern of coloured light and apparatus and method for reconstructing from a black & white image such information |
| 07/04/2002 | US20020085757 Surface position detecting method |
| 07/04/2002 | US20020085606 Injection seeded laser with precise timing control |
| 07/04/2002 | US20020085297 Method and device for improved lithographic critical dimension control |
| 07/04/2002 | US20020085291 Mounting device for an optical element |
| 07/04/2002 | US20020085286 Projection exposure device |
| 07/04/2002 | US20020085276 Illumination optical apparatus and exposure apparatus provided with illumination optical apparatus |
| 07/04/2002 | US20020085271 Broad spectrum ultraviolet catadioptric imaging system |
| 07/04/2002 | US20020085192 Gas-actuated stages including reaction-force-canceling mechanisms for use in charged-particle-beam microlithography systems |
| 07/04/2002 | US20020085191 Device for exposure of a peripheral area of a film circuit board |
| 07/04/2002 | US20020085190 Manufacturing method in manufacturing line, manufacturing method for exposure apparatus, and exposure apparatus |
| 07/04/2002 | US20020085188 Apparatus and method for compensating for distortion of a printed circuit workpiece substrate |