| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/16/2002 | US6420100 Process for making deflection member using three-dimensional mask |
| 07/16/2002 | US6420098 Deep ultraviolet (deep uv) photoresists; etch resistance is increased, resist decomposition during etch is prevented by specific chemical poisoning (amine or ammonia) to prevent the acid generation; reducing processing time |
| 07/16/2002 | US6420095 Etching amorphous carbon film at high etching selection ratio relative to resist film; dry etching using reducing fluoride gas, halogen gas, and gas containing oxygen; reducing fluoride gas is sf6, nf3, cf4, or chf3 |
| 07/16/2002 | US6420094 Photolithography for precise processing of semiconductors; improved resolution; deformation illumination system optimal for photomask pattern; irradiating a phase shift exposure mask |
| 07/16/2002 | US6420091 Method of producing lithographic printing plate |
| 07/16/2002 | US6420090 Liquid photocurable composition, water-based photocurable composition and resist pattern-forming method by use of the same |
| 07/16/2002 | US6420089 Polymeric organic binder, radiation-absorbing component and overcoat; daylight processing; high degree of light sensitivity without affecting other properties such as developability, ink acceptance and storage stability |
| 07/16/2002 | US6420088 Polysiloxane and polysilsesquioxanes with chromophores attached, crosslinking component, acid generator; outstanding optical, mechanical and etch selectivity properties; spin-on application; lithography, semiconductors |
| 07/16/2002 | US6420087 Direct positive lithographic plate |
| 07/16/2002 | US6420085 Resist compositions and patterning process |
| 07/16/2002 | US6420084 Radiation-sensitive resist comprising a polysilsesquioxane; patterned metal layer selected from cr, cu, al, and alloys, lithography |
| 07/16/2002 | US6420082 Positive resist fluid and positive resist composition |
| 07/16/2002 | US6420081 Process for the production of back-coating recording material for the production of offset printing plates |
| 07/16/2002 | US6420077 Line width offsets due to proximity effect are eliminated by referring to the contact hole model. |
| 07/16/2002 | US6420075 Mask for manufacturing semiconductor device and method of manufacture thereof |
| 07/16/2002 | US6420074 Shrinking integrated circuit designs using a two mask process: a phase shift mask and a single phase structure mask; prevention of erasure of phase shifting regions and the creation of undesirable artifact regions; minimization |
| 07/16/2002 | US6419408 Developing process and developing unit |
| 07/16/2002 | US6418946 Apparatus for automatically cleaning resist nozzle |
| 07/16/2002 | US6418849 Sheet body fixing device having clamp with uniform nipping force |
| 07/16/2002 | CA2102107C Stereolithography using vinyl ether-epoxide polymers |
| 07/16/2002 | CA2059144C Bisacylphosphine sulfides |
| 07/11/2002 | WO2002054837A2 Direct pattern writer |
| 07/11/2002 | WO2002054500A1 Integrated-circuit technology photosensitive sensor |
| 07/11/2002 | WO2002054465A1 Electron beam exposure system and electron beam shaping member |
| 07/11/2002 | WO2002054464A1 Method and system for exposure |
| 07/11/2002 | WO2002054463A1 Exposure device |
| 07/11/2002 | WO2002054462A1 Stage device, exposure device, method of adjusting multipoint position detection system, exposure method, and device manufacturing method |
| 07/11/2002 | WO2002054461A1 Photomask unit, photomask device, projection exposure device, projection exposure method and semiconductor device |
| 07/11/2002 | WO2002054460A1 Exposure device |
| 07/11/2002 | WO2002054459A1 Projection optical system and production method therefor, exposure system and production method therefor, and production method for microdevice |
| 07/11/2002 | WO2002054458A2 Method for the manufacture of micro structures |
| 07/11/2002 | WO2002054416A1 Method for patterning electroconductive tin oxide film |
| 07/11/2002 | WO2002054413A1 Device for x-ray lithography |
| 07/11/2002 | WO2002054156A1 Method of controlling photoresist stripping process and regenerating photoresist stripper composition based on near infrared spectrometer |
| 07/11/2002 | WO2002054154A2 Method for the production of thermally cross-linked laser engravable flexographic elements |
| 07/11/2002 | WO2002054153A1 Illumination system with vacuum chamber wall having transparent structure |
| 07/11/2002 | WO2002054115A2 A self-cleaning optic for extreme ultraviolet lithography |
| 07/11/2002 | WO2002054036A1 Imaging characteristics measuring method, imaging characteriatics adjusting method, exposure method and system, program and recording medium, and device producing method |
| 07/11/2002 | WO2002053795A1 Device and method for deposition, electron beam exposure device, deflecting device, and method of manufacturing deflecting device |
| 07/11/2002 | WO2002053627A1 Two-layer imageable element comprising thermally reversible polymers |
| 07/11/2002 | WO2002053626A1 Imageable element and composition comprising thermally reversible polymers |
| 07/11/2002 | WO2002053300A1 Method and apparatus for critical flow particle removal |
| 07/11/2002 | WO2002044817A3 Making an integrated circuit using polarized light |
| 07/11/2002 | WO2002027402A3 Illumination system particularly for microlithography |
| 07/11/2002 | WO2002027400A3 Illumination system particularly for microlithography |
| 07/11/2002 | WO2002025374A3 Antireflective composition |
| 07/11/2002 | WO2001046999A3 Method and apparatus for supercritical processing of a workpiece |
| 07/11/2002 | WO2001042856A3 A method and a plate for digitally-imaged offset printing |
| 07/11/2002 | WO2000055573A9 Systems and methods for characterizing and correcting cyclic errors in distance measuring and dispersion interferometry |
| 07/11/2002 | US20020091438 Stent design |
| 07/11/2002 | US20020091216 5-norbornene-2-carboxylic acid-3-hydroxyethyl carboxylate for example; far ultraviolet photolithography |
| 07/11/2002 | US20020091215 Lactone ring-substituted norbornene based polymers; photoresists; resolution, etching resistance, use in micropatterning with electron beams or deep-ultraviolet radation |
| 07/11/2002 | US20020090833 Recess formed selectively in a main surface of insulating film including an alkylsilane bond; and a surface protective layer including Si-H bond, being formed in a surface of said insulating film in an inner wall of said recess. |
| 07/11/2002 | US20020090832 Method for forming micro-pattern of semiconductor device |
| 07/11/2002 | US20020090827 Method of processing residue of ion implanted photoresist, and method of producing semiconductor device |
| 07/11/2002 | US20020090809 Method of manufacturing semiconductor device having passivation film and buffer coating film |
| 07/11/2002 | US20020090735 Protection of semiconductor fabrication and similar sensitive processes |
| 07/11/2002 | US20020090580 Disk substrate and manufacturing method therefor, and disk manufactured by the disk substrate |
| 07/11/2002 | US20020090577 Method for forming-photoresist mask |
| 07/11/2002 | US20020090576 Resist surface of the exposed (or unexposed) area is silylated while the unexposed (or exposed) area is not silylated; reactive ion etching to do dry development after exposure and silylation of a photoresist pattern. |
| 07/11/2002 | US20020090575 Developing a selectively exposed resist pattern, on an integrated circuit wafer, which avoids damage to the resist pattern and allows greater freedom in the choice of resists. |
| 07/11/2002 | US20020090574 Polymers and use thereof |
| 07/11/2002 | US20020090573 Resin with radical polymerization groups and carboxyl groups obtained by reacting a cyclic ether vinyl monomer to addition copolymer with carboxylic groups; polyfunctional acrylate; cyclic ether (e.g., epoxide); photopolymerization initiator |
| 07/11/2002 | US20020090572 Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applications |
| 07/11/2002 | US20020090571 Acid generating agent which is an iodonium salt with a fluoroalkyl sulfonate ion; interpolymer of vinylphenol, styrene and an alkyl (meth)acrylate; solubility-reducing group capable of being eliminated by acid |
| 07/11/2002 | US20020090570 Positive-working chemical-amplification photoresist composition |
| 07/11/2002 | US20020090569 Radiation-sensitive resin composition |
| 07/11/2002 | US20020090568 Prepared from acetoxystyrene and either 5-benzofuranonyl (meth)acrylate or 3-hydroxy-4-chromenon-6-yl (meth)acrylate |
| 07/11/2002 | US20020090567 Terpolymer of 50-85% of (a) hydroxyl group-containing styrene units, 15-35% of (b) styrene units, and 2-20% of (c) tert-butyl (meth)acrylate units; and 1-20 parts by weight of a radiation-sensitive acid-generating agent |
| 07/11/2002 | US20020090565 Methods and apparatus for manufacturing electronic and electromechanical elements and devices by thin-film deposition and imaging |
| 07/11/2002 | US20020090564 Polyamic acid ester and/or a polyamic acid having specific end groups; compound having a phenolic hydroxyl group; and a quinonediazide sulfonate. |
| 07/11/2002 | US20020090518 Inhibiting polarization mode dispersion of lithography light utilizing low birefringence mask blanks and photomasks; for manufacturing integrated circuits with deep ultraviolet wavelengths; semiconductors |
| 07/11/2002 | US20020090494 Substrate for liquid crystal display and method of fabricating the same |
| 07/11/2002 | US20020090452 Terpolymer of units 9-anthracenemethylimineethyl acrylate, 2-hydroxyethyl acrylate, and 9-anthracenemethyl methacrylate; semiconductors |
| 07/11/2002 | US20020090172 Multiplex laser light source and exposure apparatus |
| 07/11/2002 | US20020090054 Apparatus and method for containing debris from laser plasma radiation sources |
| 07/11/2002 | US20020089766 Adjusting apparatus for an optical element in a lens system |
| 07/11/2002 | US20020089734 Apparatus, system, and method for active compensation of aberrations in an optical system |
| 07/11/2002 | US20020089671 Interferometric servo control system for stage metrology |
| 07/11/2002 | US20020089657 Stage devices configured for use in a vacuum environment of a charged-particle-beam microlithography apparatus |
| 07/11/2002 | US20020089656 Containers for lithography mask and method of use |
| 07/11/2002 | US20020089655 Substrate transport apparatus and method |
| 07/11/2002 | US20020089654 Projection exposure apparatus and device manufacturing method using the same |
| 07/11/2002 | US20020089652 Exposure control apparatus in a lithography system and method thereof |
| 07/11/2002 | US20020089340 Method for measuring reticle leveling in stepper |
| 07/11/2002 | US20020089239 Linear motor and exposure apparatus using the same |
| 07/11/2002 | US20020088951 Method and apparatus for detecting aberrations in an optical system |
| 07/11/2002 | US20020088772 Chemical imaging of a lithographic printing plate |
| 07/11/2002 | US20020088544 Substrate processing apparatus |
| 07/11/2002 | US20020088478 Holding substrate in tank and filling tank with gas mixture comprising water vapor, ozone and an additive acting as a scavenger |
| 07/11/2002 | DE10100546A1 Vorrichtung zur Verstellung eines optischen Elementes in einem Objektiv Device for adjusting an optical element in an objective |
| 07/11/2002 | DE10100514A1 Verfahren zur Herstellung von thermisch vernetzten, lasergravierbaren Flexodruckelementen A process for preparing thermally crosslinked, laser-engravable flexographic printing elements |
| 07/11/2002 | DE10100265A1 Beleuchtungssystem mit Rasterelementen unterschiedlicher Größe Lighting system with raster elements of different sizes |
| 07/11/2002 | DE10065198A1 Lichtintegrator für eine Beleuchtungseinrichtung Light integrator for a lighting device |
| 07/11/2002 | DE10063819A1 Maskenerstellung zur Herstellung einer Druckform Mask creation of producing a printing forme |
| 07/11/2002 | DE10063591A1 Strahlungsempfindliches Aufzeichnungsmaterial mit strukturierter Rückseite A radiation-sensitive recording material with textured back |
| 07/11/2002 | CA2432528A1 Integrated-circuit technology photosensitive sensor |
| 07/10/2002 | EP1221634A2 Illumination system with array elements of different sizes |
| 07/10/2002 | EP1221072A1 Contact hole production by means of crossing sudden phase shift edges of a single phase mask |
| 07/10/2002 | EP1220879A1 Modified pigments having steric and amphiphilic groups |