| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/23/2002 | US6423456 Method for manufacture of electronic parts |
| 07/23/2002 | US6423455 Method for fabricating a multiple masking layer photomask |
| 07/23/2002 | US6423380 Spraying liquid dielelctric layers on a rotating substrate to form films having uniform thickness |
| 07/23/2002 | US6423206 Method for electrochemical roughening of a substrate |
| 07/23/2002 | US6423139 Chemical liquid treatment apparatus |
| 07/23/2002 | US6423138 Coating apparatus having a cascade wall and metering blade, and a cleaning and recirculation arrangement for the coating apparatus |
| 07/23/2002 | US6422918 Chemical-mechanical polishing of photoresist layer |
| 07/23/2002 | US6422246 Method removing residual photoresist |
| 07/18/2002 | WO2002056468A2 Method and system for efficient and accurate filtering and interpolation |
| 07/18/2002 | WO2002056432A1 Smart laser with fast deformable grating |
| 07/18/2002 | WO2002056354A1 Method for forming a pattern and a semiconductor device |
| 07/18/2002 | WO2002056114A2 Projection system for euv lithography |
| 07/18/2002 | WO2002056113A2 Method for producing an etching mask |
| 07/18/2002 | WO2002056072A1 Method and system for manufacturing optical elements and optical element |
| 07/18/2002 | WO2002055286A1 Protective film peeling machine for printed circuit boards |
| 07/18/2002 | WO2002027405A3 Illumination system particularly for microlithography |
| 07/18/2002 | WO2002022360A3 Printing plate |
| 07/18/2002 | WO2002010857A3 Process for making a periodic profile |
| 07/18/2002 | WO2002008836A3 Method and device for thermally treating a photoresist layer on a circuit substrate, especially a semiconductor wafer |
| 07/18/2002 | WO2001084599A3 Uv-enhanced silylation process to increase etch resistance of ultra thin resists |
| 07/18/2002 | WO2001080306A3 Automated process monitoring and analysis system for semiconductor processing |
| 07/18/2002 | US20020095018 Comprising silicon-based compound and incorporatable organic absorbing compound that absorbs light at a wavelength less than 375 nm, wherein one of the silicon or absorber compounds comprises an alkyl, an alkoxy, a ketone, or an azo group |
| 07/18/2002 | US20020094692 Method for carrying out a plasma etching process |
| 07/18/2002 | US20020094688 Method of forming fine patterns |
| 07/18/2002 | US20020094593 Method for adjusting optical properties of an anti-reflective coating layer |
| 07/18/2002 | US20020094496 Applying in a predetermined pattern an activating light curable liquid to a portion of a substrate, surface area of the substrate is less than that of the template |
| 07/18/2002 | US20020094495 Method for manufacture of fresnel lens sheet and method for manufacture of molding die for fresnel lens sheet |
| 07/18/2002 | US20020094492 Binary photomask with chrome regions that define non-critical dimension features and also protect for phase shift exposure of critical dimensions |
| 07/18/2002 | US20020094489 Photolithography for fine patterned resist layer having orthogonal cross-section profile with high photosensitivity and pattern resolution by exposure to excimer laser; for manufacture of semiconductors |
| 07/18/2002 | US20020094488 Positive type photosensitive resin composition and method for forming resist pattern |
| 07/18/2002 | US20020094485 Colored photosensitive composition |
| 07/18/2002 | US20020094483 Pattern is transferred to photoresist on semiconductor wafer via reduction projection exposure to variety of waverlengths using photomask; photolithography |
| 07/18/2002 | US20020094482 Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures |
| 07/18/2002 | US20020094382 Method of forming conductive pattern |
| 07/18/2002 | US20020094370 Apparatus and method of forming liquid film |
| 07/18/2002 | US20020094306 Gas recirculating system is blown into the sealed vacuum chamber so gas flow is in a predetermined direction along the processing portion; for semiconductor manufacture (X-ray exposure) |
| 07/18/2002 | US20020094257 Workpiece sorter operating with modular bare workpiece stockers and/or closed container stockers |
| 07/18/2002 | US20020094063 Laser plasma EUV light source apparatus and target used therefor |
| 07/18/2002 | US20020094005 Fan for gas discharge laser |
| 07/18/2002 | US20020093656 Exposure apparatus |
| 07/18/2002 | US20020093648 Methods and systems for determining an implant characterstic and a presence of defects on a specimen |
| 07/18/2002 | US20020093637 Reaction mass for a stage device |
| 07/18/2002 | US20020093636 Illumination system and exposure apparatus and method |
| 07/18/2002 | US20020093635 Position detection apparatus having a plurality of detection sections, and exposure apparatus |
| 07/18/2002 | US20020093634 Quick chamber seals |
| 07/18/2002 | US20020093632 Three-dimensional fabrication using entangled-photon lithography |
| 07/18/2002 | US20020093600 Array substrate for a liquid crystal display device and method of manufacturing the same |
| 07/18/2002 | US20020093122 camouflaging surface treatments having reduced visibility to vision enhancing devices, and surfaces providing reduced muffling |
| 07/18/2002 | US20020093119 Silicon micro-mold and method for fabrication |
| 07/18/2002 | US20020093077 Positive-type photosensitive polyimide precursor and composition comprising the same |
| 07/18/2002 | US20020093069 Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof |
| 07/18/2002 | US20020092993 Scaling method for a digital photolithography system |
| 07/18/2002 | US20020092964 Wafer edge exposure apparatus, and wafer edge exposure method |
| 07/18/2002 | US20020092825 Creating a mask for producing a printing plate |
| 07/18/2002 | US20020092436 Developing solution for photosensitive lithographic printing plate, plate-making method of lithographic printing plate, and photosensitive lithographic printing plate |
| 07/18/2002 | US20020092369 Method for confirming alignment of a substrate support mechanism in a semiconductor processing system |
| 07/18/2002 | DE10146476A1 Verfahren zum Herstellen einer Halbleitervorrichtung mit einem Passivierungsfilm und einem Pufferüberzugsfilm A method of manufacturing a semiconductor device with a passivation film and a buffer coating film |
| 07/18/2002 | DE10064889A1 Aufzeichnungsmaterial mit negativ arbeitender, strahlungsempfindlicher Schicht, die Zusätze zur Förderung der Entwickelbarkeit enthält A recording material with negative working radiation-sensitive layer, the additives to promote the developability |
| 07/18/2002 | DE10058990A1 Illuminating object to record visual product involves using at least one lens with electrically variable focal length; at least one optical arrangement based on domain inversion can be used |
| 07/17/2002 | EP1223471A1 Substrate positioning apparatus and exposure apparatus |
| 07/17/2002 | EP1223470A1 Method for forming pattern |
| 07/17/2002 | EP1223469A1 Lithographic apparatus |
| 07/17/2002 | EP1223468A1 Lithographic projection Apparatus and device manufacturing method |
| 07/17/2002 | EP1223467A2 Positive image-forming material |
| 07/17/2002 | EP1223196A2 Negative image-recording material and cyanine dye |
| 07/17/2002 | EP1222842A1 Production of a dense mist of micrometric droplets in particular for extreme uv lithography |
| 07/17/2002 | EP1222497A1 Uv-absorbing support layers and flexographic printing elements comprising same |
| 07/17/2002 | EP1222496A1 Resist ink composition |
| 07/17/2002 | EP1222233A1 A method for synthesizing polymeric azo dyes |
| 07/17/2002 | EP1115545B1 Device and method for transferring microstructures |
| 07/17/2002 | CN2501079Y Reflecting cover device for ultravioet ray lamp of exposure meter |
| 07/17/2002 | CN2501078Y Float bottom frame device for exposure meter |
| 07/17/2002 | CN2501077Y Energy integrating controller for exposure meter |
| 07/17/2002 | CN1359349A Cassette buffering within a minienvironment |
| 07/17/2002 | CN1359337A Thermal transfer of a black matrix containing carbon black |
| 07/17/2002 | CN1359316A Method of removing organic materials from substrates |
| 07/17/2002 | CN1359032A Photoinduction SiO2 gel preparation and microfine pattern making method thereof |
| 07/17/2002 | CN1359031A Original plate for lithographic printing plate |
| 07/17/2002 | CN1358610A 抛光方法 Polishing method |
| 07/16/2002 | US6421820 Semiconductor device fabrication using a photomask with assist features |
| 07/16/2002 | US6421573 Quasi-continuous wave lithography apparatus and method |
| 07/16/2002 | US6421457 Process inspection using full and segment waveform matching |
| 07/16/2002 | US6421188 Optical element |
| 07/16/2002 | US6421180 Apparatus for generating a laser pattern on a photomask and associated methods |
| 07/16/2002 | US6421129 Pattern reading apparatus |
| 07/16/2002 | US6421123 Position detecting apparatus |
| 07/16/2002 | US6421122 Inspection method, apparatus and system for circuit pattern |
| 07/16/2002 | US6421113 Photolithography system including a SMIF pod and reticle library cassette designed for ESD protection |
| 07/16/2002 | US6421112 Movable support in a vacuum chamber and its application in lithographic projection apparatuses |
| 07/16/2002 | US6421111 Multiple image reticle for forming layers |
| 07/16/2002 | US6420819 Packaged strain actuator |
| 07/16/2002 | US6420766 Transistor having raised source and drain |
| 07/16/2002 | US6420716 Servo control method and its application in a lithographic apparatus |
| 07/16/2002 | US6420714 Electron beam imaging apparatus |
| 07/16/2002 | US6420713 Image position and lens field control in electron beam systems |
| 07/16/2002 | US6420271 Method of forming a pattern |
| 07/16/2002 | US6420247 Method of forming structures on a semiconductor including doping profiles using thickness of photoresist |
| 07/16/2002 | US6420224 Stepper alignment mark formation with dual field oxide process |
| 07/16/2002 | US6420169 Device for generating preferential nucleotide sequences; for use as tools drug design |
| 07/16/2002 | US6420101 Method of reducing post-development defects in and around openings formed in photoresist by use of non-patterned exposure |