| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/25/2002 | WO2002057814A2 Diffraction grating-based wavelength selection unit |
| 07/25/2002 | WO2002057513A1 Semiconductor stripping composition containing 1,3-dicarbonyl compounds |
| 07/25/2002 | WO2002019040A9 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization |
| 07/25/2002 | WO2001099164A3 Patterning method using a removable inorganic antireflection coating |
| 07/25/2002 | WO2001098830A3 Modification of mask layout data to improve mask fidelity |
| 07/25/2002 | WO2001087534A3 Method and system for precisely positioning a waist of a material-processing laser beam to process microstructures within a laser-processing site |
| 07/25/2002 | WO2001081970A3 Apparatus, system, and method for precision positioning and alignment of a lens in an optical system |
| 07/25/2002 | WO2001001025A9 Microfabricated elastomeric valve and pump systems |
| 07/25/2002 | US20020100013 Exposure processing method and exposure system for the same |
| 07/25/2002 | US20020100012 Focus monitoring method, exposure apparatus, and exposure mask |
| 07/25/2002 | US20020099147 Solubility in alkaline aqueous solution in the presence of a proton; for use in photolithography |
| 07/25/2002 | US20020099111 Novel photoinitiators and applications therefor |
| 07/25/2002 | US20020098709 Method for removing photoresist layer on wafer edge |
| 07/25/2002 | US20020098605 Automated variation of stepper exposure dose based upon across wafer variations in device characteristics, and system for accomplishing same |
| 07/25/2002 | US20020098458 Substrate processing apparatus |
| 07/25/2002 | US20020098447 Overcoat is substantially conformally coated on the photosensitive layer surface so that the surface of the overcoat has peaks and valleys substantially corresponding to the major peaks and valleys of the substrate microscopic |
| 07/25/2002 | US20020098444 Aromatic polyimide precursor, wherein a 10 mu m thick polyimide film made from the resin and deposited on a silicon substrate has light transmittance at a wavelength of 365 nm of at least 1% and a residual stress of at most 25 MPa. |
| 07/25/2002 | US20020098443 Preventing a resist film from thinning and also for enhancing the resolution and focus margin of resist; heterocyclic amine compounds having a hydrating group such as a hydroxy, ether, ester, carbonyl, carbonate group or lactone ring |
| 07/25/2002 | US20020098442 Alicyclic protecting groups bond to a base resin such that elimination of the protecting groups from the resist resin increases its alkali- solubility. |
| 07/25/2002 | US20020098441 Resin useful for resist, resist composition and pattern forming process using the same |
| 07/25/2002 | US20020098440 Positive photoresist composition for far ultraviolet ray exposure |
| 07/25/2002 | US20020098427 Contact hole model-based optical proximity correction method |
| 07/25/2002 | US20020098426 Semiconductors; photoresists; polarizing light alignment tool/filter |
| 07/25/2002 | US20020098424 Electrically programmable photolithography mask |
| 07/25/2002 | US20020098421 Photolithography; photomask and integrated circuit development within same clean room |
| 07/25/2002 | US20020098364 Silicone elastomer stamp with hydrophilic surfaces and method of making same |
| 07/25/2002 | US20020098288 Method of manufacturing lithographic printing plate |
| 07/25/2002 | US20020098283 Mounting a substrate inside an enclosed housing, passing a control gas through an inlet, depositing the polymer, spinning the substrate, and exhausting the control gas and any solvent vapor |
| 07/25/2002 | US20020097758 Projection exposure apparatus and device manufacturing method using the same |
| 07/25/2002 | US20020097495 Point array maskless lithography |
| 07/25/2002 | US20020097493 Graded anti-reflective coatings for photolithography |
| 07/25/2002 | US20020097440 Procedure for photo engraving in high definition on metal |
| 07/25/2002 | US20020097406 Methods and systems for determining a thickness of a structure on a specimen and at least one additional property of the specimen |
| 07/25/2002 | US20020097399 Single tone process window metrology target and method for lithographic processing |
| 07/25/2002 | US20020097387 Illumination system and exposure apparatus and method |
| 07/25/2002 | US20020097386 Detection apparatus and exposure apparatus using the same |
| 07/25/2002 | US20020097385 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 07/25/2002 | US20020097205 Semiconductor manufacturing apparatus |
| 07/25/2002 | US20020096946 Coil with cooling means |
| 07/25/2002 | US20020096666 Alkali development type photocurable composition and calcined pattern obtained by use of the same |
| 07/25/2002 | US20020096651 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 07/25/2002 | US20020096647 Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby |
| 07/25/2002 | US20020096646 Electron beam proximity exposure apparatus and method |
| 07/25/2002 | US20020096640 Magnetic shielding for charged-particle-beam optical systems |
| 07/25/2002 | US20020096256 Application of an ozonated DI water spray to resist residue removal processes |
| 07/25/2002 | US20020096195 Pump for gas flow into tube or slot in juxtaposition with first end and surface to be cleaned, so gas flow forms shock wave to dislodge particles from surface of semiconductor wafers, reticles |
| 07/25/2002 | DE10201818A1 High-resolution photoengraving on metal, especially metal-coated ceramics |
| 07/25/2002 | DE10145016A1 Vorrichtung zur Regulierung des Breiterdruckens (Fan-Out) einer Bahn Device for regulating the Broad printing (fan-out) of a web |
| 07/25/2002 | DE10138313A1 Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm Collector for Beleuchtugnssysteme with a wavelength <193 nm |
| 07/25/2002 | DE10101734A1 Verfahren zum Ausbilden einer Ätzmaske A method of forming an etching mask |
| 07/25/2002 | CA2332190A1 Addressable semiconductor array light source for localized radiation delivery |
| 07/24/2002 | EP1225493A2 Alignment apparatus and method |
| 07/24/2002 | EP1225482A1 Lithographic apparatus and device manufacturing method |
| 07/24/2002 | EP1225481A2 Collector for an illumination system with wavelength of 193 nm |
| 07/24/2002 | EP1225480A2 Radiation-sensitive resin composition |
| 07/24/2002 | EP1225479A2 Chemical amplifying type positive resist composition |
| 07/24/2002 | EP1225478A2 Photosensitive resin composition |
| 07/24/2002 | EP1225477A1 Process for fabricating and marking micromechanical components using photolithography and electrodeposition |
| 07/24/2002 | EP1225476A1 Positive photoresist for the production of an information recording medium, manufacturing method of the information recording medium and the information recording medium |
| 07/24/2002 | EP1225192A1 Polyimides and polyamic acids |
| 07/24/2002 | EP1225041A2 Thermal imaging compositions and member and methods of imaging and printing |
| 07/24/2002 | EP1224717A1 High pulse rate pulse power system with fast rise time and low leakage current |
| 07/24/2002 | EP1224497A1 Birefringence minimizing fluoride crystal optical vuv microlithography lens elements and optical blanks therefor |
| 07/24/2002 | EP1053507A4 Integral thin-film metal resistor with improved tolerance and simplified processing |
| 07/24/2002 | EP1028818A4 Deposition of substances on a surface |
| 07/24/2002 | EP0998697A4 Method and system for providing a probe array chip design database |
| 07/24/2002 | EP0970085B1 Photoactivatable nitrogen-containing bases based on alpha-amino alkenes |
| 07/24/2002 | EP0900213B1 Processes for preparing thioxanthone and derivatives thereof |
| 07/24/2002 | EP0804431B1 GLYCOPROTEIN IIb/IIIa ANTAGONISTS |
| 07/24/2002 | CN1360685A Alkali development type photocurable composition and pattern of burned matter obtained from same |
| 07/24/2002 | CN1360463A Method for making printed circuit board with corrosion-resistant dry film |
| 07/24/2002 | CN1088319C Thick-film conductor circuit and production method therefor |
| 07/24/2002 | CN1088208C In-situ synchronous photopolymerization photoproduced color imaging material composition and its preparing method and use |
| 07/24/2002 | CN1088070C Novel amide- and imide-contg. copolymer, preparation thereof and photoresist comprising same |
| 07/23/2002 | US6424882 Method for patterning and fabricating wordlines |
| 07/23/2002 | US6424879 System and method to correct for distortion caused by bulk heating in a substrate |
| 07/23/2002 | US6424471 Catadioptric objective with physical beam splitter |
| 07/23/2002 | US6424417 Method and system for controlling the photolithography process |
| 07/23/2002 | US6424405 Exposure apparatus and device manufacturing method |
| 07/23/2002 | US6424404 Multi-stage microlens array |
| 07/23/2002 | US6424368 System for the transfer of digitized images to an image support or vice-versa |
| 07/23/2002 | US6423977 Pattern size evaluation apparatus |
| 07/23/2002 | US6423964 Method and apparatus for adjusting amount of light in image exposure recording system |
| 07/23/2002 | US6423799 Irradiation |
| 07/23/2002 | US6423797 Anti-reflective coating polymers from p-tosylmethylacrylamide and preparation method |
| 07/23/2002 | US6423631 Isolation using an antireflective coating |
| 07/23/2002 | US6423480 Remover composition |
| 07/23/2002 | US6423477 Applying photoresist to plate; exposure to ultraviolet radiation; development, heating |
| 07/23/2002 | US6423474 Patterning and etching photoresist; annealing |
| 07/23/2002 | US6423472 Aqueous developable photosensitive polyurethane-methacrylate |
| 07/23/2002 | US6423471 Photosensitive composition and method of making lithographic printing plate |
| 07/23/2002 | US6423469 Thermal switchable composition and imaging member containing oxonol IR dye and methods of imaging and printing |
| 07/23/2002 | US6423468 Anodized titanium layer capable of image correction when exposed to light; latent image partly erased by heat |
| 07/23/2002 | US6423467 Photosensitive resin composition |
| 07/23/2002 | US6423466 Hand application to fabric of heat transfers imaged with color copiers/printers |
| 07/23/2002 | US6423465 Process for preparing a patterned continuous polymeric brush on a substrate surface |
| 07/23/2002 | US6423463 Novolac, polyvinyl lower alkyl ether, polyphenol derivative, and naphthoquinonediazide; positive tones, printed circuits |
| 07/23/2002 | US6423462 Image forming material |
| 07/23/2002 | US6423458 Adding tracing substance to light sensitive layers; measurement; automatic processor |
| 07/23/2002 | US6423457 In-situ process for monitoring lateral photoresist etching |