Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2002
08/01/2002US20020102749 Methods and systems for determining a characteristic of a layer formed on a specimen by a deposition process
08/01/2002US20020102747 Correction of overlay offset between inspection layers in integrated circuits
08/01/2002US20020102567 Method for comparing nucleic acid sequences
08/01/2002US20020102501 Photosensitive resin composition and method for formation of resist pattern by use thereof
08/01/2002US20020102500 Method for raising etching selectivity of oxide to photoresist
08/01/2002US20020102498 Method for forming biconvex microlens of image sensor
08/01/2002US20020102497 Barium fluoride crystalline material for use in dispersion management of below 160 nm optical lithography processes
08/01/2002US20020102493 Norbornene based polymers; photoresists; resolution, etching resistance, use in micropatterning with electron beams or deep-ultraviolet radation
08/01/2002US20020102492 Positive-working resist composition
08/01/2002US20020102491 Positive photosensitive composition
08/01/2002US20020102490 Substituted norbornene fluoroacrylate copolymers and use thereof lithographic photoresist compositions
08/01/2002US20020102488 Capable of plat-making by scanning exposure based on digital signals, having high-sensitivity and good press life, capable of giving printed matters having no stains, and capable of printing by being mounted on printing machine as is
08/01/2002US20020102483 Antireflective coating compositions
08/01/2002US20020102482 Reference wafer and process for manufacturing same
08/01/2002US20020102481 Support assembly for an exposure apparatus
08/01/2002US20020102480 Two or more color-developing layers, which develop hues differing from each other, laminated on the support.
08/01/2002US20020102479 Processor controls a display of an image on the electronically programmed mask, wherein the display replicates conventional type masks; optical contrast; characteristics easily changed or reprogrammed by the processor.
08/01/2002US20020102478 Semitransparent phase shifting mask has, in the periphery of a pattern element area, a light shielding portion which is formed by a semitransparent phase shifting portion and a transparent portion with the optimal size combination.
08/01/2002US20020102477 Semiconductor device manufacturing method
08/01/2002US20020102476 Preparing a plurality of first photomasks including one or more resist masks; and transferring each pattern of said photomasks onto a second photomask by reduced projection exposure.
08/01/2002US20020102475 Method of curing a photosensitive material using evanescent wave energy
08/01/2002US20020102474 Optical proximity correction method
08/01/2002US20020102472 Using an electrical test structure comprised of a cross resistor for van der Pauw sheet resistance measurements, a bridge resistor, and a split-bridge resistor
08/01/2002US20020102470 Information storage on masks for microlithographic tools
08/01/2002US20020102469 Method for aligning a contact or a line to adjacent phase-shifter on a mask
08/01/2002US20020102468 Method of forming an improved attenuated phase-shifting photomask
08/01/2002US20020102312 Molecular imprinting of small particles, and production of small particles from solid state reactants
08/01/2002US20020102015 Pellicle, identification system of the same, and method of identifying the same
08/01/2002US20020101956 X-ray projection exposure apparatus and a device manufacturing method
08/01/2002US20020101903 Purge monitoring system for gas discharge laser
08/01/2002US20020101902 Laser gas replenishment method
08/01/2002US20020101901 Laser gas replenishment method
08/01/2002US20020101892 Exposure apparatus and device manufacturing method using the same
08/01/2002US20020101654 Holder for positioning a specimen slide, and apparatus for laser cutting of specimens, and microscope
08/01/2002US20020101647 Compact imaging head and high speed multi-head laser imaging assembly and method
08/01/2002US20020101644 Light modulation device and system
08/01/2002US20020101574 Irradiance photometer and exposure apparatus
08/01/2002US20020101572 Projection exposure method and apparatus
08/01/2002US20020101501 Multibeam exposure head and multibeam exposure apparatus
08/01/2002US20020101460 Lithography apparatus, lithography method and method of manufacturing master print for transfer
08/01/2002US20020101253 Method and device for vibration control
08/01/2002US20020101027 Method and device for separating printing plates
08/01/2002US20020100882 Plasma focus high energy photon source with blast shield
08/01/2002US20020100881 Charged particle beam lithography apparatus for forming pattern on semi-conductor
08/01/2002US20020100785 Ticket dispensing modules and method
08/01/2002US20020100691 3-dimensional imprint tool
08/01/2002US20020100553 Adhesive tape and process for removing resist
08/01/2002US20020100386 Method of, and apparatus for, handling an exposure surface to be exposed, in particular, a printing plate
08/01/2002US20020100385 Lithographic printing machine and lithographic printing method
08/01/2002US20020100384 Lithographic printing plates for use with laser imaging apparatus
08/01/2002US20020100164 Wiring substrate manufacturing method
08/01/2002DE10143218A1 Verfahren und Vorrichtung zum Drucken 3D-modellierter Objekte Method and apparatus for printing 3D modeled objects
08/01/2002DE10135068A1 Ausrichtgerät zum Ausbilden eines Musters auf einem Halbleitersubstrat durch Belichten und Verfahren zur Herstellung einer Halbleitervorrichtung mit einem Ausrichtgerät Aligner for forming a pattern on a semiconductor substrate by exposing and method of manufacturing a semiconductor device having a positioning mechanism
08/01/2002DE10104177A1 Katadioptrisches Reduktionsobjektiv A catadioptric reduction objective
08/01/2002DE10104078A1 Verfahren und Einrichtung zur Vereinzelung von Druckplatten Method and apparatus for separating plates
07/2002
07/31/2002EP1227354A2 Catadioptric reduction objective
07/31/2002EP1227344A1 Antireflection base for ultraviolet and vacuum ultraviolet regions
07/31/2002EP1226936A2 Processes for producing lithographic printing plate
07/31/2002EP1226635A1 Gas discharge laser with gas temperature control
07/31/2002EP1226634A1 Single chamber gas discharge laser with line narrowed seed beam
07/31/2002EP1226603A2 Removal of photoresist and residue from substrate using supercritical carbon dioxide process
07/31/2002EP1226471A2 Removable cover for protecting a reticle, system including and method of using the same
07/31/2002EP1226470A2 Method of forming optical images, mask for use in this method, method of manufacturing a device using this method, and apparatus for carrying out this method
07/31/2002EP1226469A1 Trimming mask with semitransparent phase-shifting regions
07/31/2002EP1199603A9 Positive photosensitive composition
07/31/2002EP0787255B1 Perforated disc, especially for injection valves
07/31/2002CN1361450A Optical proximity effect correcting method
07/31/2002CN1088527C Method for imaging process of photosensitive resin composition
07/31/2002CN1088526C Photo sensitive ink inhibitor composition
07/31/2002CN1088525C Photo mask and method for manufacturing the same
07/31/2002CN1088458C Process for producing thioxanthone and derivatives thereof
07/30/2002US6426860 Holding device for a substrate
07/30/2002US6426840 Electronic spot light control
07/30/2002US6426790 Stage apparatus and holder, and scanning exposure apparatus and exposure apparatus
07/30/2002US6426789 Aligner having shared rotation shaft
07/30/2002US6426788 Stage device and exposure apparatus using the same
07/30/2002US6426508 Surface-position detection device, a projection exposure apparatus using the device, and a device manufacturing method using the apparatus
07/30/2002US6426506 Compact multi-bounce projection system for extreme ultraviolet projection lithography
07/30/2002US6426304 Forming reducing plasma in reaction vessel in proximity with portion of semiconductor wafer including layer of organosilicate dielectric, using plasma to strip portion of photoresist from wafer in situ within semiconductor apparatus
07/30/2002US6426299 Method and apparatus for manufacturing semiconductor device
07/30/2002US6426269 Dummy feature reduction using optical proximity effect correction
07/30/2002US6426232 Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment
07/30/2002US6426184 Making multimers such as dna or peptides in chemical reactor by solution-based photochemical reactions involving reagents generated in situ by irradiation
07/30/2002US6426177 Single component developer for use with ghost exposure
07/30/2002US6426174 Detecting focus position variation and sensitivity variation separately without previous calculation of correction magnitude which is optimal for exposure of interconnection pattern with target-sized wiring width of semiconductor device
07/30/2002US6426173 Preparation method for printing plate
07/30/2002US6426171 Photoresist monomer, polymer thereof and photoresist composition containing it
07/30/2002US6426168 Method of inspecting photo masks
07/30/2002US6426131 Off-axis pupil aperture and method for making the same
07/30/2002US6425722 Substrate treatment system, substrate transfer system, and substrate transfer method
07/30/2002US6425669 Maskless exposure system
07/30/2002US6425497 Method and apparatus for dispensing resist solution
07/30/2002US6425482 Screwdriver hanger
07/30/2002US6425327 Method for forming a cylindrical photosensitive element
07/30/2002US6425280 Wafer alignment jig for wafer-handling systems
07/25/2002WO2002058199A1 Spinodal copper alloy electrodes
07/25/2002WO2002058119A1 Electron beam deflection device, method of producing electron beam deflection device, and electron beam exposure device
07/25/2002WO2002058118A1 Electron beam exposure device and electron beam deflection device
07/25/2002WO2002057851A1 Method and apparatus for microlithography
07/25/2002WO2002057830A1 Zoom optical system, aligner having the zoom optical system, and aligning method