Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2013
10/30/2013CN101738882B Alignment mark detecting method
10/30/2013CN101713928B Exposure apparatus
10/30/2013CN101700992B Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition
10/30/2013CN101681094B Imprint lithography with improved substrate/mold separation
10/29/2013US8570515 Periodic patterns and technique to control misalignment between two layers
10/29/2013US8570491 System for patterning flexible foils
10/29/2013US8570486 Lithographic apparatus and device manufacturing method
10/29/2013US8569398 Jettable compositions
10/29/2013US8569393 UV-LED curable compositions and inks
10/29/2013US8568964 Flood exposure process for dual tone development in lithographic applications
10/29/2013US8568962 Process for preparing a polymeric relief structure
10/29/2013US8568961 Methods for protecting a die surface with photocurable materials
10/29/2013US8568960 Multiple exposure photolithography methods
10/29/2013US8568959 Techniques for reducing degradation and/or modifying feature size of photomasks
10/29/2013US8568958 Underlayer composition and process thereof
10/29/2013US8568956 Resist composition and method for producing resist pattern
10/29/2013US8568954 Positive photosensitive resin composition
10/29/2013US8568534 Method for washing device substrate
10/29/2013US8568043 Coating and developing apparatus and coating and developing method
10/29/2013US8567040 Iron core, iron core manufacturing method, alignment apparatus, and exposure apparatus
10/24/2013WO2013158543A1 Methods for making micro- and nano-scale conductive grids for transparent electrodes and polarizers by roll to roll optical lithography
10/24/2013WO2013158021A1 A nanocapillary device for biomolecule detection, a fluidic network structure and a method of manufacturing thereof
10/24/2013WO2013157900A1 Base material for forming conductive pattern and conductive pattern formed using same
10/24/2013WO2013157643A1 Polysiloxane composition having radical-crosslinkable group
10/24/2013WO2013157459A1 Photosensitive resin composition, process for producing cured film, cured film, organic el display device, and liquid-crystal display device
10/24/2013WO2013157366A1 Liquid treatment device, liquid treatment method, and filter device
10/24/2013WO2013157356A1 Mask unit and substrate processing device
10/24/2013WO2013156942A1 Method and apparatus for the photopolymerization and the washing in series of digital printing plates for flexography
10/24/2013WO2013156926A1 Lighting apparatus for providing light for processing an object
10/24/2013WO2013156335A1 Optical system, in particular of a microlithographic projection exposure apparatus
10/24/2013WO2013156278A1 Optical system of a microlithographic projection exposure apparatus
10/24/2013WO2013156251A1 Optical system of a microlithographic projection exposure apparatus, and method for adjusting an optical system
10/24/2013WO2013156240A1 Methods for providing spaced lithography features on a substrate by self-assembly of block copolymers
10/24/2013WO2013156236A1 Substrate holder, lithographic apparatus, and device manufacturing method
10/24/2013WO2013156145A1 Microlithographic apparatus and method of changing an optical wavefront in such an apparatus
10/24/2013WO2013156086A1 Adaptive pattern generation
10/24/2013WO2013156041A1 A microlithographic apparatus and a method of changing an optical wavefront in an objective of such an apparatus
10/24/2013WO2013155947A1 Single degree of freedom vibration isolating device of linear motor and motion control method thereof
10/24/2013WO2013155838A1 Cylindrical lenticulation and manufacturing method thereof
10/24/2013WO2013155799A1 Colour filter and manufacturing method therefor
10/24/2013WO2013155747A1 Colour filter, manufacturing method therefor, and liquid crystal panel
10/24/2013WO2013155729A1 Device and method for prebaking alignment film with substrate supported by temperature control pin
10/24/2013WO2013127608A3 Methods of providing patterned chemical epitaxy templates for self-assemblable block copolymers for use in device lithography
10/24/2013WO2013127587A3 Source collector apparatus, lithographic apparatus and device manufacturing method
10/24/2013WO2013018978A8 Photoactive compound and a light-sensitive resin composition comprising same
10/24/2013US20130280920 Templated Monolayer Polymerization and Replication
10/24/2013US20130280912 Silicon compound, silicon-containing compound, composition for forming resist underlayer film containing the same and patterning process
10/24/2013US20130280661 Method for manufacturing liquid crystal display device
10/24/2013US20130280660 Method of pattering nonmetal conductive layer
10/24/2013US20130280659 Exhaust apparatus, processing apparatus, and device manufacturing method
10/24/2013US20130280658 Radiation-sensitive composition, and compound
10/24/2013US20130280657 Photoresist composition and resist pattern-forming method
10/24/2013US20130280656 Photosensitive, developer-soluble bottom anti-reflective coating material
10/24/2013US20130280655 Aromatic hydrocarbon resin, underlayer film forming composition for lithography, and method for forming multilayer resist pattern
10/24/2013US20130280654 Positive-type photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device including the cured film
10/24/2013US20130280646 Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
10/24/2013US20130280645 Mask Set for Double Exposure Process and Method of Using the Mask Set
10/24/2013US20130280541 Photo-curing polysiloxane composition and application thereof
10/24/2013US20130279869 Planar optical waveguide and method for making same
10/24/2013US20130279038 Color filter and manufacturing method thereof
10/24/2013US20130279029 Replacement apparatus for an optical element
10/24/2013US20130278915 Lithographic Apparatuses and Methods for Compensating For Eigenmode Coupling
10/24/2013US20130278913 Filter device for the compensation of an asymmetric pupil illumination
10/24/2013US20130278910 Projection optical assembly, projection optical assembly adjustment method, exposure device, exposure method, and device manufacturing method
10/24/2013US20130278909 Apparatus for thermal development with supporting surface for a development medium
10/24/2013US20130278908 Exposure apparatus and exposure method, maintenance method, and device manufacturing method
10/24/2013US20130277627 Photosensitive resin composition and applications of the same
10/24/2013US20130277452 Chamber apparatus and method of maintaining target supply unit
10/24/2013DE102012206612A1 Optisches Bauelement zur Führung eines Strahlungsbündels An optical device for guiding a radiation beam
10/24/2013DE102012206609A1 Strahlführungsoptik für ein Vielstrahlsystem Beamline optics for a multi-beam system
10/24/2013DE102012103007B3 Method for measuring distance between photomask and substrate in lithographic device, involves determining impact point of light of illumination device reflected on photomask or on substrate
10/24/2013DE102010046395B4 Belichtungsanordnung Exposure arrangement
10/23/2013EP2654073A2 Illumination optical apparatus and projection exposure apparatus
10/23/2013EP2653924A2 Liquid recovery system, immersion exposure apparatus, immersion exposure method, and device fabricating method
10/23/2013EP2653923A1 Method for forming semipermeable membranes for sensor applications using photopolymerizable silicone materials
10/23/2013EP2653922A1 Positive photoresist composition, coating film thereof, and novolac phenol resin
10/23/2013EP2653222A2 Microstructured apparatus with optical surface quality and method for the production thereof
10/23/2013EP2652554A1 Method for structuring a flexographic printing forme
10/23/2013EP2651996A1 Transparent layer forming polymer
10/23/2013EP2651865A1 Fluoroalcohol containing molecular photoresist materials and processes of use
10/23/2013CN103370656A Printing plate developing solution composition, developing solution, and method of manufacturing printing plate precursor
10/23/2013CN103370655A Lithography system and method of processing substrates in such a lithography system
10/23/2013CN103370654A Method and apparatus for printing high-resolution two-dimensional periodic patterns
10/23/2013CN103370653A Underlayer coating composition and process for manufacturing a microelectronic device
10/23/2013CN103370652A A method of casting
10/23/2013CN103370642A Colored composition for color filters, and color filter
10/23/2013CN103370366A Separating fluid, method and installation for separating multilayer systems
10/23/2013CN103370347A A self-imageable film forming polymer, compositions thereof and devices and structures made therefrom
10/23/2013CN103369840A Substrate treating apparatus
10/23/2013CN103367558A Spherical photoresist mask and preparation method thereof
10/23/2013CN103367541A Method for preparing solar cell silver wire grid electrode based on photolithographic mask method and liquid phase method
10/23/2013CN103367200A Litho cluster and modulization to enhance productivity
10/23/2013CN103367120A Forming method for high-resolution channel pattern
10/23/2013CN103366861A 导电糊剂和导电电路 Conductive paste and conductive circuit
10/23/2013CN103365203A Control apparatus, lithography apparatus, and method of manufacturing article
10/23/2013CN103365125A Process base fringing field leveling method
10/23/2013CN103365124A 曝光对准方法 Exposure alignment method
10/23/2013CN103365123A Adjusting mechanism of diaphragm plate of alignment system
10/23/2013CN103365122A Self-reference interference alignment system for photoetching equipment
10/23/2013CN103365121A Slushing compound peeling composition and a method employing the slushing compound peeling composition to peel off the slushing compound
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