| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/08/2002 | WO2002041078A3 Radiation curable compositions |
| 08/08/2002 | WO2002029448A3 Photocurable resin composition and optical material |
| 08/08/2002 | WO2002010858A3 Process for manufacturing a microelectronic device |
| 08/08/2002 | WO2002003142A3 Electric microcontact printing method and apparatus |
| 08/08/2002 | WO2001095030A3 Resin composition and three-dimensional object |
| 08/08/2002 | WO2001027695A9 Removable cover for protecting a reticle, system including and method of using the same |
| 08/08/2002 | WO2001009884A9 Optical data storage system and method |
| 08/08/2002 | US20020107660 Methods and systems for determining a critical dimension and a thin film characteristic of a specimen |
| 08/08/2002 | US20020107650 Methods and systems for determining a critical dimension and a presence of defects on a specimen |
| 08/08/2002 | US20020107413 Chemical intermediates such as lithium 2,6-dimethylbenzoyl phenylphosphine for preparation of acylphosphines, acylphosphine oxides or acylphosphine sulfides |
| 08/08/2002 | US20020106902 Etching process for organic anti-reflective coating |
| 08/08/2002 | US20020106848 Methods and systems for determining a property of a specimen prior to, during, or subsequent to lithography |
| 08/08/2002 | US20020106830 Process for producing optical article |
| 08/08/2002 | US20020106821 Method of varying stepper exposure dose to compensate for across-wafer variations in photoresist thickness, and system for accomplishing same |
| 08/08/2002 | US20020106818 Method of manufacturing semiconductor device and apparatus of automatically adjusting semiconductor pattern |
| 08/08/2002 | US20020106589 Reduce the surface tension in water-based systems |
| 08/08/2002 | US20020106588 Forming a negative photoresist layer with a first and second perpendicular, parallel strip patterns transferred by first and second masks |
| 08/08/2002 | US20020106584 Solid imaging compositions for preparing polypropylene-like articles |
| 08/08/2002 | US20020106581 Polysiloxane synthesized by the reaction of a silane compound having an amino group with an aromatic acid anhydride and a copolymerization alkali soluble siloxane component |
| 08/08/2002 | US20020106580 A resin capable of increased solubility in alkali by interacting with an acid, an iradiation acid generator compound, a compound with at least two vinyl ether groups, and an organic amine |
| 08/08/2002 | US20020106579 Adjust the height and center of a liquid dispenser nozzle with respect to the wafer chuck |
| 08/08/2002 | US20020106578 Cyclopentanone solvent, polymethylglutarimide and a light absorption dye applied onto a body, heat treated, and covered with a photoresist |
| 08/08/2002 | US20020106577 Photosensitive copper paste and method of forming copper pattern using the same |
| 08/08/2002 | US20020106568 For use as color filters for liquid-crystal displays |
| 08/08/2002 | US20020106446 Layer comprising acrylic polymer, fluorescent substance and a photosensitive resin are formed inside cell of display substrate; exposing, developing and baking |
| 08/08/2002 | US20020106445 Chemical liquid coating device and chemical liquid coating method |
| 08/08/2002 | US20020106268 Substrate treatment system, substrate transfer system, and substrate transfer method |
| 08/08/2002 | US20020106050 X-ray exposure apparatus |
| 08/08/2002 | US20020105996 Ultra pure component purge system for gas discharge laser |
| 08/08/2002 | US20020105994 Gas discharge laser with improved beam path |
| 08/08/2002 | US20020105993 Pulsed discharge gas laser having non-integral supply reservoir |
| 08/08/2002 | US20020105649 Method and apparatus for self-referenced wafer stage positional error mapping |
| 08/08/2002 | US20020105648 Inspection method, apparatus and system for circuit pattern |
| 08/08/2002 | US20020105629 Method and apparatus for microlithography |
| 08/08/2002 | US20020105628 Exposure method and apparatus using near field light |
| 08/08/2002 | US20020105627 Fabrication method for correcting member, fabrication method for projection optical system, and exposure apparatus |
| 08/08/2002 | US20020105043 Antireflective coating layer |
| 08/08/2002 | US20020104970 Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field |
| 08/08/2002 | US20020104950 Active vibration suppression apparatus, control method therefor, and exposure apparatus having active vibration suppression apparatus |
| 08/08/2002 | US20020104550 Treating exposed metallized (metal X) surfaces, with an alkaline, water-based solution of a first constituent comprised of the metal X and a second constituent that reacts with the first to form anticorrosive film and remove residues |
| 08/08/2002 | US20020104455 Chemical imaging of a lithographic printing plate |
| 08/08/2002 | US20020104453 Air bearing assembly |
| 08/08/2002 | US20020104452 Image recording apparatus |
| 08/08/2002 | DE10162447A1 Einrichtung zur Bebilderung einer Druckform mit einem fokusverschiebenden optischen Element Device for imaging a printing form with a focus shifting optical element |
| 08/08/2002 | DE10103823A1 Entwicklerflüssigkeit enthaltend Dipropylenglycoldialkylether Developer liquid containing Dipropylenglycoldialkylether |
| 08/08/2002 | DE10062660A1 Halbleiterstruktur mit einer Siliciumoxynitrid -ARC-Schicht und Verfahren zur Herstellung desselben Of the same semiconductor structure with a silicon oxynitride -Arc layer and processes for preparing |
| 08/08/2002 | CA2696880A1 Flexible patterned mask with regions of differing opacity |
| 08/07/2002 | EP1229573A1 Exposure method and system |
| 08/07/2002 | EP1229391A2 Process and device for handling a surface to be exposed, particularly a printing plate |
| 08/07/2002 | EP1229390A1 Positive type radiation-sensitive composition and process for producing pattern with the same |
| 08/07/2002 | EP1229389A1 Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern, resist pattern and substrate having the resist pattern laminated thereon |
| 08/07/2002 | EP1229388A2 Adhesive tape and process for removing photoresist |
| 08/07/2002 | EP1229387A2 Lithography apparatus, lithography method and method of manufacturing master print for transfer |
| 08/07/2002 | EP1229386A2 Ambient condition sensor for a photosensitive media cartridge |
| 08/07/2002 | EP1229092A2 Polymer composition, cured product, laminate and method for producing the cured product |
| 08/07/2002 | EP1228871A1 Apparatus for cleaning a surface |
| 08/07/2002 | EP1228865A2 Lithographic printing plate precursor |
| 08/07/2002 | EP1228402A1 Composite relief image printing elements |
| 08/07/2002 | EP1228401A1 Step and flash imprint lithography |
| 08/07/2002 | EP1228264A1 Improved aperture plate and methods for its construction and use |
| 08/07/2002 | CN1088856C Scale mask-plate for off-axis lighting |
| 08/07/2002 | CN1088855C Oximesulfonic acid esters and use thereof as latent sulfonic acids |
| 08/07/2002 | CN1088854C Reticle |
| 08/06/2002 | US6430465 Abbe error correction system and method |
| 08/06/2002 | US6430464 Stepper alignment process |
| 08/06/2002 | US6429937 Pattern reading apparatus |
| 08/06/2002 | US6429931 Method and apparatus for article inspection including speckle reduction |
| 08/06/2002 | US6429930 Determination of center of focus by diffraction signature analysis |
| 08/06/2002 | US6429445 Electron beam irradiating apparatus having cathode plate formed of non-metal conductive material |
| 08/06/2002 | US6429443 Multiple beam electron beam lithography system |
| 08/06/2002 | US6429440 Lithography apparatus having a dynamically variable illumination beam |
| 08/06/2002 | US6429425 Method for forming a calibation standard to adjust a micro-bar of an electron microscope |
| 08/06/2002 | US6429143 Pattern formation method |
| 08/06/2002 | US6429141 Method of manufacturing a semiconductor device with improved line width accuracy |
| 08/06/2002 | US6429140 Method of etching of photoresist layer |
| 08/06/2002 | US6429138 Method of manufacturing semiconductor device |
| 08/06/2002 | US6429058 Method of forming fully self-aligned TFT improved process window |
| 08/06/2002 | US6428940 Method for pattern generation with improved image quality |
| 08/06/2002 | US6428894 Tunable and removable plasma deposited antireflective coatings |
| 08/06/2002 | US6428862 Ink, ink-jet recording method using the same, and photopolymerization initiator |
| 08/06/2002 | US6428852 Process for coating a solid surface with a liquid composition |
| 08/06/2002 | US6428729 Composite substrate carrier |
| 08/06/2002 | US6427596 Softening polymer using acid, base |
| 08/06/2002 | US6427325 Flowable compositions and use in filling vias and plated through-holes |
| 08/01/2002 | WO2002060037A1 Coil with cooling means |
| 08/01/2002 | WO2002059960A1 Apparatus and method of inspecting semiconductor wafer |
| 08/01/2002 | WO2002059905A2 Narrow-band spectral filter and the use thereof |
| 08/01/2002 | WO2002059892A1 Optical recording medium, master disc for manufacturing optical recording medium, and device and method for manufacturing master disc for manufacturing optical recording medium |
| 08/01/2002 | WO2002059695A1 Stepper exposure dose control based upon across wafer variations in device characteristics |
| 08/01/2002 | WO2002059184A2 Molecular imprinting of small particles, and production of small particles from solid state reactants |
| 08/01/2002 | WO2002059073A1 Process for preparing alkyladamantyl esters and compositions |
| 08/01/2002 | WO2002041079A3 Positive type photosensitive epoxy resin composition and printed circuit board using the same |
| 08/01/2002 | WO2002033491A3 Aqueous developer for lithographic printing plates |
| 08/01/2002 | WO2002012960A3 Method of laminating a photoresist sheet to a substrate |
| 08/01/2002 | WO2001088469A8 Interferometric apparatus and method |
| 08/01/2002 | WO2001011666A9 Method of etching a wafer layer using multiple layers of the same photoresistant material and structure formed thereby |
| 08/01/2002 | US20020103564 Methods and systems for determining a composition and a thickness of a specimen |
| 08/01/2002 | US20020103270 Photo- or heat-curable resin composition and multilayer printed wiring board |
| 08/01/2002 | US20020102782 Semiconductor device with two types of FET's having different gate lengths and its manufacture method |
| 08/01/2002 | US20020102750 Method for reducing borderless contact leakage by opc |